WO2009057680A1 - Appareil de formation de film et procédé de formation de film - Google Patents

Appareil de formation de film et procédé de formation de film Download PDF

Info

Publication number
WO2009057680A1
WO2009057680A1 PCT/JP2008/069728 JP2008069728W WO2009057680A1 WO 2009057680 A1 WO2009057680 A1 WO 2009057680A1 JP 2008069728 W JP2008069728 W JP 2008069728W WO 2009057680 A1 WO2009057680 A1 WO 2009057680A1
Authority
WO
WIPO (PCT)
Prior art keywords
rotating
film forming
sub
center
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/069728
Other languages
English (en)
Japanese (ja)
Inventor
Junichiro Yoshioka
Kuniaki Horie
Nobumasa Nambu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JCU Corp
Original Assignee
Ebara Udylite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Udylite Co Ltd filed Critical Ebara Udylite Co Ltd
Publication of WO2009057680A1 publication Critical patent/WO2009057680A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

Une section rotative principale (15) qui tourne avec un arbre principal (13) au centre est équipée d'une pluralité de sous-sections rotatives (16), et chaque sous-section rotative (16) comporte une pluralité de porte-pièces (17). Une pièce (W) supportée par le porte-pièce (17) tourne sur son propre arbre rotatif (46), tout en tournant avec l'arbre principal (13) au centre et en tournant avec un sous-arbre (36) au centre par la rotation de la section rotative principale (15) et des sous-sections rotatives (16). Des films sont formés en faisant en sorte que les surfaces des pièces (W) fassent face à une cible (23) de façon séquentielle.
PCT/JP2008/069728 2007-10-31 2008-10-30 Appareil de formation de film et procédé de formation de film Ceased WO2009057680A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007283475A JP2009108384A (ja) 2007-10-31 2007-10-31 成膜装置
JP2007-283475 2007-10-31

Publications (1)

Publication Number Publication Date
WO2009057680A1 true WO2009057680A1 (fr) 2009-05-07

Family

ID=40591065

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/069728 Ceased WO2009057680A1 (fr) 2007-10-31 2008-10-30 Appareil de formation de film et procédé de formation de film

Country Status (2)

Country Link
JP (1) JP2009108384A (fr)
WO (1) WO2009057680A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113316661A (zh) * 2019-02-14 2021-08-27 东和株式会社 工件保持部旋转单元及真空处理装置
CN116324012A (zh) * 2020-08-05 2023-06-23 芝浦机械株式会社 表面处理装置及表面处理方法
CN119040836A (zh) * 2024-11-01 2024-11-29 苏州文迪光电科技有限公司 一种双面镀膜设备及用于滤光片加工的镀膜方法

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5036501B2 (ja) * 2007-11-19 2012-09-26 小島プレス工業株式会社 基材の支持装置及びスパッタリング装置
JP6135519B2 (ja) * 2014-01-17 2017-05-31 株式会社デンソー 成膜装置
CN113463056B (zh) * 2021-07-01 2022-06-17 安徽工业大学 一种真空镀膜无遮挡样品翻转装置
KR102895935B1 (ko) * 2023-01-31 2025-12-04 한국원자력연구원 피복관 코팅장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0310464U (fr) * 1989-06-20 1991-01-31
JP2006307318A (ja) * 2005-03-31 2006-11-09 Kobe Steel Ltd αアルミナ層形成部材の製法および表面処理法
JP2007039710A (ja) * 2005-08-01 2007-02-15 Optorun Co Ltd 成膜装置及び薄膜形成方法
JP2007100123A (ja) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp 真空蒸着装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0310464U (fr) * 1989-06-20 1991-01-31
JP2006307318A (ja) * 2005-03-31 2006-11-09 Kobe Steel Ltd αアルミナ層形成部材の製法および表面処理法
JP2007039710A (ja) * 2005-08-01 2007-02-15 Optorun Co Ltd 成膜装置及び薄膜形成方法
JP2007100123A (ja) * 2005-09-30 2007-04-19 Kyocera Kinseki Corp 真空蒸着装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113316661A (zh) * 2019-02-14 2021-08-27 东和株式会社 工件保持部旋转单元及真空处理装置
CN116324012A (zh) * 2020-08-05 2023-06-23 芝浦机械株式会社 表面处理装置及表面处理方法
CN119040836A (zh) * 2024-11-01 2024-11-29 苏州文迪光电科技有限公司 一种双面镀膜设备及用于滤光片加工的镀膜方法

Also Published As

Publication number Publication date
JP2009108384A (ja) 2009-05-21

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