WO2009036892A1 - Vorrichtung zum granulieren von kunststoffsträngen - Google Patents
Vorrichtung zum granulieren von kunststoffsträngen Download PDFInfo
- Publication number
- WO2009036892A1 WO2009036892A1 PCT/EP2008/007228 EP2008007228W WO2009036892A1 WO 2009036892 A1 WO2009036892 A1 WO 2009036892A1 EP 2008007228 W EP2008007228 W EP 2008007228W WO 2009036892 A1 WO2009036892 A1 WO 2009036892A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- rail
- counter
- knife
- blade
- undercut
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29B—PREPARATION OR PRETREATMENT OF THE MATERIAL TO BE SHAPED; MAKING GRANULES OR PREFORMS; RECOVERY OF PLASTICS OR OTHER CONSTITUENTS OF WASTE MATERIAL CONTAINING PLASTICS
- B29B9/00—Making granules
- B29B9/02—Making granules by dividing preformed material
- B29B9/06—Making granules by dividing preformed material in the form of filamentary material, e.g. combined with extrusion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
- C01B32/174—Derivatisation; Solubilisation; Dispersion in solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/674—Thin-film transistors [TFT] characterised by the active materials
- H10D30/6741—Group IV materials, e.g. germanium or silicon carbide
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/881—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being a two-dimensional material
- H10D62/882—Graphene
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/02—Single-walled nanotubes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
- H10K85/225—Carbon nanotubes comprising substituents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/647—With means to convey work relative to tool station
- Y10T83/6476—Including means to move work from one tool station to another
- Y10T83/6478—Tool stations angularly related
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/727—With means to guide moving work
- Y10T83/739—Positively confines or otherwise determines path of work
Definitions
- the blade carrier 1 shown in FIG. 1 has on its upper side the counter blade 2 which is bolted to the blade carrier 1 and which consists of a particularly hard material in order to counteract wear.
- the splitter 3a divided into two parts and 3b is shown on the knife carrier 1, which are inserted into a dovetail-like groove 4 in the knife carrier 1.
- the design of the mounting of the rail 3a and 3b in the dovetail-shaped receptacle can be clearly seen in Figure 2, which will be discussed in more detail below.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Composite Materials (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
- Crushing And Pulverization Processes (AREA)
Abstract
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/670,596 US8721317B2 (en) | 2007-09-17 | 2008-09-04 | Device for granulating plastic strands |
| BRPI0817317 BRPI0817317A2 (pt) | 2007-09-17 | 2008-09-04 | Dispositivo para granular fios plásticos |
| EP20080785821 EP2190638B1 (de) | 2007-09-17 | 2008-09-04 | Vorrichtung zum granulieren von kunststoffsträngen |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE200710044201 DE102007044201A1 (de) | 2007-09-17 | 2007-09-17 | Vorrichtung zum Granulieren von Kunststoffsträngen |
| DE102007044201.9 | 2007-09-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009036892A1 true WO2009036892A1 (de) | 2009-03-26 |
Family
ID=40278988
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2008/007228 Ceased WO2009036892A1 (de) | 2007-09-17 | 2008-09-04 | Vorrichtung zum granulieren von kunststoffsträngen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8721317B2 (de) |
| EP (1) | EP2190638B1 (de) |
| BR (1) | BRPI0817317A2 (de) |
| DE (1) | DE102007044201A1 (de) |
| TW (1) | TWI428222B (de) |
| WO (1) | WO2009036892A1 (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010045702A1 (de) * | 2010-09-16 | 2012-03-22 | Schmidt & Heinzmann Gmbh & Co. Kg | Faserschneidvorrichtung |
| CN112171943A (zh) * | 2020-09-30 | 2021-01-05 | 安徽中鑫宏伟科技有限公司 | 一种尼龙隔热条母粒加工用切粒机及其使用方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2340682A1 (de) * | 1973-08-10 | 1975-03-13 | Hench Automatik App Masch | Laermschutzvorrichtung am ausgang einer granuliermaschine |
| DE8600491U1 (de) * | 1986-01-10 | 1987-06-19 | AUTOMATIK Apparate-Maschinenbau GmbH, 8754 Großostheim | Vorrichtung zum Granulieren von Strängen aus thermoplastischen Kunststoffen |
| WO1988006959A1 (fr) * | 1987-03-16 | 1988-09-22 | Michael Reinhard | Dispositif de production de granules cylindriques a contre-lame echangeable en fonctionnement |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB227174A (en) | 1923-10-08 | 1925-01-08 | Hugh Oswald Short | Improvements in or connected with controlling the petrol supply to internal combustion engines and particularly those used on aircraft |
| US2739647A (en) * | 1951-11-17 | 1956-03-27 | Coste Pierre Paul Henri | Machine for the production of granular material, more particularly for injection moulding machines |
| DE2219784C3 (de) * | 1972-04-22 | 1975-09-04 | C.F. Scheer & Cie, 7000 Stuttgart | Granulator zum Granulieren von Kunststoffsträngen |
| US4025252A (en) * | 1975-01-28 | 1977-05-24 | Automatik Apparate-Maschinebau H. Hench Gmbh | Granulating apparatus, especially for strands of thermoplastic materials |
| US4360168A (en) * | 1978-12-21 | 1982-11-23 | Conair, Inc. | Rotary blade assembly for pelletizer assembly |
| DE3145613C2 (de) * | 1981-11-17 | 1984-06-07 | Automatik Apparate-Maschinenbau H. Hench Gmbh, 8754 Grossostheim | Vorrichtung zum Zuleiten von aus Düsen schmelzflüssig austretenden Kunststoffsträngen zu einer Granuliervorrichtung |
| DE3600567C1 (de) * | 1986-01-10 | 1987-05-07 | Automatik App Maschb Gmbh | Vorrichtung zum Granulieren von Straengen aus thermoplastischen Kunststoffen |
| DE3611179C1 (de) * | 1986-04-03 | 1987-11-26 | Automatik App Maschb Gmbh | Messerleiste,insbesondere zum Granulieren von Kunststoffstraengen |
| US5265507A (en) * | 1989-07-31 | 1993-11-30 | Kuraray Co., Ltd. | Process for producing pellets |
| JPH0613175B2 (ja) * | 1989-07-31 | 1994-02-23 | 株式会社クラレ | ペレツトの製造法 |
| JPH04137811U (ja) * | 1991-06-19 | 1992-12-22 | 有限会社勝製作所 | ストランドに於ける冷却付カツターのペレツト製造機 |
| JPH0716948B2 (ja) * | 1991-08-27 | 1995-03-01 | 株式会社タナカ | ペレタイザーの固定刃取付方法 |
| US5313864A (en) * | 1992-10-26 | 1994-05-24 | The Conair Group, Inc. | Plastic strand pelletizer |
| DE4236451C1 (de) * | 1992-10-28 | 1993-11-04 | Scheer & Cie C F | Granuliervorrichtung fuer strangmaterialien |
| WO1994020275A1 (fr) * | 1993-03-02 | 1994-09-15 | Kabushiki Kaisha Hoshi Plastic | Methode et machine pour le decoupage des cables toronnes, et mode de fonctionnement de la machine |
| DE4328778C2 (de) * | 1993-08-26 | 1996-01-25 | Rieter Automatik Gmbh | Schneidleiste mit einer Schneidschicht aus hochverschleißfestem Material |
| DE4414754A1 (de) * | 1994-04-27 | 1995-11-02 | Scheer & Cie C F | Vorrichtung zum Abkühlen und Granulieren von Kunststoff-Strängen |
| US5545025A (en) * | 1994-10-03 | 1996-08-13 | Katsu Manufacturing Co., Ltd. | Cooled pellet making machine |
| DE4439774B4 (de) * | 1994-11-07 | 2004-02-26 | C. F. Scheer & Cie Gmbh & Co | Vorrichtung zum Granulieren von Kunststoff-Strängen |
| KR100292163B1 (ko) * | 1999-05-01 | 2001-06-01 | 윤영술 | 수지 압출 커팅장치 |
| DE19933497A1 (de) * | 1999-07-16 | 2001-01-18 | Rieter Automatik Gmbh | Vorrichtung zur Schneidspalteinstellung und Verfahren |
| US20040025658A1 (en) * | 1999-12-10 | 2004-02-12 | Fisher George F. | Polymer cutting apparatus and method |
| DE10103827B4 (de) * | 2001-01-29 | 2005-12-29 | Rieter Automatik Gmbh | Messeranordnung für einen Granulator zum Granulieren von Kunststoffsträngen |
-
2007
- 2007-09-17 DE DE200710044201 patent/DE102007044201A1/de not_active Withdrawn
-
2008
- 2008-06-19 TW TW97122845A patent/TWI428222B/zh active
- 2008-09-04 BR BRPI0817317 patent/BRPI0817317A2/pt not_active IP Right Cessation
- 2008-09-04 US US12/670,596 patent/US8721317B2/en active Active
- 2008-09-04 WO PCT/EP2008/007228 patent/WO2009036892A1/de not_active Ceased
- 2008-09-04 EP EP20080785821 patent/EP2190638B1/de active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2340682A1 (de) * | 1973-08-10 | 1975-03-13 | Hench Automatik App Masch | Laermschutzvorrichtung am ausgang einer granuliermaschine |
| DE8600491U1 (de) * | 1986-01-10 | 1987-06-19 | AUTOMATIK Apparate-Maschinenbau GmbH, 8754 Großostheim | Vorrichtung zum Granulieren von Strängen aus thermoplastischen Kunststoffen |
| WO1988006959A1 (fr) * | 1987-03-16 | 1988-09-22 | Michael Reinhard | Dispositif de production de granules cylindriques a contre-lame echangeable en fonctionnement |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2190638A1 (de) | 2010-06-02 |
| TW200914233A (en) | 2009-04-01 |
| BRPI0817317A2 (pt) | 2015-03-17 |
| TWI428222B (zh) | 2014-03-01 |
| DE102007044201A1 (de) | 2009-03-19 |
| US8721317B2 (en) | 2014-05-13 |
| EP2190638B1 (de) | 2012-05-30 |
| US20100276834A1 (en) | 2010-11-04 |
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