WO2009020116A1 - 光学用樹脂材料及びそれを用いた光学素子 - Google Patents

光学用樹脂材料及びそれを用いた光学素子 Download PDF

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Publication number
WO2009020116A1
WO2009020116A1 PCT/JP2008/064021 JP2008064021W WO2009020116A1 WO 2009020116 A1 WO2009020116 A1 WO 2009020116A1 JP 2008064021 W JP2008064021 W JP 2008064021W WO 2009020116 A1 WO2009020116 A1 WO 2009020116A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin material
refractive index
optical
element utilizing
curable resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/064021
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English (en)
French (fr)
Inventor
Akiyoshi Kimura
Yasuo Taima
Hideaki Wakamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Opto Inc
Original Assignee
Konica Minolta Opto Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto Inc filed Critical Konica Minolta Opto Inc
Priority to US12/668,457 priority Critical patent/US20100190919A1/en
Priority to CN200880102097A priority patent/CN101772521A/zh
Priority to EP08792207A priority patent/EP2177546A4/en
Priority to JP2009526460A priority patent/JPWO2009020116A1/ja
Publication of WO2009020116A1 publication Critical patent/WO2009020116A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00—Use of pretreated ingredients
    • C08K9/04—Ingredients treated with organic substances
    • C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/141—Beam splitting or combining systems operating by reflection only using dichroic mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/145—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces
    • G02B27/146—Beam splitting or combining systems operating by reflection only having sequential partially reflecting surfaces with a tree or branched structure
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/253—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates
    • G11B7/2533—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins
    • G11B7/2538—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of substrates comprising resins polycycloolefins [PCO]

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Composite Materials (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Eyeglasses (AREA)

Abstract

　本発明は、光線透過率が高く、屈折率の温度安定性が高い光学用樹脂材料及びそれを用いた光学素子を提供する。この光学用樹脂材料は、硬化性樹脂に、屈折率が異なる２種以上の金属酸化物からなる無機微粒子を分散した光学用樹脂材料であって、前記無機微粒子は、屈折率分布を有し、かつ、表面処理剤により表面処理され、少なくとも一部が重合性官能基を持つ表面修飾剤で改質されており、前記硬化性樹脂の硬化後の屈折率をｎｈ、前記無機微粒子の屈折率をｎｇとするとき、下記式（１）の条件を満たすことを特徴とする。 　（１）｜ｎｇ－ｎｈ｜≦０．０７
PCT/JP2008/064021 2007-08-09 2008-08-05 光学用樹脂材料及びそれを用いた光学素子 Ceased WO2009020116A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US12/668,457 US20100190919A1 (en) 2007-08-09 2008-08-05 Resin material for optical purposes, and optical element utilizing the same
CN200880102097A CN101772521A (zh) 2007-08-09 2008-08-05 光学用树脂材料及使用该光学用树脂材料的光学元件
EP08792207A EP2177546A4 (en) 2007-08-09 2008-08-05 RESIN MATERIAL FOR OPTICAL OBJECTIVES AND OPTICAL ELEMENT USING THE SAME
JP2009526460A JPWO2009020116A1 (ja) 2007-08-09 2008-08-05 光学用樹脂材料及びそれを用いた光学素子

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-207804 2007-08-09
JP2007207804 2007-08-09

Publications (1)

Publication Number Publication Date
WO2009020116A1 true WO2009020116A1 (ja) 2009-02-12

Family

ID=40341348

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/064021 Ceased WO2009020116A1 (ja) 2007-08-09 2008-08-05 光学用樹脂材料及びそれを用いた光学素子

Country Status (6)

Country Link
US (1) US20100190919A1 (ja)
EP (1) EP2177546A4 (ja)
JP (1) JPWO2009020116A1 (ja)
KR (1) KR20100056452A (ja)
CN (1) CN101772521A (ja)
WO (1) WO2009020116A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101831129A (zh) * 2010-03-31 2010-09-15 江苏华天通科技有限公司 含过渡金属氧化物纳米材料的电焊用透镜的制备方法
WO2014132624A1 (ja) * 2013-02-27 2014-09-04 パナソニック株式会社 光学材料、光学素子及び複合光学素子

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014062198A (ja) * 2012-09-21 2014-04-10 Dow Corning Toray Co Ltd 硬化性シリコーン組成物、それを用いてなる半導体封止材および光半導体装置
TWI557140B (zh) * 2014-08-19 2016-11-11 努發化工（國際）公司 使用單活性中心催化劑產生之乙烯共聚物
US10329460B2 (en) * 2016-09-14 2019-06-25 3M Innovative Properties Company Fast curing optical adhesive
US11583388B2 (en) 2019-04-05 2023-02-21 Amo Groningen B.V. Systems and methods for spectacle independence using refractive index writing with an intraocular lens
US11944574B2 (en) 2019-04-05 2024-04-02 Amo Groningen B.V. Systems and methods for multiple layer intraocular lens and using refractive index writing
US11564839B2 (en) 2019-04-05 2023-01-31 Amo Groningen B.V. Systems and methods for vergence matching of an intraocular lens with refractive index writing
US11529230B2 (en) 2019-04-05 2022-12-20 Amo Groningen B.V. Systems and methods for correcting power of an intraocular lens using refractive index writing
US12357509B2 (en) 2019-04-05 2025-07-15 Amo Groningen B.V. Systems and methods for improving vision from an intraocular lens in an incorrect position and using refractive index writing
US11678975B2 (en) 2019-04-05 2023-06-20 Amo Groningen B.V. Systems and methods for treating ocular disease with an intraocular lens and refractive index writing
US12377622B2 (en) 2019-04-05 2025-08-05 Amo Groningen B.V. Systems and methods for vergence matching with an optical profile and using refractive index writing
US11583389B2 (en) 2019-04-05 2023-02-21 Amo Groningen B.V. Systems and methods for correcting photic phenomenon from an intraocular lens and using refractive index writing
CN114634357A (zh) * 2022-03-03 2022-06-17 佛山仙湖实验室 一种光固化3d打印陶瓷复合材料及其制备方法与应用

Citations (10)

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JP2002207101A (ja) 2000-12-22 2002-07-26 Eastman Kodak Co 感温性が減少したポリマー状光学製品及び製造方法
JP2003073559A (ja) 2001-09-04 2003-03-12 Mitsui Chemicals Inc 熱可塑性材料組成物、及びそれを含んで構成される光学部品
JP2003073564A (ja) * 2001-09-04 2003-03-12 Mitsui Chemicals Inc 熱可塑性材料組成物、及びそれを含んで構成される光学部品
JP2003240901A (ja) 2001-12-21 2003-08-27 Eastman Kodak Co フォトレジストのナノコンポジット光学プラスチック製品及びその製作方法
JP2005146042A (ja) 2003-11-12 2005-06-09 Olympus Corp 有機無機複合材料及びその製造方法並びに光学素子
JP2005213410A (ja) 2004-01-30 2005-08-11 Nippon Zeon Co Ltd 高屈折率樹脂組成物
JP2005218937A (ja) 2004-02-04 2005-08-18 Hosokawa Funtai Gijutsu Kenkyusho:Kk 微粒子製造方法及び微粒子製造装置
JP2005325349A (ja) * 2004-04-16 2005-11-24 Konica Minolta Opto Inc 熱可塑性樹脂材料及びそれを用いた光学素子
JP2007154159A (ja) * 2005-11-09 2007-06-21 Konica Minolta Opto Inc 有機無機複合材料及び光学素子
WO2007116803A1 (ja) * 2006-04-07 2007-10-18 Konica Minolta Opto, Inc. 光学用有機無機複合材料及び光学素子

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JPS5277154A (en) * 1975-12-24 1977-06-29 Seiko Epson Corp Transparent palstic molded articles
JP2004292698A (ja) * 2003-03-27 2004-10-21 Nissan Motor Co Ltd 樹脂組成物、充填材及び樹脂組成物の製造方法
JP2007077235A (ja) * 2005-09-13 2007-03-29 Konica Minolta Opto Inc 熱可塑性樹脂組成物及び光学素子
JP4315195B2 (ja) * 2006-12-21 2009-08-19 ソニー株式会社 硬化性樹脂材料−微粒子複合材料及びその製造方法、光学材料、並びに発光装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002207101A (ja) 2000-12-22 2002-07-26 Eastman Kodak Co 感温性が減少したポリマー状光学製品及び製造方法
JP2003073559A (ja) 2001-09-04 2003-03-12 Mitsui Chemicals Inc 熱可塑性材料組成物、及びそれを含んで構成される光学部品
JP2003073564A (ja) * 2001-09-04 2003-03-12 Mitsui Chemicals Inc 熱可塑性材料組成物、及びそれを含んで構成される光学部品
JP2003240901A (ja) 2001-12-21 2003-08-27 Eastman Kodak Co フォトレジストのナノコンポジット光学プラスチック製品及びその製作方法
JP2005146042A (ja) 2003-11-12 2005-06-09 Olympus Corp 有機無機複合材料及びその製造方法並びに光学素子
JP2005213410A (ja) 2004-01-30 2005-08-11 Nippon Zeon Co Ltd 高屈折率樹脂組成物
JP2005218937A (ja) 2004-02-04 2005-08-18 Hosokawa Funtai Gijutsu Kenkyusho:Kk 微粒子製造方法及び微粒子製造装置
JP2005325349A (ja) * 2004-04-16 2005-11-24 Konica Minolta Opto Inc 熱可塑性樹脂材料及びそれを用いた光学素子
JP2007154159A (ja) * 2005-11-09 2007-06-21 Konica Minolta Opto Inc 有機無機複合材料及び光学素子
WO2007116803A1 (ja) * 2006-04-07 2007-10-18 Konica Minolta Opto, Inc. 光学用有機無機複合材料及び光学素子

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2177546A4

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101831129A (zh) * 2010-03-31 2010-09-15 江苏华天通科技有限公司 含过渡金属氧化物纳米材料的电焊用透镜的制备方法
WO2014132624A1 (ja) * 2013-02-27 2014-09-04 パナソニック株式会社 光学材料、光学素子及び複合光学素子
JPWO2014132624A1 (ja) * 2013-02-27 2017-02-02 パナソニックＩｐマネジメント株式会社 光学材料、光学素子及び複合光学素子

Also Published As

Publication number Publication date
CN101772521A (zh) 2010-07-07
US20100190919A1 (en) 2010-07-29
JPWO2009020116A1 (ja) 2010-11-04
KR20100056452A (ko) 2010-05-27
EP2177546A4 (en) 2012-02-29
EP2177546A1 (en) 2010-04-21

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