WO2012072004A1 - 一种投影物镜系统及使用该投影物镜系统的微光刻系统 - Google Patents

一种投影物镜系统及使用该投影物镜系统的微光刻系统 Download PDF

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Publication number
WO2012072004A1
WO2012072004A1 PCT/CN2011/082945 CN2011082945W WO2012072004A1 WO 2012072004 A1 WO2012072004 A1 WO 2012072004A1 CN 2011082945 W CN2011082945 W CN 2011082945W WO 2012072004 A1 WO2012072004 A1 WO 2012072004A1
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Prior art keywords
lens group
lens
projection objective
sub
objective system
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PCT/CN2011/082945
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English (en)
French (fr)
Inventor
朱立荣
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Shanghai Micro Electronics Equipment Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
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Priority to KR1020137014649A priority Critical patent/KR101685654B1/ko
Priority to EP11845562.5A priority patent/EP2648027B1/en
Priority to US13/991,080 priority patent/US8970964B2/en
Publication of WO2012072004A1 publication Critical patent/WO2012072004A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B15/00—Optical objectives with means for varying the magnification
    • G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
    • G02B15/145—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having five groups only
    • G02B15/1451—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having five groups only the first group being positive
    • G02B15/145121—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective having five groups only the first group being positive arranged +-+-+
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0087—Simple or compound lenses with index gradient
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Definitions

  • a projection objective system and a microlithography system using the projection objective system are provided.
  • the present invention relates to a projection objective system, and more particularly to a projection objective system for use in a stepper for fabricating semiconductor chips or other micro devices. Background technique
  • U.S. Patent No. 6,806,942 proposes a three-convex double waist structure projection objective for a wavelength range of relative bandwidth > 0.002 or even ⁇ / > 0.005, wherein three protrusions have positive power and two waists have negative power, and Through the optimized selection of materials, the chromatic aberration is well corrected, and the system has better stability.
  • Figure 1 and Figure 2 show the projection objective of U.S. Patent 6,068,942, which comprises 31 optical components, which can be divided into five groups: Gl, G2, G3, G4 and G5, wherein G1-G4 is shown in Figure 1, and G1 includes the first film.
  • Gl a total of five lenses
  • the first and third films use a high transmittance material
  • the second film is a negative lens
  • G2 includes the sixth to the ninth film, a total of four lenses, all of which are negative lenses.
  • the ninth film uses a high refractive index material
  • G3 includes a total of four lenses from the 10th to the 13th, which are positive lenses
  • the 13th film uses a high transmittance material:
  • G4 includes 14th to 16th, which is a negative lens.
  • G5 includes the 17th to 31st sheets, wherein the 20th sheet is an optical flat plate, and the 22nd, 27th, 30th, and 31st sheets are made of a high refractive index material.
  • 107 denotes an optical axis
  • 103 denotes an object plane
  • 113 denotes a central field of view
  • 109 and 111 respectively denote upper and lower edge rays of the central field of view
  • 121 denotes an edge field of view
  • 115 and 119 denote edge field of view, respectively Light from the top and bottom edges.
  • 123 denotes a pupil plane
  • 105 denotes an image plane.
  • the disadvantage of the projection objective lens of this structure is that the telecentricity of the system is large, especially the object is far from the telecentricity, which causes the system to be extremely sensitive to the unevenness of the mask surface due to processing, that is, the mask surface is minute.
  • the magnification of the projections and projections through the projection objective causes an image quality on the wafer surface, especially a large change in distortion.
  • the tiny bumps are magnified by the projection objective to cause a lack of imaging quality on the silicon wafer surface.
  • the projection objective lens of the present invention is arranged in order from the object plane to the image plane: the first lens group has a positive power; the second lens group has a negative power; and the third lens group has a power of a fourth lens group having a negative power; a fifth lens group having a positive power having a first and a second sub-lens group; and a pupil located at the first portion of the fifth lens group Between the second sub-lens groups; wherein, the effective focal length f of the projection objective system, the distance L from the object plane to the image plane, and the difference ⁇ ⁇ between the maximum apertures of the respective fields of view at the pupil, the pupil
  • the maximum aperture R of the beam emitted by the central field of view satisfies the following conditions: 0.12 ⁇
  • the first lens group includes a first sub-lens group having a negative refractive power, the first sub-lens group of the first lens group includes at least one negative lens, a front surface of the negative lens is aspherical; and has a positive power
  • the second sub-lens group, the second sub-lens group of the first lens group includes at least three lenses.
  • the second lens group includes at least three negative lenses.
  • the third lens group includes at least three positive lenses.
  • the fourth lens group includes at least three negative lenses, and the rear surface of the last lens is aspherical.
  • the first sub-lens group of the fifth lens group is a positive lens, wherein a front surface of the positive lens closest to the pupil is bent toward the pupil, the curved vertex is away from the pupil, the radius of curvature is positive, and the rear surface is also curved
  • the aperture has a curved apex away from the pupil and a radius of curvature greater than a radius of curvature of the front surface.
  • the second sub-lens group of the fifth lens group includes a negative lens, and the rear surface of the negative lens is aspherical.
  • the projection objective lens further has first, second, and third plates respectively located between the object surface and the first lens group, between the pupil and the first sub-lens group of the fifth lens group, and the fifth Between the lens group and the image plane.
  • the first and third plates are used as protective glasses to avoid internal optical lenses External influence
  • the second plate acts as a reserve compensation component and can be ground to compensate for the influence of other optical components on the image quality.
  • the projection objective system comprises at least two optical materials, a high refractive index material having a refractive index greater than 1.6 at the operating wavelength, and a low refractive index material having a refractive index less than 1.6 at the operating wavelength.
  • the material of the negative lens in the first sub-lens group of the first lens group is a low refractive index material
  • the material of at least one lens in the second sub-lens group is a high refractive index material
  • the negative lens in the second lens group At least two materials are high refractive index materials
  • at least one positive lens material in the third lens group is a high refractive index material
  • at least two negative lens materials in the fourth lens group are high refractive index materials
  • the lens material of the first sub-lens group of the five lens group is a low refractive index material
  • the material of the second lens group of the fifth lens group having a non-spherical surface is a high refractive index material, and the aperture is not less than 0.9 Dmax
  • the objective distance of the projection objective is >40mm, the image working distance is >10mm, the angle between the image and the optical axis is ⁇ 3mrad, and the image side numerical aperture is greater than 0.5.
  • the object working distance of the projection objective lens is >45 mm
  • the image working distance is >12 mm
  • the angle between the image and the optical axis is ⁇ lmrad
  • the ratio of the effective focal length of the projection objective system to the object-to-image surface distance is 0.15- Between 0.3, the ratio of the difference between the maximum aperture of the beam emitted by each field of view and the maximum aperture of the beam emitted by the central field of view is ⁇ 0.5%
  • the image-side numerical aperture is greater than 0.65.
  • the above projection objective system can be used in a microlithography system.
  • the projection objective lens of the invention can have a numerical aperture of up to 0.65 or more, and is suitable for the ultraviolet spectral range, especially the i-line band, and the maximum spectral width can reach 5 nm.
  • the chief ray of each field of view on the object plane is incident on the first optical element parallel to the optical axis; on the image side, the principal ray of each field of view is quasi-parallel to the optical axis , imaged on the image surface, its angle with the optical axis ⁇ 3mrad, in some cases can reach below lmrad.
  • the projection objective lens of the present invention is not sensitive to the unevenness of the mask surface due to processing, that is, minute irregularities on the mask surface do not cause significant deterioration in image quality, particularly distortion, on the wafer surface.
  • the ratio of the distance L from the object surface to the image surface to the effective focal length f of the projection objective system is between 0.12 and 0.4, and more preferably between 0.15 and 0.3, which is advantageous for controlling the distortion within a certain range, and also ensures the system.
  • the structure is compact.
  • the ratio of the difference between the maximum aperture of the beam emitted by each field of view and the maximum aperture of the beam emitted by the central field of view at the pupil of the projection objective system is ⁇ 1%, preferably ⁇ 0.5%. This not only reduces the barrier of the pupil, but also facilitates the uniformity of the lines throughout the field.
  • the projection objective of the present invention can be widely used in the 280 nm node technology, and particularly in the 240 nm node technology.
  • FIG. 1 and 2 are schematic structural views of a projection objective lens of US Pat. No. 6,806,942;
  • FIG. 3 is a schematic structural view of a projection objective lens according to an embodiment of the present invention.
  • Figure 4 is a close-up field curvature and distortion diagram of the projection objective lens of Figure 3;
  • Fig. 5 is a diagram showing the aberration of the projection objective lens of Fig. 3. detailed description
  • the projection objective according to the invention has a total length of no more than 1200 mm and is suitable for the i-line spectral range, the spectral width is up to 5 nm, the magnification is 0.25, the image numerical aperture is >0.5, preferably >0.65, and the image side diagonal field of view is >56111111 , the range of the ratio of the effective focal length f to the distance L from the object plane to the image plane is 0.1 2 ⁇
  • the object surface The principal ray of each field of view is incident on the first optical element parallel to the optical axis; on the image side, the principal ray of each field of view is quasi-parallel to the optical axis, imaged on the image plane, and sandwiched with the optical axis Angle ⁇ 3111 ⁇ (1, preferably ⁇ lmrad.
  • the object working distance here refers to the distance from the object surface to the object optical plate, or in the case where the object side has no protective glass, the shortest distance from the object surface to the first optical lens in the optical axis direction, the image working distance finger
  • Figure 3 shows an embodiment of a projection objective in accordance with the present invention.
  • Object and Image represent the object and image plane respectively
  • AS is the aperture
  • the entire projection objective consists of 30 optical components: 27 optical lenses and Pl, P2, P3 three optical plates.
  • the first lens group S1, the second lens group S2, the third lens group S3, the fourth lens group S4, and the fifth lens group are respectively divided into five groups.
  • the first lens group SI has a positive refractive power, and includes 5 optical lenses of L1-L5, wherein L1 is a negative lens, and a low refractive index material having a refractive index of ⁇ 1.6, the front surface of which is aspherical surface 1, the aspheric surface The difference between the vector height and the best fit spherical surface is less than 0.3mm, which is to reduce the generation of high-order aberrations and to facilitate the correction of the latter distortion; the second lens group S2 has a negative power, including L6-L8 Negative lens, in which L7 and L8 use a high refractive index material with a refractive index higher than 1.6; third lens group S3 has a positive power, including L9-L11 three positive lenses, all using a refractive index lower than 1.6 The refractive index material; the fourth lens group S4 has a negative refractive power, and includes a L12-L15 four-lens lens, wherein the lens L13 and the lens L14 adopt
  • the material and the rear surface of the lens L15 are aspherical, the role of which is to correct the aberration associated with the field of view;
  • the fifth lens group S5 has a positive power, including a total of 12 optical lenses of L16-L27 and an optical plate P2.
  • the optical component can be divided into two sub-lens groups according to its function: LSI and LS2, There is a stop AS between two sub-lens group.
  • the first sub-lens group LSI includes an L16-L18 three-piece optical lens, and an optical plate P2, each of which is a positive lens, using a low refractive index material of n ⁇ 1.6, wherein the first surface of the positive lens L18 closest to the pupil Bending toward the pupil, the curved vertex is far from the pupil, and the radius of curvature is positive; the second surface is also bent toward the pupil, the curved vertex is far from the pupil, and the radius of curvature is larger than the first surface. It is the Petzval field song that is light.
  • the second sub-lens group LS2 includes a total of 9 lenses of L19-L27, and a low refractive index material of n ⁇ 1.6 except for L20; a negative lens of L20, a high refractive index material of n>1.6, and a rear surface of L20
  • the aspheric surface has a caliber of not less than 0.9Dmax, and its main function is to correct the aberration associated with the pupil.
  • the ratio of the difference between the maximum aperture of the beam emitted by each field of view at the pupil and the maximum aperture of the beam emitted by the central field of view is ⁇ 1%, preferably ⁇ 0.5%.
  • the three parallel plates are respectively located at the first lens position closest to the object surface, one lens position before the pupil and the last lens position closest to the image surface.
  • the first optical plate P1 and the last optical plate P3 are used as protective glass to prevent the internal optical lens from being interfered by the external system; the front lens P2 can be used as a compensation component, and can be repaired if necessary to compensate for other The influence of the machining error of the optical component on the image quality of the system.
  • Figure 4 shows the paraxial curvature and distortion of the projection objective of Figure 3. It can be seen that the structure has small field curvature and astigmatism values, the field curvature is less than 100 nm, and the astigmatism is less than 70 nm.
  • Figure 5 is a graph showing aberrations of the projection objective lens of Figure 3. It can be seen that the various main aberrations in this embodiment are well corrected, leaving only a small amount of chromatic aberration.

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Description

一种投影物镜系统及使用该投影物镜系统的微光刻系统。
技术领域
本发明涉及一种投影物镜系统， 尤其涉及用于制作半导体芯片或其他微 器件的步进式光刻机中的投影物镜系统。 背景技术
美国专利 US6806942对于相对带宽 > 0.002 , 甚至^/ > 0.005的波 长范围， 提出了一种三凸双腰结构投影物镜， 其中三个凸起具有正光焦度， 两个腰部具有负光焦度， 并且通过对于材料的优化选择， 很好的校正色差， 使系统具有较好的稳定性。
图 1和图 2所示为美国专利 US6806942的投影物镜，共包括 31片光学元 件， 可分成五组： Gl、 G2、 G3、 G4和 G5, 其中 G1-G4见图 1 , G1包括第 1 片到第 5片共 5片透镜， 第 1片和第 3片采用高透过率材料， 第 2片为负透 镜； G2包括第 6片到第 9片， 共 4片透镜， 均为负透镜， 其中第 9片采用高 折射率材料； G3包括第 10片到第 13片共 4片透镜， 为正透镜， 其中第 13 片采用高透过率材料： G4包括第 14到 16片， 为负透镜， 均采用高折射率材 料。 G5如图 2所示， 包括第 17到第 31片， 其中第 20片为光学平板， 第 22 片、 第 27片、 第 30片和第 31片采用高折射率材料。 在图 1中， 107表示光 轴， 103表示物面， 113表示中心视场， 109和 111分别表示中心视场的上下 两条边缘光线， 121表示边缘视场， 115和 119分别表示边缘视场上下两条边 缘光线。 图 2中 123表示光阑面， 105表示像面。
这种结构的投影物镜的缺点在于， 系统的远心较大， 尤其是物方远心较 差， 导致本系统对于掩模面上由于加工产生的不平整度极其敏感， 即掩模面 上微小的凹凸经投影物镜的放大， 会引起硅片面上成像质量， 尤其是畸变的 极大变化。 发明内容
本发明的目的在于提供一种投影物镜系统， 其具有大孔径双远心结构， 用于将该投影物镜物平面上的图案成像到投影物镜的像平面上， 以避免先前 技术中掩模面上微小的凹凸经投影物镜放大而引起硅片面上的成像质量之缺 失。
本发明的投影物镜， 从物面至像面依次排列有： 第一透镜组， 其光焦度 为正； 第二透镜组， 其光焦度为负； 第三透镜组， 其光焦度为正； 第四透镜 组， 其光焦度为负； 第五透镜组， 其光焦度为正， 具有第一、 第二子透镜组； 以及光阑， 位于第五透镜组的该第一、 第二子透镜组之间； 其中， 该投影物 镜系统的有效焦距 f、 该物面至像面的距离 L、 该光阑处各个视场发出的光束 最大口径之差 Δ Ι、 该光阑处中心视场发出的光束的最大口径 R 满足以下条 件： 0.12〈|L//|〈0.4以及 A R/R<1%。
该第一透镜组包括具有负光焦度的第一子透镜组， 该第一透镜组的第一 子透镜组至少包括一片负透镜， 该负透镜的前表面为非球面； 以及具有正光 焦度的第二子透镜组， 该第一透镜组的第二子透镜组至少包括三个透镜。
该第二透镜组至少包括三片负透镜。
该第三透镜组至少包括三片正透镜。
该第四透镜组至少包括三片负透镜， 最后一个透镜的后表面为非球面。 该第五透镜组的第一子透镜组均为正透镜， 其中最靠近光阑的正透镜的 前表面弯向光阑， 其弯曲顶点远离光阑， 曲率半径为正值， 后表面同样弯向 光阑， 其弯曲顶点远离光阑， 且曲率半径大于该前表面的曲率半径。 该第五 透镜组的第二子透镜组包括一片负透镜， 该负透镜的后表面为非球面。
该投影物镜还具有第一、 第二、 第三平板， 分别位于该物面与第一透镜 组之间、 该光阑与该第五透镜组的第一子透镜组之间、 以及该第五透镜组与 该像面之间。 其中， 该第一、 第三平板作为保护玻璃， 避免内部光学镜片受 外界影响， 该第二平板作为预留补偿元件， 可被修磨以补偿其它光学元件对 系统像质的影响。
该投影物镜系统至少包括两种光学材料， 一种是在工作波长处折射率大 于 1.6的高折射率材料，一种是在工作波长处折射率小于 1.6的低折射率材料。 其中， 第一透镜组的第一子透镜组中的负透镜的材料为低折射率材料， 第二 子透镜组中至少有一个透镜的材料为高折射率材料； 第二透镜组中的负透镜 至少有两个的材料为高折射率材料； 第三透镜组中至少有一个正透镜的材料 是高折射率材料； 第四透镜组中至少有两个负透镜的材料是高折射率材料； 第五透镜组的第一子透镜组的透镜材料均为低折射率材料， 第五透镜组的第 二子透镜组具有非球面表面的负透镜的材料为高折射率材料， 且口径不小于 0.9Dmax。
投影物镜的物方工作距离 >40mm, 像方工作距离 >10mm, 所成像与光轴 的夹角 <3mrad, 像方数值孔径大于 0.5。
较佳地， 投影物镜的物方工作距离 >45mm, 像方工作距离 >12mm, 所成 像与光轴的夹角 <lmrad, 投影物镜系统有效焦距与物面到像面的距离之比在 0.15-0.3之间， 光阑处由各个视场发出的光束最大口径之差与中心视场发出 的光束的最大口径之比<0.5%, 像方数值孔径大于 0.65。
上述投影物镜系统可被用于微光刻系统中。
本发明的投影物镜数值孔径最大可以达到 0.65以上， 适用于紫外光谱范 围， 尤其是 i-line波段， 最大光谱宽度可以达到 5nm。 具有双远心效果， 即在 物方， 物面上的各视场的主光线平行于光轴入射到第一光学元件上； 在像方， 各视场点的主光线准平行于光轴出射， 成像在像面上， 其与光轴的夹角 <3mrad, 某些情况下可以达到 lmrad以下。 因此， 本发明的投影物镜对于掩 模面上由于加工产生的不平整度并不敏感， 即掩模面上微小的凹凸不会引起 硅片面上成像质量， 尤其是畸变的显著变化。 物面到像面的距离 L与投影物镜系统有效焦距 f之比在 0.12— 0.4之间， 更优的是在 0.15— 0.3之间， 从而有利于控制畸变在一定范围内， 同时也保证 了系统结构的紧凑。
此投影物镜系统光阑处由各个视场发出的光束最大口径之差与中心视场 发出的光束的最大口径之比 <1% , 更优的 <0.5%。 这样既减少了光瞳遮拦， 而 且有利于在整场内得到能量均匀的线条。
本发明的投影物镜可广泛用于 280nm 节点技术中， 特别是可以用于 240nm节点技术中。 附图说明
图 1和图 2所示为美国专利 US6806942的投影物镜的结构示意图； 图 3所示为根据本发明的实施例的投影物镜的结构示意图；
图 4所示为图 3中的投影物镜的近轴场曲和畸变图；
图 5所示为图 3中的投影物镜的像差曲线图。 具体实施方式
下面， 结合附图详细描述根据本发明的优选实施例。 为了便于描述和突 出显示本发明， 附图中省略了现有技术中已有的相关部件， 并将省略对这些 公知部件的描述。
根据本发明的投影物镜的总长不超过 1200mm, 适用于 i-line光谱范围， 光谱宽度可达 5nm, 放大倍率 0.25 , 像方数值孔径 >0.5 , 优选 >0.65 , 像方对 角线视场>56111111,有效焦距 f与物面到像面的距离 L之比的范围 0.12〈|L//|〈0.4 , 优选 0.15〈|L//|〈0.3 , 在物方， 物面上的各视场的主光线平行于光轴入射到第一 光学元件上； 在像方， 各视场点的主光线准平行于光轴出射， 成像在像面上， 其与光轴的夹角<3111^(1, 优选 <lmrad。 物方工作距离 >40mm, 优选 >45mm, 像方工作距离 >10mm, 优选 >12mm。 此处的物方工作距离指物面到物方光学 平板的距离， 或者在物方没有保护玻璃的情况下， 指物面到第一片光学透镜 在沿光轴方向的最短距离， 像方工作距离指像方光学平板到像面的距离， 或 者在像方没有保护玻璃的情况下， 指最后一片光学元件到像面在沿光轴方向 的最短距离。
图 3所示为根据本发明的投影物镜的一实施例。如图 3所示，其中 Object 和 Image分别代表物面和像面， AS是光阑， 整个投影物镜共包括 30片光学 元件： 27 片光学透镜和 Pl、 P2、 P3 三片光学平板。 沿光线传播方向按依次 排列， 根据光焦度的分布情况可以分成五组， 分别是第一透镜组 Sl、 第二透 镜组 S2、 第三透镜组 S3、 第四透镜组 S4和第五透镜组 S5。 第一透镜组 SI 的光焦度为正， 包括 L1-L5共 5片光学透镜， 其中 L1为负透镜， 采用折射率 <1.6的低折射率材料， 其前表面为非球面 1 , 此非球面与其最佳拟合球面的矢 高差不超过 0.3mm, 其作用是减小高级像差的产生， 有利于后级畸变的校正； 第二透镜组 S2的光焦度为负， 包括 L6-L8三片负透镜，其中 L7和 L8采用折 射率高于 1.6的高折射率材料； 第三透镜组 S3 的光焦度为正， 包括 L9-L11 三片正透镜， 均采用折射率低于 1.6的低折射率材料； 第四透镜组 S4的光焦 度为负， 包括 L12-L15四片透镜， 其中透镜 L13和透镜 L14采用 n>1.6的高 折射率材料， 透镜 L15采用 n<1.6的低折射率材料且透镜 L15后表面为非球 面， 其作用是校正与视场有关的像差； 第五透镜组 S5 的光焦度为正， 包括 L16-L27共 12片光学透镜以及一个光学平板 P2,这些光学元件根据其作用可 以分成两个子透镜组： LSI和 LS2, 在两个子透镜组之间存在一光阑 AS。 第 一子透镜组 LSI包括 L16-L18三片光学透镜， 以及光学平板 P2, 光学透镜均 为正透镜， 采用 n<1.6的低折射率材料， 其中最靠近光阑的正透镜 L18的第 一表面弯向光阑， 其弯曲顶点远离光阑， 曲率半径为正值； 第二表面同样弯 向光阑， 其弯曲顶点远离光阑， 且曲率半径大于第一表面， 这种结构有效校 正了光阑面的 Petzval场曲。 第二子透镜组 LS2包括 L19-L27共 9片透镜， 除 L20外均采用 n<1.6的低折射率材料； L20为负透镜， 采用 n>1.6的高折射率 材料， 且 L20的后表面为非球面， 口径不小于 0.9Dmax, 其主要作用是校正 与光阑有关的像差。 光阑处由各个视场发出的光束最大口径之差与中心视场 发出的光束的最大口径之比 <1%, 优选 <0.5%。
三片平行平板分别位于最接近物面的第一片透镜位置， 光阑前一片透镜 位置和最接近像面的最后一片透镜位置。 其中第一片光学平板 P1和最后一片 光学平板 P3均作为保护玻璃， 避免内部光学透镜受到外界系统干扰； 光阑前 一片透镜 P2可作为预留补偿元件， 必要时可进行修磨， 以补偿其他光学元件 的加工误差对于系统像质的影响。
投影物镜系统的具体参数参见表 1和表 2。
表 1
Figure imgf000008_0001
L
Figure imgf000009_0001
0/llOZN3/X3d WOZ薦 ΪΟΖ OAV 51.06465 36.8371529 SFSL5Y—OHARA
-1412.52 8.08037644
1.00E+18 20 SI02—SPECIAL
1.00E+18 34.5117836
光阑 1.00E+18 -2.5
303.9157 36.1734063 SFSL5Y—OHARA
-519.266 9.93615773
-305.013 20 PBL25Y_OHARA 非球面 3 229.4571 14.8367387
417.609 28.6769175 SFSL5Y—OHARA
-217.042 10.3837664
362.6817 29.705095 SFSL5Y—OHARA
-1349.77 16.524509
250.2507 36.9088222 SFSL5Y—OHARA
-549.975 0.9000001
154.5506 40.7076006 SFSL5Y—OHARA
503.9516 0.90000001
308.7465 44.3719893 SFSL5Y—OHARA
1215.241 0.9
-4661.36 36.9312861 SFSL5Y—OHARA
53.79116 3.6355942
49.68648 21.7953991 SFSL5Y—OHARA
311.6276 4.44934018
infinity 6 SI02—SPECIAL infinity 12
Figure imgf000011_0001
表 2
Figure imgf000011_0002
图 4所示为图 3 中的投影物镜的近轴场曲和畸变图。 可以看出本结构有 很小的场曲和像散值， 场曲小于 lOOnm, 像散小于 70nm。
图 5所示为图 3 中的投影物镜的像差曲线图。 可以看出本实施例中各种 主要像差都得到 4艮好校正， 仅剩余少量色球差。
本说明书中所述的只是本发明的几种较佳具体实施例， 以上实施例仅用 以说明本发明的技术方案而非对本发明的限制。 凡本领域技术人员依本发明 的构思通过逻辑分析、 推理或者有限的实验可以得到的技术方案， 皆应在本 发明的范围之内。

Claims

权利要求
1、 一种投影物镜系统， 从物面至像面依次排列有：
第一透镜组， 其光焦度为正；
第二透镜组， 其光焦度为负；
第三透镜组， 其光焦度为正；
第四透镜组， 其光焦度为负；
第五透镜组， 其光焦度为正， 具有第一、 第二子透镜组； 以及
光阑， 位于该第五透镜组的第一、 第二子透镜组之间；
其特征在于， 该投影物镜系统至少包括两种光学材料， 一种是在工作波 长处折射率大于 1.6的高折射率材料， 一种是在工作波长处折射率小于 1.6的 低折射率材料；
其中， 该第五透镜组的第一子透镜组均为正透镜， 且透镜材料均为低折 射率材料； 该第五透镜组的第二子透镜组包括一片负透镜， 该负透镜的后表 面为非球面且透镜材料为高折射率材料；
光阑处各个视场发出的光束最大口径之差 Δ R 与光阑处中心视场发出的 光束的最大口径 R满足： △ R/R<1 %。
2、 根据权利要求 1所述的投影物镜系统， 其中， 该第一透镜组包括具 有负光焦度的第一子透镜组， 该第一透镜组的第一子透镜组至少包括一片负 透镜， 该负透镜的前表面为非球面； 以及具有正光焦度的第二子透镜组， 该 第一透镜组的第二子透镜组至少包括三个透镜。
3、 根据权利要求 2所述的投影物镜系统， 其中， 该第一透镜组的第一 子透镜组中的负透镜的材料为低折射率材料， 该第一透镜组的第二子透镜组 中至少有一个透镜的材料为高折射率材料。
4、 根据权利要求 1所述的投影物镜系统， 其中， 该第二透镜组至少包 括三片负透镜。
5、 根据权利要求 4所述的投影物镜系统， 其中， 该第二透镜组中的负 透镜至少有两个的材料为高折射率材料。
6、 根据权利要求 1所述的投影物镜系统， 其中， 该第三透镜组至少包 括三片正透镜。
7、 根据权利要求 6所述的投影物镜系统， 其中， 该第三透镜组中至少 有一个正透镜的材料是高折射率材料。
8、 根据权利要求 1所述的投影物镜系统， 其中， 该第四透镜组至少包 括三片负透镜， 最后一个透镜的后表面为非球面。
9、 根据权利要求 8所述的投影物镜系统， 其中， 该第四透镜组中至少 有两个负透镜的材料是高折射率材料。
10、 根据权利要求 1所述的投影物镜系统， 其中， 该第五透镜组的第一 子透镜组中最靠近光阑的正透镜的前表面弯向光阑， 其弯曲顶点远离光阑， 曲率半径为正值， 后表面同样弯向光阑， 其弯曲顶点远离光阑， 且曲率半径 大于该前表面的曲率半径。
11、 根据权利要求 1所述的投影物镜系统， 还包括第一、 第二、 第三平 板， 分别位于该物面与第一透镜组之间、 该光阑与该第五透镜组的第一子透 镜组之间、 以及该第五透镜组与该像面之间。
12、 根据权利要求 11 所述的投影物镜系统， 其中， 该第一、 第三平板 作为保护玻璃， 避免内部光学镜片受外界影响， 该第二平板作为预留补偿元 件， 可被修磨以补偿其它光学元件对系统像质的影响。
13、 根据权利要求 1所述的投影物镜系统， 其中， 该第五透镜组的第二 子透镜组中具有非球面表面的负透镜的口径不小于 0.9Dmax, Dmax为最大镜 片口径。
14、 根据权利要求 1所述的投影物镜系统， 其中， 投影物镜的物方工作 距离大于 40mm, 像方工作距离大于 10mm, 像方数值孔径大于 0.5。
15、 根据权利要求 1所述的投影物镜系统， 其中， 投影物镜的物方工作 距离大于 45mm,像方工作距离大于 12mm,所成像与光轴的夹角小于 lmrad, 该物面到像面的距离与投影物镜系统有效焦距之比在 0.15— 0.3之间， 该光阑 处由各个视场发出的光束最大口径之差与中心视场发出的光束的最大口径之 比 <0.5%, 像方数值孔径大于 0.65。
16、 一种微光刻系统， 其特征在于， 使用了根据权利要求 1 - 15中任一 项所述的投影物镜系统。
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CN116954028A (zh) * 2022-04-12 2023-10-27 上海微电子装备（集团）股份有限公司 光刻投影物镜及光刻机
DE102023210777A1 (de) 2023-10-31 2025-04-30 Carl Zeiss Smt Gmbh Optisches System zur Führung von Beleuchtungs- und Abbildungslicht von einer Lichtquelle hin zu einem Bildfeld
CN118068543B (zh) * 2024-04-19 2024-06-25 南京信息工程大学 一种长工作距高分辨率物方远心镜头
DE102024205221A1 (de) 2024-06-06 2025-02-20 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Abbildungsqualität einer optischen Baugruppe eines optischen Systems

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