WO2009156121A1 - Anordnung zum beschichten bandförmiger foliensubstrate - Google Patents
Anordnung zum beschichten bandförmiger foliensubstrate Download PDFInfo
- Publication number
- WO2009156121A1 WO2009156121A1 PCT/EP2009/004515 EP2009004515W WO2009156121A1 WO 2009156121 A1 WO2009156121 A1 WO 2009156121A1 EP 2009004515 W EP2009004515 W EP 2009004515W WO 2009156121 A1 WO2009156121 A1 WO 2009156121A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating
- arrangement according
- film substrate
- support
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2001—Maintaining constant desired temperature
Definitions
- the invention relates to an arrangement for coating belt-shaped film substrates with an unwinding and a take-up roll between which the film substrate is guided under a strip tension and a coating station arranged therebetween.
- a belt-shaped film substrate is guided under vacuum from a supply reel over a coating station and picked up again by a take-up reel.
- a film substrate to be coated which in particular exposes a metal foil, which may have a thickness of a few ⁇ m to several 100 ⁇ m, to a heat load. Due to the small thickness, however, superheating phenomena quickly occur in the case of such film substrates, which regularly lead to structural changes in the substrate. For this reason, it must be ensured that a maximum substrate temperature during transport and coating of the substrate, as well as ensuring a different lower maximum substrate temperature, is not exceeded before the substrate is wound up
- the side of the substrate to be coated must not be subjected to mechanical disturbances, such as those caused by support or transport rollers. For this reason, a contact of the substrate side to be coated "front" with rollers or other parts of the system during transport, the Coating or other substrate treatment (eg cooling) to avoid.
- the invention has for its object to provide a vacuum coating of film substrates, in which exceeding the maximum substrate temperature is prevented and allows a high-quality substrate transport.
- Claims 2 to 16 show embodiments of the solution according to the invention.
- an unwinding and a take-up roll is provided, between which the film substrate is guided under a strip tension.
- a coating station is arranged in between, i. between unwind and take-up.
- This coating station has at least two coating sources lying one behind the other in the region of a strip coating run, in which the strip is guided between the unwinding roll and take-up rolls through the coating station. These face a coating side of the film substrate, i. they are arranged at a distance to the coating side.
- a support element is arranged between two adjacent coating sources, which generates a support force resulting from the tape tension on the back side of the film substrate.
- the film substrate freely stretched. If a plurality of support elements provided, as is the case in the rule, then the film substrate is also freely stretched between two support elements.
- a heat absorption element absorbing the substrate is arranged. By this absorption element introduced into the film substrate by the coating process heat is removed.
- the film substrate in the coil coating run has a surface which follows in cross-section a traverse.
- the absorption element can be arranged on the coating side or on the back side.
- the absorption element is arranged lying opposite two coating sources of the coating side.
- Absorption element is arranged in the region of a coating source of the back opposite.
- one or more absorption elements are arranged on both sides, whereby the cooling effect can be increased considerably.
- the absorption element is a cooling element through which a coolant flows.
- the heat absorbed by the absorption element can be removed controlled.
- At least one support element is arranged with its axis of rotation transverse to the direction of movement of the film Substrates lying support roller is formed.
- Such a support roller may have an additional function, for example, in that the support roller is designed as a cooling roller. These can also be designed to flow through a coolant.
- Film substrates are very sensitive to web guidance. They can run away quickly or be prone to distortions. If the support roller is formed as a spherically shaped spreader roller, an exact web guide can be supported.
- the one or more support elements are located on the back of the film substrate, it is possible that at least one support element is formed as a sliding block lying transversely to the direction of movement of the film substrate.
- At least one support element is also possible for at least one support element to be designed as a support element which applies contactlessly to the support force on the rear side.
- This can be realized by a gas flow element generating an air cushion between the rear side and the support element, in particular when the
- Support element is located outside the vacuum of the coating station.
- Another possibility is to produce a magnetic pad in that the support element is formed as a magnetic element generating a distance between the rear side of a ferromagnetic metal foil as film substrate and the support element.
- the support member is formed as a generating a distance between the back and the support member electrostatic element.
- the arrangement of tape winding, Bandumlenkrollen and belt cooling rolls is done so that only the back of the belt is touched by rollers. This is achieved by the position of all roles is chosen so that the defined by density and Bandzugschreib the strip material theoretical slack of the tape in the vertical direction is always above the respective role position.
- the coating rate is controlled so that, depending on the substrate thickness, specific heat capacity and substrate speed, a maximum permissible substrate temperature is not exceeded.
- Adjacent coating sources are arranged so that the substrate before reaching the first following coating source can sufficiently cool by means of suitable absorption surfaces or absorption elements to the expected increase in temperature of the further coating source following the first coating source.
- the invention realizes an arrangement, a drive and a control of the surface temperature of active belt cooling devices (cooling rollers) in such a way that interfering relative movements between the cooling device and the substrate are excluded.
- the design of the substrate guide ensures that the coating side is exposed above the region of the coating source or of the coating sources. Even at the back of the substrate large surface parts are exposed.
- the free surface portions on the coating side and / or the back side allow the arrangement of absorption elements in such proximity to the surfaces that the substrate is cooled by absorbing the radiant heat.
- the arrangement according to the invention makes possible, in particular, the PVD coating of thin metal foils.
- Thin metal foils have a thickness of less than 500 ⁇ m.
- a film substrate 1 is moved by a tape winding device 2 between a supply reel 7 and a take-up reel with a tape tension F z .
- coating sources 5 are arranged.
- support rollers 3 are arranged, and indeed always at a distance from the direct connecting line of two adjacent rollers, which creates a support force F 3 from a force triangle on the tape tension F z , the film substrate 1 easily on the support rollers suppressed.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP09768970A EP2297768B1 (de) | 2008-06-23 | 2009-06-23 | Anordnung zum beschichten bandförmiger foliensubstrate |
| US12/999,431 US20110139067A1 (en) | 2008-06-23 | 2009-06-23 | Arrangement for coating tape-shaped film substrates |
| DE112009000019T DE112009000019A5 (de) | 2008-06-23 | 2009-06-23 | Anordnung zum Beschichten bandförmiger Foliensubstrate |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008029379.2 | 2008-06-23 | ||
| DE102008029379A DE102008029379A1 (de) | 2008-06-23 | 2008-06-23 | Anordnung zum Beschichten bandförmiger Foliensubstrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2009156121A1 true WO2009156121A1 (de) | 2009-12-30 |
Family
ID=40847446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2009/004515 Ceased WO2009156121A1 (de) | 2008-06-23 | 2009-06-23 | Anordnung zum beschichten bandförmiger foliensubstrate |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20110139067A1 (de) |
| EP (1) | EP2297768B1 (de) |
| DE (2) | DE102008029379A1 (de) |
| WO (1) | WO2009156121A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102011015875A1 (de) | 2011-04-04 | 2012-10-04 | Von Ardenne Anlagentechnik Gmbh | Transportvorrichtung für bandförmige Substrate in einer Vakuumanlage |
| DE102012206502B4 (de) | 2012-04-19 | 2019-01-31 | VON ARDENNE Asset GmbH & Co. KG | Vorrichtung zum frontseitenberührungsfreien Transport von bandförmigem Material |
| DE102012108231A1 (de) | 2012-06-06 | 2013-12-12 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Beschichtung bandförmiger Substrate |
| DE102014117766B4 (de) * | 2014-12-03 | 2021-03-18 | VON ARDENNE Asset GmbH & Co. KG | Substratkühlvorrichtung, Bandsubstratbehandlungsvorrichtung und Verwendung |
| DE102015114187B4 (de) * | 2015-08-26 | 2018-10-11 | Solayer Gmbh | Durchlauf-Folienbehandlungsanlage vertikal ausgerichteter Substrate |
| US11499221B2 (en) * | 2016-08-16 | 2022-11-15 | Flisom Ag | Flexible substrate deposition system |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0661760A2 (de) * | 1993-12-28 | 1995-07-05 | Canon Kabushiki Kaisha | Verfahren und Vorrichtung zur Herstellung wiedergeschlagener Schichten |
| US5589007A (en) * | 1993-01-29 | 1996-12-31 | Canon Kabushiki Kaisha | Photovoltaic elements and process and apparatus for their formation |
| WO2001020054A1 (de) * | 1999-09-13 | 2001-03-22 | Voest-Alpine Industrieanlagenbau Gmbh | Verfahren zum beschichten eines metallbandes sowie anlage hierzu |
| WO2003100111A1 (fr) * | 2002-05-27 | 2003-12-04 | Changsha Lyrun Materials Co., Ltd. | Procede de production de metal poreux par depot physique en phase vapeur combine et equipement associe |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2382432A (en) * | 1940-08-02 | 1945-08-14 | Crown Cork & Seal Co | Method and apparatus for depositing vaporized metal coatings |
| US3036549A (en) * | 1957-05-08 | 1962-05-29 | Sumitomo Electric Industries | Apparatus for vacuum evaporation of metals |
| GB1596385A (en) * | 1976-12-29 | 1981-08-26 | Matsushita Electric Industrial Co Ltd | Methods and apparatus for manufacturing magnetic recording media |
| JPS58189371A (ja) * | 1982-04-28 | 1983-11-05 | Teijin Ltd | スパツタ装置 |
| US4812217A (en) * | 1987-04-27 | 1989-03-14 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method and apparatus for feeding and coating articles in a controlled atmosphere |
| JPH02148715A (ja) * | 1988-11-29 | 1990-06-07 | Canon Inc | 半導体デバイスの連続形成装置 |
| IT1233170B (it) * | 1989-03-09 | 1992-03-14 | Perini Finanziaria Spa | Macchina ribobinatrice per formare rotoli di carta od altro |
| JP2975151B2 (ja) * | 1991-03-28 | 1999-11-10 | キヤノン株式会社 | 半導体素子の連続的製造装置 |
| DE4203631C2 (de) * | 1992-02-08 | 2000-06-08 | Leybold Ag | Vorrichtung für die Behandlung einer Oxidschicht |
| DE4342574C1 (de) * | 1993-12-14 | 1995-04-13 | Hilmar Weinert | Bandbedampfungsanlage |
| US6273955B1 (en) * | 1995-08-28 | 2001-08-14 | Canon Kabushiki Kaisha | Film forming apparatus |
| JP3332700B2 (ja) * | 1995-12-22 | 2002-10-07 | キヤノン株式会社 | 堆積膜形成方法及び堆積膜形成装置 |
| US6108937A (en) * | 1998-09-10 | 2000-08-29 | Asm America, Inc. | Method of cooling wafers |
| US20050005846A1 (en) * | 2003-06-23 | 2005-01-13 | Venkat Selvamanickam | High throughput continuous pulsed laser deposition process and apparatus |
| US6906008B2 (en) * | 2003-06-26 | 2005-06-14 | Superpower, Inc. | Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers |
| EP1589130B1 (de) * | 2004-04-13 | 2009-07-29 | Applied Materials GmbH & Co. KG | Führungsanordnung mit mindestens einer Führungswalze für die Führung von Bändern in Bandbehandlungsanlagen |
| JP4951301B2 (ja) * | 2006-09-25 | 2012-06-13 | 富士フイルム株式会社 | 光学フィルムの乾燥方法及び装置並びに光学フィルムの製造方法 |
| US8771419B2 (en) * | 2007-10-05 | 2014-07-08 | Solopower Systems, Inc. | Roll to roll evaporation tool for solar absorber precursor formation |
-
2008
- 2008-06-23 DE DE102008029379A patent/DE102008029379A1/de not_active Ceased
-
2009
- 2009-06-23 EP EP09768970A patent/EP2297768B1/de not_active Not-in-force
- 2009-06-23 US US12/999,431 patent/US20110139067A1/en not_active Abandoned
- 2009-06-23 WO PCT/EP2009/004515 patent/WO2009156121A1/de not_active Ceased
- 2009-06-23 DE DE112009000019T patent/DE112009000019A5/de not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5589007A (en) * | 1993-01-29 | 1996-12-31 | Canon Kabushiki Kaisha | Photovoltaic elements and process and apparatus for their formation |
| EP0661760A2 (de) * | 1993-12-28 | 1995-07-05 | Canon Kabushiki Kaisha | Verfahren und Vorrichtung zur Herstellung wiedergeschlagener Schichten |
| WO2001020054A1 (de) * | 1999-09-13 | 2001-03-22 | Voest-Alpine Industrieanlagenbau Gmbh | Verfahren zum beschichten eines metallbandes sowie anlage hierzu |
| WO2003100111A1 (fr) * | 2002-05-27 | 2003-12-04 | Changsha Lyrun Materials Co., Ltd. | Procede de production de metal poreux par depot physique en phase vapeur combine et equipement associe |
Also Published As
| Publication number | Publication date |
|---|---|
| DE112009000019A5 (de) | 2012-01-05 |
| US20110139067A1 (en) | 2011-06-16 |
| DE102008029379A1 (de) | 2009-08-13 |
| EP2297768A1 (de) | 2011-03-23 |
| EP2297768B1 (de) | 2012-08-08 |
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