WO2020217204A1 - Systèmes et procédés de fabrication additive de cibles de pulvérisation recyclables - Google Patents

Systèmes et procédés de fabrication additive de cibles de pulvérisation recyclables Download PDF

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Publication number
WO2020217204A1
WO2020217204A1 PCT/IB2020/053853 IB2020053853W WO2020217204A1 WO 2020217204 A1 WO2020217204 A1 WO 2020217204A1 IB 2020053853 W IB2020053853 W IB 2020053853W WO 2020217204 A1 WO2020217204 A1 WO 2020217204A1
Authority
WO
WIPO (PCT)
Prior art keywords
additive manufacturing
substrate
manufacturing system
deposition material
heat source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IB2020/053853
Other languages
English (en)
Inventor
Patrick Morse
Dean Plaisted
Nancy NORBERG
Paul Carter
Larry FERRIN
Shawn HUSSEY
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Junora Ltd
Original Assignee
Junora Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Junora Ltd filed Critical Junora Ltd
Publication of WO2020217204A1 publication Critical patent/WO2020217204A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20—Direct sintering or melting
    • B22F10/25—Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/20—Direct sintering or melting
    • B22F10/22—Direct deposition of molten metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/30—Process control
    • B22F10/36—Process control of energy beam parameters
    • B22F10/364—Process control of energy beam parameters for post-heating, e.g. remelting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/30—Process control
    • B22F10/38—Process control to achieve specific product aspects, e.g. surface smoothness, density, porosity or hollow structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/30—Process control
    • B22F10/32—Process control of the atmosphere, e.g. composition or pressure in a building chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F10/00—Additive manufacturing of workpieces or articles from metallic powder
    • B22F10/60—Treatment of workpieces or articles after build-up
    • B22F10/64—Treatment of workpieces or articles after build-up by thermal means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F12/00—Apparatus or devices specially adapted for additive manufacturing; Auxiliary means for additive manufacturing; Combinations of additive manufacturing apparatus or devices with other processing apparatus or devices
    • B22F12/22—Driving means
    • B22F12/226—Driving means for rotary motion
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/25—Process efficiency

Definitions

  • TITLE SYSTEMS AND METHODS FOR ADDITIVE MANUFACTURING OF
  • the present disclosure relates generally to systems and methods for additive manufacturing and recycling of sputtering targets.
  • Conventional sputtering target additive manufacturing typically involves spraying powder or wire-based materials into a solid on the surface of a substrate by using either kinetic and or thermal energy applied to the deposition material at some distance from the surface of the substrate.
  • Conventional spray processes by which solid deposition materials are formed on the surface of target material backing substrates can incorporate defects such as contaminants and or imperfections in the bulk deposition material in the form of binders, trapped gas, particulates, dislocations, and voids. Defects in deposition materials can affect the bulk deposition material properties such as the density, micro structure, thermal conductivity, electrical conductivity, yield strength, secondary electron yield, sputter yield, optical properties, and various other deposition material properties.
  • the original powder or wire deposition material yield is often lower than 70% which makes the process very costly for high purity precious metals especially when the targets are not easily recyclable.
  • an additive manufacturing system comprises heating an actively cooled sputtering target backing material substrate and corresponding deposition material with a focused concentrated heat source to change the state of the deposition material from a solid to a liquid melt pool, adhering the liquid melt pool to the backing material, and controlling the rate at which the liquid melt pool and the solid material it forms cools back down to the backing material temperature thereby allowing control of the grain structure.
  • the concentrated heat source can comprise photons, electrons, and or other high energy particle beams that can transfer thermal energy to the backing material and the deposition material.
  • the focused spot for the concentrated heat source is at least about 2 mm in diameter on the surface of the target backing material and or the melt pool.
  • the device that produces the concentrated heat source remains static while the substrate is translated within the vacuum chamber to allow the surface of the target backing material to be coated with target material.
  • the target deposition material is any metal, metallic compound, or ceramic that the be mechanically fed into the melt pool region on the surface of the actively cooled and moving target backing material.
  • the grain structure of the target deposition material is controlled by controlling the rate at which the material cools after deposition.
  • the concentrated heat source can be used to maintain higher temperatures for longer periods and/or be used to reheat the deposited material to specific temperatures in subsequent passes.
  • the rate at which the material cools and forms specific grains structures can be accurately controlled.
  • Figure 1 is a diagram of an exemplary additive manufacturing process in accordance with the present disclosure showing a target backing material that is comprised of a hollow cylinder that is water cooled on the interior surface of the hollow cylinder.
  • Figure 2 is a diagram of an exemplary additive manufacturing process in accordance with the present disclosure showing the hollow cylinder from the view point of the origin of a concentrated heat source.
  • Figure 3 is a diagram of an exemplary additive manufacturing substrate that has been formed by a sputtering process in accordance with the present disclosure.
  • the present disclosure provides systems and methods of additive manufacturing that reduce or eliminate defects in the bulk deposition material microstructure resulting from the additive manufacturing process, enables control of the grain structure that forms in the deposited target material, increases feed material yield, and enables recycling of used sputtering targets back to their original quality.
  • Depositing materials onto substrates with different coefficient of thermal expansion allows sputtering targets to be manufactured that cannot be manufactured with other processes such as casting, sintering, or hot isostatic pressing. Additive manufacturing also eliminates the need to use bonding layers between the target material and the backing material substrates that limit the final sputtering deposition process power due to the lower melting temperatures of bonding materials that must be used due to the different coefficients of thermal expansion between the substrate and the bonded target materials.
  • the vacuum environment reduces or eliminates the trapping of gasses within or reactions with the deposition materials during the phase change process required to bond the minimum deposition feature sizes together.
  • Existing in vacuum additive manufacturing processes typically minimize the melt pool size to enable higher resolution printing and smaller minimum feature sizes.
  • the minimization of the melt pool size limits the overall concentrated heat source power due to minimization of the concentrated heat source beam spot size.
  • the smaller melt pool and beam spot size limit the material deposition rates in these systems. Larger deposition rates can be achieved by increasing the minimum deposition spot size, but the deposition rate is then limited by the heat removal rate of the system and the minimum feature size requirements of the print.
  • additive manufacturing processes such as those disclosed herein take place on actively cooled target backing material substrates inside a vacuum system.
  • Depositing the target material onto actively cooled target backing material allows for higher deposition rates and for the customization of the grain structure of the deposited material. The rate at which the deposited target materials cool will determine the grain structure of the material that forms.
  • an additive manufacturing system comprises the steps of focusing a concentrated heat source onto a surface of an actively cooled substrate, heating the surface of the actively cooled substrate to a temperature that allows a deposition material to adhere to the substrate, melting the deposition material to form a liquid melt pool region on the surface of the substrate, moving the substrate in relation to the concentrated heat source to allow the liquid melt pool region to move out of the concentrated heat source and change the state of the deposition material at a controlled rate, heating of the deposition material outside the active melt pool to control a cooling rate and grain structure formation within the deposition material, and moving the substrate to form one or more solid continuous layers of the deposition material adhered onto the surface of the substrate.
  • the additive manufacturing system is located within a vacuum chamber.
  • the deposition material can be any of a metal, metallic compound, ceramic or other known or as yet unknown material and may be mechanically fed into the liquid melt pool region on the surface of the moving substrate.
  • the deposition takes place at a pressure less than 1 e-4 Torr.
  • the substrate can be configured as a hollow cylinder with the deposition material being deposited onto an exterior of the hollow cylinder and an interior surface of the hollow cylinder is actively cooled.
  • the substrate may be configured as a flat plate and the deposition material is deposited onto one surface and the opposite surface is actively cooled.
  • the concentrated heat source produces a focused spot size that is greater than about 2 mm in diameter and is comprised of at least one of an electron beam, a photon beam, or any other beam of high energy particles.
  • the liquid melt pool may be at least about 2 mm in diameter on the surface of the substrate.
  • the heat source may vary in size, intensity, and/or location as a function of time in reference to the liquid melt pool to wet the deposition material to the surface of the substrate without damaging the substrate.
  • the substrate is a used sputtering target with sputtering erosion grooves that can be refilled with deposited metal while maintaining a grain structure comparable to the original grain structure of the material when first deposited.
  • the substrate can be a used sputtering target with sputtering erosion grooves that the concentrated heat source uses to evaporate the material on the surface of the target prior to an annealing and grain size modification step followed by reapplying new deposition material to the surface.
  • material deposited into an erosion groove section at the ends of rotary cathode cylindrical targets is comprised of materials with a lower sputter yield and/or the material grain structure has been modified to reduce the sputter yield.
  • the deposition material is a wire with a diameter about 1 mm or greater.
  • the liquid melt pool is located proximate the top center on a rotating and translating hollow cylinder.
  • the concentrated heat source is used to modify a surface finish of the deposited metal by re-melting the surface of deposited deposition material without feeding wire into the focused heat source spot.
  • the concentrated heat source is used in conjunction with active cooling of the substrate to modify the grain structure of the deposition material after depositing one or more layers of deposition material.
  • the concentrated heat source can be used to simultaneously and/or independently heat the backing material (e.g. a hollow cylinder) to promote adhesion of the deposition material to the backing material, heat the deposition material to a state change temperature to form a melt pool on the surface to the target backing material, and add heat to the surface of the deposition material outside of the melt pool to control the rate of cooling to form the correct grain structure.
  • the backing material e.g. a hollow cylinder
  • an exemplary embodiment in accordance with the present disclosure of an additive manufacturing system 100 comprises a concentrated heat source 101 focusing a heat source beam 102 onto the melt pool region 103 where a wire feed system 104 is feeding wire 105 into the melt pool at the same time.
  • a target backing material 106 is a hollow cylinder supported by and rotated by a modified rotary cathode end block 107 on one end and an end support 108 on the other.
  • the modified rotary cathode end block 107 is designed to be attached to a translation rail 109 and run completely inside a vacuum chamber 110.
  • the translation rail 109 is used to move the modified rotary cathode end block 107 and the attached the rotating target backing material 106 either direction along the axis or rotation of the rotating target backing material 106 while the wire feed system 104, the concentrated heat source 101 , and the melt pool region 103 remain fixed in place.
  • the modified rotary cathode end block 107 also supplies and removes cooling water from the inside of the target backing material 106 to control the rate at which the material deposited in the melt pool region 103 will cool, and keeps the hollow cylinder at the correct voltage to work correctly with the concentrated heat source.
  • the focused concentrated heat source location, size, and intensity can be actively varied to heat the target backing material, the wire fed melt pool, and post deposition heating zone.
  • the target is rotated and the translated with the target backing material heating zone, melt pool zone, and poste deposition heating zone remaining static.
  • Figure 2 illustrates another exemplary embodiment in accordance with the present disclosure of an additive manufacturing system 100 showing just the target backing material 106 in the form of a hollow cylinder and the wire feed 105 from the viewpoint of the concentrated heat source.
  • the melt pool zone 103 is shown at top dead center of the target backing material 106 cylindrical surface.
  • the target backing material 106 is rotating in the direction shown by the rotation arrow 204.
  • the rotation of the target backing material 106 allows the concentrated heat source to focus the beam at the target backing material 106 before it reaches the melt pool zone 103 in the target backing material preheating zone 205 allowing the target backing material 106 in this zone to reach a temperature that allows the material in the melt pool zone 103 to adhere to the target backing material 106 when it rotates into the melt pool zone 103.
  • the target backing material 106 continuously rotates out the of the melt pool zone 103 the deposited material is cooling at the highest possible rate and to slow down the rate of cooling the concentrated heat source can apply heat into the cooling zone to slow the cooling rate and control the size of the grain structure that forms in the deposited material.
  • the translation direction arrow 207 shows the direction that the target backing material 106 can be translated in reference to the static heating zones 205 and 206 along with the static wire feed 105 location.
  • the translation directions 207 allow the material to be deposited in any helical or ring pattern as the target rotates in the rotation direction 204.
  • FIG 3 illustrates a cross section example of an additive manufacturing product 300 made with an additive manufacturing process in accordance with the present disclosure.
  • the additive manufacturing product 300 is composed of three parts: the target backing material 301 , which may be in the shape of a hollow cylinder (though other shapes are within the scope of the present disclosure), the remaining recyclable target material 302 left over after the end user sputters the usable material from the target backing material 301 , and the end user utilized target material 303 shaded in grey.
  • the end user utilized target material 303 typically compromises anywhere from about 60% to 85% of the total material deposited onto the target backing material 301.
  • Systems in accordance with the present disclosure are capable of replacing the end user utilized target material 303 on the surface of the remaining recyclable target material 302.
  • Material that has been eroded away in the sputtering process create erosion grooves 304 at both ends of the recyclable target material 302 and are typically the deepest erosion feature and require the most amount of material in a recycling application. Material from the erosion grooves 304 and the remaining target material can be used as the new substrate to reapply the material into the eroded target material zone. If the erosion groove 304 goes into the target backing material 301 and enough material is left remaining to maintain the structural rigidity required to mount the target backing material 301 to the modified rotary cathode in the additive manufacturing system it is possible to replace the target backing material 301 with the original material or with another material capable of providing sufficient strength to the target backing material to support the fully recycled target in the end users application.
  • some or all of the material in the erosion grooves 304 can be replaced with a material with a lower sputtering yield to improve the utilization of the utilized target material 303.
  • the material deposited into the erosion grooves 304 can have modified grain structures to reduce the erosion rate of the material in these zones in comparison to the remainder of the utilized target material 303.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

La présente invention concerne des systèmes et des procédés de fabrication additive qui réduisent ou éliminent des défauts dans la microstructure de matériau de dépôt en vrac résultant du processus de fabrication additive, permet la commande de la structure de grain qui se forme dans le matériau cible déposé, augmente le rendement du matériau d'alimentation et permet le recyclage de cibles de pulvérisation usagées à leur qualité d'origine. Le procédé de fabrication additive a lieu à l'intérieur d'une chambre à vide et utilise une source de chaleur concentrée pour faire fondre un matériau solide sur la surface d'un matériau de support de matériau cible refroidi activement. La source de chaleur concentrée est également utilisée conjointement avec le refroidissement actif pour commander la formation de structure de grain dans le matériau cible déposé.
PCT/IB2020/053853 2019-04-26 2020-04-23 Systèmes et procédés de fabrication additive de cibles de pulvérisation recyclables Ceased WO2020217204A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201962839095P 2019-04-26 2019-04-26
US62/839,095 2019-04-26

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WO2020217204A1 true WO2020217204A1 (fr) 2020-10-29

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117758219A (zh) * 2023-12-25 2024-03-26 西安航空学院 一种γ-TiAl合金靶材快速制造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070062809A1 (en) * 2005-09-21 2007-03-22 Soleras Ltd. Rotary sputtering target, apparatus for manufacture, and method of making
US20170182595A1 (en) * 2015-12-04 2017-06-29 Raytheon Company Composition and method for fusion processing aluminum alloy
US20180088343A1 (en) * 2016-09-29 2018-03-29 Nlight, Inc. Adjustable beam characteristics
US20180250744A1 (en) * 2017-03-02 2018-09-06 Velo3D, Inc. Three-dimensional printing of three-dimensional objects

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070062809A1 (en) * 2005-09-21 2007-03-22 Soleras Ltd. Rotary sputtering target, apparatus for manufacture, and method of making
US20170182595A1 (en) * 2015-12-04 2017-06-29 Raytheon Company Composition and method for fusion processing aluminum alloy
US20180088343A1 (en) * 2016-09-29 2018-03-29 Nlight, Inc. Adjustable beam characteristics
US20180250744A1 (en) * 2017-03-02 2018-09-06 Velo3D, Inc. Three-dimensional printing of three-dimensional objects

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117758219A (zh) * 2023-12-25 2024-03-26 西安航空学院 一种γ-TiAl合金靶材快速制造方法

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