WO2017193646A1 - 一种掩膜板 - Google Patents

一种掩膜板 Download PDF

Info

Publication number
WO2017193646A1
WO2017193646A1 PCT/CN2017/072806 CN2017072806W WO2017193646A1 WO 2017193646 A1 WO2017193646 A1 WO 2017193646A1 CN 2017072806 W CN2017072806 W CN 2017072806W WO 2017193646 A1 WO2017193646 A1 WO 2017193646A1
Authority
WO
WIPO (PCT)
Prior art keywords
mask
opening
vacant
contour shape
strip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/072806
Other languages
English (en)
French (fr)
Inventor
吕守华
孙朴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Ordos Yuansheng Optoelectronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Ordos Yuansheng Optoelectronics Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to EP17737459.2A priority Critical patent/EP3456856B1/en
Priority to US15/544,915 priority patent/US20180216220A1/en
Publication of WO2017193646A1 publication Critical patent/WO2017193646A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the invention belongs to the technical field of OLED display, and in particular relates to a mask.
  • OLED Organic Light-Emitting Diode
  • a high-precision mask is used as a mold, and the organic material is volatilized at a high temperature, and then evaporated onto the back glass through a mask opening in an effective opening region of the mask on the molecular state of the material.
  • an organic light-emitting layer it is used to realize organic light emission.
  • the mask generally comprises a plurality of mask strips and a mounting frame. Specifically, after each mask strip is stretched by a clamp to a parameter whose requirements are satisfactory, it is attached and fixed to the surface of the mounting frame.
  • each mask strip 1 is provided with a plurality of mask units 11 (cells).
  • each mask unit 11 includes an effective opening area and two vacant areas (which may be referred to as dummy areas), and a mask opening 11a is disposed in the effective opening area, and two vacant areas are respectively disposed in the effective opening area.
  • the vacant area is provided with vacant openings 11b along both sides perpendicular to the stretching direction and adjacent to the effective opening area.
  • FIG. 1-1 there is shown a schematic diagram of a mask unit of the mask strip in the prior art, in which the mask opening 11a of the effective opening area and the vacant opening 11b of the vacant area are both contoured.
  • Shape ie, the mask strip is a slot type mask strip.
  • the edge of the mask strip curled downward during the tension adjustment of the clip. (As shown in Figure 1-2), and the greater the tensile force, the more severe the curl deformation phenomenon. This kind of curl will cause shadow effect on the edge of the mask unit during evaporation, which will eventually lead to the edge of the display panel during evaporation. Poor color mixing, resulting in low product yield.
  • FIG. 2-1 there is shown a schematic view of another mask unit of the mask strip in the prior art, in which the mask opening 21a of the effective opening area and the vacant opening 21b of the vacant area are both contoured. It is a thin strip (ie, the mask strip is a slit type mask strip). However, the use included is shown in Figure 2-1 In the process of masking the mask strip formed by the mask unit, it is found that during the tension adjustment process of the clamp, when the tension of the tension adjusting mask strip is within a certain range, the mask strip does not occur.
  • the present invention aims to at least solve one of the technical problems existing in the prior art, and proposes a mask for preventing curling of a mask strip during stretching, thereby reducing the shadow effect of the mask unit edge, and further Avoid the appearance of poor color mixing at the edge of the display panel during evaporation, thereby increasing product yield.
  • the present invention provides a mask comprising a plurality of mask strips and a mounting frame, the plurality of mask strips being stretched and mounted on the mounting frame, each of the mask strips comprising a plurality of masks a membrane unit, each mask unit includes an effective opening area and two vacant areas, wherein the effective opening area is provided with a mask opening, and the two vacant areas are respectively disposed at an edge of the effective opening area and perpendicular to the stretching Two sides of the direction and close to the effective opening area, the vacant area is provided with a vacant opening, the contour shape of the mask opening is different from the contour shape of the vacant opening, and the two are generated during the stretching process The stresses can compensate each other.
  • the mask opening has a contour shape
  • the vacant opening has a contour shape of a thin strip
  • the vacant opening has a longitudinal direction that tends to be a tensile direction.
  • the length direction of the vacant opening is parallel to the stretching direction.
  • the mask opening has a contour shape of a thin strip
  • the vacant opening has a contour shape
  • the length direction of the mask opening tends to be a tensile direction
  • the length direction of the mask opening is parallel to the stretching direction.
  • the effective opening area is provided with a plurality of the mask openings, and the plurality of the mask openings have the same contour shape and uniform distribution;
  • the vacant area is provided with a plurality of the vacant openings, and more The vacant openings have the same contour shape and size and are evenly distributed.
  • the mask strip is fixed to the mounting frame by soldering.
  • each of the mask strips is fixed on the mounting frame in a horizontal direction;
  • the mask strips are sequentially disposed next to each other in the vertical direction.
  • the mask strip is made of a metal material.
  • the metallic material comprises Invar.
  • the mask provided by the present invention can compensate the stress generated during the stretching process by setting the contour shape of the mask opening and the contour shape of the vacant opening, thereby preventing the mask strip from being stretched during the stretching process.
  • the curl phenomenon in the film can reduce the shadow effect of the edge of the mask unit, thereby avoiding the situation that the display panel has poor edge color mixing during evaporation, thereby increasing the product yield.
  • FIG. 1 is a schematic view of a mask strip in the prior art
  • 1-1 is a schematic view showing an example of a mask unit of the mask strip of FIG. 1;
  • Figure 1-2 is a side view of the mask strip composed of the mask unit shown in Figure 1-1 when it is curled during stretching;
  • FIG. 2-1 is a schematic view showing another example of a mask unit of the mask strip of FIG. 1;
  • FIG. 2-2 is a side view of the mask strip composed of the mask unit shown in FIG. 2-1 when no curling occurs during stretching;
  • Figure 2-3 is a side view of the mask strip composed of the mask unit shown in Figure 2-1 when it is curled during stretching;
  • FIG. 3 is a schematic diagram of a mask unit of a mask strip according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram of another mask unit of a mask strip according to an embodiment of the present invention.
  • Embodiments of the present invention provide a mask comprising a plurality of mask strips and an The frame is mounted, and the plurality of mask strips are stretched and mounted on the mounting frame, each mask strip includes a plurality of mask units, each mask unit includes an effective opening area and two vacant areas, and the effective opening area is disposed There is a mask opening, and two vacant areas are respectively disposed on both sides perpendicular to the stretching direction of the effective opening area and close to the effective opening area, and the vacant area is provided with a vacant opening.
  • the contour shape of the mask opening is different from the contour shape of the vacant opening, and the stress generated by the two during the stretching process can compensate each other.
  • the mask provided by the present invention can compensate the stress generated during the stretching process by setting the contour shape of the mask opening and the contour shape of the vacant opening, thereby preventing the mask strip from being stretched during the stretching process.
  • the curl phenomenon in the film can reduce the shadow effect of the edge of the mask unit, thereby avoiding the situation that the display panel has poor edge color mixing during evaporation, thereby increasing the product yield.
  • the outline shape of the mask opening 31a in the effective opening area is a hole shape (slot type), and the outline shape of the vacant opening 31b in the vacant area is a thin strip shape (slit)
  • the longitudinal direction of the vacant opening 31b tends to be the stretching direction. Specifically, when the stretching direction is the horizontal direction in FIG. 3, the longitudinal direction of the vacant opening 31b tends to be horizontal.
  • the mask strip composed of the mask unit shown in FIG. 3 is used because the stress direction generated by the effective opening region is downward (ie, perpendicular to the paper surface) during the stretching adjustment process, and the vacant area is generated.
  • the direction of the stress is upward (i.e., perpendicular to the outside of the paper), and therefore, the ability of the mask strip to equalize the stress is enhanced to prevent the mask strip from curling during stretching.
  • the longitudinal direction of the vacant opening 31b is parallel to the stretching direction.
  • the longitudinal direction of the vacant opening 31b is also the horizontal direction.
  • the outline shape of the mask opening 41a of the effective opening area is a thin strip shape (slit type), and the outline shape of the vacant opening 41b of the vacant area is a hole shape (slot)
  • the longitudinal direction of the mask opening 41a tends to the stretching direction. Specifically, when the stretching direction is the horizontal direction, the longitudinal direction of the mask opening 41a tends to be horizontal.
  • the mask strip composed of the mask unit shown in FIG. 4 is used, since The stress direction generated by the effective opening area during the extension adjustment is upward (ie, perpendicular to the paper facing outward), and the stress direction generated by the vacant area is downward (ie, perpendicular to the paper facing), and therefore, the equalizing stress of the mask strip The ability to enhance the curl of the mask strip during stretching.
  • the length direction of the mask opening 41a is parallel to the stretching direction, that is, the horizontal direction.
  • the effective opening area may be provided with a plurality of mask openings having the same contour shape and uniform distribution; the vacant area may be provided with a plurality of vacant openings having the same contour shape and size And evenly distributed, as shown in Figure 3 and Figure 4.
  • the mask strips when the mask strips are fixed to the mounting frame, the mask strips may be fixed to the mounting frame by soldering.
  • Each of the mask strips may be fixed to the mounting frame in a horizontal direction, and the plurality of mask strips are sequentially disposed next to each other in the vertical direction. That is to say, each mask strip is fixed to the mounting frame in order from top to bottom.
  • the material of the mask strip needs to have characteristics of high temperature and high pressure resistance, small thermal expansion coefficient, and stable shape.
  • the mask strip can be made of a metal material.
  • the metal material includes, but is not limited to, Invar.
  • FIG. 3 and FIG. 4 show two specific implementation manners of the mask unit of the mask strip provided by the present invention, and the present invention is not limited thereto as long as the contour shape and vacancy of the mask opening are satisfied.
  • the contour shapes of the openings are different, and the stresses generated by the two during the stretching process can compensate each other, and such structures are also within the scope of protection of the present invention.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

一种掩膜板，包括多个掩膜条（1）和安装框架，多个掩膜条（1）经过拉伸后安装于安装框架上，每个掩膜条（1）的掩膜单元（11）包括有效开口区和两个空置区，有效开口区内设置有掩膜开口（11a，21a，31a，41a），两个空置区分别设置在有效开口区的沿垂直于拉伸方向的两侧且靠近有效开区，空置区内设置有空置开口(11b，21b，31b，41b)，掩膜开口（11a，21a，31a，41a）的轮廓形状与空置开口(11b，21b，31b，41b)的轮廓形状不同，且二者在拉伸过程中产生的应力能够相互补偿。掩膜板可防止掩膜条（1）在拉伸过程中的卷曲现象，从而可减少掩膜单元（11）边缘阴影效应，进而避免显示面板在蒸镀时出现边缘混色不良的情况，增加产品良率。

Description

一种掩膜板 技术领域
本发明属于OLED显示技术领域，具体涉及一种掩膜板。
背景技术
有机电致发光(OLED，Organic Light-Emitting Diode)器件具有自发光、反应时间快、视角广、成本低、制造工艺简单、分辨率佳及高亮度等多项优点，被认为是下一代的平面显示器新兴的应用技术。
在OLED有机蒸镀膜的技术中，利用高精度掩膜板作为模具，有机材料高温挥发后以材料分子状态透过掩膜板上的有效开口区内的掩膜开口蒸镀到背板玻璃上，作为有机发光层，用于实现有机发光。所述掩膜板一般包括多个掩膜条和安装框架，具体地，在将每个掩膜条通过夹具拉伸调整到其参数满足要求后，将其贴合并固定到安装框架的表面。
参阅图1，每个掩膜条1上设置有多个掩膜单元11(cell)。参照图1-1，每个掩膜单元11包括有效开口区和两个空置区(可称为dummy区)，有效开口区内设置有掩膜开口11a，两个空置区分别设置在有效开口区的沿垂直于拉伸方向的两侧且靠近有效开口区，空置区内设置有空置开口11b。
如图1-1所示，其示出了现有技术中的掩膜条的一种掩膜单元的示意图，有效开口区的掩膜开口11a和空置区的空置开口11b的轮廓形状均为孔状(即，该掩膜条为slot型掩膜条)。然而，在使用包括由图1-1所示的掩膜单元构成的掩膜条的掩膜板的过程中发现：在夹具拉伸调整过程中，掩膜条的边缘会出现向下卷曲的现象(如图1-2所示)，且拉伸力越大卷曲变形现象越严重，该种卷曲在蒸镀时会造成掩膜单元边缘出现shadow效应，最终会导致显示面板在蒸镀时出现边缘混色不良的情况，进而导致产品良率不高。
如图2-1所示，其示出了现有技术中的掩膜条的另一种掩膜单元的示意图，有效开口区的掩膜开口21a和空置区的空置开口21b的轮廓形状为均为细条状(即，该掩膜条为slit型掩膜条)。然而，在使用包括由图2-1 所示的掩膜单元构成的掩膜条的掩膜板的过程中发现：在夹具拉伸调整过程中，当拉伸调节掩膜条的拉力在一定范围内时，掩膜条不会发生较大形变(如图2-2所示)；当拉力逐渐增大超过一定范围后，掩膜条发生向上卷曲的现象(如图2-3所示)，该种卷曲同样在蒸镀时会造成掩膜单元边缘出现shadow效应，最终会导致显示面板在蒸镀时出现边缘混色不良的情况，进而导致产品良率不高。
发明内容
本发明旨在至少解决现有技术中存在的技术问题之一，提出了一种掩膜板，可防止掩膜条在拉伸过程中的卷曲现象，从而可减少掩膜单元边缘shadow效应，进而避免显示面板在蒸镀时出现边缘混色不良的情况，从而增加产品良率。
本发明提供了一种掩膜板，包括多个掩膜条和安装框架，所述多个掩膜条经过拉伸后安装于所述安装框架上，每个所述掩膜条包括多个掩膜单元，每个掩膜单元包括有效开口区和两个空置区，所述有效开口区内设置有掩膜开口，所述两个空置区分别设置在所述有效开口区的沿垂直于拉伸方向的两侧且靠近所述有效开区，所述空置区内设置有空置开口，所述掩膜开口的轮廓形状与所述空置开口的轮廓形状不同，且二者在拉伸过程中产生的应力能够相互补偿。
可选地，所述掩膜开口的轮廓形状为孔状，所述空置开口的轮廓形状为细条状；所述空置开口的长度方向趋于拉伸方向。
优选地，所述空置开口的长度方向平行于拉伸方向。
可选地，所述掩膜开口的轮廓形状为细条状，所述空置开口的轮廓形状为孔状；所述掩膜开口的长度方向趋于拉伸方向。
优选地，所述掩膜开口的长度方向平行于拉伸方向。
可选地，所述有效开口区设置有多个所述掩膜开口，多个所述掩膜开口的轮廓形状和大小相同且均匀分布；所述空置区设置有多个所述空置开口，多个所述空置开口的轮廓形状和大小相同且均匀分布。
可选地，所述掩膜条采用焊接的方式固定于所述安装框架上。
可选地，每个所述掩膜条沿水平方向固定在所述安装框架上；多 个所述掩膜条沿垂直方向彼此紧挨地依次设置。
可选地，所述掩膜条采用金属材料制成。
优选地，所述金属材料包括因瓦合金。
本发明具有以下有益效果：
本发明提供的掩膜板，通过设置掩膜开口的轮廓形状与空置开口的轮廓形状不同，来使二者在拉伸过程中产生的应力能够相互补偿，因而可防止掩膜条在拉伸过程中的卷曲现象，从而可减少掩膜单元边缘shadow效应，进而避免显示面板在蒸镀时出现边缘混色不良的情况，从而增加产品良率。
附图说明
附图是用来提供对本发明的进一步理解，并且构成说明书的一部分，与下面的具体实施方式一起用于解释本发明，但并不构成对本发明的限制。在附图中：
图1为现有技术中的掩膜条的示意图；
图1-1为图1中的掩膜条的掩膜单元的一种示例的示意图；
图1-2为由图1-1所示的掩膜单元构成的掩膜条在被拉伸过程中出现卷曲现象时的侧视图；
图2-1为图1中的掩膜条的掩膜单元的另一种示例的示意图；
图2-2为由图2-1所示的掩膜单元构成的掩膜条在被拉伸过程中未出现卷曲现象时的侧视图；
图2-3为由图2-1所示的掩膜单元构成的掩膜条在被拉伸过程中出现卷曲现象时的侧视图；
图3为本发明实施例提供的一种掩膜条的掩膜单元的示意图；
图4为本发明实施例提供的另一种掩膜条的掩膜单元的示意图。
具体实施方式
为使本领域的技术人员更好地理解本发明的技术方案，下面结合附图来对本发明提供的掩膜板进行详细描述。
本发明实施例提供了一种掩膜板，该掩膜板包括多个掩膜条和安 装框架，多个掩膜条经过拉伸后安装于安装框架上，每个掩膜条包括多个掩膜单元，每个掩膜单元包括有效开口区和两个空置区，有效开口区内设置有掩膜开口，两个空置区分别设置在有效开口区的沿垂直于拉伸方向的两侧且靠近有效开区，空置区内设置有空置开口。其中，掩膜开口的轮廓形状与空置开口的轮廓形状不同，且二者在拉伸过程中产生的应力能够相互补偿。
本发明提供的掩膜板，通过设置掩膜开口的轮廓形状与空置开口的轮廓形状不同，来使二者在拉伸过程中产生的应力能够相互补偿，因而可防止掩膜条在拉伸过程中的卷曲现象，从而可减少掩膜单元边缘shadow效应，进而避免显示面板在蒸镀时出现边缘混色不良的情况，从而增加产品良率。
下面结合图3和图4详细描述本发明提供的掩膜板的具体结构。
如图3所示，根据实施例的掩膜单元中，有效开口区内的掩膜开口31a的轮廓形状为孔状(slot型)，空置区内的空置开口31b的轮廓形状为细条状(slit型)；并且，空置开口31b的长度方向趋于拉伸方向，具体地，拉伸方向为图3中的水平方向时，空置开口31b的长度方向趋于水平方向。
可以理解，采用由图3所示的掩膜单元构成的掩膜条，由于在拉伸调整过程中有效开口区产生的应力方向向下(即，垂直于纸面向里)，而空置区产生的应力方向向上(即，垂直于纸面向外)，因此，该掩膜条均衡应力的能力增强，可以防止该掩膜条在拉伸过程中卷曲的现象。
优选地，空置开口31b的长度方向平行于拉伸方向。在图3中，拉伸方向为水平方向时，空置开口31b的长度方向也为水平方向。
如图4所示，根据另一实施例的掩膜单元中，有效开口区的掩膜开口41a的轮廓形状为细条状(slit型)，空置区的空置开口41b的轮廓形状为孔状(slot型)；掩膜开口41a的长度方向趋于拉伸方向，具体地，拉伸方向为水平方向时，掩膜开口41a的长度方向趋于水平方向。
可以理解，采用由图4所示的掩膜单元构成的掩膜条，由于在拉 伸调整过程中有效开口区产生的应力方向向上(即，垂直于纸面向外)，而空置区产生的应力方向向下(即，垂直于纸面向里)，因此，该掩膜条的均衡应力的能力增强，可以防止该掩膜条在拉伸过程中卷曲的现象。
优选地，掩膜开口41a的长度方向平行于拉伸方向，即为水平方向。
本发明的实施例提供的掩膜板中，有效开口区可设置有多个掩膜开口，其轮廓形状和大小相同且均匀分布；空置区可设置有多个空置开口，其轮廓形状和大小相同且均匀分布，如图3和图4所示。
具体地，在将各个掩膜条固定于安装框架上时，可以采用焊接的方式将掩膜条固定于安装框架上。
每个掩膜条可以沿水平方向固定在安装框架上，多个掩膜条沿垂直方向彼此紧挨地依次设置。也就是说，各个掩膜条由上至下依次固定于安装框架上。
进一步地，由于蒸镀往往在高温高压的环境中进行，为避免掩膜条发生严重形变，掩膜条的材料需要具有耐高温高压、热膨胀系数小且形态稳定等特点。具体地，掩膜条可以采用金属材料制备。该金属材料包括但不限于因瓦合金。
需要说明的是，图3和图4示出了本发明提供的掩膜条的掩膜单元的两种具体实现方式，而本发明并不局限于此，只要满足掩膜开口的轮廓形状与空置开口的轮廓形状不同，且二者在拉伸过程中产生的应力能够相互补偿，这样的结构也均属于本发明的保护范围。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (10)

  1. 一种掩膜板，包括多个掩膜条和安装框架，所述多个掩膜条经过拉伸后安装于所述安装框架上，每个掩膜条包括多个掩膜单元，每个掩膜单元包括有效开口区和两个空置区，所述有效开口区内设置有掩膜开口，所述两个空置区分别设置在所述有效开口区的沿垂直于拉伸方向的两侧且靠近所述有效开口区，所述空置区内设置有空置开口，其特征在于，所述掩膜开口的轮廓形状与所述空置开口的轮廓形状不同，且二者在拉伸过程中产生的应力能够相互补偿。
  2. 根据权利要求1所述的掩膜板，其特征在于，所述掩膜开口的轮廓形状为孔状，所述空置开口的轮廓形状为细条状；
    所述空置开口的长度方向趋于拉伸方向。
  3. 根据权利要求1所述的掩膜板，其特征在于，所述掩膜开口的轮廓形状为细条状，所述空置开口的轮廓形状为孔状；
    所述掩膜开口的长度方向趋于拉伸方向。
  4. 根据权利要求2所述的掩膜板，其特征在于，所述空置开口的长度方向平行于拉伸方向。
  5. 根据权利要求3所述的掩膜板，其特征在于，所述掩膜开口的长度方向平行于拉伸方向。
  6. 根据权利要求1所述的掩膜板，其特征在于，所述有效开口区设置有多个所述掩膜开口，多个所述掩膜开口的轮廓形状和大小相同且均匀分布；
    所述空置区设置有多个所述空置开口，多个所述空置开口的轮廓形状和大小相同且均匀分布。
  7. 根据权利要求1所述的掩膜板，其特征在于，所述掩膜条采用焊接的方式固定于所述安装框架上。
  8. 根据权利要求1所述的掩膜板，其特征在于，每个所述掩膜条沿水平方向固定在所述安装框架上；
    多个所述掩膜条沿垂直方向彼此紧挨地依次设置。
  9. 根据权利要求1至8中任一项权利要求所述的掩膜板，其特征在于，所述掩膜条采用金属材料制成。
  10. 根据权利要求9所述的掩膜板，其特征在于，所述金属材料包括因瓦合金。
PCT/CN2017/072806 2016-05-09 2017-02-03 一种掩膜板 Ceased WO2017193646A1 (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP17737459.2A EP3456856B1 (en) 2016-05-09 2017-02-03 Mask plate
US15/544,915 US20180216220A1 (en) 2016-05-09 2017-02-03 Mask

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201620413388.2 2016-05-09
CN201620413388.2U CN205576262U (zh) 2016-05-09 2016-05-09 一种掩膜板

Publications (1)

Publication Number Publication Date
WO2017193646A1 true WO2017193646A1 (zh) 2017-11-16

Family

ID=56857313

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2017/072806 Ceased WO2017193646A1 (zh) 2016-05-09 2017-02-03 一种掩膜板

Country Status (4)

Country Link
US (1) US20180216220A1 (zh)
EP (1) EP3456856B1 (zh)
CN (1) CN205576262U (zh)
WO (1) WO2017193646A1 (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN205576262U (zh) * 2016-05-09 2016-09-14 鄂尔多斯市源盛光电有限责任公司 一种掩膜板
CN107130209B (zh) * 2017-06-30 2020-02-04 京东方科技集团股份有限公司 掩膜板、掩膜板的制造方法和蒸镀装置
TWI649787B (zh) * 2017-07-12 2019-02-01 林義溢 多層式遮罩
CN107815641B (zh) * 2017-10-25 2020-05-19 信利（惠州）智能显示有限公司 掩膜板
CN109722630B (zh) * 2019-01-09 2020-01-14 昆山工研院新型平板显示技术中心有限公司 掩模单元及具有该掩模单元的掩模板组件
WO2020194630A1 (ja) * 2019-03-27 2020-10-01 シャープ株式会社 表示装置及び蒸着マスク
CN109778116B (zh) * 2019-03-28 2021-03-02 京东方科技集团股份有限公司 一种掩膜版及其制作方法、掩膜版组件
CN111490084B (zh) * 2020-04-21 2023-02-03 京东方科技集团股份有限公司 显示模组的制备方法、显示模组及电子设备
KR102919371B1 (ko) * 2021-05-25 2026-01-28 삼성디스플레이 주식회사 마스크, 마스크 조립체 및 표시 장치의 제조장치
KR20230020035A (ko) * 2021-08-02 2023-02-10 삼성디스플레이 주식회사 증착용 마스크

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110157575A1 (en) * 2009-12-15 2011-06-30 Samsung Mobile Display Co., Ltd. Mask frame assembly for thin layer deposition and organic light emitting display device
CN103390728A (zh) * 2012-05-08 2013-11-13 三星显示有限公司 单位掩模板及包括该单位掩模板的掩模板组装体
US20140065355A1 (en) * 2012-09-03 2014-03-06 Samsung Display Co., Ltd. Mask and mask assembly
CN103911583A (zh) * 2012-12-29 2014-07-09 上海天马微电子有限公司 Amoled金属掩膜板
CN205576262U (zh) * 2016-05-09 2016-09-14 鄂尔多斯市源盛光电有限责任公司 一种掩膜板

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101182239B1 (ko) * 2010-03-17 2012-09-12 삼성디스플레이 주식회사 마스크 및 이를 포함하는 마스크 조립체
KR101820020B1 (ko) * 2011-04-25 2018-01-19 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 어셈블리
KR102002494B1 (ko) * 2012-11-30 2019-07-23 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 어셈블리

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110157575A1 (en) * 2009-12-15 2011-06-30 Samsung Mobile Display Co., Ltd. Mask frame assembly for thin layer deposition and organic light emitting display device
CN103390728A (zh) * 2012-05-08 2013-11-13 三星显示有限公司 单位掩模板及包括该单位掩模板的掩模板组装体
US20140065355A1 (en) * 2012-09-03 2014-03-06 Samsung Display Co., Ltd. Mask and mask assembly
CN103911583A (zh) * 2012-12-29 2014-07-09 上海天马微电子有限公司 Amoled金属掩膜板
CN205576262U (zh) * 2016-05-09 2016-09-14 鄂尔多斯市源盛光电有限责任公司 一种掩膜板

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3456856A4 *

Also Published As

Publication number Publication date
CN205576262U (zh) 2016-09-14
EP3456856A4 (en) 2020-01-15
EP3456856B1 (en) 2021-04-07
US20180216220A1 (en) 2018-08-02
EP3456856A1 (en) 2019-03-20

Similar Documents

Publication Publication Date Title
WO2017193646A1 (zh) 一种掩膜板
US9605336B2 (en) Mask, method for manufacturing the same and process device
US10934613B2 (en) Mask plate, mask plate assembly including mask plate and method for manufacturing same
TWI618804B (zh) 遮罩片及使用其製造有機發光二極體顯示器之方法
US11214858B2 (en) Mask plate and mask sheet
CN204825028U (zh) 掩膜板和显示基板蒸镀系统
TWI580803B (zh) 遮罩及具有其之遮罩組件
CN107978676B (zh) 一种蒸镀用掩膜组件
US10337097B2 (en) Mask frame assembly, evaporation method, and array substrate
US10517196B2 (en) Flexible display device
CN107699854A (zh) 掩膜组件及其制造方法
CN108179380B (zh) 一种掩膜版
WO2020143217A1 (zh) 掩膜单元及具有该掩膜单元的掩膜板组件
CN108611596B (zh) 掩膜板
CN105154822A (zh) 一种小开口蒸镀用掩模板
US20210336147A1 (en) Mask
CN109487206B (zh) 掩膜版及采用该掩膜版的掩膜装置
WO2021046807A1 (zh) 掩膜装置及其制造方法、蒸镀方法、显示装置
WO2021036301A1 (zh) 掩膜板及掩膜板制备方法
WO2016150289A1 (zh) 掩模板
WO2019218605A1 (zh) 掩膜板
CN105839051A (zh) 掩模板及其制作方法、oled显示基板和显示装置
WO2023226187A1 (zh) 掩膜板及其制作方法、掩膜组件及其制作方法
CN110863176A (zh) 一种掩膜版及其制作方法、显示面板
CN104561894A (zh) 一种掩膜板的制造方法

Legal Events

Date Code Title Description
REEP Request for entry into the european phase

Ref document number: 2017737459

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 15544915

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 17737459

Country of ref document: EP

Kind code of ref document: A1