WO2020042656A1 - 像素界定结构和显示面板及其制备方法、显示装置 - Google Patents

像素界定结构和显示面板及其制备方法、显示装置 Download PDF

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Publication number
WO2020042656A1
WO2020042656A1 PCT/CN2019/084929 CN2019084929W WO2020042656A1 WO 2020042656 A1 WO2020042656 A1 WO 2020042656A1 CN 2019084929 W CN2019084929 W CN 2019084929W WO 2020042656 A1 WO2020042656 A1 WO 2020042656A1
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Prior art keywords
pixel
opening
defining layer
lyophilic
layer
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English (en)
French (fr)
Inventor
胡春静
侯文军
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BOE Technology Group Co Ltd
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BOE Technology Group Co Ltd
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Priority to EP19831971.7A priority Critical patent/EP3846212B1/en
Priority to US16/497,585 priority patent/US10964776B2/en
Priority to JP2019560278A priority patent/JP7295033B2/ja
Publication of WO2020042656A1 publication Critical patent/WO2020042656A1/zh
Anticipated expiration legal-status Critical
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing

Definitions

  • the present disclosure relates to the field of display technology, and in particular, to a pixel-defining structure, a display panel, a manufacturing method thereof, and a display device.
  • the drying process will cause the thickness of the formed film to be uneven, which will affect the life of the device and the display effect.
  • the related wet manufacturing process uses a double pixel definition layer (PDL) structure to reduce the thickness non-uniformity of the film caused by the drying process.
  • PDL double pixel definition layer
  • a pixel defining structure including a first pixel defining layer having a first opening, which is located on a substrate, and the first pixel defining layer includes a first lyophilic material.
  • the first portion and the second portion formed of a second lyophilic material, the projections of the first portion and the second portion on the substrate surface do not overlap, and the side of the first pixel defining layer facing the first opening includes The first side formed by the first affinity material and the second side formed by the second affinity material, wherein the first affinity material is different from the second affinity material.
  • the first portion is a lyophilic portion
  • the second portion is a lyophobic portion
  • a side of the lyophilic portion near the first opening includes a toothed structure
  • the lyophobic portion is located at Between the teeth of the tooth-shaped structure, the lyophobic portion does not exceed the lyophilic portion in the direction in which the teeth extend.
  • the tooth structure is a rectangular tooth structure, and the first side and the second side are both rectangular.
  • the pixel defining structure further includes a second pixel defining layer having a second opening, which is located on a side of the first pixel defining layer away from the substrate, and the second pixel defining layer is formed by The second lyophilic material is formed, a projection of the second pixel defining layer on the substrate surface is completely covered by a projection of the first pixel defining layer on the substrate surface, and the second opening and the first The position of an opening corresponds, and the projection of the second opening on the substrate surface completely covers the projection of the first opening on the substrate surface.
  • the first lyophilic material includes SiO 2 .
  • the second lyophilic material includes a fluorolipid material.
  • the slope angle of the side facing the first opening is 30 degrees to 90 degrees.
  • the first pixel-defining layer is a mesh structure having a plurality of first openings, and all sides of the first pixel-defining layer facing the first opening include the first lyophilic material. A first side is formed and a second side is formed from the second lyophilic material.
  • the first portion and the second portion in the first pixel-defining layer have the same height.
  • the second portion in the first pixel-defining layer and the second lyophilic material in the second pixel-defining layer are integrated, and the second lyophilic material is a lyophobic material.
  • a slope angle of a side surface of the second pixel defining layer facing the second opening is 30 degrees to 90 degrees.
  • a display panel including the aforementioned pixel defining structure.
  • a display device including the aforementioned display panel.
  • a method for preparing a pixel defining structure including: forming a first pixel defining layer having a first opening on a substrate, the first pixel defining layer comprising A first portion formed of a material and a second portion formed of a second lyophilic material, the projections of the first portion and the second portion on a substrate surface do not overlap, and the first pixel defining layer faces the first opening
  • the side surface includes a first side surface formed by the first lyophilic material and a second side surface formed by the second lyophilic material, wherein the first lyophilic material is different from the second lyophilic material in affinity.
  • the preparation method further includes forming a second pixel defining layer on the first pixel defining layer, wherein forming the first pixel defining layer and the second pixel defining layer includes: on the substrate Forming a first lyophilic material layer thereon; patterning the first lyophilic material layer to form the first portion of the first pixel defining layer; forming a second lyophilic material on the basis of the patterned first lyophilic material layer Patterning the second lyophilic material layer to form the second portion of the first pixel-defining layer and the second pixel-defining layer, wherein the second pixel-defining layer has a second opening, The projection of the second pixel defining layer on the substrate surface is completely covered by the projection of the first pixel defining layer on the substrate surface, the second opening corresponds to the position of the first opening, and the The projection of the second opening on the substrate surface completely covers the projection of the first opening on the substrate surface.
  • the first part is a lyophilic part
  • the preparation method further includes: determining the first part according to a climbing speed of the functional layer to be formed at the first opening at the lyophilic part.
  • an area ratio of the first side to the second side is inversely proportional to the climbing speed.
  • a method for manufacturing a display panel including the foregoing method for manufacturing a pixel-defining structure.
  • the pixel-defining structure surrounds an opening for forming a functional layer
  • the opening includes a first opening
  • the preparation method further includes: using inkjet printing to form an opening containing the function in the opening. Solution of layer material.
  • FIG. 1 is a plan view illustrating a pixel defining structure according to an embodiment of the present disclosure
  • FIG. 1A is a top view of a portion of the pixel defining structure shown in FIG. 1; FIG.
  • FIG. 1B and 1C are cross-sectional views of a pixel-defining structure taken along lines AA 'and BB' in the top view shown in FIG. 1A, respectively;
  • FIG. 1D is a cross-sectional view of a pixel defining structure taken along a line CC ′ in the cross-sectional view shown in FIG. 1B;
  • FIG. 2A is a top view illustrating a pixel defining structure according to another embodiment of the present disclosure.
  • 2B and 2C are cross-sectional views of a pixel defining structure taken along lines aa 'and bb', respectively, in the top view shown in FIG. 2A;
  • 2D is a cross-sectional view of a pixel defining structure taken along a line cc ′ in the cross-sectional view shown in FIG. 2B;
  • 3A is a top view illustrating a pixel defining structure according to still another embodiment of the present disclosure.
  • 3B and 3C are cross-sectional views of a pixel defining structure taken along lines AA ′ and BB ′ in FIG. 3A, respectively;
  • 3D is a cross-sectional view of a pixel defining structure taken along a line CC ′ in FIG. 3B;
  • FIG. 4A is a flowchart illustrating a method of manufacturing a pixel-defining structure according to an embodiment of the present disclosure
  • 4B is a flowchart illustrating a method of manufacturing a pixel-defining structure according to another embodiment of the present disclosure
  • FIG. 5 is a flowchart illustrating a method of manufacturing a display panel according to an embodiment of the present disclosure
  • FIG. 6 is a cross-sectional view showing a first lyophilic material layer according to an embodiment of the present disclosure
  • FIG. 7A is a top view illustrating a pattern of a first lyophilic material layer according to an embodiment of the present disclosure
  • FIG. 7B is a cross-sectional view of a pixel defining structure taken along a line AA ′ in FIG. 7A;
  • FIG. 8 is a cross-sectional view showing a second lyophilic material layer according to an embodiment of the present disclosure
  • 9A and 9B respectively show thickness distribution diagrams of a functional layer in a pixel unit in a longitudinal direction L and a transverse direction T;
  • 10A and 10B respectively show thickness distribution diagrams of a functional layer in a longitudinal direction L and a transverse direction T in a pixel unit according to some embodiments of the present disclosure.
  • a specific element when it is described that a specific element is located between the first element and the second element, there may or may not be an intermediate element between the specific element and the first element or the second element.
  • the related wet preparation process still has difficulty in guaranteeing the uniform thickness of the formed film.
  • the present disclosure proposes a technical solution capable of improving the uniformity of the thickness of a thin film prepared by a wet process.
  • the pixel defining structure includes a first pixel defining layer having a first opening.
  • the first pixel defining layer is located on the substrate.
  • the first pixel-defining layer includes a first portion formed from a first lyophilic material and a second portion formed from a second lyophilic material.
  • the projections of the first part and the second part on the substrate surface do not overlap.
  • the side of the first pixel defining layer facing the first opening includes a first side formed of a first lyophilic material and a second side formed of a second lyophilic material.
  • the first affinity material is different from the second affinity material.
  • the pixel defining structure further includes a second pixel defining layer having a second opening.
  • the second pixel defining layer is located on a side of the first pixel defining layer away from the substrate, and is formed of a second lyophilic material.
  • the projection of the second pixel defining layer on the substrate surface is completely covered by the projection of the first pixel defining layer on the substrate surface, the second opening corresponds to the position of the first opening, and the projection of the second opening on the substrate surface completely covers the first Projection of an opening on the substrate surface.
  • FIG. 1 is a top view illustrating a pixel defining structure according to an embodiment of the present disclosure.
  • FIG. 1 illustrates the distribution of the first pixel-defining layer PDL1 and the second pixel-defining layer PDL2 in the longitudinal direction L and the lateral direction T on the substrate 100.
  • FIG. 1A is a plan view of a portion of a pixel defining structure (including two pixel defining units) shown in FIG. 1.
  • 1B and 1C are cross-sectional views of a pixel-defining structure taken along lines AA ′ and BB ′ in FIG. 1A, respectively.
  • FIG. 1D is a cross-sectional view of the pixel defining structure taken along a line CC ′ in FIG. 1B.
  • FIG. 1A illustrates the distribution of the first pixel-defining layer PDL1 and the second pixel-defining layer PDL2 along the longitudinal direction L on the substrate 100.
  • the first pixel defining layer PDL1 has a first opening 110 and the second pixel defining layer PDL2 has a second opening 210.
  • the second opening 210 corresponds to the position of the first opening 110, and the projection of the second opening 210 on the substrate surface completely covers the projection of the first opening 110 on the substrate surface.
  • the second opening 210 corresponds to the position of the first opening 110 and the centers thereof substantially overlap, and the second opening 210 is larger than the first opening 110.
  • the side of the first pixel defining layer PDL1 facing the first opening 110 includes a first side SF1 and a second side SF2, as shown in FIGS. 1B and 1C, respectively.
  • the projections P1 and P2 of the first side SF1 and the second side SF2 on the surface of the substrate 100 have no intersection lines, as shown in FIG. 1D.
  • the first side SF1 is formed of a first lyophilic material (for example, a lyophilic material)
  • the second side SF2 is formed of a second lyophilic material (for example, a lyophilic material).
  • the lyophilic material includes SiO 2 and the lyophobic material includes a fluorolipid material.
  • the first pixel defining layer PDL1 is located on the substrate 100.
  • the projection of the second pixel defining layer PDL2 on the substrate surface is completely covered by the projection of the first pixel defining layer PDL1 on the substrate surface.
  • the second pixel defining layer PDL2 partially covers the first pixel defining layer PDL1.
  • the first pixel defining layer PDL1 includes a first portion (eg, a lyophilic portion) 120 formed of a first lyophilic material and a second portion (eg, a lyophobic portion) 130 formed of a second lyophilic material.
  • the height of the first portion 120 and the second portion 130 are the same.
  • the projections of the first portion 120 and the second portion 130 on the substrate surface do not overlap.
  • the second pixel defining layer PDL2 is formed of a second lyophilic material, for example, it includes the same second lyophilic material as PDL1.
  • the second lyophilic material in the second pixel defining layer PDL2 and the second lyophilic material in the second portion 130 of the first pixel defining layer PDL1 are integrated, for example, both are lyophobic materials.
  • PDL2 is formed of a lyophobic material or its surface includes a lyophobic material, which can prevent overflow during the process of preparing a functional layer by a wet process, thereby effectively preventing cross-color between adjacent pixels.
  • FIG. 1D shows a cross-sectional view of the first pixel defining layer PDL1 taken along a line CC ′ in the cross-sectional view shown in FIG. 1B.
  • the first part 120 is a lyophilic part
  • the second part 130 is a lyophobic part.
  • a side of the lyophilic portion 120 near the first opening 110 includes a toothed structure.
  • the lyophobic portion 130 is located between the teeth of the tooth structure. In the direction in which the teeth extend, the lyophobic portion 130 does not extend beyond the lyophilic portion 120. As shown in FIG.
  • the projections P1 and P2 on the surface of the substrate 100 of the side facing the first opening are tooth-shaped, in which the lyophilic portion 120 is longer than the lyophobic portion 130 in the direction in which the teeth extend.
  • the tooth structure is a rectangular tooth structure.
  • FIG. 1D shows that the side of the first pixel-defining layer PDL1 facing the first opening 110 has a rectangular tooth shape, wherein the first side SF1 and the second side SF2 are both rectangular.
  • the side of the first pixel defining layer PDL1 facing the first opening 110 is planar. That is, the first side surface and the second side surface are coplanar, and the projections of the first side surface and the second side surface on the surface of the substrate 100 are linear.
  • the side of the first pixel defining layer is designed to face the first opening including the first side formed of a lyophilic insulating material and the second side formed of a lyophobic insulating material, which can significantly improve the thickness of the formed film. Uniformity.
  • FIG. 2A is a top view illustrating a pixel defining structure according to another embodiment of the present disclosure.
  • 2B and 2C are cross-sectional views of a pixel defining structure taken along lines aa ′ and bb ′ in FIG. 2A, respectively.
  • FIG. 2D is a cross-sectional view of the pixel defining structure taken along a line cc ′ in FIG. 2B.
  • FIG. 2A illustrates the second pixel defining layer PDL2 ′ and the substrate 100.
  • the first pixel defining layer PDL1 ' has a first opening 110'
  • the second pixel defining layer PDL2 ' is the same as the opening of the first pixel defining layer PDL1'.
  • the side of the first pixel defining layer PDL1 ′ facing the first opening 110 ′ includes a first side SF1 ′ and a second side SF2 ′, as shown in FIGS. 2B and 2C, respectively.
  • the second pixel defining layer PDL2 ' completely covers the first pixel defining layer PDL1'.
  • the first pixel defining layer PDL1 ′ in FIG. 2C also includes a lyophilic portion 120 ′ and a lyophobic portion 130 ′, the difference is that the volume ratio of the lyophobic portion to the lyophilic portion is larger.
  • FIG. 2D shows a cross-sectional view of the first pixel defining layer PDL1 ′ taken along a line cc ′ in the cross-sectional view shown in FIG. 2B.
  • the projections P1 ′ and P2 ′ of the first side surface SF1 ′ and the second side surface SF2 ′ on the surface of the substrate 100 are linear, that is, the first side surface and the second side surface are coplanar.
  • the first pixel-defining layer and the second pixel-defining layer are both mesh structures having a plurality of openings.
  • the first pixel-defining layer is a mesh structure having a plurality of first openings, and all sides of the first pixel-defining layer facing the first opening include a first side formed of a first lyophilic material and a second lyophilic material A second side formed by the material.
  • the second pixel defining layer is a mesh structure having a plurality of second openings.
  • the slope angle of the side of the first pixel defining layer facing the first opening may be in a range of 30 degrees to 90 degrees.
  • the slope angle of the side of the second pixel defining layer facing the second opening is 30 degrees to 90 degrees.
  • FIG. 3A is a top view illustrating a pixel defining structure according to still another embodiment of the present disclosure.
  • 3A is the same as the top view shown in FIG. 1A, and therefore similar structures are denoted by the same reference numerals.
  • 3B and 3C are cross-sectional views of the pixel defining structure taken along lines AA ′ and BB ′ in FIG. 3A, respectively.
  • FIG. 3D is a cross-sectional view of the pixel defining structure taken along a line CC ′ in FIG. 3B.
  • 3B and FIG. 1B are the same. The same points are not repeated, and the different FIG. 3C and FIG. 3D will be described in detail below.
  • FIG. 3D is a cross-sectional view of the first pixel defining layer PDL1 ′′ taken along the line CC ′ in FIG. 3B.
  • the lyophilic portion 120 ′′ and the lyophobic portion 130 ′′ are alternately arranged in a strip structure, where In the extending direction of the strip, the lyophilic portion 120 "is longer than the lyophobic portion 130".
  • the projection of the side of the first pixel defining layer PDL1 "facing the first opening onto the surface of the substrate 100 P1 and P2 are also toothed.
  • FIG. 4A is a flowchart illustrating a method of manufacturing a pixel-defining structure according to an embodiment of the present disclosure. Steps S1-S2 in FIG. 4A are described below with reference to FIGS. 1A-1D and 2A-2D.
  • a first pixel defining layer is formed on a substrate, and the first pixel defining layer has a first opening.
  • the first pixel defining layer shown in FIGS. 1D and 2D is formed.
  • the first pixel defining layer includes the first portion and the second portion, and the projections of the first portion and the second portion on the surface of the substrate do not overlap, and the side of the first pixel defining layer facing the first opening includes a first portion A first side formed by a lyophilic material and a second side formed by a second lyophilic material, wherein the first lyophilic material is different from the second lyophilic material in affinity.
  • the first opening is used to form a functional layer.
  • a second pixel defining layer is formed on the first pixel defining layer, for example, a structure shown in FIGS. 1A-1C and 2A-2C is formed.
  • the second pixel defining layer has a second opening.
  • the projection of the second pixel defining layer on the substrate surface is completely covered by the projection of the first pixel defining layer on the substrate surface.
  • the second opening corresponds to the position of the first opening, and the projection of the second opening on the substrate surface completely covers the projection of the first opening on the substrate surface.
  • the method for preparing a pixel-defining structure further includes: Step S3, determining the first side and the first side according to the climbing speed of the functional layer to be formed at the first opening in the first part (ie, the lyophilic part). Area ratio of two sides. Step S3 will be described later with reference to FIG. 5.
  • FIG. 4B is a flowchart illustrating a method of manufacturing a pixel-defining structure according to another embodiment of the present disclosure. Steps S11-S14 in FIG. 4B are described below with reference to FIGS. 6-8.
  • FIG. 6 illustrates a cross-sectional view after forming a first lyophilic material layer according to an embodiment of the present disclosure.
  • FIG. 7A is a top view illustrating a pattern of a first lyophilic material layer according to an embodiment of the present disclosure;
  • FIG. 7B is a cross-sectional view of a pixel defining structure taken along a line AA ′ in FIG. 7A.
  • FIG. 8 is a cross-sectional view showing a second lyophilic material layer according to an embodiment of the present disclosure.
  • a first lyophilic material layer 300 is formed on the substrate 100 to form a structure as shown in FIG. 6.
  • the first lyophilic material layer is formed by a spin coating or evaporation process.
  • the first lyophilic material layer may include SiO 2 .
  • the first lyophilic material layer 300 is patterned to form a first portion (for example, a lyophilic portion) of the first pixel defining layer, for example, to form a structure shown in FIGS. 7A and 7B.
  • a side of the patterned first lyophilic material layer 300 near the opening 310 includes a toothed structure.
  • the projection of the side of the first lyophilic material layer 300 facing the opening 310 on the substrate 100 is tooth-shaped. That is, the side facing the opening of the first lyophilic material layer is a surface where the protrusions 310P and the depressions 310C are alternately provided.
  • the patterning process includes a photolithography process, for example, exposing and developing the first lyophilic material layer using a mask to form a tooth-shaped first lyophilic material layer.
  • a second lyophilic material layer 400 is formed on the basis of the patterned first lyophilic material layer 300 to form a structure such as that shown in FIG. As shown in FIG. 8, a portion of the second lyophilic material layer 400 fills the opening 310, and another portion covers the first lyophilic material layer 300 (the lyophilic portion of the first pixel defining layer).
  • the second lyophilic material layer is formed by a spin coating or evaporation process.
  • the second lyophilic material layer may include a fluorolipid material.
  • the second lyophilic material layer 400 is patterned to form a first opening and a second opening at corresponding positions of the opening 310, thereby forming a first pixel defining layer having the first opening and a second pixel defining layer having the second opening.
  • the pixel defining layer forms a structure as shown in FIG. 1B or 2B.
  • the projection of the second opening on the substrate surface completely covers the projection of the first opening on the substrate surface.
  • FIG. 1B shows that the second opening is larger than the first opening; and
  • FIG. 2B shows that the second opening is substantially the same size as the first opening.
  • the side of the first pixel-defining layer facing the first opening includes a first side formed of a first lyophilic material and a second side formed of a second lyophilic material.
  • step S14 a patterning process similar to that in step S12 may be adopted, for example, the second lyophilic material is exposed and developed by using a mask, and the difference is that a different mask is used from step S12.
  • Different first and second openings can be formed by using different masks, so that different first pixel defining layers and second pixel defining layers can be formed.
  • a mask is used to form the first pixel-defining layer PDL1 and the second pixel-defining layer PDL2 as shown in FIGS. 1A-1D, wherein the second opening 210 is larger than the first opening 110 and the second pixel defines The layer PDL2 partially covers the first pixel defining layer PDL1.
  • another mask is used to form the first pixel-defining layer PDL1 ′ and the second pixel-defining layer PDL2 ′ as shown in FIGS. 2A-2D, wherein the second opening 210 ′ is equal to the first opening 110 ', The second pixel defining layer PDL2' completely covers the first pixel defining layer PDL1 '.
  • a display panel including the aforementioned pixel defining structure and a method of manufacturing the same.
  • FIG. 5 is a flowchart illustrating a method of manufacturing a display panel according to another embodiment of the present disclosure. Steps S11, S12, S13, and S14 in FIG. 5 are similar to the corresponding steps in FIG. 4B, so the description will not be repeated below, and only steps S21, S22, and S3 will be described in detail.
  • a solution containing a functional layer material is formed in the opening by a wet process, the pixel defining structure surrounds an opening for forming the functional layer, and the opening includes a first opening.
  • the wet process includes an inkjet printing process.
  • an ink may be formed by dissolving a corresponding functional layer material as a solute in an aromatic solvent.
  • the functional layer is, for example, a light emitting layer, a hole injection layer, a hole transport layer, or an electron blocking layer.
  • the following functional layers can be selected from the following materials.
  • the material of the light-emitting layer may be selected from, for example, polyparastyrene, polythiophene, polyfluorene, and the like.
  • the material of the hole transport layer may be PEDOT / PSS (doped polyaniline).
  • the material of the electron blocking layer can be Ir (ppz) 3 (Tris (phenylpyrazole) iridium; tris (1-ylpyrazole) iridium).
  • step S22 the solution containing the functional layer material is dried.
  • the solution is dried in a vacuum chamber, such as a vacuum process.
  • a corresponding functional layer can be obtained at a position corresponding to the first opening.
  • the thickness uniformity of these functional layers will significantly affect the display effect.
  • Each pixel unit is located in a first opening.
  • FIGS. 9A and 9B respectively show the thickness distribution of the functional layer in a pixel unit in the longitudinal direction L and the transverse direction T, wherein the horizontal axis represents the width of the pixel unit (ie, the pixel width), and the vertical axis represents the thickness of the functional layer (ie, the film thickness) .
  • the first pixel defining layer used in FIGS. 9A and 9B is only composed of a hydrophilic material.
  • the functional layer has a uniform thickness throughout the entire pixel width range, which is equal to the design thickness. That is, it is expected that the functional layer corresponding to the actual thickness within the design tolerance range (also known as the actual width) is as large as the design width.
  • the design tolerance means that the difference between the actual thickness and the design thickness is within a certain range. Tolerant. Functional layers whose actual thickness is within the design tolerance range are considered flat and can be used to calculate the actual width.
  • the formed The uniformity of the film thickness for example, can reach L 1 / L 0 ⁇ 90%, T 1 / T 0 ⁇ 85%, and make the thickness uniformity in the longitudinal L and transverse T close, that is, L 1 / L 0 is more Close to T 1 / T 0 .
  • the thickness uniformity of the functional layer can be further improved by adjusting the area ratio of the first side surface to the second side surface.
  • the thickness uniformity of the obtained functional layer can reflect the climbing speed of the lyophilic part of the functional layer to be formed at the opening. Therefore, the area ratio of the first side surface to the second side surface can be determined in step S3 according to the climbing speed of the functional layer to be formed at the opening on the lyophilic portion.
  • the first pixel definition in the transverse T can be reduced.
  • the area ratio of the first surface to the second surface of the layer facing the first opening, so that the surface tension of the solution is redistributed during the drying process, so that the solute migration in the longitudinal and transverse directions is consistent, and T 1 / T 0 L 1 / L 0 .
  • the area of the first surface or the area of the second surface can be reduced, or both the area of the first surface and the area of the second surface can be increased.
  • the width of the rectangular teeth can be reduced without changing the shape of the opening, so that the area of the first side on the top of the rectangular teeth will be reduced. , And the area of the second side at the root of the rectangular tooth will increase accordingly.
  • the first pixel-defining layer adopts the shape of a rectangular tooth, which plays a role of draining the solution, and helps further control the shape of the functional layer.
  • the area ratio of the first side to the second side is inversely proportional to the climbing speed. That is, the faster the climbing speed of the functional layer material on the lyophilic portion of the first pixel defining layer in a certain direction, the smaller the area ratio of the first side to the second side in this direction is adjusted.
  • the climbing of the functional layer material on the side of the first pixel defining layer can be reduced, thereby further Increasing L 1 / L 0 or T 1 / T 0 can achieve L 1 / L 0 ⁇ T 1 / T 0 ⁇ 90%.
  • FIGS. 10A and 10B respectively show thickness distribution diagrams of a functional layer in a longitudinal direction L and a transverse direction T in a pixel unit according to some embodiments of the present disclosure.
  • the design tolerance is still 10 nm
  • the actual widths in the vertical L and horizontal T are L 1 ⁇ 115 ⁇ m and T 1 ⁇ 70 ⁇ m, respectively.
  • FIGS. 10A and 10B it can also be seen that: in the longitudinal direction L, the climbing of the functional layer material on the side of the first pixel defining layer is more obvious; and in the lateral direction T, the functional layer material is stacked in the middle region of the pixel unit. More obvious.
  • the lyophilic material on the first side in the longitudinal direction L plays a more important role than the lyophobic material on the second side, that is, the solute
  • the attraction effect is greater than the repulsion effect, causing the solute to climb on the side.
  • the situation in the transverse direction T is just the opposite.
  • the lyophobic material on the second side plays a more important role than the lyophilic material on the first side, that is, the repellent effect on the solute is greater than the attraction effect on both sides of the pixel unit.
  • the solute is repelled by the side, and thus accumulates in the middle region away from the side.
  • the thickness uniformity of the functional layer in the longitudinal L and transverse T can be determined according to the design widths L 0 and T 0 of the pixels in the longitudinal L and transverse T, and then in which direction needs to be adjusted. Solute migration, so that solute migration in different directions is consistent.
  • L 0 ⁇ 135 ⁇ m and T 0 ⁇ 80 ⁇ m L 1 / L 0 ⁇ 85% and T 1 / T 0 ⁇ 87.5% can be calculated. That is, the thickness uniformity in the transverse direction T is greater than the thickness nonuniformity in the longitudinal direction L, T 1 / T 0 > L 1 / L 0 . Therefore, the solute migration effect in the longitudinal direction L can be adjusted, for example, reducing the attraction effect of the lyophilic material in the longitudinal direction L and increasing the repellent effect of the lyophobic material.
  • L 0 ⁇ 128 ⁇ m and T 0 ⁇ 80 ⁇ m L 1 / L 0 ⁇ 90% and T 1 / T 0 ⁇ 87.5% can be calculated. That is, the thickness uniformity in the transverse direction T is lower than the thickness uniformity in the longitudinal direction L, T 1 / T 0 ⁇ L 1 / L 0 . Therefore, the solute migration effect of the lateral T can be adjusted, such as reducing the repellent effect of the lyophobic material and increasing the attraction of the lyophilic material in the lateral T.
  • the area ratio of the first surface to the second surface of the first pixel defining layer facing the first opening in the transverse direction T can be increased to redistribute the surface tension of the solution during the drying process, so that the solute migration in the transverse direction T and the longitudinal direction can be increased.
  • Determining the area ratio of the first surface to the second surface also needs to consider multiple factors such as the composition of the solution, the material of the first pixel defining layer, and the slope angle of the side.
  • a slope angle of a side of the first pixel defining layer facing the first opening is in a range of 30 degrees to 90 degrees.
  • the area ratio of the first surface to the second surface may also be reflected by the size of the teeth.
  • the size of the teeth can be determined according to the resolution of the formed display panel.
  • the resolution of the display panel determines the pixel size (that is, the size of the first opening) and the pitch, that is, the structure of the pixel defining layer, for example, the size of the pixel defining unit (ie, PDL1).
  • the following uses the long side as an example to describe how to determine the size of the teeth.
  • the minimum size of PDL2 that guarantees no overflow is D 2
  • the slope angles of PDL1 and PDL2 facing the opening are 90 degrees
  • the maximum size of the teeth is (D 1 -D 2 ) / 2.
  • the cell size of PDL1 is 40 ⁇ m.
  • the adjustable size range (ie, the range from zero to the maximum size) of the teeth in the pixel definition layer PDL1 of different resolutions may be different.
  • the adjustable size range of the teeth in PDL1 also depends on the slope angle of PDL1 and PDL2 facing the opening.
  • the minimum size of PDL2 that ensures no overflow is also different. That is, the adjustable size range of the teeth in PDL1 also depends on the wet process used.
  • a display device including the foregoing display panel is also provided.
  • the display device may be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.

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Abstract

本公开涉及一种像素界定结构和显示面板及其制备方法、显示装置。像素界定结构包括：具有第一开口的第一像素界定层，位于基板上，所述第一像素界定层包括由第一亲疏材料形成的第一部分和由第二亲疏材料形成的第二部分，所述第一部分和所述第二部分在基板表面上的投影不交叠，所述第一像素界定层面向第一开口的侧面包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面，其中，所述第一亲疏材料与所述第二亲疏材料的亲疏性不同。

Description

像素界定结构和显示面板及其制备方法、显示装置
相关申请的交叉引用
本申请是以CN申请号为201811010429.3，申请日为2018年8月31日的申请为基础，并主张其优先权，该CN申请的公开内容在此作为整体引入本申请中。
技术领域
本公开涉及显示技术领域，特别涉及像素界定结构和显示面板及其制备方法、显示装置。
背景技术
随着显示技术的快速发展，人们对显示产品的性能要求越来越高。显示面板作为显示产品的重要组成部分，受到了广泛的关注。
在显示面板的制备过程中，尤其是在利用喷墨打印等湿法工艺制备功能层薄膜的过程中，需要通过干燥工艺去除多余的溶剂。干燥工艺会导致形成的薄膜厚度不均，进而影响器件的寿命和显示效果。
相关的湿法制备工艺采用双层像素界定层(PDL)结构来减小干燥工艺导致的薄膜的厚度不均匀性。
发明内容
根据本公开实施例的第一方面，提供了一种像素界定结构，包括：具有第一开口的第一像素界定层，位于基板上，所述第一像素界定层包括由第一亲疏材料形成的第一部分和由第二亲疏材料形成的第二部分，所述第一部分和所述第二部分在基板表面上的投影不交叠，所述第一像素界定层面向第一开口的侧面包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面，其中，所述第一亲疏材料与所述第二亲疏材料的亲疏性不同。
在一些实施例中，所述第一部分为亲液部分，所述第二部分为疏液部分，所述亲液部分靠近所述第一开口的一侧包括齿形结构，所述疏液部分位于所述齿形结构的齿之间，且在所述齿的延伸方向上所述疏液部分不超出所述亲液部分。
在一些实施例中，所述齿形结构为矩形齿结构，所述第一侧面和所述第二侧面均为矩形。
在一些实施例中，所述像素界定结构还包括：具有第二开口的第二像素界定层，位于所述第一像素界定层远离所述基板的一侧，所述第二像素界定层由所述第二亲疏材料形成，所述第二像素界定层在所述基板表面上的投影被所述第一像素界定层在所述基板表面上的投影完全覆盖，所述第二开口与所述第一开口的位置对应，且所述第二开口在所述基板表面上的投影完全覆盖所述第一开口在所述基板表面上的投影。
在一些实施例中，所述第一亲疏材料包括SiO 2。
在一些实施例中，所述第二亲疏材料包括氟脂材料。
在一些实施例中，所述面向第一开口的侧面的坡度角为30度-90度。
在一些实施例中，所述第一像素界定层为具有多个第一开口的网状结构，且所述第一像素界定层的所有面向第一开口的侧面均包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面。
在一些实施例中，所述第一像素界定层中所述第一部分和所述第二部分的高度相同。
在一些实施例中，所述第一像素界定层中的所述第二部分和所述第二像素界定层中的第二亲疏材料为一体，所述第二亲疏材料为疏液材料。
在一些实施例中，所述第二像素界定层面向所述第二开口的侧面的坡度角为30度-90度。
根据本公开实施例的第二方面，提供了一种包括前述像素界定结构的显示面板。
根据本公开实施例的第三方面，提供了一种包括前述显示面板的显示装置。
根据本公开实施例的第四方面，提供了一种像素界定结构的制备方法，包括：在基板上形成具有第一开口的第一像素界定层，所述第一像素界定层包括由第一亲疏材料形成的第一部分和由第二亲疏材料形成的第二部分，所述第一部分和所述第二部分在基板表面上的投影不交叠，所述第一像素界定层面向所述第一开口的侧面包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面，其中，所述第一亲疏材料与所述第二亲疏材料的亲疏性不同。
在一些实施例中，所述制备方法还包括在所述第一像素界定层上形成第二像素界定层，其中，形成所述第一像素界定层和第二像素界定层包括：在所述基板上形成第 一亲疏材料层；图案化所述第一亲疏材料层，以形成所述第一像素界定层的所述第一部分；在图案化的第一亲疏材料层的基础上形成第二亲疏材料层；图案化所述第二亲疏材料层，以形成所述第一像素界定层的所述第二部分和所述第二像素界定层，其中，所述第二像素界定层具有第二开口，所述第二像素界定层在基板表面上的投影被所述第一像素界定层在所述基板表面上的投影完全覆盖，所述第二开口与所述第一开口的位置对应，且所述第二开口在所述基板表面上的投影完全覆盖所述第一开口在所述基板表面上的投影。
在一些实施例中，所述第一部分为亲液部分，所述制备方法还包括：根据在所述第一开口处待形成的功能层在所述亲液部分的攀爬速度确定所述第一侧面与所述第二侧面的面积比。
在一些实施例中，所述第一侧面与所述第二侧面的面积比与所述攀爬速度成反比。
根据本公开实施例的第五方面，提供了一种显示面板的制备方法，包括：前述像素界定结构的制备方法。
在一些实施例中，所述像素界定结构围成用于形成功能层的开口，所述开口包括第一开口，所述制备方法还包括：利用喷墨打印在所述开口内形成包含所述功能层的材料的溶液。
通过以下参照附图对本公开的实施例的详细描述，本公开的其它特征及其优点将会变得清楚。
附图说明
构成说明书的一部分的附图描述了本公开的实施例，并且连同说明书一起用于解释本公开的原理。
参照附图，根据下面的详细描述，可以更加清楚地理解本公开，其中：
图1是示出根据本公开一个实施例的像素界定结构的俯视图；
图1A是图1所示的像素界定结构的一部分的俯视图；
图1B和1C是分别沿图1A所示的俯视图中线AA'和BB'截取的像素界定结构的截面图；
图1D是沿图1B所示的截面图中线CC'截取的像素界定结构的剖面图；
图2A是示出根据本公开另一个实施例的像素界定结构的俯视图；
图2B和2C是分别沿图2A所示的俯视图中线aa'和bb'截取的像素界定结构的截面图；
图2D是沿图2B所示的截面图中线cc'截取的像素界定结构的剖面图；
图3A是示出根据本公开又一个实施例的像素界定结构的俯视图；
图3B和3C是分别沿图3A中的线AA'和BB'截取的像素界定结构的截面图；
图3D是沿图3B中的线CC'截取的像素界定结构的剖面图；
图4A是示出根据本公开一个实施例的像素界定结构的制备方法的流程图；
图4B是示出根据本公开另一个实施例的像素界定结构的制备方法的流程图；
图5是示出根据本公开一个实施例的显示面板的制备方法的流程图；
图6是示出根据本公开一个实施例在形成第一亲疏材料层后的截面图；
图7A是示出根据本公开一个实施例在图案化第一亲疏材料层后的俯视图；
图7B是沿图7A中的线AA'截取的像素界定结构的截面图；
图8是示出根据本公开一个实施例在形成第二亲疏材料层后的截面图；
图9A、9B分别示出一个像素单元内功能层在纵向L和横向T上的厚度分布图；
图10A、10B分别示出根据本公开一些实施例在一个像素单元内功能层在纵向L和横向T上的厚度分布图。
应当明白，附图中所示出的各个部分的尺寸并不是按照实际的比例关系绘制的。此外，相同或类似的参考标号表示相同或类似的构件。
具体实施方式
现在将参照附图来详细描述本公开的各种实施例。对实施例的描述仅仅是说明性的，决不作为对本公开及其应用或使用的任何限制。本公开可以以许多不同的形式实现，不限于这里所述的实施例。提供这些实施例是为了使本公开透彻且完整，并且向本领域技术人员充分表达本公开的范围。应注意到：除非另外具体说明，否则在这些实施例中阐述的部件和步骤的相对布置应被解释为仅仅是示意性的，而不是作为限制。
本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的部分。“包括”等类似的词语意指在该词前的要素涵盖在该词后列举的要素，并不排除也涵盖其他要素的可能。“上”、“下”、“左”、“右”等仅用于表示相对位置关系，当被描述对象的绝对位置改变后，则该相对位置 关系也可能相应地改变。
在本公开中，当描述到特定元件位于第一元件和第二元件之间时，在该特定元件与第一元件或第二元件之间可以存在居间元件，也可以不存在居间元件。
本公开使用的所有术语(包括技术术语或者科学术语)与本公开所属领域的普通技术人员理解的含义相同，除非另外特别定义。还应当理解，在诸如通用字典中定义的术语应当被解释为具有与它们在相关技术的上下文中的含义相一致的含义，而不应用理想化或极度形式化的意义来解释，除非这里明确地这样定义。
对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论，但在适当情况下，所述技术、方法和设备应当被视为说明书的一部分。
相关的湿法制备工艺仍然很难保证形成的薄膜的厚度均匀。
为此，本公开提出一种能够改善通过湿法工艺制备的薄膜厚度的均匀性的技术方案。
根据本公开一些实施例，像素界定结构包括具有第一开口的第一像素界定层。第一像素界定层位于基板上。第一像素界定层包括由第一亲疏材料形成的第一部分和由第二亲疏材料形成的第二部分。第一部分和第二部分在基板表面上的投影不交叠。第一像素界定层面向第一开口的侧面包括由第一亲疏材料形成的第一侧面和由第二亲疏材料形成的第二侧面。第一亲疏材料与第二亲疏材料的亲疏性不同。
根据本公开另一些实施例，像素界定结构还包括具有第二开口的第二像素界定层。第二像素界定层位于第一像素界定层远离基板的一侧，由第二亲疏材料形成。第二像素界定层在基板表面上的投影被第一像素界定层在基板表面上的投影完全覆盖，第二开口与第一开口的位置对应，且第二开口在基板表面上的投影完全覆盖第一开口在基板表面上的投影。
图1是示出根据本公开一个实施例的像素界定结构的俯视图。
图1示出第一像素界定层PDL1、第二像素界定层PDL2在基板100上沿纵向L和横向T的分布。
图1A是图1所示的像素界定结构的一部分(包括两个像素界定单元)的俯视图。图1B和1C是分别沿图1A中的线AA'和BB'截取的像素界定结构的截面图。图1D是沿图1B中的线CC'截取的像素界定结构的剖面图。
图1A示出第一像素界定层PDL1、第二像素界定层PDL2在基板100上沿纵向L的 分布。如图1B所示，第一像素界定层PDL1具有第一开口110，第二像素界定层PDL2具有第二开口210。第二开口210与第一开口110的位置对应，且第二开口210在基板表面上的投影完全覆盖第一开口110在基板表面上的投影。例如，第二开口210与第一开口110的位置对应且中心基本重叠，且第二开口210大于第一开口110。
第一像素界定层PDL1面向第一开口110的侧面包括第一侧面SF1和第二侧面SF2，分别如图1B和1C所示。第一侧面SF1与第二侧面SF2在基板100的表面上的投影P1和P2没有交线，如图1D所示。第一侧面SF1由第一亲疏材料(例如亲液材料)形成，而第二侧面SF2由第二亲疏材料(例如疏液材料)形成。在一些实施例中，亲液材料包括SiO 2，疏液材料包括氟脂材料。
如图1B和1C所示，第一像素界定层PDL1位于基板100上。第二像素界定层PDL2在基板表面上的投影被第一像素界定层PDL1在基板表面上的投影完全覆盖。例如，第二像素界定层PDL2部分覆盖第一像素界定层PDL1。
如图1C所示，第一像素界定层PDL1包括由第一亲疏材料形成的第一部分(例如亲液部分)120和由第二亲疏材料形成的第二部分(例如疏液部分)130。在一些实施例中，第一部分120和第二部分130的高度相同。如图1D所示，第一部分120和第二部分130在基板表面上的投影不交叠。
第二像素界定层PDL2由第二亲疏材料形成，例如与PDL1包括同一种第二亲疏材料。在一些实施例中，第二像素界定层PDL2中的第二亲疏材料与第一像素界定层PDL1的第二部分130中的第二亲疏材料是一体的，例如都是疏液材料。PDL2由疏液材料形成或者其表面包括疏液材料，可以防止利用湿法工艺制备功能层的过程中发生溢流，从而有效防止相邻像素间的串色。
图1D示出沿图1B所示的截面图中线CC'截取的第一像素界定层PDL1的剖面图。第一部分120为亲液部分，第二部分130为疏液部分。亲液部分120靠近第一开口110的一侧包括齿形结构。疏液部分130位于齿形结构的齿之间。在齿的延伸方向上，疏液部分130不超出亲液部分120。如图1D所示，面向第一开口的侧面在基板100的表面上的投影P1和P2呈齿形，其中在齿的延伸方向上，亲液部分120比疏液部分130更长。在一些实施例中，齿形结构为矩形齿结构。图1D示出第一像素界定层PDL1面向第一开口110的侧面为矩形齿状，其中，第一侧面SF1和第二侧面SF2均为矩形。
在另一些实施例中，第一像素界定层PDL1面向第一开口110的侧面为平面状。 即，第一侧面与第二侧面共平面，第一侧面与第二侧面在基板100的表面上的投影呈直线形。
在上述实施例中，将第一像素界定层设计为面向第一开口的侧面包括由亲液绝缘材料形成的第一侧面和由疏液绝缘材料形成的第二侧面，可以显著改善形成的薄膜厚度的均匀性。
图2A是示出根据本公开另一个实施例的像素界定结构的俯视图。图2B和2C是分别沿图2A中的线aa'和bb'截取的像素界定结构的截面图。图2D是沿图2B中的线cc'截取的像素界定结构的剖面图。
图2A示出第二像素界定层PDL2'和基板100。如图2B所示，第一像素界定层PDL1'具有第一开口110'，第二像素界定层PDL2'与第一像素界定层PDL1'的开口相同。
第一像素界定层PDL1'面向第一开口110'的侧面包括第一侧面SF1'和第二侧面SF2'，分别如图2B和2C所示。如图2B和2C所示，第二像素界定层PDL2'完全覆盖第一像素界定层PDL1'。与图1C类似，图2C中的第一像素界定层PDL1'也包括亲液部分120'和疏液部分130'，区别在于疏液部分与亲液部分的体积比更大。
图2D示出沿图2B所示的截面图中线cc'截取的第一像素界定层PDL1'的剖面图。如图2D所示，第一侧面SF1'与第二侧面SF2'在基板100的表面上的投影P1'和P2'呈直线形，即第一侧面与第二侧面共平面。
在一些实施例中，第一像素界定层和第二像素界定层均为具有多个开口的网状结构。例如，第一像素界定层为具有多个第一开口的网状结构，且第一像素界定层的所有面向第一开口的侧面均包括由第一亲疏材料形成的第一侧面和由第二亲疏材料形成的第二侧面。第二像素界定层为具有多个第二开口的网状结构。
第一像素界定层面向第一开口的侧面的坡度角可以在30度-90度的范围内。第二像素界定层面向第二开口的侧面的坡度角为30度-90度。
图3A是示出根据本公开又一个实施例的像素界定结构的俯视图。图3A与图1A示出的俯视图是相同的，因此用同样的附图标记来表示类似的结构。图3B和3C是分别沿图3A中的线AA'和BB'截取的像素界定结构的截面图。图3D是沿图3B中的线CC'截取的像素界定结构的剖面图。图3B与图1B示出的截面图也是相同的。对于相同之处不再赘述，下面将详细描述不同的图3C和图3D。
与图1C不同的是，从图3C仅能看到第一像素界定层PDL1”的疏液部分130”， 而看不到第一像素界定层PDL1”的亲液部分120”。
图3D是沿图3B中的线CC'截取的第一像素界定层PDL1”的剖面图。如图3D所示，亲液部分120”和疏液部分130”为交替设置的条形结构，其中，在条形的延伸方向上，亲液部分120”比疏液部分130”更长。类似于与图1D，第一像素界定层PDL1”面向第一开口的侧面在基板100的表面上的投影P1和P2也呈齿形。
图4A是示出根据本公开一个实施例的像素界定结构的制备方法的流程图。下面结合图1A-1D和2A-2D来描述图4A中的步骤S1-S2。
在步骤S1中，在基板上形成第一像素界定层，第一像素界定层具有第一开口，例如形成图1D和2D所示的第一像素界定层。如前所述，第一像素界定层包括第一部分和第二部分，第一部分和第二部分在基板表面上的投影不交叠，第一像素界定层面向所述第一开口的侧面包括由第一亲疏材料形成的第一侧面和由第二亲疏材料形成的第二侧面，其中，第一亲疏材料与第二亲疏材料的亲疏性不同。第一开口处用于形成功能层。
在步骤S2中，在第一像素界定层上形成第二像素界定层，例如形成图1A-1C和2A-2C所示的结构。如前所述，第二像素界定层具有第二开口。第二像素界定层在基板表面上的投影被第一像素界定层在基板表面上的投影完全覆盖。第二开口与第一开口的位置对应，且第二开口在基板表面上的投影完全覆盖第一开口在基板表面上的投影。
在一些实施例中，像素界定结构的制备方法还包括：步骤S3，根据在第一开口处待形成的功能层在第一部分(即亲液部分)的攀爬速度确定第一侧面与所述第二侧面的面积比。后面将结合图5来描述步骤S3。
图4B是示出根据本公开另一个实施例的像素界定结构的制备方法的流程图。下面结合图6-8来描述图4B中的步骤S11-S14。图6示出根据本公开一个实施例在形成第一亲疏材料层后的截面图。图7A是示出根据本公开一个实施例在图案化第一亲疏材料层后的俯视图；图7B是沿图7A中的线AA'截取的像素界定结构的截面图。图8是示出根据本公开一个实施例在形成第二亲疏材料层后的截面图。
在步骤S11中，在基板100上形成第一亲疏材料层300，形成如图6所示的结构。在一些实施例中，通过旋涂或蒸镀工艺形成第一亲疏材料层。如前所述，第一亲疏材料层可以包括SiO 2。
在步骤S12中，图案化第一亲疏材料层300，以形成第一像素界定层的第一部分(例如亲液部分)，例如形成图7A和7B所示的结构。图案化的第一亲疏材料层300靠近开口310的一侧包括齿形结构。如图7A所示，第一亲疏材料层300面向开口310的侧面在基板100上的投影为齿形。即，第一亲疏材料层面向开口的侧面为凸起310P与凹陷310C交替设置的面。在一些实施例中，图案化工艺包括光刻工艺，例如利用掩膜对第一亲疏材料层进行曝光显影，形成齿状的第一亲疏材料层。
在步骤S13中，在图案化的第一亲疏材料层300的基础上形成第二亲疏材料层400，形成例如图8所示的结构。如图8所示，第二亲疏材料层400的一部分填充开口310，另一部分覆盖第一亲疏材料层300(第一像素界定层的亲液部分)。在一些实施例中，通过旋涂或蒸镀工艺形成第二亲疏材料层。如前所述，第二亲疏材料层可以包括氟脂材料。
在步骤S14中，图案化第二亲疏材料层400，以在开口310的对应位置形成第一开口和第二开口，从而形成具有第一开口的第一像素界定层和具有第二开口的第二像素界定层，例如形成如图1B或2B所示的结构。图1B和图2B中，第二开口在基板表面上的投影均完全覆盖第一开口在基板表面上的投影。具体地，图1B示出第二开口大于第一开口；而图2B示出第二开口与第一开口的大小基本相同。如前所述，第一像素界定层面向第一开口的侧面包括由第一亲疏材料形成的第一侧面和由第二亲疏材料形成的第二侧面。
在步骤S14中可以采用与步骤S12中类似的图案化工艺，例如利用掩膜对第二亲疏材料进行曝光显影，区别在于，采用与步骤S12中不同的掩膜。采用不同的掩膜可以形成不同的第一开口和第二开口，从而可以形成不同的第一像素界定层和第二像素界定层。
在一些实施例中，采用一种掩膜形成如图1A-1D所示的第一像素界定层PDL1和第二像素界定层PDL2，其中，第二开口210大于第一开口110，第二像素界定层PDL2部分覆盖第一像素界定层PDL1。
在另一些实施例中，采用另一种掩膜形成如图2A-2D所示的第一像素界定层PDL1'和第二像素界定层PDL2'，其中，第二开口210'等于第一开口110'，第二像素界定层PDL2'完全覆盖第一像素界定层PDL1'。
根据本公开的实施例，还提供了一种包括前述像素界定结构的显示面板及其制备 方法。
图5是示出根据本公开的另一个实施例的显示面板的制备方法的流程图。图5中的步骤S11、S12、S13、S14与图4B中的相应步骤类似，因此下面将不再重复描述，而仅详细描述步骤S21、S22和S3。
在步骤S21中，利用湿法工艺在开口内形成包含功能层材料的溶液，像素界定结构围成用于形成功能层的开口，开口包括第一开口。在一些实施例中，湿法工艺包括喷墨打印工艺。在利用喷墨打印形成包含功能层材料的溶液时，墨水可以通过相应功能层材料作为溶质溶于芳香族溶剂来形成。
功能层例如为发光层、空穴注入层、空穴传输层或电子阻挡层。作为示例，上述各功能层可以选择如下材料。例如，发光层的材料可以选择例如聚对苯乙烯、聚噻吩、聚芴等。空穴传输层的材料可以选择PEDOT/PSS(掺杂聚苯胺)。电子阻挡层的材料可以选择Ir(ppz)3(Tris(phenylpyrazole)iridium；三(1-基吡唑)合铱)。
在步骤S22中，对包含功能层材料的溶液进行干燥处理。在一些实施例中，在真空腔中对溶液进行干燥处理，例如进行抽真空处理。根据不同的功能层材料，采用不同参数(例如温度、时间、真空度等)干燥后，可以在第一开口对应的位置得到相应的功能层。作为像素的组成部分，这些功能层的厚度均匀性将显著影响显示效果。每个像素单元位于一个第一开口中。
在得到相应的功能层后，可以测量功能层在不同方向的厚度。图9A、9B分别示出一个像素单元内功能层在纵向L和横向T上的厚度分布，其中横轴表示像素单元的宽度(即像素宽度)，纵轴表示功能层的厚度(即薄膜厚度)。图9A、9B采用的第一像素界定层仅由亲水材料构成。
根据发光器件(例如OLED)的发光原理，期望功能层在整个像素宽度范围内厚度一致，都等于设计厚度。即期望的是：实际厚度在设计容差范围内的功能层对应的宽度(也称实际宽度)尽可能与设计宽度一样大，设计容差指实际厚度与设计厚度之差在一定范围内是可容忍的。实际厚度在设计容差范围内的功能层认为是平坦的，可以用于计算实际宽度。
图9A、9B分别示出像素在纵向L和横向T上的设计宽度为L 0和T 0，实际宽度为L 1和T 1，其中设计容差为10nm。根据图9A、9B的数据，可以计算出L 1/L 0＝82％，T 1/T 0＝73％。这样的结果表示：在纵向L和横向T上的厚度均匀性都较低，且在横向T上的厚度均 匀性低于纵向L上的厚度均匀性，即T 1/T 0<L 1/L 0。
在前述实施例中，通过将第一像素界定层设计为面向第一开口的侧面包括由第一亲疏材料形成的第一侧面和由第二亲疏材料形成的第二侧面，则可以显著改善形成的薄膜厚度的均匀性，例如，能够达到L 1/L 0≈90％，T 1/T 0≈85％，并且使得在纵向L和横向T上的厚度均匀性接近，即L 1/L 0更接近T 1/T 0。
在另一些实施例中，还可以通过调整第一侧面与第二侧面的面积比来进一步改善功能层的厚度均匀性。得到的功能层的厚度均匀性可以反映在开口处待形成的功能层在亲液部分的攀爬速度。由此，可以在步骤S3中根据在开口处待形成的功能层在亲液部分的攀爬速度确定第一侧面与第二侧面的面积比。
例如，如果测量出的结果为T 1/T 0<L 1/L 0，即在横向T上的厚度均匀性低于纵向L上的厚度均匀性，则可以减小横向T上第一像素界定层面向第一开口的第一表面与第二表面的面积比，以使在干燥过程中溶液的表面张力重新分布，进而使得纵向和横向上的溶质迁移作用一致，尽量达到T 1/T 0＝L 1/L 0。这种情况下，可以减小第一表面的面积或增加第二表面的面积，或既减小第一表面的面积又增加第二表面的面积。
以图1-1D的第一侧面和第二侧面呈矩形齿状为例，可以在开口形状不变的情形下减小矩形齿的宽度，这样位于矩形齿顶部的第一侧面的面积将减小，而位于矩形齿根部的第二侧面的面积将相应增加。另外，第一像素界定层采用矩形齿的形状，对溶液会起到引流的作用，有助于进一步控制功能层的形貌。
类似地，如果测量出的结果为T 1/T 0>L 1/L 0，即在横向T上的厚度均匀性大于纵向L上的厚度不均匀性，则可以通过减小纵向L上第一像素界定层面向第一开口的第一表面与第二表面的面积比，以尽量达到T 1/T 0＝L 1/L 0。
根据本公开一些实施例，第一侧面与第二侧面的面积比与攀爬速度成反比。即，在某个方向上功能层材料在第一像素界定层的亲液部分的攀爬速度越快，则将该方向上的第一侧面与第二侧面的面积比调整为越小。通过减小纵向L或横向T上第一像素界定层面向第一开口的第一表面与第二表面的面积比，可以减弱功能层材料在第一像素界定层的侧面上的攀爬，从而进一步提高L 1/L 0或T 1/T 0，例如，能够达到L 1/L 0≈T 1/T 0≈90％。
图10A、10B分别示出根据本公开一些实施例在一个像素单元内功能层在纵向L和横向T上的厚度分布图。根据图10A、10B的数据，仍以设计容差为10nm为例，则 纵向L和横向T上的实际宽度分别为L 1≈115μm，T 1≈70μm。
比较图10A和10B，还可以看出：在纵向L上，功能层材料在第一像素界定层侧面上的攀爬比较明显；而在横向T上，功能层材料在像素单元的中间区域的堆积比较明显。
具体地，在纵向L上第一侧面上的亲液材料比第二侧面上的疏液材料起着更重要的作用，即在像素单元的两侧(第一像素界定层的侧面)上对溶质的吸引作用大于排斥作用，导致溶质在侧面上攀爬。在横向T上的情况正相反，第二侧面上的疏液材料比第一侧面上的亲液材料起着更重要的作用，即在像素单元的两侧上对溶质的排斥作用大于吸引作用，导致溶质被侧面排斥，从而堆积在远离侧面的中间区域。
这样的结果表示：在纵向L和横向T上功能层材料的溶质迁移作用不一致。在这种情况下，可以根据像素在纵向L和横向T上的设计宽度L 0和T 0，来确定在纵向L和横向T上功能层的厚度均匀性，并进而确定需要调整哪个方向上的溶质迁移，以使得不同方向上的溶质迁移作用一致。
例如，如果L 0≈135μm，T 0≈80μm，则可以计算出L 1/L 0≈85％，T 1/T 0≈87.5％。即，在横向T上的厚度均匀性大于纵向L上的厚度不均匀性，T 1/T 0>L 1/L 0。因此，可以调整纵向L上的溶质迁移作用，例如减小纵向L上亲液材料的吸引作用、增加疏液材料的排斥作用。即，可以减小纵向L上第一像素界定层面向第一开口的第一表面与第二表面的面积比，以尽量达到T 1/T 0＝L 1/L 0，且与在横向T上的溶质迁移作用趋于一致。
相反，如果L 0≈128μm，T 0≈80μm，则可以计算出L 1/L 0≈90％，T 1/T 0≈87.5％。即，在横向T上的厚度均匀性低于纵向L上的厚度均匀性，T 1/T 0<L 1/L 0。因此，可以调整横向T的溶质迁移作用，例如在横向T上减小疏液材料的排斥作用、增加亲液材料的吸引作用。可以增加横向T上第一像素界定层面向第一开口的第一表面与第二表面的面积比，以使在干燥过程中溶液的表面张力重新分布，进而使得横向T上的溶质迁移作用与纵向L上的一致，尽量达到T 1/T 0＝L 1/L 0。
确定第一表面与第二表面的面积比还需要考虑溶液的成分、第一像素界定层的材料及侧面的坡度角等多个因素。在一些实施例中，第一像素界定层面向第一开口的侧面的坡度角在30度-90度的范围内。
在第一像素界定层PDL1的亲液部分靠近第一开口的一侧包括齿形结构的像素界 定结构中，第一表面与第二表面的面积比也可以通过齿的尺寸来反映。齿的尺寸可以根据形成的显示面板的分辨率来确定。显示面板的分辨率决定了像素尺寸(即第一开口的大小)和节距，即决定了像素界定层的结构，例如决定了像素界定单元(即PDL1)的尺寸。下面以长边为例描述如何确定齿的尺寸。例如，假设像素节距为P，像素长边尺寸为D p，则像素界定单元PDL1的尺寸为D 1＝P-D p。假设在利用湿法工艺形成包含功能层材料的溶液时，保证不溢流的PDL2的最小尺寸为D 2，且PDL1和PDL2面向开口的坡度角都为90度，则齿的最大尺寸就是(D 1-D 2)/2。
例如，对于最大分辨率为160ppi(pixels per inch每英寸像素)的显示面板来说，以长边为例，设像素尺寸和节距分别为120μm和160μm，则PDL1的单元尺寸为40μm。假设在利用喷墨打印形成包含功能层材料的溶液时，保证不溢流的PDL2的最小尺寸为20μm，且PDL1和PDL2面向开口的坡度角都为90度，则齿的最大尺寸就是(40-20)/2＝10μm。
不同分辨率的像素界定层PDL1中齿的可调节尺寸范围(即从零到最大尺寸的范围)可能是不同的。分辨率越高，齿的可调节尺寸范围越大。
从上述内容还可以看出，PDL1中齿的可调节尺寸范围还取决于PDL1和PDL2面向开口的坡度角的大小。另外，对于制备功能层材料的不同湿法工艺，保证不溢流的PDL2的最小尺寸也是不同的。即，PDL1中齿的可调节尺寸范围还取决于采用的湿法工艺。
根据本公开实施例，还提供了一种包括前述显示面板的显示装置。在一些实施例中，显示装置可以为：手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
至此，已经详细描述了本公开的各种实施例。为了避免遮蔽本公开的构思，没有描述本领域所公知的一些细节。本领域技术人员根据上面的描述，完全可以明白如何实施这里公开的技术方案。
虽然已经通过示例对本公开的一些特定实施例进行了详细说明，但是本领域的技术人员应该理解，以上示例仅是为了进行说明，而不是为了限制本公开的范围。本领域的技术人员应该理解，可在不脱离本公开的范围和精神的情况下，对以上实施例进行修改或者对部分技术特征进行等同替换。本公开的范围由所附权利要求来限定。

Claims (19)

  1. 一种像素界定结构，包括：
    具有第一开口的第一像素界定层，位于基板上，所述第一像素界定层包括由第一亲疏材料形成的第一部分和由第二亲疏材料形成的第二部分，所述第一部分和所述第二部分在基板表面上的投影不交叠，所述第一像素界定层面向第一开口的侧面包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面，其中，所述第一亲疏材料与所述第二亲疏材料的亲疏性不同。
  2. 根据权利要求1所述的像素界定结构，其中，所述第一部分为亲液部分，所述第二部分为疏液部分，所述亲液部分靠近所述第一开口的一侧包括齿形结构，所述疏液部分位于所述齿形结构的齿之间，且在所述齿的延伸方向上所述疏液部分不超出所述亲液部分。
  3. 根据权利要求2所述的像素界定结构，其中，所述齿形结构为矩形齿结构，所述第一侧面和所述第二侧面均为矩形。
  4. 根据权利要求1所述的像素界定结构，还包括：
    具有第二开口的第二像素界定层，位于所述第一像素界定层远离所述基板的一侧，所述第二像素界定层由所述第二亲疏材料形成，所述第二像素界定层在所述基板表面上的投影被所述第一像素界定层在所述基板表面上的投影完全覆盖，所述第二开口与所述第一开口的位置对应，且所述第二开口在所述基板表面上的投影完全覆盖所述第一开口在所述基板表面上的投影。
  5. 根据权利要求1所述的像素界定结构，其中，所述第一亲疏材料包括SiO2。
  6. 根据权利要求1所述的像素界定结构，其中，所述第二亲疏材料包括氟脂材料。
  7. 根据权利要求1所述的像素界定结构，其中，所述面向第一开口的侧面的坡度角为30度-90度。
  8. 根据权利要求1所述的像素界定结构，其中，所述第一像素界定层为具有多个第一开口的网状结构，且所述第一像素界定层的所有面向第一开口的侧面均包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面。
  9. 根据权利要求1所述的像素界定结构，其中，所述第一像素界定层中所述第一部分和所述第二部分的高度相同。
  10. 根据权利要求4所述的像素界定结构，其中，所述第一像素界定层中的所述第二部分和所述第二像素界定层中的所述第二亲疏材料为一体，所述第二亲疏材料为疏液材料。
  11. 根据权利要求4所述的像素界定结构，其中，所述第二像素界定层面向所述第二开口的侧面的坡度角为30度-90度。
  12. 一种显示面板，包括根据权利要求1至11中任一项所述的像素界定结构。
  13. 一种显示装置，包括根据权利要求12所述的显示面板。
  14. 一种像素界定结构的制备方法，包括：
    在基板上形成具有第一开口的第一像素界定层，所述第一像素界定层包括由第一亲疏材料形成的第一部分和由第二亲疏材料形成的第二部分，所述第一部分和所述第二部分在基板表面上的投影不交叠，所述第一像素界定层面向第一开口的侧面包括由所述第一亲疏材料形成的第一侧面和由所述第二亲疏材料形成的第二侧面，其中，所述第一亲疏材料与所述第二亲疏材料的亲疏性不同。
  15. 根据权利要求14所述的制备方法，还包括在所述第一像素界定层上形成第二像素界定层，其中，形成所述第一像素界定层和第二像素界定层包括：
    在所述基板上形成第一亲疏材料层；
    图案化所述第一亲疏材料层，以形成所述第一像素界定层的所述第一部分；
    在图案化的第一亲疏材料层的基础上形成第二亲疏材料层；
    图案化所述第二亲疏材料层，以形成所述第一像素界定层的所述第二部分和所述第二像素界定层，其中，所述第二像素界定层具有第二开口，所述第二像素界定层在基板表面上的投影被所述第一像素界定层在所述基板表面上的投影完全覆盖，所述第二开口与所述第一开口的位置对应，且所述第二开口在所述基板表面上的投影完全覆盖所述第一开口在所述基板表面上的投影。
  16. 根据权利要求14所述的制备方法，其中，所述第一部分为亲液部分，所述制备方法还包括：
    根据在所述第一开口处待形成的功能层在所述亲液部分的攀爬速度确定所述第一侧面与所述第二侧面的面积比。
  17. 根据权利要求16所述的制备方法，其中，所述第一侧面与所述第二侧面的面积比与所述攀爬速度成反比。
  18. 一种显示面板的制备方法，包括：
    根据权利要求14至17中任一项所述的像素界定结构的制备方法。
  19. 根据权利要求18所述的制备方法，所述像素界定结构围成用于形成功能层的开口，所述开口包括第一开口，所述制备方法还包括：利用喷墨打印在所述开口内形成包含所述功能层的材料的溶液。
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