WO2009005041A1 - 耐フレッティング性コネクタおよびその製造方法 - Google Patents

耐フレッティング性コネクタおよびその製造方法 Download PDF

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Publication number
WO2009005041A1
WO2009005041A1 PCT/JP2008/061868 JP2008061868W WO2009005041A1 WO 2009005041 A1 WO2009005041 A1 WO 2009005041A1 JP 2008061868 W JP2008061868 W JP 2008061868W WO 2009005041 A1 WO2009005041 A1 WO 2009005041A1
Authority
WO
WIPO (PCT)
Prior art keywords
fretting
manufacturing
same
resistant connector
connector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/061868
Other languages
English (en)
French (fr)
Inventor
Kazuo Yoshida
Yoshiaki Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Original Assignee
Furukawa Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd filed Critical Furukawa Electric Co Ltd
Priority to JP2009521628A priority Critical patent/JP4809920B2/ja
Priority to US12/667,195 priority patent/US20110009015A1/en
Priority to EP08777719.9A priority patent/EP2173012B1/en
Priority to CN2008800227111A priority patent/CN101689720B/zh
Publication of WO2009005041A1 publication Critical patent/WO2009005041A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02—Contact members
    • H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Paints Or Removers (AREA)

Abstract

　導電性金属材料の少なくとも表面の一部にエーテル結合基を有する有機化合物から形成された有機皮膜を有する耐フレッティング性コネクタ。
PCT/JP2008/061868 2007-06-29 2008-06-30 耐フレッティング性コネクタおよびその製造方法 Ceased WO2009005041A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009521628A JP4809920B2 (ja) 2007-06-29 2008-06-30 耐フレッティング性コネクタおよびその製造方法
US12/667,195 US20110009015A1 (en) 2007-06-29 2008-06-30 Fretting-resistant connector and process for manufacturing the same
EP08777719.9A EP2173012B1 (en) 2007-06-29 2008-06-30 Fretting-resistant connector and process for manufacturing the same
CN2008800227111A CN101689720B (zh) 2007-06-29 2008-06-30 耐微振磨损性连接器及其制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007173335 2007-06-29
JP2007-173335 2007-06-29

Publications (1)

Publication Number Publication Date
WO2009005041A1 true WO2009005041A1 (ja) 2009-01-08

Family

ID=40226085

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061868 Ceased WO2009005041A1 (ja) 2007-06-29 2008-06-30 耐フレッティング性コネクタおよびその製造方法

Country Status (5)

Country Link
US (1) US20110009015A1 (ja)
EP (1) EP2173012B1 (ja)
JP (1) JP4809920B2 (ja)
CN (1) CN101689720B (ja)
WO (1) WO2009005041A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4795466B2 (ja) * 2007-06-29 2011-10-19 古河電気工業株式会社 金属材料、その製造方法、及びそれを用いた電気電子部品
JP2012209051A (ja) * 2011-03-29 2012-10-25 Sumitomo Wiring Syst Ltd ハーネス部品の膜厚検査方法及びハーネス部品の膜厚検査装置
WO2014021219A1 (ja) * 2012-08-03 2014-02-06 株式会社オートネットワーク技術研究所 コネクタ端子及びコネクタ端子用材料
WO2023182259A1 (ja) * 2022-03-22 2023-09-28 株式会社オートネットワーク技術研究所 端子材料および電気接続端子

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5192878B2 (ja) * 2007-04-09 2013-05-08 古河電気工業株式会社 コネクタおよびコネクタ用金属材料
JP5246503B2 (ja) * 2009-02-23 2013-07-24 住友電装株式会社 端子金具
JP5464284B1 (ja) * 2013-01-10 2014-04-09 株式会社オートネットワーク技術研究所 コネクタ端子及びコネクタ端子の製造方法
FR3009445B1 (fr) * 2013-07-31 2017-03-31 Hypertac Sa Organe de contact entre un support et un dispositif et connecteur electrique comprenant un tel organe de contact
JP6361477B2 (ja) * 2014-11-19 2018-07-25 株式会社オートネットワーク技術研究所 コネクタ用端子
JP6540890B2 (ja) 2016-05-12 2019-07-10 住友電装株式会社 端子金具
CN108092065A (zh) * 2017-11-21 2018-05-29 瑞声科技(新加坡)有限公司 电磁连接组件
CN111403937A (zh) * 2020-03-24 2020-07-10 东莞立德精密工业有限公司 金属端子及其制作方法
JP6872089B1 (ja) * 2020-03-27 2021-05-19 日本航空電子工業株式会社 接点部材、コネクタ、組成物、接点部材の製造方法

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000015743A (ja) * 1998-06-29 2000-01-18 Japan Aviation Electronics Ind Ltd めっき材
JP2002212582A (ja) * 2001-01-15 2002-07-31 Chemical Denshi:Kk 水溶性金属表面潤滑剤及び電子部品
JP2002343168A (ja) * 2001-05-11 2002-11-29 Mitsubishi Electric Corp 摺動通電体
JP2004176179A (ja) 2002-11-15 2004-06-24 Chubu Kiresuto Kk 電子部品端子の水溶性半田濡れ性向上処理剤および処理法
JP2004323926A (ja) 2003-04-25 2004-11-18 Ishihara Chem Co Ltd メッキ表面の後処理液、及び後処理方法
JP2005019103A (ja) * 2003-06-24 2005-01-20 Kobe Steel Ltd コネクタ接点材料および多極端子
JP2005240181A (ja) 2004-02-25 2005-09-08 Posco チオール化合物を利用した金属の腐蝕防止方法及び被覆方法
JP2005336554A (ja) 2004-05-27 2005-12-08 Matsushita Electric Ind Co Ltd 錫めっき皮膜及びめっき皮膜の製造方法
JP2006086113A (ja) * 2004-08-18 2006-03-30 Yazaki Corp 低挿入力コネクタ端子、その製造方法、及び、低挿入力コネクタ端子用基板
JP2006173059A (ja) * 2004-12-20 2006-06-29 Kobe Steel Ltd コネクタ接点材料
JP2006261118A (ja) * 2005-03-15 2006-09-28 Delphi Technologies Inc 低摩擦電気接点
JP2006299416A (ja) * 2001-08-14 2006-11-02 Marjan Inc コーティング

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11217579A (ja) * 1998-02-04 1999-08-10 Kanto Chem Co Inc 電気接点用処理剤
US7104850B2 (en) * 2004-08-18 2006-09-12 Yazaki Corporation Low insertion-force connector terminal, method of producing the same and substrate for the same
US20060212348A1 (en) * 2005-03-15 2006-09-21 Lambert Matthew C Method for scheduling of broadcast events

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000015743A (ja) * 1998-06-29 2000-01-18 Japan Aviation Electronics Ind Ltd めっき材
JP2002212582A (ja) * 2001-01-15 2002-07-31 Chemical Denshi:Kk 水溶性金属表面潤滑剤及び電子部品
JP2002343168A (ja) * 2001-05-11 2002-11-29 Mitsubishi Electric Corp 摺動通電体
JP2006299416A (ja) * 2001-08-14 2006-11-02 Marjan Inc コーティング
JP2004176179A (ja) 2002-11-15 2004-06-24 Chubu Kiresuto Kk 電子部品端子の水溶性半田濡れ性向上処理剤および処理法
JP2004323926A (ja) 2003-04-25 2004-11-18 Ishihara Chem Co Ltd メッキ表面の後処理液、及び後処理方法
JP2005019103A (ja) * 2003-06-24 2005-01-20 Kobe Steel Ltd コネクタ接点材料および多極端子
JP2005240181A (ja) 2004-02-25 2005-09-08 Posco チオール化合物を利用した金属の腐蝕防止方法及び被覆方法
JP2005336554A (ja) 2004-05-27 2005-12-08 Matsushita Electric Ind Co Ltd 錫めっき皮膜及びめっき皮膜の製造方法
JP2006086113A (ja) * 2004-08-18 2006-03-30 Yazaki Corp 低挿入力コネクタ端子、その製造方法、及び、低挿入力コネクタ端子用基板
JP2006173059A (ja) * 2004-12-20 2006-06-29 Kobe Steel Ltd コネクタ接点材料
JP2006261118A (ja) * 2005-03-15 2006-09-28 Delphi Technologies Inc 低摩擦電気接点

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2173012A4

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4795466B2 (ja) * 2007-06-29 2011-10-19 古河電気工業株式会社 金属材料、その製造方法、及びそれを用いた電気電子部品
JP2012209051A (ja) * 2011-03-29 2012-10-25 Sumitomo Wiring Syst Ltd ハーネス部品の膜厚検査方法及びハーネス部品の膜厚検査装置
WO2014021219A1 (ja) * 2012-08-03 2014-02-06 株式会社オートネットワーク技術研究所 コネクタ端子及びコネクタ端子用材料
JP2014031545A (ja) * 2012-08-03 2014-02-20 Auto Network Gijutsu Kenkyusho:Kk コネクタ端子及びコネクタ端子用材料
WO2023182259A1 (ja) * 2022-03-22 2023-09-28 株式会社オートネットワーク技術研究所 端子材料および電気接続端子

Also Published As

Publication number Publication date
JP4809920B2 (ja) 2011-11-09
EP2173012A1 (en) 2010-04-07
CN101689720B (zh) 2012-12-12
JPWO2009005041A1 (ja) 2010-08-26
EP2173012A4 (en) 2011-10-19
CN101689720A (zh) 2010-03-31
US20110009015A1 (en) 2011-01-13
EP2173012B1 (en) 2019-04-17

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