WO2020115112A3 - Procédé de formation de nanostructures sur une surface et système d'inspection de tranches - Google Patents

Procédé de formation de nanostructures sur une surface et système d'inspection de tranches Download PDF

Info

Publication number
WO2020115112A3
WO2020115112A3 PCT/EP2019/083632 EP2019083632W WO2020115112A3 WO 2020115112 A3 WO2020115112 A3 WO 2020115112A3 EP 2019083632 W EP2019083632 W EP 2019083632W WO 2020115112 A3 WO2020115112 A3 WO 2020115112A3
Authority
WO
WIPO (PCT)
Prior art keywords
water
inspection system
wafer inspection
optics
terminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2019/083632
Other languages
German (de)
English (en)
Other versions
WO2020115112A2 (fr
Inventor
Alexandra Pazidis
Martin Noah
Felix Lange
Florian Schapper
Claus Zahlten
Marcel Härtling
Aleksey Sidorenko
Salomé Vargas Ruiz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to KR1020217016878A priority Critical patent/KR102892503B1/ko
Priority to CN201980090032.6A priority patent/CN113366346B/zh
Publication of WO2020115112A2 publication Critical patent/WO2020115112A2/fr
Publication of WO2020115112A3 publication Critical patent/WO2020115112A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

L'invention concerne un procédé de formation de nanostructures (5) sur une surface dégagée (3) d'un substrat (1) cristallin, en particulier ionique, pour assurer la transmission de rayonnements se situant dans la plage de longueurs d'ondes de l'ordre de l'ultraviolet lointain/de l'ultraviolet du vide, ledit procédé comprenant : disposer d'une surface dégagée (3) du substrat (1), qui n'est pas orientée le long d'un plan réticulaire à énergie de surface minimale, et injecter un apport d'énergie (E) dans la surface dégagée (3) de manière à réarranger la surface dégagée (3) de sorte à former les nanostructures (5), l'apport d'énergie (E ) étant produit par exposition de la surface dégagée (3) à un rayonnement électromagnétique (4). L'invention concerne également un élément optique qui présente une surface (3) sur laquelle sont formées des nanostructures (5), ainsi qu'un système d'inspection de tranches.
PCT/EP2019/083632 2018-12-07 2019-12-04 Procédé de formation de nanostructures sur une surface et système d'inspection de tranches Ceased WO2020115112A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020217016878A KR102892503B1 (ko) 2018-12-07 2019-12-04 표면에 나노구조물을 형성하는 방법 및 웨이퍼 검사 시스템
CN201980090032.6A CN113366346B (zh) 2018-12-07 2019-12-04 具有晶片封端光学件的晶片检查系统

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102018221190.6A DE102018221190A1 (de) 2018-12-07 2018-12-07 Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und Wafer-Inspektionssystem
DE102018221190.6 2018-12-07

Publications (2)

Publication Number Publication Date
WO2020115112A2 WO2020115112A2 (fr) 2020-06-11
WO2020115112A3 true WO2020115112A3 (fr) 2020-08-13

Family

ID=68835195

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2019/083632 Ceased WO2020115112A2 (fr) 2018-12-07 2019-12-04 Procédé de formation de nanostructures sur une surface et système d'inspection de tranches

Country Status (4)

Country Link
KR (1) KR102892503B1 (fr)
CN (1) CN113366346B (fr)
DE (1) DE102018221190A1 (fr)
WO (1) WO2020115112A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12510692B2 (en) 2020-08-27 2025-12-30 Kla Corporation Protection of optical materials of optical components from radiation degradation
DE102021202848A1 (de) 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Optische Anordnung für den FUV/VUV-Wellenlängenbereich
DE102021203505A1 (de) 2021-04-09 2022-10-13 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zum Abscheiden mindestens einer Schicht, optisches Element und optische Anordnung
DE102022210037A1 (de) * 2022-09-23 2024-03-28 Carl Zeiss Smt Gmbh Anordnung zum Tempern mindestens eines Teilbereichs eines optischen Elementes
DE102022210514A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Herstellung einer fluoridischen Schutzbeschichtung für ein reflektives optisches Element
DE102022210513A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren zum Bilden einer Fluorid- oder Oxyfluoridschicht
DE102022210512A1 (de) 2022-10-05 2024-04-11 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Nachbehandlung einer Fluoridschicht für ein optisches Element für den VUV-Wellenlängenbereich

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235430A (ja) * 2000-02-25 2001-08-31 Nikon Corp 光学式検査装置および光学式表面検査装置
US20050006590A1 (en) * 2003-01-16 2005-01-13 Harrison Dale A. Broad band referencing reflectometer

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0921557A3 (fr) * 1997-09-30 2004-03-17 Siemens Aktiengesellschaft Formation de couche non homogène par utilisation d'un rideau protecteur de gas inerte
US6421127B1 (en) * 1999-07-19 2002-07-16 American Air Liquide, Inc. Method and system for preventing deposition on an optical component in a spectroscopic sensor
JP2002158267A (ja) * 2000-11-21 2002-05-31 Sanken Electric Co Ltd 半導体ウエハの検査法及び検査装置
KR20030076238A (ko) * 2001-04-17 2003-09-26 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 극자외선 투과 계면 구조체 및 극자외선 리소그래피 투사장치
CN1536101A (zh) * 2003-04-08 2004-10-13 微视科技股份有限公司 晶圆的电镀设备
DE102006044591A1 (de) * 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
WO2008074503A1 (fr) * 2006-12-21 2008-06-26 Carl Zeiss Smt Ag Élément optique d'émission
DE102008002193A1 (de) * 2007-08-29 2009-03-05 Carl Zeiss Smt Ag Optisches Element mit hydrophober Oberfläche und Projektionsbelichtungsanlage für die Immersionslithographie damit
JP5474891B2 (ja) 2011-08-12 2014-04-16 ギガフォトン株式会社 光源装置及びそれを用いた露光装置
DE102013102670A1 (de) * 2013-03-15 2014-10-02 Asml Netherlands B.V. Optisches Element und optisches System für die EUV-Lithographie sowie Verfahren zur Behandlung eines solchen optischen Elements
KR20150033416A (ko) * 2013-09-24 2015-04-01 삼성전기주식회사 집속 이온 빔 장치 및 샘플 제조방법
DE102014216118A1 (de) * 2014-08-13 2016-02-18 Carl Zeiss Smt Gmbh Vakuum-System, insbesondere EUV-Lithographiesystem, und optisches Element

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001235430A (ja) * 2000-02-25 2001-08-31 Nikon Corp 光学式検査装置および光学式表面検査装置
US20050006590A1 (en) * 2003-01-16 2005-01-13 Harrison Dale A. Broad band referencing reflectometer

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
HIRSCH E H ET AL: "Stress in porous thin films through absorption of polar molecules (and relevance to optical coatings)", JOURNAL OF PHYSICS D: APPLIED PHYSICS, INSTITUTE OF PHYSICS PUBLISHING LTD, GB, vol. 13, no. 11, 14 November 1980 (1980-11-14), pages 2081 - 2094, XP020011525, ISSN: 0022-3727, DOI: 10.1088/0022-3727/13/11/018 *
KANAKI ET AL.: "Theoretical study on the morpgology of MgF2 nanocrystals at finite temperature and pressure", SURFACE SCIENCE, vol. 632, 2015, pages 158 - 163, XP002797926 *
REITEROV ET AL.: "Influence of adsorbed films on the change in spectral transmission of fluoride crystal windows in the vacuum ultraviolet", SOVIET JOURNAL OF OPTICAL TECHNOLOGY, vol. 47, no. 5, 1980, pages 284 - 287, XP009519078 *

Also Published As

Publication number Publication date
CN113366346A (zh) 2021-09-07
KR20210097130A (ko) 2021-08-06
WO2020115112A2 (fr) 2020-06-11
DE102018221190A1 (de) 2020-06-10
CN113366346B (zh) 2023-06-20
KR102892503B1 (ko) 2025-12-01

Similar Documents

Publication Publication Date Title
WO2020115112A3 (fr) Procédé de formation de nanostructures sur une surface et système d'inspection de tranches
WO2020007398A3 (fr) Procédé et dispositif de nettoyage et de désinfection d'objets
CN104334198B (zh) 杀菌装置
WO2018066911A8 (fr) Module de caméra et procédé de fabrication de module de caméra
WO2015126982A3 (fr) Réacteur à ultra-violets très efficace
WO2015153856A3 (fr) Concentrateurs de rayonnement solaire, procédés de concentration de rayonnement solaire, et objectifs prismatiques de concentration de rayonnement solaire
WO2020115086A3 (fr) Élément optique de réflexion de rayonnements ultraviolets du vide et ensemble optique
WO2018191102A3 (fr) Imageur avec unité de focalisation de lentille
Prutchi Exploring Ultraviolet Photography: Bee Vision, Forensic Imaging, and Other NearUltraviolet Adventures with Your DSLR
WO2017144866A3 (fr) Capteur d'image et procédé destinés à un satellite en orbite géostationnaire
CA2535305A1 (fr) Chauffe-air a infrarouges
EP4365644A3 (fr) Lentilles ophtalmiques absorbant les uv et le visible à haute énergie
RU2016134840A (ru) Накопитель с переменной геометрией для уф-очистки воды
JP2019526078A5 (fr)
JP2017505227A5 (fr)
SG11201903702QA (en) Water treatment apparatus
CN104317038B (zh) 大像面高分辨率数码相机镜头
CN203718444U (zh) Led光源模组及包含其的led灯具
Panchuk et al. Stellar spectroscopy in ground-based ultraviolet. I: Observational technique
Taranova et al. JHKLM photometry for carbon stars
RU2542641C1 (ru) Сверхширокоугольная солнечно-слепая фотоприемная головка
WO2021014163A3 (fr) Lunettes
RU2008148710A (ru) Модульная комбинированная установка для обработки жидкости инфракрасным и ультрафиолетовым излучением тонкого слоя
CN203909379U (zh) 棱镜拼合式大口径吸收体的装夹工装
JPS57105761A (en) Device for fixing by flash

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19817219

Country of ref document: EP

Kind code of ref document: A2

ENP Entry into the national phase

Ref document number: 20217016878

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 2019817219

Country of ref document: EP

Effective date: 20210707

122 Ep: pct application non-entry in european phase

Ref document number: 19817219

Country of ref document: EP

Kind code of ref document: A2