WO2014153855A1 - 彩膜基板及其制作方法、触摸屏、显示装置 - Google Patents

彩膜基板及其制作方法、触摸屏、显示装置 Download PDF

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Publication number
WO2014153855A1
WO2014153855A1 PCT/CN2013/077421 CN2013077421W WO2014153855A1 WO 2014153855 A1 WO2014153855 A1 WO 2014153855A1 CN 2013077421 W CN2013077421 W CN 2013077421W WO 2014153855 A1 WO2014153855 A1 WO 2014153855A1
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WIPO (PCT)
Prior art keywords
sensing
layer
sensing electrode
film layer
sensing unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2013/077421
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English (en)
French (fr)
Inventor
高永益
黄炜赟
南英瑛
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Chengdu BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US14/344,563 priority Critical patent/US20160188070A1/en
Priority to EP13834319.9A priority patent/EP2980635B1/en
Publication of WO2014153855A1 publication Critical patent/WO2014153855A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • Embodiments of the present invention relate to a color film substrate, a method of fabricating the same, a touch screen, and a display device. Background technique
  • the touch screen also known as the "touch screen” is the most convenient, convenient and natural human-computer interaction method. It is an attractive new multimedia interactive device.
  • the existing liquid crystal display touch screen is disposed between the color film substrate and the polarizing plate of the liquid crystal panel, that is, a touch sensor is formed on the liquid crystal panel, which is called a ' ⁇ -cell' touch screen.
  • a touch sensor is formed on the liquid crystal panel, which is called a ' ⁇ -cell' touch screen.
  • the touch screen is relatively thick. It is difficult to meet the increasing demand for display products.
  • the touch panel is externally disposed on the liquid crystal display panel, and there is a physical space between the liquid crystal display panel and the touch panel, so that external light is reflected between the upper surface of the liquid crystal panel and the lower surface of the touch panel, thereby Causes poor readability in the sun.
  • Embodiments of the present invention provide a color film substrate and a manufacturing method thereof, a touch screen, and a display device, which make the touch screen thin and light and more readable under sunlight.
  • Embodiments of the present invention provide a color filter substrate including a transparent substrate and a color film layer disposed on the transparent substrate; the color film layer includes a plurality of filter blocks, a plurality of first sensing electrodes, and a plurality of a second sensing electrode, the first sensing electrode and the second sensing electrode are insulated; the color film layer is located at a portion where the first sensing electrode and the second sensing electrode intersect. The first sensing electrode and the second sensing electrode are insulated at intersections, thereby forming a touch sensing capacitor.
  • the first sensing electrodes are formed in a plurality of rows in a first direction
  • the second sensing electrodes are formed in a plurality of rows in a second direction.
  • first direction and the second direction are perpendicular.
  • the first sensing electrode may further include: a first sensing unit and a first connecting line, wherein the first sensing unit belonging to the same first sensing electrode is electrically connected through the first connecting line;
  • the sensing electrode comprises: a second sensing unit and a second connecting line, belonging to the same second sensing electrode
  • the second sensing unit is electrically connected by a second connecting line.
  • the first sensing unit, the second sensing unit, and the second connecting line are disposed on the same layer, and the first sensing unit is insulated from the second sensing unit and the second connecting line,
  • the first connecting line and the first sensing unit are disposed in different layers, and the color film layer is disposed between the first connecting line and the first sensing unit, and the color film layer is provided with a via hole, belonging to A first sensing unit of the same first sensing electrode is electrically connected to the first connecting line through the via.
  • the first connecting line is in the form of a black strip at a position where the color filter layer filter blocks are in contact.
  • the color filter substrate may further include a black strip crossing the first connecting line, the black strip being located at a position where the color film filter blocks are in contact with each other, and insulated from the first connecting line.
  • the first sensing unit and the first connecting line are disposed in the same layer
  • the second sensing unit and the second connecting line are disposed in the same layer
  • the first sensing unit and the second sensing unit are disposed in different layers.
  • a layer, and the color film layer is disposed between the first sensing electrode and the second sensing electrode to insulate the first sensing electrode and the second sensing electrode.
  • the color filter substrate may further include a black matrix film layer disposed between the color film layer and the transparent substrate, the black matrix film layer includes a black matrix, and the black matrix is disposed on the color film layer Where the light blocks meet.
  • the color filter substrate may further include a flat layer, and the color film layer and the first sensing electrode and the second sensing electrode are disposed between the flat layer and the transparent substrate.
  • the color filter substrate may further include a transparent conductive layer disposed between the transparent conductive layer and the transparent substrate.
  • the transparent conductive layer is grounded.
  • the color filter substrate may further include an insulating layer disposed between the insulating layer and the transparent substrate.
  • the embodiment of the invention provides a touch screen, which comprises any color film substrate provided by the embodiment of the invention.
  • the touch screen may further include: an array substrate and a driving circuit connected to the first sensing electrode and the second sensing electrode for controlling the first sensing electrode and the second sensing electrode, and the driving The circuit is placed with the drive circuit on the array substrate.
  • An embodiment of the present invention provides a display device, including any touch provided by an embodiment of the present invention. Screen.
  • the embodiment of the invention provides a method for fabricating a color filter substrate, comprising: providing a first connecting line on a transparent substrate, wherein the first connecting line is configured to make the first sensing unit belonging to the same first sensing electrode a color film layer is disposed on the transparent substrate, wherein the color film layer includes a plurality of closely spaced filter blocks, and a via hole is disposed on the color film layer; and the first sensing layer is disposed on the transparent substrate a unit, a second sensing unit, and a second connecting line, wherein the first sensing unit is electrically connected to the first connecting line through a via hole on the color film layer, and the second connecting line is used to make The second sensing unit of the same second sensing electrode is electrically connected, and the first sensing unit is insulated from the second sensing unit and the second connecting line.
  • the first connecting line is in the form of a strip of black which is located at a position where the color filter layer of the color filter layer is in contact.
  • the method may further include: providing a black strip on the transparent substrate that intersects the first connecting line, the black strip is located at a position where the color filter layer is in contact with each other, and is insulated from the first connecting line .
  • the method may further include: providing a flat layer on the transparent substrate, and the color film layer and the first and second sensing electrodes are located between the flat layer and the transparent substrate.
  • the method may further include: providing a transparent conductive layer on the transparent substrate, and the flat layer is disposed between the transparent conductive layer and the transparent substrate.
  • the method may further include: providing an insulating layer on the transparent substrate, and the transparent conductive layer is disposed between the insulating layer and the transparent substrate.
  • the embodiment of the invention provides a method for fabricating a color filter substrate, comprising: disposing a first sensing unit and a first connecting line on a transparent substrate, wherein the first connecting line is used to make the same first sensing a first sensing unit of the electrode is electrically connected; a color film layer is disposed on the transparent substrate, wherein the color film layer comprises a plurality of closely connected filter blocks; and the second sensing unit and the second connection are disposed on the transparent substrate a line, wherein the second connection line is for electrically connecting the second sensing units belonging to the same second sensing electrode.
  • the method further includes: providing a black matrix film layer on the transparent substrate, wherein the black matrix film layer comprises a black matrix, and the black matrix is disposed At a position where the color filter layer filter blocks meet.
  • the method may further include: providing a flat layer on the transparent substrate, and the color film layer And the first sensing electrode and the second sensing electrode are located between the flat layer and the transparent substrate.
  • the method may further include: providing a transparent conductive layer on the transparent substrate, and the flat layer is disposed between the transparent conductive layer and the transparent substrate.
  • the method may further include: providing an insulating layer on the transparent substrate, and the transparent conductive layer is disposed between the insulating layer and the transparent substrate.
  • FIG. 1A and FIG. 1B are schematic top views showing two examples of a color filter substrate according to an embodiment of the present invention.
  • Figure 2 is a partial enlarged view of Figure 1A;
  • 3A and 3B are schematic cross-sectional views of the two examples of FIG. 2 taken along line A-A';
  • FIG. 4 is a schematic top plan view of another color filter substrate according to an embodiment of the present invention.
  • FIG. 5 is a partial enlarged view of FIG.
  • 6A and 6B are schematic cross-sectional views of the two examples of FIG. 5 taken along line A-A';
  • FIG. 7 is a schematic diagram of the circuit switching of the color filter substrate shown in FIG. 3A according to an embodiment of the present invention
  • FIG. 8 is a schematic diagram of the circuit switching of the color filter substrate shown in FIG. 6A according to an embodiment of the present invention
  • FIG. 10 is a schematic diagram of a first connecting line disposed on a transparent substrate according to an embodiment of the present invention
  • FIG. 11 is a schematic diagram of a color film layer disposed on a transparent substrate according to an embodiment of the present invention
  • FIG. 13 is a schematic diagram of another method for fabricating a color filter substrate according to an embodiment of the present invention.
  • FIG. 14 is a schematic diagram of a black matrix film layer disposed on a transparent substrate according to an embodiment of the present invention.
  • FIG. 16 is a schematic diagram of a color film layer disposed on a transparent substrate according to an embodiment of the present invention.
  • 17 is a second schematic diagram of a transparent substrate provided on an embodiment of the present invention. Schematic diagram of the sensing electrode; 1-transparent substrate; 2-color film layer; 21-filter block; 3-first sensing electrode; 31-first sensing unit; 32-first connecting line; 4-second sensing electrode; Second sensing unit; 42-second connecting line; 5-black matrix film layer; 6-flat layer; 7-transparent conductive layer; 8-insulating layer; 10-isotropic conductive material; 11-blocking glue; 20-array substrate; 21-connection point; 22-via; 33-black strip. detailed description
  • the color filter substrate comprises: a transparent substrate 1 and a color film layer 2 disposed on the transparent substrate 1; the color film layer 2 includes a plurality of filter blocks 21 (see the dotted frame in the figure), and each filter block can be Corresponding to one sub-pixel, for example, it may be a red, green or blue filter block.
  • the color filter substrate further includes: a plurality of first sensing electrodes 3 and a plurality of second sensing electrodes 4; the color film layer 2 is located at a crossover position of the first sensing electrode 3 and the second sensing electrode 4 The portion of the first sensing electrode 3 and the second sensing electrode 4 are insulated at the intersection to form a touch sensing capacitor.
  • the touch screen works by touching the display with a finger or other similar object.
  • the touch sensing capacitor generates a charge at the touched position, and the change of the charge of the touch sensing capacitor is detected by the first sensing electrode 3 and the second sensing electrode 4, and is transmitted to the control chip in the form of coordinates.
  • the control chip determines the input information according to the transmitted touch signal, thereby controlling the display.
  • the color film layer of this embodiment includes a plurality of filter blocks, which may be closely connected at portions where the respective edges overlap each other, or may be a plurality of filter blocks that do not overlap and closely adhere to each other. Alternatively, it may be separated from each other by a structure functioning as a barrier, as separated by a black matrix.
  • the two filter blocks adjacent to the color film layer have overlapping portions with each other, so that the adjacent two filter blocks are prevented from coming into contact with each other and leaking light.
  • the color film substrate provided in this embodiment is provided with a first sensing electrode and a second sensing electrode on the color film substrate, and the touch position can be positioned by the first sensing electrode and the second sensing electrode. So that the color film substrate can realize the touch function.
  • the first sensing electrode and the second sensing electrode are insulated by a color film layer, and an insulating layer specially used for spacing the first and second sensing electrodes is reduced with respect to the color filter substrate of the existing touch screen. .
  • the touch screen including the color film substrate is thinner and lighter than the existing "On-cell" touch screen.
  • the first sensing electrode and the second sensing electrode are directly disposed on the color filter substrate, and the readability in sunlight is increased compared with the existing "On-cell" touch screen.
  • the color film substrate provided by the embodiment of the present invention is applicable not only to a liquid crystal display device but also to other types of display devices such as an OLED (Organic Light Emitting Diode).
  • OLED Organic Light Emitting Diode
  • the first sensing electrodes 3 are formed in a plurality of rows along the first direction, and the second sensing electrodes 4 are formed in a plurality of rows along the second direction.
  • the first sensing electrodes 3 are formed in a plurality of rows along the first direction 101, and the second sensing electrodes 4 are formed in a plurality of rows along the second direction 102.
  • the first direction 101 and the second direction 102 are perpendicular.
  • the embodiment of the present invention will be described in detail by taking this form as an example.
  • the first sensing electrode 3 includes a first sensing unit 31 and a first connecting line 32, and the first sensing unit belonging to the same first sensing electrode 3
  • the unit 31 is electrically connected by a first connecting line 32
  • the second sensing electrode 4 includes a second sensing unit 41 and a second connecting line 42, and the second sensing unit 41 belonging to the same second sensing electrode 4 passes the
  • the two connecting wires 42 are electrically connected.
  • the material forming the first connecting line 32 and the second connecting line 42 may be a conductive material, which may be the same material as the first sensing unit 31 and the second sensing unit 41, and may be, for example, indium tin oxide; or may be conductive.
  • First connection line 32 and second connection line 42 connects the first sensing unit 31 and the second sensing unit 41, respectively.
  • An example of the shape of the first connection line 32 and the second connection line 42 can be referred to FIG.
  • the first sensing unit 31 and the second sensing unit 41 may be diamonds as shown in FIG. 2, and may also have other shapes; the shapes of the first connecting line 32 and the second connecting line 42 are not limited to The shape shown in the figure is only required to realize the function of connecting the first sensing unit 31 and the second sensing unit 41.
  • the first sensing unit 31, the second sensing unit 41, and the first connecting line 32 and the second connecting line 42 are taken as the example shown in FIG. 2 for detailed description.
  • the connecting line in the embodiment is not limited to the single connecting line.
  • the first connecting line 32 in the above embodiment may be an integrated structure formed simultaneously with the first sensing unit 31, or may be separately fabricated in a sequential order.
  • the first sensing unit 31, the second sensing unit 41, and the second connecting line 42 are disposed on the same layer, and the first sensing unit 31 and the The second sensing unit 41 and the second connecting line 42 are insulated, the first connecting line 32 and the first sensing unit 31 are disposed in different layers, and the color film layer 2 is disposed on the first connecting line 32 and the first pass Between the sensing units 31, a via 22 is disposed in the color film layer 2, and the first sensing unit 31 belonging to the same first sensing electrode 3 is electrically connected to the first connecting line 32 through the via 22.
  • FIG. 2 FIG.
  • the first sensing unit 31, the second sensing unit 41 and the second connecting line 42 are disposed on the upper surface of the color film layer 2, and the second sensing electrodes are located in the same row.
  • the second sensing unit 41 is directly connected to the second connecting line 42 for electrical connection.
  • the first connecting line 32 is disposed under the color film layer 2 (relative to the substrate 1), and a via hole 22 is disposed in the color film layer 2, and the first sensing unit 31 disposed on the color film layer 2 passes the The via 22 in the color film layer 2 is connected to the first connection line 32 disposed under the color film layer 2 such that the first sensing unit 31 of the first sensing electrode 3 in the same row passes through the first connection line 32. Electrical connection.
  • the "upper” and “lower” are based on the order of production on the substrate, the “below” which is previously produced, and the “upper” which is produced later.
  • the first connecting line 32 is disposed under the color film layer 2, and the first sensing unit 31, the second sensing unit 41, and the second connecting line 42 are disposed on the color film layer 2, that is, The color film layer 2 is disposed between the first connection line 32, the second sensing unit 41, the second connection line 42, and the first sensing unit 31.
  • the first connecting lines 32 are in the form of black strips at positions where the filter blocks 21 of the color film layer 2 are in contact with each other.
  • the first connecting line 32 is a black strip
  • the first connection line 32 can be used not only to electrically connect the first sensing unit 31 in which the first sensing electrodes 3 are located in the same row, but also to prevent the color film from being further prevented. Light is leaked at the position where the filter blocks 21 of the layer 2 are in contact. That is, the first connection line 32 may be a part of the black matrix, and electrical connection between the first sensing units 31 belonging to the same first sensing electrode 3 may be realized.
  • the color filter substrate further includes a black strip 33 crossing the first connecting line 32, and the black strip 33 is also located at a position where the filter blocks 21 of the color film layer 2 are in contact with each other. Thereby perpendicular to the first connecting line 32.
  • the black strips 33 may be made of a conductive material to be insulated from the first connecting wires 32, for example, the black strips 33 may be disposed in different layers from the first connecting lines 32. Alternatively, the black strips 33 may be made of an insulating material so as to be disposed in the same layer as the first connecting line 32.
  • the black strips 33 and the first connecting lines 32 are made of a conductive material and are disposed on the same layer, but are not connected to each other to ensure insulation.
  • the black strip 33 intersects the first connecting line 32 and is disposed at a position where the filter blocks 21 of the color film layer 2 are in contact with each other, so that light leakage at the junction of the filter blocks 21 of the color film layer 2 can be prevented.
  • the first connecting line 32 forms a black matrix with the black strip 33, and the first connecting line 32 is electrically insulated from the black strip 33.
  • the black strip 33 in this embodiment may be a part of the black matrix or a black strip structure specially provided.
  • the color filter substrate may further include a flat layer 6.
  • the color film layer 2 and the first sensing electrode 3 and the second sensing electrode 4 are disposed on the flat layer 6 and the transparent substrate 1 Between, that is, the flat layer 6 covers them.
  • the flat layer 6 is disposed on the second sensing electrode 4.
  • the flat layer 6 can not only flatten the film layer on the color filter substrate, but also the flat layer 6 has an insulating function, and the sensing capacitor and the liquid crystal which can be formed by the first sensing electrode 3 and the second sensing electrode 4 The capacitors are separated to prevent them from interfering with each other.
  • the color filter substrate may further include a transparent conductive layer 7, and the flat layer
  • the liquid crystal display device controls the light transmittance through the liquid crystal using an electric field to display an image.
  • the liquid crystal display device is roughly classified into a vertical electric field drive type and a horizontal electric field drive type in accordance with the electric field direction in which the liquid crystal is driven.
  • the vertical electric field driving type liquid crystal display device is provided with a common electrode and a pixel electrode opposite to each other on the color filter substrate and the array substrate, and a vertical electric field is formed between the common electrode and the pixel electrode to drive the liquid crystal.
  • TN Transist Nematic
  • VA Very Alignment
  • the horizontal electric field-driven liquid crystal display device has a common electrode and a pixel electrode disposed on the array substrate, and a horizontal electric field is formed between the common electrode and the pixel electrode to drive the liquid crystal, such as ADS (Advanced-Super Dimensional Switching).
  • ADS Advanced-Super Dimensional Switching
  • Type, IPS In Plane Switch type liquid crystal display device.
  • the vertical electric field type liquid crystal display device is further provided with a common electrode on the color filter substrate for forming a vertical electric field with the pixel electrode on the array substrate.
  • the transparent conductive layer 7 may include a common electrode, and the color film substrate may be applied to a vertical electric field type liquid crystal display device.
  • the transparent conductive layer 7 is disposed on top of the planar layer 6, the transparent conductive layer
  • the common electrode on the transparent conductive layer 7 can be electrically connected to the common electrode line on the array substrate.
  • the color filter substrate may further include an insulating layer 8, and the transparent conductive layer 7 is disposed between the insulating layer 8 and the transparent substrate 1. . That is, the insulating layer 8 is disposed on the upper surface of the transparent conductive layer 7.
  • an insulating layer 8 for preventing the capacitance formed by the first sensing electrode 3 and the second sensing electrode 4 is further disposed on the transparent conductive layer 7. Mutual interference with liquid crystal capacitors.
  • the transparent conductive layer 7 may be disposed on the flat layer 6, but the transparent conductive layer 7 is grounded at this time.
  • the transparent conductive layer 6 can further prevent mutual interference between the capacitance formed by the first sensing electrode 3 and the second sensing electrode 4 and the liquid crystal capacitance.
  • the color filter substrate provided by the embodiment of the present invention is not limited to the color filter substrate shown in the drawings, as long as the first sensing electrode 3 and the second sensing electrode 4 are insulated by the color film layer.
  • the first sensing unit 31, the second sensing unit 41, and the second connecting line 42 may be disposed under the color film layer 2, and the first connecting line 32 may be disposed on the color film.
  • a via hole 22 is provided in the color film layer 2, and the first connection line 32 is electrically connected to the first sensing unit 31 through the via hole 22.
  • the first sensing unit 31 and the first connecting line 32 are disposed in the same layer, and the second sensing unit 41 and the second connecting line 42 are disposed.
  • the first sensing unit 31 and the second sensing unit 41 are disposed in different layers, and the color film layer 2 is disposed between the first sensing electrode 3 and the second sensing electrode 4, so that the first pass The sensing electrode 3 and the second sensing electrode 4 are insulated.
  • the first sensing unit 31 and the first connecting line 32 are disposed in the same layer, and the first sensing unit 31 in which the first sensing electrodes 3 are located in the same row is directly connected through the first connecting line 32.
  • the second sensing unit 41 and the second connecting line 42 are disposed on the same layer, and the second sensing unit 41 in which the second sensing electrodes 4 are located in the same row is directly connected through the second connecting line 42. And the color film layer 2 is disposed between the first sensing electrode 3 and the second sensing electrode 4 to insulate the first sensing electrode 3 and the second sensing electrode 4.
  • the color filter substrate may further include: a black matrix film layer 5 disposed between the color film layer 2 and the transparent substrate 1, the black matrix film layer 5 including a black matrix, and the The black matrix is disposed at a position where the color filter layer filter block 21 is in contact.
  • the black matrix film layer 5 is disposed under the first sensing electrode 3. Since the color film layer 2 includes a plurality of filter blocks 21, a seam is formed at a position where the filter blocks 21 meet, the black matrix includes staggered black strips, and the black matrix is disposed in the color film layer. At the position where the block 21 is connected, light leakage at the junction of the filter blocks 21 in the color film layer 2 can be further prevented.
  • the color filter substrate may further include a flat layer 6.
  • the color film layer 2 and the first sensing electrode 3 and the second sensing electrode 4 are disposed on the flat layer 6 and the transparent substrate 1 Between, that is, the flat layer 6 covers them.
  • the flat layer 6 is disposed on the second sensing electrode 4.
  • the flat layer 6 can not only flatten the film layer on the color filter substrate, but also the flat layer 6 has an insulating function, and the sensing capacitor and the liquid crystal which can be formed by the first sensing electrode 3 and the second sensing electrode 4 The capacitors are separated to prevent them from interfering with each other.
  • the color filter substrate may further include a transparent conductive layer 7, and the flat layer 6 is disposed between the transparent conductive layer 7 and the transparent substrate 1.
  • the vertical electric field type liquid crystal display device is further provided with a common electrode on the color filter substrate for forming a vertical electric field with the pixel electrode on the array substrate.
  • the transparent conductive layer may include a common electrode, and the color filter substrate may be applied to a vertical electric field type liquid crystal display device.
  • the transparent conductive layer is disposed on the flat layer 6, and the transparent conductive layer 7 includes a common electrode.
  • the common electrode of the transparent conductive layer 7 and the common electricity on the array substrate Polar line electrical connection are common electrodes of the transparent conductive layer 7 and the common electricity on the array substrate Polar line electrical connection.
  • the color film substrate may further include an insulating layer 8 disposed between the insulating layer 8 and the transparent substrate 1. . That is, the insulating layer 8 is disposed on the upper surface of the transparent conductive layer 7.
  • an insulating layer 8 for preventing the capacitance formed by the first sensing electrode 3 and the second sensing electrode 4 is further disposed on the transparent conductive layer 7 Mutual interference with liquid crystal capacitors.
  • the transparent conductive layer 7 may be disposed on the flat layer 6, but the transparent conductive layer is grounded at this time.
  • the transparent conductive layer 7 corresponds to the insulating layer, and mutual interference between the capacitance formed by the first sensing electrode 3 and the second sensing electrode 4 and the liquid crystal capacitance can be further prevented.
  • the color filter substrate provided in this embodiment is not limited to the color filter substrate shown in the drawing, as long as the first sensing electrode 3 and the second sensing electrode 4 are insulated by the color film layer 2, Within the scope of protection.
  • the black matrix film layer 5 may also be disposed between the first sensing electrode 3 and the color film layer 2.
  • the embodiment of the invention provides a touch screen, which comprises any color film substrate provided by the embodiment of the invention.
  • the touch screen further comprises a connection with the first sensing electrode 3 and the second sensing electrode 4.
  • a driving circuit (not shown) for controlling the first sensing electrode 3 and the second sensing electrode 4.
  • the touch screen can be applied to a liquid crystal display device or a light emitting diode display device.
  • first sensing electrode 3 and the second sensing electrode 4 are connected to the driving circuit for controlling the first sensing electrode 3 and the second sensing electrode 4 at the edge of the color filter substrate.
  • a liquid crystal display device For a liquid crystal display device, it generally includes an array substrate and a color filter substrate which are disposed opposite to each other to form a liquid crystal cell, and a driving circuit is usually disposed on the array substrate.
  • the driving circuit for controlling the first sensing electrode 3 and the second sensing electrode 4 is disposed together with the driving circuit on the array substrate. This not only reduces the process, but also increases the integration of the display device, reduces the number of boards, and reduces the cost. Thus, the first sensing electrode 3 and the second sensing electrode 4 on the color filter substrate need to be transferred to the array substrate.
  • the first sensing electrode 3 and the second sensing electrode 4 on the color filter substrate are passed through the anisotropic conductive material 10 and the array substrate.
  • the connection point 21 is electrically connected, and a drive circuit or the like is connected through the connection point 21.
  • the anisotropic conductive materials 10 are separated by an insulating sealant 11 .
  • the anisotropic conductive material may be an anisotropic conductive paste containing conductive gold balls.
  • An embodiment of the present invention provides a display device, including any of the touch screens provided by the embodiments of the present invention.
  • the display device may be a display device such as a liquid crystal display, an electronic paper, an OLED display, or any display product or component such as a television, a digital camera, a mobile phone, a tablet computer or the like including the display device.
  • One embodiment of the present invention provides a method of fabricating a color filter substrate. As shown in FIG. 9, the method includes the following steps.
  • Step S101 A first connection line is disposed on the transparent substrate.
  • the first connection line is used to electrically connect the first sensing units located in the same row.
  • the first connecting line 32 is shown in a black strip shape, and is located at a position where the filter blocks of the color film layer formed later are in contact with each other, which can further prevent the filtering of the color film layer. Light is leaking at the junction of the light blocks.
  • the transparent substrate 1 is, for example, a glass substrate, a plastic substrate or the like.
  • Step S102 providing a color film layer on the transparent substrate.
  • the color film layer includes a plurality of closely spaced filter blocks. Preferably, between the two filter blocks adjacent to the color film layer, the edges of the two filter blocks overlap each other, so that the adjacent two filter blocks are prevented from coming into contact with each other and leaking light.
  • the color film layer 2 is provided with a via hole 22. It should be noted that, in step S102, after step S101, the color film layer 2 is disposed on the transparent substrate 1, that is, the color film is disposed on the transparent substrate 1 on which the first connection line 32 formed in step S101 is formed. Layer 2.
  • Step S103 disposing a first sensing unit, a second sensing unit, and a second connecting wire on the transparent substrate.
  • the first sensing unit 31 located in the same row is electrically connected to the first connecting line 32 through the via 22 on the color film layer 2.
  • the second connection line 42 is used to connect the second sensing unit 41 in the same row.
  • the first sensing unit 31, the second sensing unit 41, and the second connecting line 42 are disposed on the transparent substrate 1, that is, formed therein.
  • the first sensing unit 31, the second sensing unit 41, and the second connecting line 42 are disposed on the transparent substrate 1 of the color line layer 2 formed in the step S101 and the first connecting line 32 formed in step S102. And so on, in the latter step, the transparent substrate is packaged.
  • the method may further include: providing a black strip crossing the first connecting line 32 on the transparent substrate 1, for example, the black strip is located at a position where the color filter layer is in contact with the first connection Line insulation.
  • the black strip may be disposed in different layers from the first connecting line. For example, setting the black strip may be performed after the step S104. Alternatively, the black bar is set between the above step S101 and step S102. Alternatively, the black strip is disposed in the same layer as the first connecting line and is not in contact with the first connecting line to ensure insulation from the first connecting line.
  • the manufacturing method may further include the step S104, providing a flat layer on the transparent substrate.
  • the color film layer 2 and the first sensing electrode 3 and the second sensing electrode 4 are located between the flat layer 6 and the transparent substrate 1.
  • the flat layer 6 not only planarizes the film layer on the color filter substrate, but also has the function of insulating the flat layer 6 to form the sensing capacitor and the liquid crystal formed by the first sensing electrode 3 and the second sensing electrode 4.
  • the capacitors are separated to prevent them from interfering with each other.
  • the manufacturing method may further include the step S105, providing a transparent conductive layer on the transparent substrate.
  • the flat layer is disposed between the transparent conductive layer and the transparent substrate.
  • the transparent conductive layer of the color filter substrate is grounded, so that the transparent conductive layer can further prevent mutual interference between the capacitance formed by the first sensing electrode and the second sensing electrode and the liquid crystal capacitance.
  • the transparent conductive layer on the color filter substrate includes a common electrode.
  • the method of fabricating the color filter substrate further comprises providing an insulating layer on the transparent substrate.
  • the transparent conductive layer is disposed between the insulating layer and the transparent substrate.
  • the insulating layer serves to prevent mutual interference between the capacitance formed by the first sensing electrode and the second sensing electrode and the liquid crystal capacitance.
  • the method for fabricating the color filter substrate provided by the embodiment of the present invention is not limited to the above steps.
  • the black strip crossing the first connecting line on the transparent substrate may be performed after the above step S103.
  • Another embodiment of the present invention provides a method of fabricating a color filter substrate, as shown in FIG. 13, including the following steps.
  • Step S201 the first sensing unit and the first connecting line are disposed on the transparent substrate.
  • the first connecting line 32 is for electrically connecting the first sensing units 31 located in the same row.
  • the transparent substrate 1 is, for example, a glass substrate, a plastic substrate or the like.
  • Step S202 providing a color film layer on the transparent substrate.
  • the color film layer 2 includes a plurality of filter blocks.
  • the two filter blocks adjacent to the color film layer overlap each other at the edge portions, so as to prevent the adjacent two filter blocks from being in close contact with each other and leaking light.
  • the color film layer 2 is disposed on the transparent substrate 1, that is, the first sensing unit 31 and the first connecting line 32 formed in step S201 are transparent.
  • the color film layer 2 is provided on the substrate 1.
  • Step S203 providing a second sensing unit and a second connecting line on the transparent substrate.
  • the second connecting line 42 is for electrically connecting the second sensing units 41 located in the same row.
  • the second sensing unit and the second connecting line are disposed on the transparent substrate, that is, the first sensing unit 31 formed in step S201 is formed.
  • the second sensing unit 41 and the second connecting line 42 are disposed on the transparent substrate 1 of the color line layer 2 formed by the first connecting line 32 and the step S202.
  • step S205 may further include: setting a black matrix film layer 5 on the transparent substrate, as shown in FIG.
  • the black matrix film layer includes a black matrix, and the black matrix is disposed at a position where the color film layer filter blocks meet. It is used to further prevent light leakage at the junction of the color filter layers.
  • the manufacturing method may further include the step S205, providing a flat layer on the transparent substrate.
  • the color film layer 2 and the first sensing electrode 3 and the second sensing electrode 4 are located between the flat layer 6 and the transparent substrate 1.
  • the flat layer 6 can not only flatten the film layer on the substrate, but also the insulating layer 6 can separate the sensing capacitance formed by the first sensing electrode 3 and the second sensing electrode 4 from the liquid crystal capacitor. To prevent them from interfering with each other.
  • the manufacturing method may further include the step S206, providing a transparent conductive layer on the transparent substrate.
  • the flat layer is disposed between the transparent conductive layer and the transparent substrate.
  • the transparent conductive layer of the color filter substrate is grounded, so that the transparent conductive layer can further prevent mutual interference between the capacitance formed by the first sensing electrode and the second sensing electrode and the liquid crystal capacitance.
  • the transparent conductive layer on the color filter substrate includes: a common electrode electrically connected to a common electrode line on the array substrate.
  • the method for fabricating the color filter substrate further includes disposing an insulating layer on the transparent substrate.
  • the transparent conductive layer is disposed between the insulating layer and the transparent substrate. The insulating layer serves to prevent mutual interference between the capacitance formed by the first sensing electrode 3 and the second sensing electrode 4 and the liquid crystal capacitance.
  • the arrangement of the black matrix film layer on the transparent substrate may be performed after the above step S203.

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Abstract

一种彩膜基板及其制作方法、触摸屏、显示装置，包括彩膜基板的显示屏可实现触摸功能。彩膜基板包括：透明基板（1）以及设置在透明基板（1）上的彩色膜层（2），其中，彩色膜层（2）包括多个滤光块（21）、多个第一传感电极（3）和多个第二传感电极（4），第一传感电极（3）和第二传感电极（4）绝缘；彩色膜层（2）位于第一传感电极（3）和第二传感电极（4）交叉位置处的部分，使得第一传感电极（3）和第二传感电极（4）在交叉位置处绝缘，由此形成触摸传感电容。

Description

彩膜基板及其制作方法、 触摸屏、 显示装置 技术领域
本发明的实施例涉及一种彩膜基板及其制作方法、 触摸屏、 显示装置。 背景技术
触摸屏（touch screen ) 又称为 "触控屏"， 是目前最筒单、 方便、 自然的 人机交互方式。 它是极富吸引力的全新多媒体交互设备。
现有的液晶显示触摸屏是将触摸面板设置在液晶面板的彩膜基板和偏振 片之间， 即在液晶面板上面配制触摸传感器， 这被称为' Όη-cell"触摸屏。 但 这种触摸屏比较厚重， 难以满足显示产品日益轻薄化的需求。
另一方面， 现有的触摸屏产品， 将触摸面板外置于液晶显示面板， 液晶 显示面板和触摸面板之间存在物理空间， 因此在液晶面板上面和触摸面板下 面之间会反射外来光线等， 从而导致在阳光下可读性差。 发明内容
本发明的实施例提供一种彩膜基板及其制作方法、 触摸屏、 显示装置， 使得触摸屏轻薄且阳光下更易读。
本发明实施例提供了一种彩膜基板， 包括透明基板以及设置在所述透明 基板上的彩色膜层； 所述彩色膜层包括多个滤光块、 多个第一传感电极、 多 个第二传感电极， 所述第一传感电极和所述第二传感电极绝缘； 所述彩色膜 层位于所述第一传感电极和所述第二传感电极交叉位置处的部分， 将所述第 一传感电极和所述第二传感电极在交叉位置处绝缘，由此形成触摸传感电容。
例如， 所述第一传感电极沿第一方向形成多排， 所述第二传感电极沿第 二方向形成多排。
例如， 所述第一方向和第二方向垂直。
例如， 所述第一传感电极还可以包括： 第一传感单元以及第一连接线， 属于同一个第一传感电极的第一传感单元通过第一连接线电连接； 所述第二 传感电极包括： 第二传感单元以及第二连接线， 属于同一个第二传感电极的 第二传感单元通过第二连接线电连接。
例如，所述第一传感单元、第二传感单元以及第二连接线设置在同一层， 且所述第一传感单元与所述第二传感单元以及第二连接线绝缘， 所述第一连 接线与第一传感单元设置在不同层， 且所述彩色膜层设置在所述第一连接线 和第一传感单元之间， 所述彩色膜层上设置有过孔， 属于同一个第一传感电 极的第一传感单元通过所述过孔与第一连接线电连接。
例如， 所述第一连接线为黑色的条状， 位于彩色膜层滤光块相接的位置 处。
例如， 该彩膜基板还可以包括与所述第一连接线交叉的黑色条， 所述黑 色条位于彩色膜层滤光块相接的位置处， 且与第一连接线绝缘。
例如， 所述第一传感单元和第一连接线设置在同一层， 所述第二传感单 元和第二连接线设置在同一层，第一传感单元和第二传感单元设置在不同层， 且所述彩色膜层设置在所述第一传感电极和第二传感电极之间， 使得第一传 感电极和第二传感电极绝缘。
例如， 该彩膜基板还可以包括设置在所述彩色膜层和透明基板之间的黑 矩阵膜层， 所述黑矩阵膜层包括黑矩阵， 且所述黑矩阵设置在所述彩色膜层 滤光块相接的位置处。
例如， 该彩膜基板还可以包括平坦层， 所述彩色膜层以及第一传感电极 和第二传感电极设置在所述平坦层和透明基板之间。
例如， 该彩膜基板还可以包括透明导电层， 所述平坦层设置在所述透明 导电层和透明基板之间。
例如， 所述透明导电层接地。
例如， 该彩膜基板还可以包括绝缘层， 所述透明导电层设置在所述绝缘 层和透明基板之间。
本发明实施例提供了一种触摸屏， 包括本发明实施例提供的任一彩膜基 板。
例如， 该触摸屏还可以包括： 阵列基板以及与所述第一传感电极和第二 传感电极相连用于控制所述第一传感电极和第二传感电极的驱动电路， 且所 述驱动电路与阵列基板上的驱动电路设置在一起。
本发明实施例提供了一种显示装置， 包括本发明实施例提供的任一触摸 屏。
本发明实施例提供了一种彩膜基板的制作方法， 包括： 在透明基板上设 置第一连接线， 所述第一连接线用于使得属于同一第一传感电极的第一传感 单元电连接； 在透明基板上设置彩色膜层， 其中所述彩色膜层包括多个紧密 相接的滤光块， 且在所述彩色膜层上设置有过孔； 在透明基板上设置第一传 感单元、 第二传感单元以及第二连接线， 其中， 所述第一传感单元通过所述 彩色膜层上的过孔与第一连接线电连接， 所述第二连接线用于使得属于同一 个第二传感电极的第二传感单元电连接， 所述第一传感单元与所述第二传感 单元以及第二连接线绝缘。
例如， 所述第一连接线为黑色的条状， 其位于彩色膜层滤光块相接的位 置处。
例如， 所述方法还可以包括： 在透明基板上设置与所述第一连接线交叉 的黑色条， 所述黑色条位于彩色膜层滤光块相接的位置处， 且与第一连接线 绝缘。
例如， 该方法还可以包括： 在透明基板上设置平坦层， 且所述彩色膜层 以及第一传感电极和第二传感电极位于所述平坦层和透明基板之间。
例如， 该方法还可以包括： 在透明基板上设置透明导电层， 且所述平坦 层设置在所述透明导电层和透明基板之间。
例如， 该方法还可以包括： 在透明基板上设置绝缘层， 且所述透明导电 层设置在所述绝缘层和透明基板之间。
本发明实施例提供了一种彩膜基板的制作方法， 包括： 在透明基板上设 置第一传感单元以及第一连接线， 其中所述第一连接线用于使得属于同一个 第一传感电极的第一传感单元电连接； 在透明基板上设置彩色膜层， 其中所 述彩色膜层包括多个紧密相接的滤光块； 在透明基板上设置第二传感单元以 及第二连接线， 其中所述第二连接线用于使得属于同一个第二传感电极的第 二传感单元电连接。
例如，在透明基板上设置第一传感单元以及第一连接线之前还可以包括： 在透明基板上设置黑矩阵膜层， 其中， 所述黑矩阵膜层包括黑矩阵， 且所述 黑矩阵设置在所述彩色膜层滤光块相接的位置处。
例如， 该方法还可以包括： 在透明基板上设置平坦层， 且所述彩色膜层 以及第一传感电极和第二传感电极位于所述平坦层和透明基板之间。
例如， 该方法还可以包括： 在透明基板上设置透明导电层， 且所述平坦 层设置在所述透明导电层和透明基板之间。
例如， 该方法还可以包括： 在透明基板上设置绝缘层， 且所述透明导电 层设置在所述绝缘层和透明基板之间。 附图说明
为了更清楚地说明本发明实施例的技术方案， 下面将对实施例的附图作 筒单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例， 而非对本发明的限制。
图 1A和图 1B为本发明实施例提供的一种彩膜基板的两个示例的俯视结 构示意图；
图 2为图 1 A的局部放大示意图；
图 3A和图 3B为图 2的两个示例沿 A-A'的剖视结构示意图；
图 4为本发明实施例提供的另一种彩膜基板的俯视结构示意图； 图 5为图 4的局部放大示意图；
图 6A和图 6B为图 5的两个示例沿 A-A'的剖视结构示意图；
图 7为本发明实施例提供的如图 3A所示的彩膜基板的线路转接示意图； 图 8为本发明实施例提供的如图 6A所示的彩膜基板的线路转接示意图； 图 9为本发明实施例提供的一种制作彩膜基板的方法示意图；
图 10为本发明实施例提供的在透明基板上设置第一连接线的示意图； 图 11为本发明实施例提供的在透明基板上设置彩色膜层的示意图； 图 12为本发明实施例提供的在透明基板上设置第一传感单元、第二传感 单元以及第二连接线的示意图；
图 13为本发明实施例提供的另一种制作彩膜基板的方法示意图； 图 14为本发明实施例提供的在透明基板上设置黑矩阵膜层的示意图； 图 15为本发明实施例提供的在透明基板上设置第一传感电极的示意图； 图 16为本发明实施例提供的在透明基板上设置彩色膜层的示意图； 图 17为本发明实施例提供的在透明基板上设置第二传感电极的示意图； 附图标记： 1-透明基板； 2-彩色膜层； 21-滤光块； 3-第一传感电极； 31-第一传感单 元； 32-第一连接线； 4-第二传感电极； 41-第二传感单元； 42-第二连接线； 5—黑矩阵膜层； 6-平坦层； 7-透明导电层； 8-绝缘层； 10-各向异性导电材料； 11-封框胶; 20-阵列基板; 21-连接点; 22-过孔； 33-黑色条。 具体实施方式
为使本发明实施例的目的、 技术方案和优点更加清楚， 下面将结合本发 明实施例的附图，对本发明实施例的技术方案进行清楚、 完整地描述。显然， 所描述的实施例是本发明的一部分实施例， 而不是全部的实施例。 基于所描 述的本发明的实施例， 本领域普通技术人员在无需创造性劳动的前提下所获 得的所有其他实施例， 都属于本发明保护的范围。
除非另作定义， 此处使用的技术术语或者科学术语应当为本发明所属领 域内具有一般技能的人士所理解的通常意义。 本发明专利申请说明书以及权 利要求书中使用的 "第一" 、 "第二" 以及类似的词语并不表示任何顺序、 数量或者重要性，而只是用来区分不同的组成部分。同样， "一个 "或者 "一" 等类似词语也不表示数量限制， 而是表示存在至少一个。 "包括" 或者 "包 含" 等类似的词语意指出现在该词前面的元件或者物件涵盖出现在该词后面 列举的元件或者物件及其等同， 并不排除其他元件或者物件。 "连接" 或者 "相连" 等类似的词语并非限定于物理的或者机械的连接， 而是可以包括电 性的连接， 不管是直接的还是间接的。 "上" 、 "下" 、 "左" 、 "右" 等 仅用于表示相对位置关系， 当被描述对象的绝对位置改变后， 则该相对位置 关系也可能相应地改变。
本发明的一个实施例提供了一种彩膜基板， 如图 1A或图 1B、 图 2、 图 3A或图 3B所示。 该彩膜基板包括： 透明基板 1以及设置在该透明基板 1上 的彩色膜层 2; 该彩色膜层 2包括多个滤光块 21 (参见图中的虚线框） ， 每 个滤光块可对应于一个亚像素， 例如可以为红、 绿或蓝色滤光块。 该彩膜基 板还包括： 多个第一传感电极 3、 多个第二传感电极 4; 该彩色膜层 2的位于 该第一传感电极 3和该第二传感电极 4交叉位置处的部分， 将该第一传感电 极 3和该第二传感电极 4在交叉位置处绝缘形成触摸传感电容。
需要说明的是， 触摸屏的工作原理是， 用手指或其他类似物体触摸显示 屏时， 在所触摸的位置会使触摸传感电容产生电荷， 触摸传感电容的电荷的 变化由第一传感电极 3和第二传感电极 4检测， 并以坐标形式传送给控制芯 片， 控制芯片才 据传递的触摸信号， 确定输入的信息， 进而控制显示。 该实 施例的彩色膜层包括多个滤光块， 该多个滤光块可以是在各自的边缘互相有 重叠的部分紧密相接， 也可以是多个滤光块没有重叠而紧密贴合相接， 也可 以是由起隔挡作用的结构相互隔开， 如由黑矩阵隔开。 优选的， 该彩色膜层 相邻的两个滤光块之间相互有重叠的部分， 这样可以防止相邻的两个滤光块 相接不紧密而漏光。
本实施例提供的一种彩膜基板， 在该彩膜基板上设置第一传感电极和第 二传感电极，通过该第一传感电极和第二传感电极可以对触摸位置进行定位， 以使得该彩膜基板可实现触摸功能。 该第一传感电极和第二传感电极利用彩 色膜层绝缘， 相对于现有的触摸屏的彩膜基板， 减少了一层特别用于将第一 和第二传感电极间隔开的绝缘层。 包括该彩膜基板的触摸屏相对于现有的 "On-cell"触摸屏更加轻薄。 且直接将第一传感电极和第二传感电极设置在彩 膜基板上， 相对于现有的 "On-cell"触摸屏， 增加了在阳光下易读性。
需要说明的是,本发明实施例提供的彩膜基板不仅适用于液晶显示装置， 还可适用于 OLED (有机发光二极管)等其他类型的显示装置。
可选的， 该第一传感电极 3沿第一方向形成多排， 该第二传感电极 4沿 第二方向形成多排。 优选地， 如图 1所示， 本发明实施例中该第一传感电极 3沿第一方向 101方向形成多排， 该第二传感电极 4沿第二方向 102形成多 排。
优选的， 如图 1所示， 该第一方向 101和第二方向 102垂直。 且本发明 实施例以这种形式为例进行详细说明。
可选的， 如图 2、 图 3A或 3B所示， 该第一传感电极 3包括第一传感单 元 31以及第一连接线 32,属于同一个第一传感电极 3的第一传感单元 31通 过第一连接线 32电连接； 该第二传感电极 4包括第二传感单元 41以及第二 连接线 42, 属于同一个第二传感电极 4的第二传感单元 41通过第二连接线 42电连接。 形成第一连接线 32和第二连接线 42的材料可以为导电材料， 其 可以与第一传感单元 31以及第二传感单元 41的材料相同， 例如可以是铟氧 化锡； 也可以是导电金属等， 例如可以是铬等。 第一连接线 32和第二连接线 42分别连接第一传感单元 31和第二传感单元 41。第一连接线 32和第二连接 线 42的形状的示例可参照图 2所示。 当然， 该第一传感单元 31和第二传感 单元 41可以为图 2中所示的菱形， 也可以是其他形状； 第一连接线 32和第 二连接线 42的形状也不局限于附图所示的形状，只要实现连接第一传感单元 31和第二传感单元 41的功能即可。
本实施例中， 以第一传感单元 31、 第二传感单元 41以及第一连接线 32 和第二连接线 42为图 2中所示的形状为例进行详细说明。需说明的是，本实 施方式中该的连接线， 并不限于该连接线是单独制作的。 举例来说， 上述实 施例中的第一连接线 32可以是和第一传感单元 31同时制作形成的一体结构， 也可以是分先后顺序各自单独制作的。
可选的， 如图 2、 图 3A或 3B所示， 该第一传感单元 31、 第二传感单元 41以及第二连接线 42设置在同一层，且该第一传感单元 31与该第二传感单 元 41以及第二连接线 42绝缘， 该第一连接线 32与第一传感单元 31设置在 不同层， 且该彩色膜层 2设置在该第一连接线 32和第一传感单元 31之间， 该彩色膜层 2中上设置有过孔 22,属于同一个第一传感电极 3的第一传感单 元 31通过该过孔 22与第一连接线 32电连接。 这样， 如图 2、 图 3或 3B所 示， 第一传感单元 31、 第二传感单元 41和第二连接线 42设置在彩色膜层 2 的上面， 第二传感电极位于同一排的第二传感单元 41与第二连接线 42直接 相连电连接。 第一连接线 32设置在彩色膜层 2的下面（相对于基板 1 ) , 且 在该彩色膜层 2中设置有过孔 22,设置在彩色膜层 2上面的第一传感单元 31 通过该彩色膜层 2中的过孔 22与设置在彩色膜层 2的下面的第一连接线 32 连接,从而使得第一传感电极 3位于同一排的第一传感单元 31通过第一连接 线 32电连接。
需要说明的是， 本发明实施例中， 该"上"、 "下"是以在基板上的制作顺 序为依据， 在先制作的在"下"， 在后制作的在"上"。 如图 3所示， 该第一连 接线 32设置在彩色膜层 2的下面， 第一传感单元 31、 第二传感单元 41和第 二连接线 42设置在彩色膜层 2的上面， 即彩色膜层 2设置在该第一连接线 32、 第二传感单元 41、 第二连接线 42和第一传感单元 31之间。
可选的， 如图 1、 图 3A或图 3B所示， 该第一连接线 32为黑色的条状， 位于彩色膜层 2的滤光块 21彼此相接的位置处。 该第一连接线 32为黑色条 状且位于滤光块 21相接的位置处， 则该第一连接线 32不仅可以用于将第一 传感电极 3位于同一排的第一传感单元 31电连接，而且可以进一步防止彩色 膜层 2的滤光块 21相接的位置处漏光。 即， 该第一连接线 32可以为黑矩阵 的一部分，且可实现属于同一第一传感电极 3的第一传感单元 31之间的电连 接。
优选的， 如图 1B所示， 该彩膜基板还包括与该第一连接线 32交叉的黑 色条 33, 该黑色条 33也位于彩色膜层 2的滤光块 21彼此相接的位置处， 从 而与第一连接线 32垂直。 该黑色条 33可以由导电材料制备， 从而与第一连 接线 32绝缘,例如该黑色条 33可以与该第一连接线 32设置在不同层。或者， 该黑色条 33可以是由绝缘材料制成， 从而可以与该第一连接线 32设置在同 一层。 又或者， 该黑色条 33和该第一连接线 32均为导电材料制备且设置在 同一层， 但不相接以保证绝缘。 该黑色条 33与该第一连接线 32交叉， 且设 置在彩色膜层 2的滤光块 21相接的位置处， 可以防止彩色膜层 2的滤光块 21相接处漏光。 可选地， 该第一连接线 32与该黑色条 33形成黑矩阵， 且该 第一连接线 32与该黑色条 33电绝缘。
需说明的是，本实施例中的黑色条 33可以是黑矩阵中的一部分，也可以 是特有设置的黑色条结构。
可选的， 如图 3A所示， 该彩膜基板还可以包括平坦层 6, 该彩色膜层 2 以及第一传感电极 3和第二传感电极 4设置在该平坦层 6和透明基板 1之间， 即平坦层 6覆盖在它们之上。
如图 3A所示，该平坦层 6设置在该第二传感电极 4的上面。该平坦层 6 不仅可以使该彩膜基板上的膜层平坦化， 而且该平坦层 6具有绝缘的作用， 可以将第一传感电极 3和第二传感电极 4形成的传感电容和液晶电容分开， 防止其相互干扰。
可选的， 如图 3B所示， 该彩膜基板还可以包括透明导电层 7, 该平坦层
6设置在该透明导电层 7和透明基板 1之间。
液晶显示装置利用电场通过液晶控制光透性以显示图像。 根据驱动液晶 的电场方向， 将液晶显示装置大致分为垂直电场驱动型和水平电场驱动型。 垂直电场驱动型液晶显示装置在彩膜基板和阵列基板上彼此相对设置公共电 极和像素电极， 在该公共电极和像素电极之间形成垂直的电场以驱动液晶， 如 TN ( Twist Nematic, 扭曲向列）型、 VA ( Vertical Alignment, 多畴垂直 取向）型液晶显示装置。 水平电场驱动型液晶显示装置在阵列基板上设置公 共电极和像素电极， 在该公共电极和像素电极之间形成水平的电场以驱动液 晶， 如 ADS ( Advanced-Super Dimensional Switching, 高级超维场开关）型、 IPS ( In Plane Switch, 横向电场开关）型液晶显示装置。
相对于水平电场型液晶显示装置， 垂直电场型液晶显示装置在彩膜基板 还设置有公共电极， 用于与阵列基板上的像素电极形成垂直电场。 本发明实 施例中， 该透明导电层 7可包括公共电极， 则该彩膜基板可以适用于垂直电 场型液晶显示装置。
在一个示例中， 该透明导电层 7设置在平坦层 6的上面， 该透明导电层
7包括公共电极。 在相应的液晶显示装置中， 该透明导电层 7上的公共电极 可以与阵列基板上的公共电极线电连接。
进一步的， 如图 3B所示， 对于透明导电层 7包括公共电极的彩膜基板， 该彩膜基板还可以包括绝缘层 8, 该透明导电层 7设置在该绝缘层 8和透明 基板 1之间。 即该绝缘层 8设置在该透明导电层 7的上面。 对于透明导电层 7包括公共电极的彩膜基板，在该透明导电层 7上面还设置有绝缘层 8,该绝 缘层 8用于防止第一传感电极 3和第二传感电极 4形成的电容和液晶电容的 相互干扰。
可选的， 对于水平电场型液晶显示装置和 OLED显示装置的彩膜基板， 也可以在该平坦层 6上面设置透明导电层 7, 但此时该透明导电层 7接地。 这样对于液晶显示装置， 该透明导电层 6可以进一步防止第一传感电极 3和 第二传感电极 4形成的电容和液晶电容的相互干扰。
本发明实施例提供的彩膜基板也不仅仅局限于附图所示的彩膜基板， 只 要该第一传感电极 3和第二传感电极 4是通过该彩色膜层实现绝缘均在本发 明的保护范围之内。 例如图 3A和 3B中， 也可以将该第一传感单元 31、 第 二传感单元 41以及第二连接线 42设置在彩色膜层 2的下面， 将第一连接线 32设置在该彩色膜层 2的上面，且在该彩色膜层 2中设置有过孔 22,该第一 连接线 32通过该过孔 22与第一传感单元 31电连接。
在另一个实施例中， 如图 4、 图 6A或 6B所示， 该第一传感单元 31和 第一连接线 32设置在同一层，该第二传感单元 41和第二连接线 42设置在同 一层， 第一传感单元 31和第二传感单元 41设置在不同层， 且该彩色膜层 2 设置在该第一传感电极 3和第二传感电极 4之间， 使得第一传感电极 3和第 二传感电极 4绝缘。 如图 4所示， 第一传感单元 31和第一连接线 32设置在 同一层， 则第一传感电极 3位于同一排的第一传感单元 31通过第一连接线 32直接连接。 第二传感单元 41和第二连接线 42设置在同一层， 则第二传感 电极 4位于同一排的第二传感单元 41通过第二连接线 42直接连接。 且该彩 色膜层 2设置在第一传感电极 3和第二传感电极 4之间， 使得第一传感电极 3和第二传感电极 4绝缘。
可选的， 如图 6A所示， 该彩膜基板还可以包括： 设置在该彩色膜层 2 和透明基板 1之间的黑矩阵膜层 5 , 该黑矩阵膜层 5包括黑矩阵， 且该黑矩 阵设置在该彩色膜层滤光块 21相接的位置处。 例如， 如图 6所示， 该黑矩阵 膜层 5设置在该第一传感电极 3的下面。由于彩色膜层 2包括多个滤光块 21 , 在滤光块 21相接的位置处形成相接缝， 该黑矩阵包括的交错设置的黑色条， 该黑矩阵设置在该彩色膜层滤光块 21相接的位置处，可以进一步防止彩色膜 层 2中的滤光块 21相接处漏光。
可选的， 如图 6A所示， 该彩膜基板还可以包括平坦层 6, 该彩色膜层 2 以及第一传感电极 3和第二传感电极 4设置在该平坦层 6和透明基板 1之间， 即该平坦层 6覆盖在它们之上。
如图 6所示， 该平坦层 6设置在该第二传感电极 4的上面。 该平坦层 6 不仅可以使该彩膜基板上的膜层平坦化， 而且该平坦层 6具有绝缘的作用， 可以将第一传感电极 3和第二传感电极 4形成的传感电容和液晶电容分开， 防止其相互干扰。
可选的， 如图 6B所示， 该彩膜基板还可以包括透明导电层 7, 该平坦层 6设置在该透明导电层 7和透明基板 1之间。
相对于水平电场型液晶显示装置， 垂直电场型液晶显示装置在彩膜基板 还设置有公共电极， 用于与阵列基板上的像素电极形成垂直电场。 本发明实 施例中， 该透明导电层可包括公共电极， 则该彩膜基板可以适用于垂直电场 型液晶显示装置。
该透明导电层设置在该平坦层 6的上面，该透明导电层 7包括公共电极。 在液晶显示装置中， 该透明导电层 7的公共电极可以与阵列基板上的公共电 极线电连接。
进一步的， 如图 6B所示， 对于透明导电层 7包括公共电极的彩膜基板， 该彩膜基板还可以包括绝缘层 8, 该透明导电层 7设置在该绝缘层 8和透明 基板 1之间。 即， 该绝缘层 8设置在该透明导电层 7的上面。 对于透明导电 层 7包括公共电极的彩膜基板， 在该透明导电层 7上面还设置有绝缘层 8, 该绝缘层 8用于防止第一传感电极 3和第二传感电极 4形成的电容和液晶电 容的相互干扰。
可选的， 对于水平电场型液晶显示装置和 OLED显示装置的彩膜基板， 也可以在该平坦层 6上面设置透明导电层 7, 但此时该透明导电层接地。 对 于液晶显示装置， 这样该透明导电层 7相当于绝缘层， 可以进一步防止第一 传感电极 3和第二传感电极 4形成的电容和液晶电容的相互干扰。
本实施例提供的彩膜基板也不局限于附图所示的彩膜基板， 只要该第一 传感电极 3和第二传感电极 4是通过该彩色膜层 2实现绝缘均在本发明的保 护范围之内。例如图 6A和 6B中，该黑矩阵膜层 5还可以设置在该第一传感 电极 3和彩色膜层 2之间。
本发明实施例提供了一种触摸屏， 包括本发明实施例提供的任一彩膜基 板， 为了实现触摸屏的触摸功能， 该触摸屏还包括与该第一传感电极 3和第 二传感电极 4相连用于控制该第一传感电极 3和第二传感电极 4的驱动电路 (未示出） 。 该触摸屏可适用于液晶显示装置也可以适用于发光二极管显示 装置。
需要说明的是， 第一传感电极 3和第二传感电极 4在彩膜基板的边缘与 控制第一传感电极 3和第二传感电极 4的驱动电路相连。
对于液晶显示装置来说， 其一般包括彼此相对设置以形成液晶盒的阵列 基板和彩膜基板， 通常在阵列基板上设置驱动电路。 优选的， 该用于控制第 一传感电极 3和第二传感电极 4的驱动电路与阵列基板上的驱动电路设置在 一起。 这样不仅可以减少工艺， 还可以提高显示装置的集成度， 减少电路板 的个数， 降低成本。 这样彩膜基板上的第一传感电极 3和第二传感电极 4需 要转接到阵列基板上。
在一个实施例中， 如图 7、 图 8的截面图所示， 所示彩膜基板上的第一 传感电极 3和第二传感电极 4通过各向异性导电材料 10与阵列基板上 20的 连接点 21电连接， 通过该连接点 21连接驱动电路等。 各向异性导电材料 10 之间通过绝缘的封框胶 11隔开。该各向异性导电材料可以为含导电金球的各 向异性导电胶。
本发明实施例提供了一种显示装置， 包括本发明实施例提供的任一该的 触摸屏。 该显示装置可以为液晶显示器、 电子纸、 OLED显示器等显示器件 以及包括这些显示器件的电视、 数码相机、 手机、 平板电脑等任何具有显示 功能的产品或者部件。
本发明的一个实施例提供了一种彩膜基板的制作方法， 如图 9所示， 该 方法包括如下的步骤。
步骤 S101、 在透明基板上设置第一连接线。
例如， 该第一连接线用于使得位于同一排的第一传感单元电连接。 且优 选的， 如图 10所示， 所示第一连接线 32为黑色的条状， 且位于之后形成的 彩色膜层的滤光块相接的位置处， 这可以进一步防止彩色膜层的滤光块相接 处漏光。 该透明基板 1例如为玻璃基板、 塑料基板等。
步骤 S102、 在透明基板上设置彩色膜层。
例如， 该彩色膜层包括多个紧密相接的滤光块。 且优选的， 该彩色膜层 相邻的两个滤光块之间在边缘相互有重叠的部分， 这样可以防止相邻的两个 滤光块相接不紧密而漏光。 如图 11所示， 该彩色膜层 2上设置有过孔 22。 需要说明的是， 步骤 S102是在步骤 S101之后进行的， 则该在透明基板 1上 设置彩色膜层 2, 即在形成有步骤 S101形成的第一连接线 32的透明基板 1 上设置该彩色膜层 2。
步骤 S103、在透明基板上设置第一传感单元、 第二传感单元以及第二连 接线。
例如， 如图 12所示， 位于同一排的第一传感单元 31通过该彩色膜层 2 上的过孔 22与第一连接线 32电连接。该第二连接线 42用于使得位于同一排 的第二传感单元电 41连接。 需要说明的是， 步骤 S103是在步骤 S101、 步骤 S102之后进行的， 则该在透明基板 1上设置第一传感单元 31、 第二传感单 元 41以及第二连接线 42, 即在形成有步骤 S101形成的第一连接线 32以及 步骤 S102形成的彩色膜层 2的透明基板 1上设置该第一传感单元 31、 第二 传感单元 41 以及第二连接线 42。 以此类推， 在后的步骤则该透明基板上包 括在前的步骤形成的薄膜或层结构。
可选的， 该方法还可以包括： 在透明基板 1 上设置与该第一连接线 32 交叉的黑色条， 例如该黑色条位于彩色膜层滤光块相接的位置处， 且与第一 连接线绝缘。 可选的， 该黑色条可以与该第一连接线设置在不同层， 例如， 设置该黑色条可以在上述步骤 S104之后进行。 或者， 在上述步骤 S101和步 骤 S102之间进行设置该黑色条。 或者， 该黑色条与该第一连接线设置在同 一层， 且与第一连接线不相接以保证与第一连接线绝缘。
可选的， 该制作方法还可以包括步骤 S104、 在透明基板上设置平坦层。 例如，如图 3A或 3B所示，该彩色膜层 2以及第一传感电极 3和第二传 感电极 4位于该平坦层 6和透明基板 1之间。 该平坦层 6不仅可以使该彩膜 基板上的膜层平坦化， 而且该平坦层 6具有绝缘的作用， 可以将第一传感电 极 3和第二传感电极 4形成的传感电容和液晶电容分开， 防止其相互干扰。
可选的， 该制作方法还可以包括步骤 S105、在透明基板上设置透明导电 层。
例如， 该平坦层设置在该透明导电层和透明基板之间。 对于水平电场型 液晶显示装置， 该彩膜基板的透明导电层接地， 这样该透明导电层可以进一 步防止第一传感电极和第二传感电极形成的电容和液晶电容的相互干扰。 对 于垂直电场型液晶显示装置， 该彩膜基板上的透明导电层包括公共电极。 对 于垂直型液晶显示装置， 该彩膜基板的制作方法还包括在透明基板上设置绝 缘层。
例如， 该透明导电层设置在该绝缘层和透明基板之间。 该绝缘层用于防 止第一传感电极和第二传感电极形成的电容和液晶电容的相互干扰。
当然， 本发明实施例提供的制作彩膜基板的方法也不仅仅局限于上述步 骤， 例如在透明基板上设置与第一连接线交叉的黑色条也可以在上述步骤 S103之后进行。
本发明的另一个实施例提供了一种彩膜基板的制作方法， 如图 13所示， 包括如下步骤。
步骤 S201、 在透明基板上设置第一传感单元以及第一连接线。
例如， 如图 4、 图 15所示， 该第一连接线 32用于使得位于同一排的第 一传感单元 31电连接。 该透明基板 1例如为玻璃基板、 塑料基板等。 步骤 S202、 在透明基板上设置彩色膜层。
例如， 如图 4、 图 16所示， 该彩色膜层 2包括多个滤光块。 优选的， 该 彩色膜层相邻的两个滤光块之间在边缘部分相互有重叠的部分， 这样可以防 止相邻的两个滤光块相接不紧密而漏光。 需要说明的是， 步骤 S202是在步 骤 S201之后进行的， 则该在透明基板 1上设置彩色膜层 2, 即在形成有步骤 S201形成的第一传感单元 31以及第一连接线 32的透明基板 1上设置该彩色 膜层 2。
步骤 S203、 在透明基板上设置第二传感单元以及第二连接线。
例如， 如图 4、 图 17所示， 该第二连接线 42用于使得位于同一排的第 二传感单元 41电连接。需要说明的是，步骤 S203是在步骤 S201、步骤 S202 之后进行的， 则该在透明基板上设置第二传感单元以及第二连接线， 即在形 成有步骤 S201形成的第一传感单元 31和第一连接线 32以及步骤 S202形成 的彩色膜层 2的透明基板 1上设置该第二传感单元 41以及第二连接线 42。
可选的， 在上述步骤 S201之前还可以包括步骤 S205、 在透明基板上设 置黑矩阵膜层 5, 如图 14所示。
例如， 该黑矩阵膜层包括黑矩阵， 且该黑矩阵设置在该彩色膜层滤光块 相接的位置处。 用于进一步防止彩色膜层滤光块相接处漏光。
可选的， 该制造方法还可以包括步骤 S205、 在透明基板上设置平坦层。 例如，如图 6A和 6B所示，该彩色膜层 2以及第一传感电极 3和第二传 感电极 4位于该平坦层 6和透明基板 1之间。 该平坦层 6不仅可以使该基板 上的膜层平坦化， 而且该平坦层 6具有绝缘的作用， 可以将第一传感电极 3 和第二传感电极 4形成的传感电容和液晶电容分开， 防止其相互干扰。
可选的， 该制作方法还可以包括步骤 S206、在透明基板上设置透明导电 层。
例如， 该平坦层设置在该透明导电层和透明基板之间。 对于水平电场型 液晶显示装置， 该彩膜基板的透明导电层接地， 这样该透明导电层可以进一 步防止第一传感电极和第二传感电极形成的电容和液晶电容的相互干扰。 对 于垂直电场型液晶显示装置， 该彩膜基板上的透明导电层包括： 公共电极， 该公共电极与阵列基板上的公共电极线电连接。且对于垂直型液晶显示装置， 该彩膜基板的制作方法还包括在透明基板上设置绝缘层。 例如， 该透明导电层设置在该绝缘层和透明基板之间。 该绝缘层用于防 止第一传感电极 3和第二传感电极 4形成的电容和液晶电容的相互干扰。 在透明基板上设置黑矩阵膜层也可以在上述步骤 S203之后进行。
以上该仅是本发明的示范性实施方式，而非用于限制本发明的保护范围， 本发明的保护范围由所附的权利要求确定。

Claims

权利要求书
1、一种彩膜基板， 包括： 透明基板以及设置在所述透明基板上的彩色膜 层， 其中， 所述彩色膜层包括多个滤光块、 多个第一传感电极、 多个第二传 感电极， 所述第一传感电极和所述第二传感电极绝缘；
其中， 所述彩色膜层的位于所述第一传感电极和所述第二传感电极交叉 位置处的部分,将所述第一传感电极和所述第二传感电极在交叉位置处绝缘， 由此形成触摸传感电容。
2、根据权利要求 1所述的彩膜基板， 其中， 所述多个第一传感电极沿第 一方向形成多排， 所述多个第二传感电极沿第二方向形成多排。
3、根据权利要求 2所述的彩膜基板， 其中， 所述第一方向和第二方向垂 直。
4、 根据权利要求 1-3任一所述的彩膜基板， 其中， 所述第一传感电极包 括： 第一传感单元以及第一连接线， 属于同一个第一传感电极的第一传感单 元通过第一连接线电连接；
所述第二传感电极包括： 第二传感单元以及第二连接线， 属于同一个第 二传感电极的第二传感单元通过第二连接线电连接。
5、 根据权利要求 4所述的彩膜基板， 其中， 所述第一传感单元、 第二传 感单元以及第二连接线设置在同一层， 且所述第一传感单元与所述第二传感 单元以及第二连接线绝缘， 所述第一连接线与第一传感单元设置在不同层， 且所述彩色膜层设置在所述第一连接线和第一传感单元之间， 所述彩色膜层 上设置有过孔， 属于同一个第一传感电极的第一传感单元通过所述过孔与第 一连接线电连接。
6、根据权利要求 5所述的彩膜基板， 其中， 所述第一连接线为黑色的条 状， 位于彩色膜层滤光块相接的位置处。
7、根据权利要求 6所述的彩膜基板，还包括与所述第一连接线交叉的黑 色条，所述黑色条位于彩色膜层滤光块相接的位置处，且与第一连接线绝缘。
8、根据权利要求 4所述的彩膜基板， 其中， 所述第一传感单元和第一连 接线设置在同一层， 所述第二传感单元和第二连接线设置在同一层， 第一传 感单元和第二传感单元设置在不同层， 且所述彩色膜层设置在所述第一传感 电极和第二传感电极之间， 使得第一传感电极和第二传感电极绝缘。
9、根据权利要求 8所述的彩膜基板，还包括设置在所述彩色膜层和透明 基板之间的黑矩阵膜层， 其中， 所述黑矩阵膜层包括黑矩阵， 且所述黑矩阵 设置在所述彩色膜层滤光块相接的位置处。
10、 根据权利要求 1-9任一项所述的彩膜基板， 还包括平坦层， 其中， 所述彩色膜层以及第一传感电极和第二传感电极设置在所述平坦层和透明基 板之间。
11、根据权利要求 10所述的彩膜基板， 还包括透明导电层， 其中， 所述 平坦层设置在所述透明导电层和透明基板之间。
12、 根据权利要求 11所述的彩膜基板， 其中， 所述透明导电层接地。
13、根据权利要求 11所述的彩膜基板， 还包括绝缘层， 其中， 所述透明 导电层设置在所述绝缘层和透明基板之间。
14、 一种触摸屏， 包括权利要求 1-13任一项所述的彩膜基板。
15、根据权利要求 14所述的触摸屏，还包括： 阵列基板以及与所述第一 传感电极和第二传感电极相连用于控制所述第一传感电极和第二传感电极的 驱动电路， 且所述驱动电路与阵列基板上的驱动电路设置在一起。
16、 一种显示装置， 包括权利要求 14或 15所述的触摸屏。
17、 一种彩膜基板的制作方法， 包括：
在透明基板上设置第一连接线， 所述第一连接线用于使得属于同一个第 一传感电极的第一传感单元电连接；
在透明基板上设置彩色膜层， 其中所述彩色膜层包括多个紧密相接的滤 光块， 且在所述彩色膜层上设置有过孔；
在透明基板上设置第一传感单元、第二传感单元以及第二连接线，其中， 所述第一传感单元通过所述彩色膜层上的过孔与第一连接线电连接， 所述第 二连接线用于使得属于同一个第二传感电极的第二传感单元电连接， 所述第 一传感单元与所述第二传感单元以及第二连接线绝缘。
18、根据权利要求 17所述的彩膜基板的制作方法， 其中， 所述第一连接 线为黑色的条状， 位于彩色膜层滤光块相接的位置处。
19、根据权利要求 18所述的彩膜基板的制作方法，还包括： 在透明基板 上设置与所述第一连接线交叉的黑色条， 其中， 所述黑色条位于彩色膜层滤 光块相接的位置处且与第一连接线绝缘。
20、 根据权利要求 17-19任一项所述的彩膜基板的制作方法， 还包括： 在透明基板上设置平坦层， 其中， 所述彩色膜层以及第一传感电极和第二传 感电极位于所述平坦层和透明基板之间。
21、根据权利要求 20所述的彩膜基板的制作方法，还包括： 在透明基板 上设置透明导电层， 其中， 所述平坦层设置在所述透明导电层和透明基板之 间。
22、根据权利要求 21所述的彩膜基板的制作方法，还包括： 在透明基板 上设置绝缘层， 其中， 所述透明导电层设置在所述绝缘层和透明基板之间。
23、 一种彩膜基板的制作方法， 包括：
在透明基板上设置第一传感单元以及第一连接线， 其中所述第一连接线 用于使得属于同一个第一传感电极的第一传感单元电连接；
在透明基板上设置彩色膜层， 其中所述彩色膜层包括多个紧密相接的滤 光块；
在透明基板上设置第二传感单元以及第二连接线， 其中所述第二连接线 用于使得属于同一个第二传感电极的第二传感单元电连接。
24、根据权利要求 23所述的彩膜基板的制作方法， 其中， 在透明基板上 设置第一传感单元以及第一连接线之前还包括：
在透明基板上设置黑矩阵膜层， 其中， 所述黑矩阵膜层包括黑矩阵， 且 所述黑矩阵设置在所述彩色膜层滤光块相接的位置处。
25、 根据权利要求 23或 24所述的彩膜基板的制作方法， 还包括： 在透 明基板上设置平坦层， 其中， 所述彩色膜层以及第一传感电极和第二传感电 极位于所述平坦层和透明基板之间。
26、根据权利要求 25所述的彩膜基板的制作方法，还包括： 在透明基板 上设置透明导电层， 其中， 所述平坦层设置在所述透明导电层和透明基板之 间。
27、根据权利要求 26所述的彩膜基板的制作方法，还包括： 在透明基板 上设置绝缘层， 其中， 所述透明导电层设置在所述绝缘层和透明基板之间。
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