WO2014067085A1 - 一种超紫外激光打标Fθ镜头及激光加工设备 - Google Patents

一种超紫外激光打标Fθ镜头及激光加工设备 Download PDF

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Publication number
WO2014067085A1
WO2014067085A1 PCT/CN2012/083801 CN2012083801W WO2014067085A1 WO 2014067085 A1 WO2014067085 A1 WO 2014067085A1 CN 2012083801 W CN2012083801 W CN 2012083801W WO 2014067085 A1 WO2014067085 A1 WO 2014067085A1
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Prior art keywords
lens
curved surface
ultra
ultraviolet laser
marking
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PCT/CN2012/083801
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English (en)
French (fr)
Inventor
李家英
周朝明
高云峰
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HAN'S CNC SCIENCE AND TECHNOLOGY Co Ltd
Han s Laser Technology Co Ltd
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HAN'S CNC SCIENCE AND TECHNOLOGY Co Ltd
Han s Laser Technology Co Ltd
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Priority to PCT/CN2012/083801 priority Critical patent/WO2014067085A1/zh
Priority to US14/439,747 priority patent/US9606335B2/en
Priority to CN201280076746.XA priority patent/CN104781716B/zh
Priority to EP12887763.6A priority patent/EP2919053B1/en
Priority to JP2015540007A priority patent/JP6125649B2/ja
Publication of WO2014067085A1 publication Critical patent/WO2014067085A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/34—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having four components only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36—Removing material
    • B23K26/362—Laser etching
    • B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/0005—Optical objectives specially designed for the purposes specified below having F-Theta characteristic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/60—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having five components only

Definitions

  • the invention belongs to the field of optical technology, and in particular relates to an ultra-ultraviolet laser marking F ⁇ lens.
  • d is the two-point minimum resolution distance
  • ⁇ is the wavelength of the processing beam
  • ⁇ is the focal length of the optical lens
  • D is the diameter of the entrance pupil of the optical lens.
  • the object of the present invention is to provide an ultra-ultraviolet laser marking F ⁇ lens, which aims to solve the traditional ultra-ultraviolet laser marking lens. Poor image quality and difficult design.
  • the present invention is achieved by an ultra-ultraviolet laser marking F ⁇ a lens comprising a first lens, a second lens, a third lens and a fourth lens arranged coaxially in the direction of transmission of the incident laser light;
  • the first lens is a double concave negative lens
  • the second lens is a meniscus negative lens
  • the third lens is a meniscus positive lens
  • the fourth lens is a biconvex positive lens
  • the intermediate portions of the second lens and the third lens both protrude toward the transmission direction of the laser;
  • the ratio of the refractive index to the Abbe number of the first lens, the second lens, the third lens, and the fourth lens is 1.476/68, and the tolerance is 5%.
  • Another object of the present invention is to provide A laser processing apparatus comprising an ultra-ultraviolet laser and an optical lens for focusing an ultra-ultraviolet laser for marking, the optical lens using the ultra-ultraviolet laser to mark an F ⁇ lens.
  • the invention effectively corrects astigmatism and distortion, and has high energy concentration, realizes high-quality imaging and high-precision marking, and solves the traditional ultra-violet lens.
  • the insurmountable aberration problem effectively improves the image quality; and the lens is simple in structure and easy to design, and is suitable for wide use in various laser processing equipment.
  • the laser marking device using the lens can also perform high quality and high precision marking.
  • FIG. 1 is a schematic structural view of an ultra-ultraviolet laser marking F ⁇ lens according to an embodiment of the present invention
  • FIG. 2 is a geometric aberration diagram of an ultra-ultraviolet laser marking F ⁇ lens according to an embodiment of the present invention
  • FIG. 3 is a distortion diagram of an ultra-ultraviolet laser marking F ⁇ lens according to an embodiment of the present invention.
  • FIG. 4 is a graph showing an optical transfer function O.T.F of an ultra-ultraviolet laser marking F ⁇ lens according to an embodiment of the present invention
  • FIG. 5 is a graph showing a transfer function M.T.F of an ultra-ultraviolet laser marking F ⁇ lens according to an embodiment of the present invention
  • FIG. 6 is a schematic view showing a dispersion pattern of an ultra-ultraviolet laser marking F ⁇ lens according to an embodiment of the present invention
  • Figure 7 is a schematic diagram showing the energy concentration of an ultra-ultraviolet laser marking F? lens according to an embodiment of the present invention.
  • FIG. 1 shows an ultra-ultraviolet laser marking F ⁇ provided by an embodiment of the present invention.
  • a schematic structural view of the lens for convenience of explanation, only the parts related to the present embodiment are shown.
  • the ultra-ultraviolet laser marking F ⁇ lens mainly comprises a first lens L1, a second lens L2, a third lens L3 and a fourth lens L4, the four lenses are arranged coaxially along the transmission direction of the incident laser, wherein the first lens L1 is a double concave negative lens, the second lens L2 is a meniscus negative lens, and the third lens L3 The meniscus positive lens, the fourth lens L4 is a double convex positive lens.
  • the radius of curvature of the second lens L2 is smaller than the radius of curvature of the exit surface
  • the third lens L3 The radius of curvature of the incident surface is larger than the radius of curvature of the exit surface, and the intermediate portions of the second lens L2 and the third lens L3 are all convex toward the laser light transmission direction, that is, protrude toward the image side.
  • First lens L1 Both sides are recessed inward, and both sides of the fourth lens L4 are outwardly convex.
  • the first lens L1, the second lens L2, the third lens L3, and the fourth lens L4 Made of the same material, the material has a refractive index to Abbe number ratio of Nd/Vd of 1.476/68 and a tolerance of 5%.
  • the material can be specifically fused silica.
  • the first lens L1 The first curved surface S1 and the second curved surface S2 have a radius of curvature of -50 mm and 300 mm, respectively;
  • the second lens L2 includes a third curved surface S3 and a fourth curved surface S4, and the radius of curvature is respectively -28mm, -32mm;
  • the third lens L3 includes a fifth curved surface S5 and a sixth curved surface S6, the radius of curvature is -250mm, -50mm, respectively;
  • the fourth lens L4 Including the seventh surface S7 and the eighth surface S8, the radius of curvature is 250mm, -100mm .
  • the negative sign in the above parameters means that the spherical center of the surface is in the object space, and the positive and negative signs are not considered as positive numbers, and the center of the spherical surface is located in the image space.
  • the first to eighth curved surfaces are sequentially arranged along the laser transmission direction, and the radius of curvature of each of the curved surfaces is not the only option, and both exist. 5% tolerance range.
  • the center thickness D and the surface pitch d of the first to fourth lenses are further Special design is carried out.
  • the center thicknesses D1, D2, D3, and D4 of the first to fourth lenses are 2mm, 5mm, 8mm, and 8mm, respectively, and 5% is also present. The tolerance range.
  • the distance d1 between the second curved surface S2 of the first lens L1 and the third curved surface S3 of the second lens L2 on the optical axis is 9 mm; the fourth curved surface S4 of the second lens L2 The distance d2 on the optical axis from the fifth curved surface S5 of the third lens L3 is 0.5 mm; the sixth curved surface S6 of the third lens L3 and the seventh curved surface S7 of the fourth lens L4
  • the pitch d3 on the optical axis is 0.5 mm; the tolerance of each of the above surfaces is 5%.
  • a fifth lens L5 which is further added to the light exiting side of the fourth lens L4, may be further added.
  • it is a planar lens comprising a ninth curved surface S9 and a tenth curved surface S10, and of course, the ninth curved surface S9 and the tenth curved surface S10 have a radius of curvature of ⁇ .
  • the fifth lens L5 It is mainly used to protect other imaging lenses in the lens to prevent other lenses from being affected by dust, moisture, high temperature or low temperature.
  • the fifth lens L5 can be selected from the same material as the other lenses, and has a center thickness D5 of 2 mm and a tolerance of 5%.
  • the distance d4 of the ninth curved surface S9 of the fifth lens L5 and the eighth curved surface S8 of the fourth lens L4 on the optical axis can be set to 5 mm, and the tolerance is still 5%.
  • the ultra-ultraviolet laser marking F ⁇ lens is still made of fused silica and has the following optical properties:
  • Marking range A 50*50mm 2 ;
  • the invention can effectively correct the astigmatism and distortion of the lens, reduce the influence of high-order aberrations, and improve the energy concentration of the laser focus point, thereby improving Marking accuracy.
  • the maximum aperture of the lens is only The 62mm is a miniaturized lens that can be used by commonly used marking machines for an ideal image quality.
  • Figures 2 ⁇ 7 characterize the imaging quality of the ultra-ultraviolet laser marking F ⁇ lens from different angles.
  • Figure 2 and Figure 3 respectively show the geometric aberration and distortion of the ultra-ultraviolet laser marking F ⁇ lens
  • Figure 2 The seven-order aberration appears to coincide with the five-level aberration, thereby correcting the aberration and flattening the entire image surface, thereby flattening the image plane within the entire marking range.
  • Figure 3 It can be seen that the lens distortion becomes well corrected, and there is no significant difference between the on-axis and off-axis imaging points. Therefore, the astigmatism and distortion of the lens have reached an ideal correction state.
  • Figures 4 and 5 show the optical transfer function O.T.F and the transfer function M.T.F of the lens, respectively.
  • Optical transfer function O.T.F represents the transfer function of fixed resolution
  • the vertical axis represents the percentage
  • the horizontal axis represents the field of view
  • the curve represents the resolution of 10 lp/mm (10 pairs) from top to bottom, respectively, 20 lp/mm (20
  • Figure 5 shows M.T.F In the curve, the vertical axis represents the percentage and the horizontal axis represents the number of pairs.
  • Both O.T.F and M.T.F are used to evaluate the image quality of the lens.
  • Figure 4, 5 It can be seen that there is no significant difference between the on-axis point and the off-axis point of the lens, and the imaging effect is stable, achieving the purpose of a flat image field.
  • Figures 6 and 7 show the speckle and energy concentration of the lens, respectively.
  • Figure 6 shows 6 The size of the speckle in the field of view, the diffuse size in all fields of view is controlled within 10 ⁇ m, and the 80% energy is concentrated at 5 ⁇ m Left and right, the energy concentration is extremely high, and high-precision marking can be achieved.
  • Ultra-ultraviolet laser marking F ⁇ provided by the invention
  • the lens effectively corrects astigmatism and distortion without changing the lens material, and has high energy concentration, achieving high-quality imaging and high-precision marking, solving the aberration problem that is difficult to overcome by the conventional ultra-violet lens.
  • the image quality is effectively improved; and the lens is simple in structure and easy to design, and is suitable for use in a wide variety of laser processing equipment.
  • the present invention still further provides a laser processing apparatus comprising an ultra-ultraviolet laser and an optical lens for focusing an ultra-ultraviolet laser for marking, wherein the optical lens can be marked with the ultra-ultraviolet laser provided by the present invention.
  • Lens for high quality and high precision marking This lens is especially suitable for ultra-ultraviolet laser marking, especially for lasers with a wavelength of 266nm. Therefore, the wavelength of the ultra-ultraviolet laser is preferably 266nm. .

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Laser Beam Processing (AREA)
  • Eyeglasses (AREA)

Abstract

一种超紫外激光打标Fθ镜头及镜头加工设备。该镜头包括沿入射激光的传输方向依次共轴设置的第一透镜（L1）、第二透镜（L2）、第三透镜（L3）、第四透镜（L4）；第一透镜（L1）为双凹负透镜，第二透镜（L2）为弯月形负透镜，第三透镜（L3）为弯月形正透镜，第四透镜（L4）为双凸正透镜，第二透镜（L2）和第三透镜（L3）的中间部分均向激光的传输方向凸出；第一、第二、第三及第四透镜的折射率与阿贝数的比例为1.476/68，公差为5%。通过四个透镜的形状及相对位置的设计，有效矫正了像散和畸变，且能量集中度高，实现了高质量成像打标，提高了成像质量，且镜头结构简单，便于涉及，适合用于各种激光加工设备中。

Description

一种超紫外激光打标Fθ镜头及激光加工设备 技术领域
本发明属于光学技术领域，特别涉及一种超紫外激光打标 Fθ 镜头。
背景技术
在激光打标技术中，不同材料、不同介质会吸收不同波长的激光与之相互作用，也就是说，对于不同的待加工介质，只能采用不同波长的激光器进行加工。另外，根据 ' 瑞利 ' 判据可知，激光打标的理论分 辨距离为：
d= 2.44λ ƒ /D ，其中：
d 为两 点最小分辨距离；
λ 为加工光束的波长；
ƒ 为光学镜头的焦距；
D 为光学镜头的入瞳直径。
由此可知，用超短波长的激光束进行打标会得到 高分辨的点距。目前商用激光器的最短波长 λ=266nm ，在理论上，它的分辨率比采用 1064nm 波长的激光器的分辨率大四倍，这是非常有吸引力的选择。但是实际上能透过这种超短波激光的材料并不多，目前较为理想的材料只有融石英（ silica ）一种，而融石英的折射率非常低，其折射率与阿贝数之比为 1.476/68 ，融石英作为镜头材料，一方面会增加透镜的厚度，另一方面，由于透镜的半径 r 通常与折射率 n 成正比，采用融石英制作镜头时半径 r 较小，这会加大高级像差，因此使得高质量 Fθ 镜头的设计 更加困难。
 技术问题
本发明的目的 在于提供一种 超紫外激光打标 Fθ 镜头 ，旨在解决传统 超紫外激光打标镜头 成像质量差、设计困难 的问题 。
技术解决方案
本发明是这样实现的， 一种超紫外激光打标 Fθ 镜头，包括沿入射激光的传输方向依次共轴设置的第一透镜、第二透镜、第三透镜及第四透镜；
所述第一透镜为双凹负透镜，所述第二透镜为弯月形负透镜，所述第三透镜为弯月形正透镜，所述第四透镜为双凸正透镜；
所述第二透镜和第三透镜的中间部分均向所述激光的传输方向凸出；
所述第一透镜、第二透镜、第三透镜及第四透镜的折射率与阿贝数的比例为 1.476/68 ，公差为 5% 。
本发明的另一目的 在于提供 一种激光加工设备，包括超紫外激光器及用于聚焦超紫外激光以进行打标的光学镜头，所述光学镜头采用所述的超紫外激光打标 Fθ 镜头。
 有益效果
本发明通过对第一至第四透镜进行上述结构设计后，有效校正了像散和畸变，且具有较高的能量集中度，实现了高质量成像及高精度打标，解决了传统超紫外镜头难以克服的像差问题，有效提高了成像质量；并且，该镜头结构简单，便于设计，适合广泛用于各种激光加工设备中。进而，采用该镜头的激光打标设备也可以进行高质量、高精度打标。
附图说明
图 1 是本发明实施例超紫外激光打标 Fθ 镜头的结构示意图；
图 2 是本发明实施例超紫外激光打标 Fθ 镜头的几何像差曲线图；
图 3 是本发明实施例超紫外激光打标 Fθ 镜头的畸变曲线图；
图 4 是本发明实施例超紫外激光打标 Fθ 镜头的光学传递函数 O.T.F 曲线图；
图 5 是本发明实施例超紫外激光打标 Fθ 镜头的传递函数 M.T.F 曲线图；
图 6 是本发明实施例超紫外激光打标 Fθ 镜头的弥散斑示意图；
图 7 是本发明实施例超紫外激光打标 Fθ 镜头的能量集中度示意图。
 本发明的实施方式
为了使本发明的目的、技术方案及优点更加清楚明白，以下结合附图及实施例，对本发明进行进一步详细说明。应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
以下结合具体实施例对本发明的具体实现进行更加详细的描述：
图 1 示出了本发明实施例提供的超紫外激光打标 Fθ 镜头的结构示意图，为了便于说明，仅示出了与本实施例相关的部分。
该超紫外激光打标 Fθ 镜头主要包括第一透镜 L1 、第二透镜 L2 、第三透镜 L3 及第四透镜 L4 ，这四枚透镜沿入射激光的传输方向依次共轴设置，其中，第一透镜 L1 为双凹负透镜，第二透镜 L2 为弯月形负透镜，第三透镜 L3 为弯月形正透镜，第四透镜 L4 为双凸正透镜。并且，第二透镜 L2 的曲率半径小于出射面的曲率半径，第三透镜 L3 的入射面的曲率半径大于出射面的曲率半径，第二透镜 L2 和第三透镜 L3 的中间部分均向着激光的传输方向凸出，即向像方突出。第一透镜 L1 的两面均向内凹陷，第四透镜 L4 的两面均向外凸出。另外，第一透镜 L1 、第二透镜 L2 、第三透镜 L3 及第四透镜 L4 采用相同材料制作，这种材料的折射率与阿贝数的比例 Nd/Vd 为 1.476/68 ，公差为 5% ，该材料具体可采用融石英。
进一步的，本实施例对各透镜的表面曲率及透镜厚度等参数进行了优化设计。具体的，第一透镜 L1 包括第一曲面 S1 和第二曲面 S2 ，曲率半径分别为 -50mm ， 300mm ；第二透镜 L2 包括第三曲面 S3 和第四曲面 S4 ，曲率半径分别为 -28mm ， -32mm ；第三透镜 L3 包括第五曲面 S5 和第六曲面 S6 ，曲率半径分别为 -250mm ， -50mm ；第四透镜 L4 包括第七曲面 S7 和第八曲面 S8 ，曲率半径分别为 250mm ， -100mm 。上述参数中的负号代表曲面的球心位于物方空间，未带有正、负号的视为正号，代表曲面的球心位于像方空间。上述第一至第八曲面沿激光传输方向依次排布，且上述各曲面的曲率半径并不是唯一的选择，均存在 5% 的公差范围。
进一步的，本实施例还对第一至第四透镜的中心厚度 D 及曲面间距 d 进行了特殊设计，具体的，第一至第四透镜的中心厚度 D1 、 D2 、 D3 、 D4 分别为 2mm 、 5mm 、 8mm 、 8mm ，亦存在 5% 的公差范围。并且，第一透镜 L1 的第二曲面 S2 与第二透镜 L2 的第三曲面 S3 在光轴上的间距 d1 为 9mm ；第二透镜 L2 的第四曲面 S4 与第三透镜 L3 的第五曲面 S5 在光轴上的间距 d2 为 0.5mm ；第三透镜 L3 的第六曲面 S6 与第四透镜 L4 的第七曲面 S7 在光轴上的间距 d3 为 0.5mm ；上述各曲面间距的公差均为 5% 。
通过对第一至第四透镜的曲面曲率 R 、透镜的中心厚度 D 及曲面间隔 d 进行上述设计后，可以得到较佳的成像质量和打标精度。另外，本实施例还可以进一步在第四透镜 L4 的出光侧增设第五透镜 L5 ，该第五透镜 L5 优选为平面透镜，其包括第九曲面 S9 和第十曲面 S10 ，当然，第九曲面 S9 和第十曲面 S10 的曲率半径均为∞。该第五透镜 L5 主要用于保护镜头内其他成像透镜，避免其他透镜受到灰尘、湿气、高温或低温等影响。
具体的，第五透镜 L5 可与其他透镜选择相同材料，其中心厚度 D5 为 2mm ，公差为 5% ；并且，第五透镜 L5 的第九曲面 S9 与第四透镜 L4 的第八曲面 S8 在光轴上的间距 d4 可设置为 5mm ，公差仍为 5% 。
根据上述内容，以下提供一种具体结构的超紫外激光打标 Fθ 镜头，参考表 1:
表 1. 超紫外激光打标 Fθ 镜头的结构参数
L( 透镜 ) S( 曲面 ) R( 曲率半径 ) d( 曲面间隔 ) D( 中心厚度 ) Nd/Vd( 材料 )
1 1 -50 2 1.476/68
2 300 9
2 3 -28 5 1.476/68
4 -32 0.5
3 5 -250 8 1.476/68
6 -50 0.5
4 7 250 8 1.476/68
8 -100 5
5 9 ∞ 2 1.476/68
10 ∞
该超紫外激光打标 Fθ 镜头仍然采用融石英材料制造，并具有下述光学特性：
通光波长 λ =266nm ；
焦距 ƒ =100mm ；
入瞳直径 D 入 =10mm ；
打标范围 A=50*50mm2 ；
视场角 2 ω =50 °。
本发明通过对上述各透镜的形状、相对位置及结构参数进行上述设计后，可以有效校正镜头的象散和畸变，减小高级像差的影响，并且提高激光聚焦点的能量集中度，进而提高打标精度。该镜头的最大通光口径只有 62mm ，是一种小型化的镜头，可供常用的打标机使用，其成像质量达到了理想状态。
图 2~7 分别从不同角度表征了该超紫外激光打标 Fθ 镜头的成像质量。
其中，图 2 和图 3 分别表示该超紫外激光打标 Fθ 镜头的几何像差和畸变，图 2 中出现七级像差正好与五级像差相抵，从而校正了像差而使整个像面变平，进而使得整个打标范围内的像面都变平。由图 3 可知镜头畸变得到良好校正，轴上与轴外成像点无明显差别。因此该镜头的象散和畸变都已达到了理想的校正状态。
图 4 和图 5 分别表示该镜头的光学传递函数 O.T.F 和传递函数 M.T.F 。光学传递函数 O.T.F 表示固定分辨率的传递函数，纵轴代表百分比，横轴代表视场，曲线从上到下分别代表分辨率为 10lp/mm(10 个线对 ) 、 20lp/mm(20 个线对 ) 、 30 lp/mm(30 个线对 ) 及 40lp/mm(40 个线对 ) 的光学传递函数曲线。图 5 所示 M.T.F 曲线中，纵轴代表百分比，横轴代表线对数量。 O.T.F 和 M.T.F 都用于评价镜头的成像质量。由图 4 、 5 可以看出，该镜头的轴上点和轴外点均无明显差别，成像效果稳定，达到了平像场的目的。
图 6 和图 7 分别表示该镜头的弥散斑和能量集中度，图 6 中示出了 6 个视场中弥散斑的大小，图中可见所有视场内的弥散斑大小均控制在 10 μ m 内，且 80% 能量集中在 5 μ m 左右，能量集中度极高，可实现高精度打标。
本发明提供的超紫外激光打标 Fθ 镜头在不改变镜头材料的基础上有效校正了像散和畸变，且具有较高的能量集中度，实现了高质量成像及高精度打标，解决了传统超紫外镜头难以克服的像差问题，有效提高了成像质量；并且，该镜头结构简单，便于设计，适合广泛用于各种激光加工设备中。
本发明还进一步提供一种激光加工设备，其包括超紫外激光器及用于聚焦超紫外激光以进行打标的光学镜头，其中，光学镜头即可采用本发明提供的超紫外激光打标 Fθ 镜头，以实现高质量及高精度打标。该镜头特别适用于超紫外激光打标，尤其适用于波长为 266nm 的激光，因此该超紫外激光器的发光波长优选为 266nm 。
以上所述仅为本发明的较佳实施例而已，并不用以限制本发明，凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等，均应包含在本发明的保护范围之内。

Claims (10)

  1. 一种超紫外激光打标 Fθ 镜头，其特征在于，包括沿入射激光的传输方向依次共轴设置的第一透镜、第二透镜、第三透镜及第四透镜；
    所述第一透镜为双凹负透镜，所述第二透镜为弯月形负透镜，所述第三透镜为弯月形正透镜，所述第四透镜为双凸正透镜；
    所述第二透镜和第三透镜的中间部分均向所述激光的传输方向凸出；
    所述第一透镜、第二透镜、第三透镜及第四透镜的折射率与阿贝数的比例为 1.476/68 ，公差为 5% 。
  2. 如权利要求 1 所述的超紫外激光打标 Fθ 镜头，其特征在于，所述第一透镜、第二透镜、第三透镜及第四透镜的材料均为融石英。
  3. 如权利要求 1 所述的超紫外激光打标 Fθ 镜头，其特征在于，所述第一透镜包括第一曲面和第二曲面，所述第二透镜包括第三曲面和第四曲面，所述第三透镜包括第五曲面和第六曲面，所述第四透镜包括第七曲面和第八曲面，所述第一至第八曲面沿激光传输方向依次排布；
    所述第一至第八曲面的曲率半径依次为： -50mm ， 300mm ， -28mm ， -32mm ， -250mm ， -50mm ， 250mm ， -100mm ，公差均为 5% 。
  4. 如权利要求 3 所述的超紫外激光打标 Fθ 镜头，其特征在于，所述第一至第四透镜的中心厚度依次为： 2mm ， 5mm ， 8mm ， 8mm ；
    所述第二曲面与第三曲面在光轴上的间距为 9mm ；
    所述第四曲面与第五曲面在光轴上的间距为 0.5mm ；
    所述第六曲面与第七曲面在光轴上的间距为 0.5mm ；
    各所述中心厚度及各所述间距的公差均为 5% 。
  5. 如权利要求 1 至 4 任一项所述的超紫外激光打标 Fθ 镜头，其特征在于，还包括第五透镜，位于所述第四透镜的出光侧，所述第五透镜包括第九曲面和第十曲面，所述第九曲面和第十曲面的曲率半径均为∞。
  6. 如权利要求 5 所述的超紫外激光打标 Fθ 镜头，其特征在于，所述第五透镜的折射率与阿贝数之比为 1.476/68 ，公差为 5% 。
  7. 如权利要求 6 所述的超紫外激光打标 Fθ 镜头，其特征在于，所述第五透镜的材料为融石英。
  8. 如权利要求 6 或 7 所述的超紫外激光打标 Fθ 镜头，其特征在于，所述第五透镜的中心厚度为 2mm ，公差为 5% ；
    所述第九曲面与所述第八曲面在光轴上的间距为 5mm ，公差为 5% 。
  9. 一种激光加工设备，包括超紫外激光器及用于聚焦超紫外激光以进行打标的光学镜头，其特征在于，所述光学镜头采用权利要求 1~8 任一项所述的超紫外激光打标 Fθ 镜头。
  10. 如权利要求 9 所述的激光加工设备，其特征在于，所述超紫外激光器的发光波长为 266nm 。
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TWI664044B (zh) * 2017-08-30 2019-07-01 大陸商上海微電子裝備（集團）股份有限公司 一種適於在雷射加工工藝中使用的F-theta鏡頭

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