WO2021019610A1 - 検査装置 - Google Patents
検査装置 Download PDFInfo
- Publication number
- WO2021019610A1 WO2021019610A1 PCT/JP2019/029471 JP2019029471W WO2021019610A1 WO 2021019610 A1 WO2021019610 A1 WO 2021019610A1 JP 2019029471 W JP2019029471 W JP 2019029471W WO 2021019610 A1 WO2021019610 A1 WO 2021019610A1
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- WO
- WIPO (PCT)
- Prior art keywords
- component
- inspection
- image
- substrate
- color
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/08—Monitoring manufacture of assemblages
- H05K13/081—Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines
- H05K13/0812—Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines the monitoring devices being integrated in the mounting machine, e.g. for monitoring components, leads, component placement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K13/00—Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
- H05K13/08—Monitoring manufacture of assemblages
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95638—Inspecting patterns on the surface of objects for PCB's
- G01N2021/95646—Soldering
Definitions
- FIG. 1 is a configuration diagram showing an outline of the configuration of the component mounting machine 10 of the present embodiment.
- FIG. 2 is a configuration diagram showing an outline of the configuration of the mark camera 50.
- FIG. 3 is a view A of the epi-illumination light source 53.
- FIG. 4 is a B view of the side emitting light source 55.
- FIG. 5 is a block diagram showing a configuration related to control of the component mounting machine 10.
- the left-right direction in FIG. 1 is the X-axis direction
- the front (front) rear (back) direction is the Y-axis direction
- the vertical direction is the Z-axis direction.
- the CPU 61 sets the monochromatic image having the maximum contrast C among the three monochromatic images as the inspection image (step S230), executes the mounting inspection using the set inspection image (step S240), and obtains the present. End the process.
- the image processing apparatus creates a histogram of the luminance value in each of the three monochromatic images, and the combination of the most frequent luminance values in each of the created histograms is used as the substrate color. It may be set. In this way, since the ratio of the substrate in the image is usually large, the substrate color can be easily specified by obtaining the combination of the most frequent luminance values in each histogram of the three monochrome images.
- the second inspection apparatus of the present disclosure acquires three monochromatic images of R, G, and B of the substrate, and in the acquired three monochromatic images, the electrode portion of the component and the periphery of the electrode having different reflectance from the electrode portion.
- the contrast in a predetermined region including at least a portion is calculated.
- the second inspection device sets the monochromatic image of the color component having the highest contrast among the three monochromatic images as the inspection image.
- the image captured by the optimum light source for distinguishing the electrode portion and the peripheral portion of the electrode can be used as an inspection image for the mounting inspection of the component, so that the inspection accuracy can be further improved.
- the circuit wiring of the substrate is formed of copper foil, and the component is mounted on the substrate so that the electrode portion comes into contact with the solder applied to the circuit wiring.
- the image processing apparatus calculates the contrast in a predetermined region including the electrode portion of the component and the solder and / or the circuit wiring as the electrode peripheral portion in each of the acquired three monochromatic images. May be. By doing so, it is possible to obtain a monochromatic image suitable for distinguishing the electrode portion of the component from the solder S and the circuit wiring (copper foil).
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- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- General Health & Medical Sciences (AREA)
- Pathology (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Immunology (AREA)
- Chemical & Material Sciences (AREA)
- Biochemistry (AREA)
- General Physics & Mathematics (AREA)
- Operations Research (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Signal Processing (AREA)
- Supply And Installment Of Electrical Components (AREA)
Abstract
Description
部品が実装された基板の検査用画像を用いて該部品の実装検査を行なう検査装置であって、
前記基板のR,G,Bの3つの単色画像を取得する撮像装置と、
前記取得された3つの単色画像の各輝度値により基板色を設定し、該設定した基板色の補色を算出し、該算出した補色の各色成分のうち輝度値が最も大きい色成分を決定し、前記取得された3つの単色画像のうち前記決定した色成分の単色画像を前記検査用画像に設定する画像処理装置と、
を備えることを要旨とする。
部品が実装された基板の検査用画像を用いて該部品の実装検査を行なう検査装置であって、
前記基板のR,G,Bの3つの単色画像を取得する撮像装置と、
前記取得された3つの単色画像において前記部品が有する電極部と該電極部と反射率が異なる電極周辺部とを少なくとも含む所定領域内におけるコントラストをそれぞれ算出し、前記3つの単色画像のうち前記コントラストが最も大きい色成分の単色画像を前記検査用画像に設定する画像処理装置と、
を備えることを要旨とする。
G'=(Max+Min)-G …(2)
B'=(Max+Min)-B …(3)
C=Lmax/Lmin …(5)
Claims (7)
- 部品が実装された基板の検査用画像を用いて該部品の実装検査を行なう検査装置であって、
前記基板のR,G,Bの3つの単色画像を取得する撮像装置と、
前記取得された3つの単色画像の各輝度値により基板色を設定し、該設定した基板色の補色を算出し、該算出した補色の各色成分のうち輝度値が最も大きい色成分を決定し、前記取得された3つの単色画像のうち前記決定した色成分の単色画像を前記検査用画像に設定する画像処理装置と、
を備える検査装置。 - 請求項1に記載の検査装置であって、
前記画像処理装置は、前記3つの単色画像において輝度値のヒストグラムをそれぞれ作成し、該作成した各ヒストグラムにおいて最頻の輝度値の組合せを前記基板色に設定する、
検査装置。 - 部品が実装された基板の検査用画像を用いて該部品の実装検査を行なう検査装置であって、
前記基板のR,G,Bの3つの単色画像を取得する撮像装置と、
前記取得された3つの単色画像において前記部品が有する電極部と該電極部と反射率が異なる電極周辺部とを少なくとも含む所定領域内におけるコントラストをそれぞれ算出し、前記3つの単色画像のうち前記コントラストが最も大きい色成分の単色画像を前記検査用画像に設定する画像処理装置と、
を備える検査装置。 - 請求項3に記載の検査装置であって、
前記画像処理装置は、前記部品の寸法を入力し、該入力した部品の寸法に基づいて前記所定領域として前記部品の外形よりも一回り大きな領域を設定して該領域内におけるコントラストを算出する、
検査装置。 - 請求項3に記載の検査装置であって、
前記画像処理装置は、前記所定領域として前記部品が有する複数の電極部のうちそれぞれ異なる電極部と電極周辺部とを含む複数の領域を設定し、領域ごとに前記検査用画像を設定する、
検査装置。 - 請求項3ないし5いずれか1項に記載の検査装置であって、
前記基板は、銅箔により回路配線が形成され、
前記部品は、前記回路配線に塗布された半田に前記電極部が接触するように前記基板に実装され、
前記画像処理装置は、前記取得された3つの単色画像において前記部品の電極部と前記電極周辺部としての前記半田および/または前記回路配線とを含む所定領域内におけるコントラストをそれぞれ算出する、
検査装置。 - 請求項1ないし6いずれか1項に記載の検査装置であって、
R,G,Bの3つの単色光を前記基板に対して独立して照射可能な照明装置を備え、
前記撮像装置は、前記照明装置から独立して照射される前記3つの単色光でそれぞれ前記基板を撮像することにより前記3つの単色画像を取得する単色カメラである、
検査装置。
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/629,757 US12216064B2 (en) | 2019-07-26 | 2019-07-26 | Inspection device |
| JP2021536455A JP7301973B2 (ja) | 2019-07-26 | 2019-07-26 | 検査装置 |
| EP19939279.6A EP4007480B1 (en) | 2019-07-26 | 2019-07-26 | Inspection device |
| PCT/JP2019/029471 WO2021019610A1 (ja) | 2019-07-26 | 2019-07-26 | 検査装置 |
| CN201980098594.5A CN114128418B (zh) | 2019-07-26 | 2019-07-26 | 检查装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2019/029471 WO2021019610A1 (ja) | 2019-07-26 | 2019-07-26 | 検査装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2021019610A1 true WO2021019610A1 (ja) | 2021-02-04 |
Family
ID=74229868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2019/029471 Ceased WO2021019610A1 (ja) | 2019-07-26 | 2019-07-26 | 検査装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US12216064B2 (ja) |
| EP (1) | EP4007480B1 (ja) |
| JP (1) | JP7301973B2 (ja) |
| CN (1) | CN114128418B (ja) |
| WO (1) | WO2021019610A1 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024009410A1 (ja) * | 2022-07-05 | 2024-01-11 | 株式会社Fuji | 部品有無判定方法および画像処理システム |
| WO2024189728A1 (ja) * | 2023-03-13 | 2024-09-19 | 株式会社Fuji | 検査装置および検査システム |
| WO2024232049A1 (ja) * | 2023-05-10 | 2024-11-14 | 株式会社Fuji | 生産支援装置および生産支援方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4198899B1 (en) * | 2021-12-15 | 2024-01-31 | Sick IVP AB | Method and arrangements for determining information regarding an intensity peak position in a space-time volume of image frames |
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2019
- 2019-07-26 EP EP19939279.6A patent/EP4007480B1/en active Active
- 2019-07-26 US US17/629,757 patent/US12216064B2/en active Active
- 2019-07-26 JP JP2021536455A patent/JP7301973B2/ja active Active
- 2019-07-26 CN CN201980098594.5A patent/CN114128418B/zh active Active
- 2019-07-26 WO PCT/JP2019/029471 patent/WO2021019610A1/ja not_active Ceased
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| JPS6486090A (en) * | 1987-09-29 | 1989-03-30 | Matsushita Electric Industrial Co Ltd | Inspection method for existence of substance |
| JPH1140983A (ja) | 1997-07-18 | 1999-02-12 | Matsushita Electric Ind Co Ltd | 基板マーク認識装置 |
| JPH11312898A (ja) * | 1998-02-27 | 1999-11-09 | Matsushita Electric Ind Co Ltd | 電子部品実装装置 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024009410A1 (ja) * | 2022-07-05 | 2024-01-11 | 株式会社Fuji | 部品有無判定方法および画像処理システム |
| JPWO2024009410A1 (ja) * | 2022-07-05 | 2024-01-11 | ||
| WO2024189728A1 (ja) * | 2023-03-13 | 2024-09-19 | 株式会社Fuji | 検査装置および検査システム |
| WO2024232049A1 (ja) * | 2023-05-10 | 2024-11-14 | 株式会社Fuji | 生産支援装置および生産支援方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7301973B2 (ja) | 2023-07-03 |
| CN114128418A (zh) | 2022-03-01 |
| US12216064B2 (en) | 2025-02-04 |
| CN114128418B (zh) | 2023-10-20 |
| US20220252524A1 (en) | 2022-08-11 |
| EP4007480A1 (en) | 2022-06-01 |
| JPWO2021019610A1 (ja) | 2021-02-04 |
| EP4007480B1 (en) | 2025-09-17 |
| EP4007480A4 (en) | 2022-08-03 |
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