WO2024183412A1 - 气体处理装置和气体处理方法 - Google Patents

气体处理装置和气体处理方法 Download PDF

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Publication number
WO2024183412A1
WO2024183412A1 PCT/CN2023/140737 CN2023140737W WO2024183412A1 WO 2024183412 A1 WO2024183412 A1 WO 2024183412A1 CN 2023140737 W CN2023140737 W CN 2023140737W WO 2024183412 A1 WO2024183412 A1 WO 2024183412A1
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WO
WIPO (PCT)
Prior art keywords
gas
mixing
cylinder
diameter
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2023/140737
Other languages
English (en)
French (fr)
Inventor
陈强
魏嘉
盛维武
李小婷
程永攀
李琳鸽
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
China Petroleum and Chemical Corp
Sinopec Engineering Group Co Ltd
Original Assignee
China Petroleum and Chemical Corp
Sinopec Engineering Group Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202310216392.4A external-priority patent/CN118615848B/zh
Priority claimed from CN202310216131.2A external-priority patent/CN118615847B/zh
Priority claimed from CN202310216418.5A external-priority patent/CN116492830A/zh
Application filed by China Petroleum and Chemical Corp, Sinopec Engineering Group Co Ltd filed Critical China Petroleum and Chemical Corp
Priority to JP2025544340A priority Critical patent/JP2026502714A/ja
Priority to KR1020257023875A priority patent/KR20250122516A/ko
Priority to EP23926106.8A priority patent/EP4613360A4/en
Publication of WO2024183412A1 publication Critical patent/WO2024183412A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
    • B01D47/021—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath by bubbling the gas through a liquid bath
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/02—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath
    • B01D47/025—Separating dispersed particles from gases, air or vapours by liquid as separating agent by passing the gas or air or vapour over or through a liquid bath by contacting gas and liquid with a static flow mixer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B01D53/185—Liquid distributors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/48—Sulfur compounds
    • B01D53/52—Hydrogen sulfide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B01D2257/302—Sulfur oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/30—Sulfur compounds
    • B01D2257/304—Hydrogen sulfide
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/40—Nitrogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0283—Flue gases
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10L—FUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G OR C10K; LIQUIFIED PETROLEUM GAS; USE OF ADDITIVES TO FUELS OR FIRES; FIRE-LIGHTERS
    • C10L2250/00—Structural features of fuel components or fuel compositions, either in solid, liquid or gaseous state
    • C10L2250/06—Particle, bubble or droplet size
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10L—FUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G OR C10K; LIQUIFIED PETROLEUM GAS; USE OF ADDITIVES TO FUELS OR FIRES; FIRE-LIGHTERS
    • C10L2290/00—Fuel preparation or upgrading, processes or apparatus therefore, comprising specific process steps or apparatus units
    • C10L2290/54—Specific separation steps for separating fractions, components or impurities during preparation or upgrading of a fuel
    • C10L2290/541—Absorption of impurities during preparation or upgrading of a fuel
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10L—FUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G OR C10K; LIQUIFIED PETROLEUM GAS; USE OF ADDITIVES TO FUELS OR FIRES; FIRE-LIGHTERS
    • C10L3/00—Gaseous fuels; Natural gas; Synthetic natural gas obtained by processes not covered by subclass C10G, C10K; Liquefied petroleum gas
    • C10L3/06—Natural gas; Synthetic natural gas obtained by processes not covered by C10G, C10K3/02 or C10K3/04
    • C10L3/10—Working-up natural gas or synthetic natural gas
    • C10L3/101—Removal of contaminants
    • C10L3/102—Removal of contaminants of acid contaminants
    • C10L3/103—Sulfur containing contaminants

Definitions

  • the present invention belongs to the technical field of gas processing, and in particular relates to a gas processing device and a gas processing method.
  • the storage medium often contains sulfur compounds, nitrogen compounds and fine particles.
  • a large amount of toxic and harmful gases will inevitably be produced. These toxic and harmful gases are not only harmful to people's health, but also cause serious damage to the ecological environment. Gas treatment equipment is needed to treat the toxic and harmful gases produced to ensure the operation of the production process.
  • the absorption towers of this structure are usually very high and have the disadvantage of being unstable. In windy weather, the absorption towers are prone to shaking, which poses an unsafe factor. In addition, it is difficult to improve the mass transfer efficiency, and the contact between the gas and liquid phases is not sufficient. The entire device has a large resistance drop and a large energy loss.
  • the purpose of the present invention is to provide a gas processing device to solve the problems of low mass transfer efficiency and insufficient gas-liquid two-phase contact, and greatly reduce the scale and cost of the device.
  • the present invention adopts the following technical solution:
  • a gas processing device comprises a cylinder, an upper end cap connected to the upper end of the cylinder, and a lower end cap connected to the lower end of the cylinder, wherein:
  • a liquid inlet pipe is provided at a position of the cylinder body close to the upper sealing head, a liquid outlet end of the liquid inlet pipe extends into the cylinder body, and an absorption liquid spray head is connected to the liquid outlet end for spraying absorption liquid downwards;
  • An air inlet pipe is arranged at a position of the cylinder body close to the lower end cap, and the air outlet end of the air inlet pipe extends into the cylinder body, so as to input the gas to be treated into the cylinder body;
  • the outlet end of the air inlet pipe is connected with a micro-bubble generating internal part, and the micro-bubble generating internal part is used to form micro-bubbles from the gas to be treated from the outlet end and mix them into the absorption liquid;
  • a back-mixing internal component is arranged in the cylinder above the micro-bubble generating internal component, and the back-mixing internal component is used to form a back-mixing vortex of the absorption liquid under the action of the upward micro-bubble flow.
  • the present invention through the above technical scheme, sequentially arranges microbubble generating internals and back-mixing internals in the cylinder from bottom to top, and the two are combined to form a micro-macro scale dual-enhanced gas absorption internal, wherein microbubbles are generated by the microbubble generating internals to enhance the microscopic gas-liquid contact; then the back-mixing internals are used to form a macro-scale back-mixing vortex in the gas-liquid phase after the micro-enhanced contact; this combination of enhanced internals, combined from both the microscopic gas-liquid contact and the macroscopic gas-liquid overall flow, can enhance back-mixing, increase the mass transfer coefficient, and increase the residence time of the gas-liquid contact, thereby effectively improving the gas absorption effect.
  • the gas processing device does not require a large number of components such as tower plates, and realizes the transformation of the plate absorption tower structure to a new absorption device, which not only simplifies the structure of the device, but also improves the space utilization rate, reduces the pressure drop of the entire device while saving costs, reduces energy loss, and improves the safety of the device.
  • the microbubble generating internal component comprises an internal component body and a submersible pump, wherein the internal component body It includes a first variable diameter mixing chamber, a necking installation chamber and a second variable diameter mixing chamber which are connected in sequence from bottom to top.
  • the first variable diameter mixing chamber forms a liquid phase inlet at one end away from the necking installation chamber.
  • a conical cavity is arranged in the first variable diameter mixing chamber.
  • the conical cavity opens toward one end of the necking installation chamber.
  • the necking installation chamber is filled with a first mixing core.
  • the inner body also includes an air intake branch pipe. One end of the air intake branch pipe is connected to the air outlet end of the air intake pipe, and the other end of the air intake branch pipe is connected to the conical cavity.
  • the outlet of the submersible pump is connected to the liquid phase inlet.
  • the ends of the first diameter-changing mixing chamber and the second diameter-changing mixing chamber respectively connected to the necked installation chamber are both small-diameter ends.
  • the first variable diameter mixing chamber includes a cylindrical section and a conical section connected from bottom to top, and the maximum diameter of the conical section is equal to the diameter of the cylindrical section; the diameter of the necking installation chamber is equal to the minimum diameter of the conical section, and the second variable diameter mixing chamber is configured to gradually expand in diameter from bottom to top, and the minimum diameter of the second variable diameter mixing chamber is equal to the diameter of the necking installation chamber.
  • the conical cavity includes a first conical section and a second conical section connected from bottom to top, and the air intake branch pipe is connected to the first conical section.
  • the taper of the first tapered section is greater than the taper of the second tapered section.
  • a Venturi mixing internal is disposed in the cylinder between the microbubble generating internal and the back-mixing internal, and the Venturi mixing internal is used to further break up and accelerate the microbubble flow from the microbubble generating internal and then output it upward.
  • the Venturi mixing internal component includes an air collecting port, a cavity structure, and a mixing expansion port connected in sequence from bottom to top, the air collecting port is configured to gradually reduce in diameter from bottom to top, the mixing expansion port is configured to gradually expand in diameter from bottom to top, and the cavity structure is provided with a necking section connected to the bottom of the mixing expansion port and a reducing section connected to the bottom of the necking section, and the necking section is filled with a second mixing core.
  • the Venturi mixing internal component further includes a connecting leg connected between the top of the mixing expansion port and the bottom of the back-mixing internal component.
  • the back-mixing internal component includes an inner cylinder and a distribution plate installed on the inner wall of the inner cylinder, the inner cylinder is coaxially arranged with the cylinder body, and there is a distance between the outer wall of the inner cylinder and the inner wall of the cylinder body.
  • the height of the inner cylinder is 500-1500 mm, and the distance between the outer wall of the inner cylinder and the inner wall of the cylinder body is 100-200 mm.
  • the back-mixing internal component further comprises a sieve plate mounted on the inner wall of the inner cylinder, and the sieve plate is arranged above the distribution plate at intervals.
  • the distribution plate is provided with a plurality of axial through holes, and a tubular distributor is disposed in each of the axial through holes.
  • a plurality of bar grids are provided on the sieve plate.
  • an exhaust pipe is disposed at the upper portion of the upper head, and a drain pipe is disposed at the lower portion of the lower head.
  • a deflection baffle is provided on the inner wall of the cylinder between the back-mixing internal component and the liquid inlet pipe.
  • a defoaming mechanism is also installed on the inner wall of the cylinder.
  • the defoamer mechanism includes an upper defoamer, a middle defoamer and a lower defoamer, the upper defoamer is located above the liquid inlet pipe, the middle defoamer is located between the liquid inlet pipe and the deflection baffle, and the lower defoamer is located below the air inlet pipe.
  • the upper demister, the middle demister and the lower demister are all wire mesh structures.
  • the mesh aperture of the upper demister is 1-5 mm, the wire diameter is 0.5-2 mm, and the thickness is 50-100 mm;
  • the mesh aperture of the middle demister is 1 mm to 5 mm, the wire diameter is 0.5 mm to 2 mm, and the thickness is 100 to 200 mm;
  • the mesh aperture of the lower demister is 2 mm to 8 mm, the wire diameter is 0.5 mm to 2 mm, and the thickness is 100 to 200 mm.
  • the present invention also provides a gas processing method, which comprises the following steps:
  • the gas treatment method of the present invention allows the gas to be treated to pass into the absorption liquid area in the form of microbubbles.
  • the absorption liquid in the absorption liquid area is a continuous phase, and the gas is a dispersed phase.
  • the contact area between the gas and the liquid is large, and the mass transfer efficiency is high.
  • the gas reacts with the absorption liquid once, and the components to be absorbed in the gas react quickly.
  • the gas is a continuous phase, and the liquid is a dispersed phase sprayed in the gas.
  • the contact area between the gas and the liquid is large, and the mass transfer efficiency is high. Therefore, the gas treatment method of the present invention not only fully absorbs a certain component in the gas and improves the mass transfer efficiency, but also improves space utilization.
  • the method further includes: before step S2, further breaking up and accelerating the microbubble flow.
  • the method is performed using the above-mentioned gas processing device.
  • FIG1 is a schematic structural diagram of a first embodiment of a gas processing device according to the present invention.
  • FIG2 is a schematic diagram of the operation flow of the gas processing device in FIG1 ;
  • FIG3 is a schematic structural diagram of a second embodiment of a gas processing device according to the present invention.
  • FIG4 is a schematic structural diagram of a third embodiment of a gas processing device according to the present invention.
  • FIG. 5 is a schematic structural diagram of a fourth embodiment of a gas processing device according to the present invention.
  • FIG6 is a schematic structural diagram of an embodiment of a back-mixing internal component in the present invention.
  • FIG. 7 is a schematic structural diagram of another embodiment of the back-mixing internals of the present invention.
  • Fig. 8 is a cross-sectional view taken along line A-A of Fig. 7;
  • Fig. 9 is a cross-sectional view taken along line B-B of Fig. 7;
  • FIG. 10 is a schematic structural diagram of an embodiment of a Venturi mixing internal in the present invention.
  • FIG. 11 is a cross-sectional view of an embodiment of a bubble generating internal member of the present invention.
  • FIG12 is a bottom view of an embodiment of the liquid inlet pipe and the absorption liquid nozzle connected in the present invention.
  • FIG. 13 is a side view of the liquid inlet pipe and the absorption liquid nozzle connected in FIG. 12 .
  • First mixing Core 950, second variable diameter mixing chamber; 960, conical cavity; 970, necking installation chamber; 10, absorption liquid nozzle; 101, water spray plate; 102, water spray port; 11, deflection baffle; 12, Venturi mixing internals; 121, gas collecting port; 122, variable diameter section; 123, necking section; 124, second mixing core; 125, mixing expansion port; 126, connecting leg; 13, cylinder; 14, upper head; 15, lower head.
  • the terms “installed”, “connected” and “connected” should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium.
  • installed should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium.
  • the specific meanings of the above terms in the present invention can be understood according to the specific circumstances.
  • a specific device is described as being located between a first device and a second device, there may or may not be an intermediate device between the specific device and the first device or the second device.
  • the gas treatment device is used to purify the gas to be treated (such as sulfur tail gas, circulating gas, natural gas, carbon dioxide, etc.) and absorb the harmful substances therein.
  • the absorption liquid introduced into the cylinder is determined according to the different gases to be treated.
  • Fig. 1 shows a schematic structural diagram of a first embodiment of a gas processing device of the present invention.
  • the gas processing device comprises a cylinder 13 , an upper end cap 14 connected to the upper end of the cylinder 13 , and a lower end cap 15 connected to the lower end of the cylinder 13 .
  • an exhaust pipe 1 is arranged on the upper part of the upper head 14, and a drain pipe 8 is arranged on the lower part of the lower head 15;
  • a liquid inlet pipe 3 is arranged near the upper head 14 of the cylinder 13, and the liquid outlet end of the liquid inlet pipe 3 extends into the cylinder 13, and the liquid outlet end of the liquid inlet pipe 3 is connected with an absorption liquid nozzle 10 for spraying the absorption liquid downward;
  • an air inlet pipe 6 is arranged near the lower head 15 of the cylinder 13, and the air outlet end of the air inlet pipe 6 extends into the cylinder 13, for inputting the gas to be treated into the cylinder 13;
  • the air outlet end of the air inlet pipe 6 is connected with a microbubble generating internal component 9, and the microbubble generating internal component 9 is used to form microbubbles from the gas to be treated from the air outlet end and mix it into the absorption liquid;
  • a back-mixing internal component 5 is arranged in the cylinder above the microbubble generating internal component 9, and
  • the present invention adopts the above technical solution to sequentially arrange the microbubble generating internal part 9 and the back-mixing internal part 5 in the cylinder 13 from bottom to top, and the two are combined to form a micro-macro scale dual-enhanced gas absorption internal part, wherein the microbubble generating internal part 9 and the back-mixing internal part 5 are arranged in sequence from bottom to top in the cylinder 13 ...
  • microbubble generating internal part 9 and the back-mixing internal part 5 are arranged in sequence to form a micro-macro scale dual-enhanced gas absorption internal part,
  • the generating internal part 9 generates microbubbles to enhance the microscopic gas-liquid contact; then the back-mixing internal part 5 is used to make the gas-liquid phase after the microscopic enhanced contact form a macroscopic back-mixing vortex; this combination of strengthening internal parts combines both the microscopic gas-liquid contact and the macroscopic gas-liquid overall flow, which can enhance back-mixing, increase the mass transfer coefficient, and increase the residence time of the gas-liquid contact, thereby effectively improving the gas absorption effect.
  • the gas treatment device provided by the present invention does not require a large number of components such as tower plates, and realizes the transformation of the plate absorption tower structure to a new absorption device, which not only simplifies the structure of the device, but also improves the space utilization rate, reduces the pressure drop of the entire device while saving costs, reduces energy loss, and improves the safety of the device.
  • the absorption liquid nozzle 10 to spray the absorption liquid downward, in the gas-liquid contact in the upper part of the device, the gas phase is the continuous phase and the liquid phase is the dispersed phase sprayed in the gas to be treated; in the gas-liquid contact in the lower part of the device, the liquid phase is the continuous phase and the gas phase is the dispersed phase; not only the mass transfer efficiency is improved, but also the device space is reasonably utilized.
  • the gas processing device further includes a defoaming mechanism, which is mounted on the inner wall of the cylinder 13.
  • the defoaming mechanism includes an upper defoamer 2, a middle defoamer 4 and a lower defoamer 7, the upper defoamer 2 is located above the liquid inlet pipe 3, the middle defoamer 4 is located below the liquid inlet pipe 3, and the lower defoamer 7 is located below the air inlet pipe 6.
  • the distance between the lowermost end of the upper end cap 14 and the liquid inlet pipe 3 is 150-300 mm, for example, 200 mm, so that a defoamer can be arranged within the spacing, and there is enough distance to eliminate the entrainment of mist and foam.
  • the distance between the lowermost end of the back-mixing inner part 5 and the upper end bubble outlet of the microbubble generating inner part 9 is 200-800 mm, for example, 500 mm, so that the gas phase can form stable microbubbles before entering the back-mixing inner part 5, and at the same time, it can ensure that the microbubble flow has a certain initial kinetic energy and flow velocity when entering the back-mixing inner part 5.
  • the cylinder 13 is provided with an air inlet (not shown in the figure) and a liquid inlet (not shown in the figure), the liquid inlet is arranged near the upper end cap 14 and is located 150-300 mm below the upper end cap 14, and the liquid inlet pipe 3 extends into the center of the cylinder through the liquid inlet and perpendicular to the cylinder.
  • the air inlet pipe 6 extends into the center of the cylinder through the air inlet and perpendicular to the cylinder.
  • the outlet end of the air inlet pipe 6 can be bent upward by 90° at the center of the cylinder (see FIGS. 1 , 3 and 5 ).
  • the cylinder 13 and the upper and lower heads 14 and 15 together enclose a reaction chamber for gas absorption, wherein the reaction chamber has an absorption liquid zone, the microbubble generating internals 9 and the back-mixing internals 5 are located in the absorption liquid zone, and the absorption liquid nozzle 10 is located above the absorption liquid zone.
  • the exhaust pipe 1 connected to the top of the upper head 14 is used to discharge the clean gas formed by the gas after absorption treatment
  • the drain pipe 8 connected to the bottom of the lower head 15 is used to discharge the rich absorption liquid after absorption.
  • the gas treatment device can prolong the gas-liquid residence time by back-mixing, so that the gas-liquid two phases can fully contact with each other. While maintaining the stability of the bed, improving mass transfer efficiency, and greatly reducing the scale and cost of the device.
  • FIG3 shows a schematic structural diagram of a second embodiment of a gas treatment device of the present invention.
  • the gas treatment device of this embodiment is similar to the gas treatment device of the first embodiment, except that the gas treatment device includes a plurality of back-mixing internals 5, and the plurality of back-mixing internals 5 are arranged at intervals from each other along the height direction of the cylinder 13 to perform multi-stage back-mixing turbulence on the gas-liquid two-phase flow in the absorption liquid zone.
  • the plurality of back-mixing internals 5 are all arranged in the absorption liquid zone, and the specific number can be 1 to 4, such as 1, 2, 3, or 4. Specifically, two back-mixing internals 5 are shown in FIG3. In practical applications, the number of back-mixing internals 5 can be selected according to the height of the cylinder 13.
  • FIG4 is a schematic structural diagram of a third embodiment of the gas processing device of the present invention, and the gas processing device of this embodiment is similar to the gas processing device of the first embodiment, and the only difference is that the gas processing device further includes a baffle plate 11, and the baffle plate 11 is arranged on the inner wall of the cylinder between the back-mixing internal 5 and the liquid inlet pipe 3.
  • the gas processing device shown in FIG4 includes a plurality of baffle plates 11 extending radially inward from the inner wall of the cylinder 13, and the plurality of baffle plates 11 are arranged at intervals from each other along the height direction of the cylinder 13, and form a serpentine channel for gas-liquid phase flow and contact mass transfer.
  • Fig. 5 shows a schematic structural diagram of a fourth embodiment of the gas processing device of the present invention.
  • the gas processing device of this embodiment is similar to the gas processing device of the third embodiment, except that a venturi mixing internal 12 is provided in the cylinder between the microbubble generating internal 9 and the back-mixing internal 5, and the venturi mixing internal 12 is used to further break up and speed up the microbubble flow from the microbubble generating internal 9 and output it upward.
  • the above-mentioned embodiment arranges a microbubble generating internal component 9, a Venturi mixing internal component 12 and a back-mixing internal component 5 in sequence from bottom to top in the cylinder 13, and the three are combined to form a micro-macro scale dual-enhanced enhanced gas absorption internal component, wherein microbubbles are generated by the microbubble generating internal component 9 to enhance the microscopic gas-liquid contact; at the same time, the Venturi mixing internal component 12 is used to further break up the microbubbles to increase the gas-liquid contact and form a high-speed microbubble flow to enhance the back-mixing, and finally the back-mixing internal component 5 is used to make the gas-liquid phase after the microscopic enhanced contact form a macroscopic back-mixing vortex; this combination of enhanced internal components combines both the microscopic gas-liquid contact and the macroscopic gas-liquid overall flow, which can enhance the back-mixing, increase the mass transfer coefficient, make the mass transfer more complete, increase the turbulence level, and increase
  • the distance between the lowermost end of the upper end cap 14 and the liquid inlet pipe 3 is 150-300 mm, for example, 250 mm, so that a demister can be arranged within the spacing and there is enough distance to eliminate mist entrainment.
  • the distance between the lowermost end of the venturi mixing inner part 12 and the upper bubble outlet of the micro-bubble generating inner part 9 is 100-500 mm, for example, 350 mm, so that all gases coming out of the upper bubble outlet of the micro-bubble generating inner part 9 can be collected.
  • the gas processing device provided by the present invention does not require a large number of components such as tower plates, and realizes the transformation of the plate absorption tower structure to a new absorption device, which not only simplifies the structure of the device, but also improves the space utilization rate, reduces the pressure drop of the entire device while saving costs, reduces energy loss, and improves the safety of the device.
  • each gas processing device provided by the present invention has the following specific features:
  • the present invention utilizes two different forms of gas-liquid two-phase mass transfer process.
  • the concentration of the component to be absorbed in the gas is the highest.
  • the gas to be absorbed exists in the absorption liquid in the form of a large number of bubbles.
  • the absorption liquid is a continuous phase, and the gas is a dispersed phase.
  • the contact area between the gas and the liquid is large, and the mass transfer efficiency is high.
  • the gas reacts with the absorption liquid once, and the components to be absorbed in the gas react quickly.
  • One or more groups of back-mixing internals are set in the absorption liquid area to make the absorption liquid area back-mix flow, increase the residence time for mass transfer, and improve the degree of turbulence.
  • absorption liquid droplets are sprayed out by the absorption liquid nozzle 10 to further absorb the continuous gas phase, and at this time, the components to be treated undergo a secondary reaction.
  • the gas just entering the device contains a relatively high concentration of the component to be treated, and the absorption liquid in the absorption liquid area is used for reaction absorption.
  • the content of the component to be treated has been reduced, and the absorption liquid droplets are used for reaction absorption. Therefore, the present invention not only fully absorbs a certain component in the gas and improves the mass transfer efficiency, but also makes reasonable use of the device space.
  • the reactor simplifies the structure of the device, does not need to set up a tower structure, and reduces the operation residence time pressure.
  • the present invention sets one or more back-mixing internals in the absorption liquid zone, and utilizes the gas driving force from bottom to top to form one or more back-mixing flows in the absorption liquid zone, thereby increasing the gas-liquid contact time, increasing the turbulence level, improving the mass transfer coefficient, and making the mass transfer more complete; at the same time, it can also maintain the stability of the bed, ensure the controllability of the reaction, and maintain a small pressure drop.
  • the microbubble generating internal component 9, the venturi mixing internal component 12, the back-mixing internal component 5, the absorption liquid nozzle 10 and the defoaming mechanism mentioned in the above-mentioned gas treatment device embodiments can have any appropriate structure as long as they can achieve their functions.
  • the present invention also provides some preferred embodiments of these components.
  • the microbubble generating inner component 9 may include an inner component body 900 and a submersible pump 910.
  • the inner component body 900 includes a first variable diameter mixing chamber 920, a necking installation chamber 970 and a second variable diameter mixing chamber 950 which are connected in sequence from bottom to top.
  • the first variable diameter mixing chamber 920 forms a liquid phase inlet at one end away from the necking installation chamber 970.
  • a conical cavity 960 is arranged in the first variable diameter mixing chamber 920.
  • the conical cavity 960 opens toward one end of the necking installation chamber 970.
  • the necking installation chamber 970 is filled with a first mixing core 940.
  • the inner component body 900 also includes an air intake branch pipe 930.
  • One end of the air intake branch pipe 930 is connected to the air outlet end of the air intake pipe 6, and the other end of the air intake branch pipe 930 is connected to the conical cavity 960.
  • the outlet of the submersible pump 910 is connected to the liquid phase inlet.
  • the microbubble generating inner part 9 is connected and fixed by the gas phase pipeline and the liquid phase pipeline at the same time, which can ensure the stable installation of the microbubble generating inner part 9.
  • the constricted flow channel reduces the flow resistance of the liquid phase entering the first variable diameter mixing chamber 920, changes the flow area of the liquid phase fluid, causes the flow velocity to increase, cuts the gas in the first variable diameter mixing chamber 920 for preliminary fragmentation, and thus effectively improves the microbubble generation effect.
  • the first variable diameter mixing chamber 920 and the second variable diameter mixing chamber 950 are both variable diameter structures, and the ends of the first variable diameter mixing chamber 920 and the second variable diameter mixing chamber 950 connected to the necking installation chamber 970 are both small diameter ends, that is, a structure of shrinking and expanding diameters is formed in the gas-liquid flow direction.
  • the submersible pump 910 can be arranged at the bottom of the device.
  • the first variable diameter mixing chamber 920 includes a cylindrical section and a conical section connected from bottom to top, the maximum diameter of the conical section is equal to the diameter of the cylindrical section; the diameter of the necked installation chamber 970 is equal to the minimum diameter of the conical section, and the second variable diameter mixing chamber 950 is configured to gradually expand in diameter from bottom to top, and the minimum diameter of the second variable diameter mixing chamber 950 is equal to the diameter of the necked installation chamber 970.
  • the conical cavity 960 includes a first conical section and a second conical section connected from bottom to top, and the intake branch pipe 930 is connected to the first conical section.
  • the taper of the first tapered section is greater than the taper of the second tapered section.
  • a first mixing core 940 is provided at the thinnest part of the microbubble generating inner part 9, and a submersible pump 910 is connected at the same time.
  • the submersible pump is provided at the bottom of the device, and the absorption liquid in the cylinder is injected into the liquid phase inlet of the first variable diameter mixing chamber 920 of the microbubble generating inner part 9 through the pump circulation.
  • the gas phase from the air inlet pipe 6 enters the conical cavity 960 located in the first variable diameter mixing chamber 920 through the air inlet branch pipe 930, and the gas and liquid phases are impact mixed at the open end of the conical cavity 960.
  • the bubbles are relatively large.
  • the bubbles After passing through the first mixing core 940, the bubbles are broken into smaller microbubbles and leave the microbubble generating inner part 9 through the gas-liquid mixing outlet of the second variable diameter mixing chamber 950.
  • the microbubble generating internal part 9 is made of a porous material, and its shape can be selected according to the needs in different shapes such as tubular, hemispherical, disc-shaped, etc., preferably spherical or hemispherical to increase the surface area, and the gas diffuses more evenly around.
  • the connection mode between the microbubble generating internal part 9 and the air inlet pipe 6 can be in the form of bolt connection, flange connection, etc.
  • the microbubble generating internal part 9 can be made of 316 stainless steel. After the gas to be treated passes through the microbubble generating internal part 9, a large number of bubbles are formed in the absorption liquid.
  • the microbubble generating internal part 9 can also adopt the microbubble generator of the enhanced hydrogenation process disclosed in the Chinese invention patent with patent number 201410081189.1.
  • the Venturi mixing internal 12 comprises a gas collecting port 121, a cavity structure and a mixing expansion port 125 connected in sequence from bottom to top, the gas collecting port 121 is configured to have a gradually decreasing diameter from bottom to top (i.e., an outwardly expanding trumpet shape), the mixing expansion port 125 is configured to have a gradually increasing diameter from bottom to top (also in the gas flow direction), the cavity structure is provided with a necking section 123 connected to the bottom of the mixing expansion port 125 and a reducing section 122 connected to the bottom of the necking section 123 (reducing the diameter from bottom to top along the gas flow direction), and the necking section 123 is filled with a second mixing core 124.
  • the gas collecting port 121 is configured to have a gradually decreasing diameter from bottom to top (i.e., an outwardly expanding trumpet shape)
  • the mixing expansion port 125 is configured to have a gradually increasing diameter from bottom to top (also in the gas flow direction)
  • the cavity structure is provided with a necking section 123 connected to the bottom of
  • This Venturi mixing internal has a simple, compact, and non-damageable structure, and at the same time increases the gas-liquid turbulence in the device, thereby improving the mass transfer coefficient and mass transfer efficiency.
  • the gas phase can enter the gas collecting port 121 under the action of air flotation, and enter the variable diameter section 122 through the gas collecting port 121, and compress and break the bubbles through the second mixing core 124 in the necking section 123. After passing through the second mixing core 124, the bubbles are further broken and dispersed due to pressure changes through the mixing expansion port 125 and leave the Venturi mixing internal component.
  • the venturi mixing internal 12 may further include a connecting leg 126, which is connected between the top of the mixing expansion port 125 and the bottom of the back-mixing internal 5.
  • the venturi mixing internal 12 is connected to the back-mixing internal 5 through the connecting leg 126.
  • the number of the connecting legs 126 is not less than 3, and may be 3, 4, 5, 6, etc.
  • the back-mixing internal component 5 is a cylindrical structure, including an inner cylinder 530 and a distribution plate 510 installed on the inner wall of the inner cylinder 530 .
  • the inner cylinder 530 is coaxially arranged with the cylinder body 13 , and there is a gap between the outer wall of the inner cylinder 530 and the inner wall of the cylinder body 13 .
  • the height of the inner cylinder 530 is 500 to 1500 mm, and more preferably, the height of the inner cylinder 530 can be 500 mm, 600 mm, 700 mm, 800 mm, 900mm, 1000mm, 1100mm, 1200mm, 1300mm, 1400mm, 1500mm, etc.
  • the spacing between the outer wall of the inner cylinder 530 and the inner wall of the cylinder body 13 is 100-200mm, more preferably, the spacing can be 100mm, 110mm, 120mm, 130mm, 140mm, 150mm, 160mm, 170mm, 180mm, 190mm, 200mm, etc.
  • the back-mixing internal component 5 includes an inner cylinder 530 and a distribution plate 510 and a sieve plate 520 mounted on the inner wall of the inner cylinder 530 .
  • the sieve plate 520 is arranged above the distribution plate 510 in parallel and at intervals.
  • the back-mixing internal component 5 is installed on the inner wall of the cylinder 13. It can be connected to the inner wall of the cylinder by relying on the structure extending from the side of the distribution plate 510, or it can be connected to the inner wall of the cylinder by relying on the structure extending from the side of the sieve plate 520.
  • the extending structure can be a common internal component installation structure. The specific form is not described or limited in the present invention. It is a conventional technical means possessed by those skilled in the art.
  • a plurality of axial through holes are evenly provided on the distribution plate 510, and a tubular distributor 511 (also called a distribution tube) is provided in each axial through hole.
  • a tubular distributor 511 also called a distribution tube
  • a plurality of strip grids 521 are provided on the sieve plate 520.
  • the bubbles pass through the distribution plate 510 located at the bottom of the back-mixing inner part 5, and the bubbles enter the back-mixing inner part 5 from the distribution tube in the distribution plate 510.
  • the distribution plate 510 can evenly distribute and stabilize a large number of bubbles in the absorption liquid. After being evenly distributed, the bubbles continue to rise and pass through the sieve plate 520.
  • the sieve plate 520 can stabilize the fluid in the back-mixing inner part 5 and reduce disturbance. Due to the effect of gas pushing from bottom to top, the absorption liquid is driven to be disturbed and back-mixed from the center to the surroundings, that is, the liquid in the absorption liquid area will form a back-mixing flow in the inner cylinder 530 and the cylinder body 13, and the absorption liquid in the inner cylinder 530 will flow back through the gap between the inner cylinder 530 and the cylinder body 13 to form a back-mixing area at the entire back-mixing inner part.
  • the absorption liquid nozzle 10 comprises a water spray plate 101 and a water spray port 102 disposed on the water spray plate 101.
  • the angle between the axial direction of the water spray port 102 and the horizontal direction is 40° to 50°, and more preferably 45°.
  • the cross section of the water spray plate 101 is circular, and the number of the water spray ports 102 is multiple and disposed on the lower surface of the water spray plate 101.
  • the multiple water spray ports 102 form an annular water spray array on the water spray plate 101, and the annular water spray array is concentrically distributed with the water spray plate 101, and the number of the annular water spray array is multiple.
  • the defoamer mechanism includes an upper defoamer 2, a middle defoamer 4 and a lower defoamer 7.
  • the upper defoamer 2 is located above the liquid inlet pipe 3
  • the middle defoamer 4 is located between the liquid inlet pipe 3 and the deflection baffle 11 (in the absence of the deflection baffle 11, the middle defoamer 4 is located between the liquid inlet pipe 3 and the back-mixing internal component 5)
  • the lower defoamer 7 is located below the air inlet pipe 6.
  • the upper demister 2, the middle demister 4 and the lower demister 7 are all wire mesh structures transversely arranged in the cylinder.
  • the mesh aperture of the upper demister 2 is 1-5 mm, the wire diameter is 0.5-2 mm, and the thickness is 50-100 mm.
  • the mesh aperture of the upper demister 2 can be 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, etc.
  • the wire diameter can be 0.5 mm, 1 mm, 1.5 mm, 2 mm
  • the thickness can be 50 mm, 60 mm, 70 mm, 80 mm, 90 mm, 100 mm, etc.
  • the upper demister 2 is used to demister the gas phase entering the exhaust pipe 1 to ensure that the gas outside the discharge device is relatively pure.
  • the mesh aperture of the middle demister 4 is 1 mm to 5 mm
  • the wire diameter is 0.5 mm to 2 mm
  • the thickness is 100 to 200 mm.
  • the mesh aperture of the middle demister 4 can be 1 mm, 2 mm, 3 mm, 4 mm, 5 mm, etc.
  • the wire diameter can be 0.5 mm, 1 mm, 1.5 mm, 2 mm
  • the thickness can be 100 mm, 110 mm, 120 mm, 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, 200 mm, etc.
  • the middle demister 4 can eliminate the foam entrained in the gas phase moving upward in the device to prevent the spraying effect of the absorption liquid from being affected.
  • the mesh aperture of the lower demister 7 is 2 mm to 8 mm, the wire diameter is 0.5 mm to 2 mm, and the thickness is 100 to 200 mm.
  • the mesh aperture of the lower demister 7 can be 2 mm, 3 mm, 4 mm, 5 mm, 6 mm, 7 mm, 8 mm, the wire diameter can be 0.5 mm, 1 mm, 1.5 mm, 2 mm, and the thickness can be 100 mm, 110 mm, 120 mm, 130 mm, 140 mm, 150 mm, 160 mm, 170 mm, 180 mm, 190 mm, 200 mm, etc.
  • the lower demister 7 is located inside the lower head 15 of the device, and can eliminate the foam in the liquid phase leaving from the bottom of the device.
  • the first and second mixed cores in the present invention are structured packings made of stainless steel.
  • the apertures for gas outlet of the microbubble generating inner member 9 and the venturi mixing inner member 12 (specifically, the apertures of the holes in the first and second mixing cores) need to be micrometer-level, for example, 0.5-3 ⁇ m.
  • Example 1 and Example 2 use the gas treatment device shown in Figure 5 to absorb and treat the sulfur-containing tail gas.
  • the comparative example uses a plate absorption tower in the prior art to absorb and treat the sulfur-containing tail gas of the same component. The specific comparison is shown in the table below.
  • the embodiment when treating sulfur-containing tail gas with the same components, compared with the comparative example, the embodiment can significantly reduce the reactor height and reduce the amount of absorption liquid while ensuring the treatment requirements.
  • Example 1 Under the condition of achieving the same treatment requirements, Example 1 can reduce the amount of absorption liquid by about 25%. Under the condition of achieving the same treatment requirements, Example 2 can reduce the reactor height by about 15%. The mass transfer coefficients of Examples 1 and 2 are greatly improved compared with the comparative example.
  • the present invention also provides a gas processing method, which comprises the following steps:
  • the gas treatment method of the present invention allows the gas to be treated to pass into the absorption liquid area in the form of microbubbles.
  • the absorption liquid in the absorption liquid area is a continuous phase, and the gas is a dispersed phase.
  • the contact area between the gas and the liquid is large, and the mass transfer efficiency is high.
  • the gas reacts with the absorption liquid once, and the components to be absorbed in the gas react quickly.
  • the gas is a continuous phase, and the liquid is a dispersed phase sprayed in the gas.
  • the contact area between the gas and the liquid is large, and the mass transfer efficiency is high. Therefore, the gas treatment method of the present invention not only fully absorbs a certain component in the gas and improves the mass transfer efficiency, but also improves space utilization.
  • the method further includes: before step S2, further breaking up and accelerating the microbubble flow.
  • the method can be carried out using the gas processing device of the present invention, and the processing process and advantages of the gas processing device are correspondingly reflected in the method.
  • the method may also be performed using any other appropriate gas processing device.

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Abstract

一种气体处理装置和气体处理方法，气体处理装置包括筒体（13）、连接在筒体（13）上端的上封头（14）和连接在筒体（13）下端的下封头（15），其中：筒体（13）的靠近上封头（14）的位置设置有进液管（3），进液管（3）的出液端伸入筒体（13）内，出液端连接有吸收液喷头（10），用于向下喷淋吸收液；筒体（13）的靠近下封头（15）的位置设置有进气管（6），进气管（6）的出气端伸入筒体（13）内，用于向筒体（13）内输入待处理气体；进气管（6）的出气端连接有微气泡发生内件（9），微气泡发生内件（9）用于将来自出气端的待处理气体形成微气泡并将其混入吸收液中；微气泡发生内件（9）上方的筒体（13）内设置有返混内件（5），返混内件（5）用于在向上的微气泡流的作用下使吸收液形成返混的涡流。

Description

气体处理装置和气体处理方法
相关申请的交叉引用
本申请要求于2023年03月08日递交的中国发明专利申请号202310216131.2、202310216392.4、202310216418.5的优先权，其全部内容通过引用并入本文。
技术领域
本发明属于气体处理技术领域，具体涉及气体处理装置和气体处理方法。
背景技术
随着石油化工行业原料品质的恶劣化，储存介质多含有含硫化合物、含氮化合物和细颗粒物，在石油化工生产过程中，会不可避免的产生大量有毒有害气体，这些有毒有害气体不仅对人们身体健康有害，更是对生态环境造成严重破坏，需要气体处理装置对产生的有毒有害气体进行处理，保证生产过程的运行。
现有的气体处理装置大多为板式塔结构，这种结构的吸收塔通常很高，存在不稳定的缺点，在大风天气容易出现吸收塔晃动的情况，存在不安全的因素；另外，传质效率提升困难，气液两相接触不够充分；整个装置阻力降较大，能量损失较大。
发明内容
针对现有技术存在的不足，本发明的目的在于提供一种气体处理装置，以解决传质效率低、气液两相接触不充分的问题，并大大减小装置规模以及成本。
为了实现上述目的，本发明采用如下技术方案：
一种气体处理装置，包括筒体、连接在所述筒体上端的上封头和连接在所述筒体下端的下封头，其中：
所述筒体的靠近所述上封头的位置设置有进液管，所述进液管的出液端伸入所述筒体内，所述出液端连接有吸收液喷头，用于向下喷淋吸收液；
所述筒体的靠近所述下封头的位置设置有进气管，所述进气管的出气端伸入所述筒体内，用于向所述筒体内输入待处理气体；
所述进气管的出气端连接有微气泡发生内件，所述微气泡发生内件用于将来自所述出气端的待处理气体形成微气泡并将其混入吸收液中；
所述微气泡发生内件上方的筒体内设置有返混内件，所述返混内件用于在向上的微气泡流的作用下使吸收液形成返混的涡流。
本发明通过上述技术方案，在筒体内从下至上依次设置微气泡发生内件和返混内件，两者结合形成微观-宏观尺度双强化的增强气体吸收内件，其中，通过微气泡发生内件产生微气泡，增强微观气液相接触；然后利用返混内件使微观强化接触后的气液相形成宏观尺度的返混涡流；这种组合强化内件，同时从微观气液接触以及宏观气液整体流动两方面进行结合，能够增强返混，增大传质系数，增加气液相接触的停留时间，从而有效提高气体吸收效果。另外，通过设置向下喷淋吸收液的吸收液喷头，使得从吸收液逸出的气体在向上流动的过程中与向下喷淋的吸收液进行二次反应，气体为连续相，液体为喷洒在气体中的分散相，气液之间接触面积大，传质效率高。相比于板式塔结构，本发明提供的气体处理装置不需要大量的塔板等构件，实现了板式吸收塔结构向新型吸收装置的转变，既简化了装置的结构，又提高了空间利用率，在节约成本的同时降低了整个装置的压降，减少了能量损失，提高了装置的安全性。
在一些实施方式中，所述微气泡发生内件包括内件主体和潜液泵，所述内件主体 包括从下至上依次连通的第一变径混合腔、缩颈安装腔以及第二变径混合腔，所述第一变径混合腔背离所述缩颈安装腔的一端形成液相入口，所述第一变径混合腔内设置有锥形腔体，所述锥形腔体朝向所述缩颈安装腔的一端开口，所述缩颈安装腔内填充有第一混合芯，所述内件主体还包括进气支管，所述进气支管的一端与所述进气管的出气端连接，所述进气支管的另一端与所述锥形腔体连通，所述潜液泵的出口与所述液相入口连通。
在一些实施方式中，所述第一变径混合腔和所述第二变径混合腔分别与所述缩颈安装腔连接的一端均为小径端。
在一些实施方式中，所述第一变径混合腔包括从下至上相连通的圆柱段和圆锥段，所述圆锥段的最大直径与所述圆柱段的直径相等；所述缩颈安装腔的直径与所述圆锥段的最小直径相等，所述第二变径混合腔设置为从下至上直径渐扩，所述第二变径混合腔的最小直径与所述缩颈安装腔的直径相等。
在一些实施方式中，所述锥形腔体包括从下至上相连通的第一锥形段和第二锥形段，所述进气支管与所述第一锥形段连通。
在一些实施方式中，所述第一锥形段的锥度大于所述第二锥形段的锥度。
在一些实施方式中，所述微气泡发生内件与所述返混内件之间的筒体内设置有文丘里混合内件，所述文丘里混合内件用于将来自所述微气泡发生内件的微气泡流进一步破碎增速后向上输出。
在一些实施方式中，所述文丘里混合内件包括从下至上依次连接的集气口、腔体结构以及混合扩径口，所述集气口设置为从下至上直径渐缩，所述混合扩径口设置为从下至上直径渐扩，所述腔体结构内设置有与所述混合扩径口底部相连通的缩颈段以及与所述缩颈段底部相连通的变径段，所述缩颈段内填充有第二混合芯。
在一些实施方式中，所述文丘里混合内件还包括连接腿，所述连接腿连接于所述混合扩径口的顶部与所述返混内件的底部之间。
在一些实施方式中，所述返混内件包括内筒以及安装在所述内筒内壁上的分配盘，所述内筒与所述筒体同轴设置，且所述内筒的外壁与所述筒体的内壁之间具有间距。
在一些实施方式中，所述内筒的高度为500～1500mm，所述内筒的外壁与所述筒体的内壁之间的间距为100～200mm。
在一些实施方式中，所述返混内件还包括安装在所述内筒内壁上的筛板，所述筛板间隔地设置于所述分配盘的上方。
在一些实施方式中，所述分配盘上开设有多个轴向通孔，每个所述轴向通孔中设置有管式分配器。
在一些实施方式中，所述筛板上开设有多个条形栅格。
在一些实施方式中，所述上封头的上部设置有排气管，所述下封头的下部设置有排液管。
在一些实施方式中，所述返混内件和所述进液管之间的筒体内壁上设置有折流挡板。
在一些实施方式中，所述筒体的内壁上还安装有除沫机构。
在一些实施方式中，所述除沫机构包括上除沫器、中除沫器和下除沫器，所述上除沫器位于所述进液管上方，所述中除沫器位于所述进液管和所述折流挡板之间，所述下除沫器位于所述进气管的下方。
在一些实施方式中，所述上除沫器、中除沫器和下除沫器均为丝网结构，
所述上除沫器的丝网孔径为1～5mm，丝径为0.5～2mm，厚度为50～100mm；
所述中除沫器的丝网孔径为1mm～5mm，丝径为0.5mm～2mm，厚度为100～200mm；
所述下除沫器的丝网孔径为2mm～8mm，丝径为0.5mm～2mm，厚度为100～200mm。
本发明还提供一种气体处理方法，所述方法包括以下步骤：
S1、使待处理气体以微气泡的形式通入吸收液区中进行一次反应；
S2、使所述吸收液区中的吸收液在向上流动的微气泡流的作用下形成返混的涡流；
S3、从所述吸收液区的上方向下喷淋吸收液，使得从所述吸收液区逸出的气体在向上流动的过程中与向下喷淋的吸收液进行二次反应。
本发明的气体处理方法，通过上述技术方案，使待处理气体以微气泡的形式通入吸收液区中，吸收液区中的吸收液为连续相，气体为分散相，气液之间接触面积大，传质效率高，气体与吸收液一次反应，对气体中的待吸收组分进行快速反应；通过从吸收液区的上方向下喷淋吸收液，使得从吸收液区逸出的气体在向上流动的过程中与向下喷淋的吸收液进行二次反应，气体为连续相，液体为喷洒在气体中的分散相，气液之间接触面积大，传质效率高。因此，本发明的气体处理方法在对气体中某成分进行充分吸收、提高传质效率的同时，还提高了空间利用。
在一些实施方式中，所述方法还包括：在所述步骤S2之前对所述微气泡流进一步破碎增速。
在一些实施方式中，所述方法采用上述气体处理装置进行。
本发明的其它特征和优点将在随后的具体实施方式部分予以详细说明。
附图说明
构成本发明的一部分的附图用来提供对本发明的进一步理解，本发明的示意性实施方式及其说明用于解释本发明，并不构成对本发明的不当限定。在附图中：
图1是本发明气体处理装置的第一种实施方式的结构示意图；
图2是图1中的气体处理装置的运行流程示意图；
图3是本发明气体处理装置的第二种实施方式的结构示意图；
图4是本发明气体处理装置的第三种实施方式的结构示意图；
图5是本发明气体处理装置的第四种实施方式的结构示意图；
图6是本发明中返混内件的一种实施方式的结构示意图；
图7是本发明中返混内件的另一种实施方式的结构示意图；
图8是图7的A-A剖视图；
图9是图7的B-B剖视图；
图10是本发明中文丘里混合内件的一种实施方式的结构示意图；
图11是本发明中气泡发生内件的一种实施方式的截面图；
图12是本发明中相连接的进液管和吸收液喷头的一种实施方式的仰视图；
图13是图12中相连接的进液管和吸收液喷头的侧视图。
附图标记说明
1、排气管；2、上除沫器；3、进液管；4、中除沫器；5、返混内件；510、分配
盘；511、管式分配器；520、筛板；521、条形格栅；530、内筒；6、进气管；7、下除沫器；8、排液管；9、微气泡发生内件；900、内件主体；910、潜液泵；920、第一变径混合腔；930、进气支管；940、第一混合芯；950、第二变径混合腔；960、锥形腔体；970、缩颈安装腔；10、吸收液喷头；101、喷水板；102、喷水口；11、折流挡板；12、文丘里混合内件；121、集气口；122、变径段；123、缩颈段；124、第二混合芯；125、混合扩径口；126、连接腿；13、筒体；14、上封头；15、下封头。
具体实施方式
下面结合附图对本发明的实施方式作进一步详细描述。以下实施方式的详细描述和附图用于示例性地说明本发明的原理，但不能用来限制本发明的范围，本发明可以以许多不同的形式实现，不局限于文中公开的特定实施方式，而是包括落入权利要求的范围内的所有技术方案。
本发明提供这些实施方式是为了使本发明透彻且完整，并且向本领域技术人员充分表达本发明的范围。应注意到：除非另外具体说明，这些实施方式中阐述的部件和步骤的相对布置、材料的组分、数字表达式和数值应被解释为仅仅是示例性的，而不是作为限制。
需要说明的是，在本发明的描述中，除非另有说明，“多个”的含义是大于或等于两个；术语“上”、“下”、“左”、“右”、“内”、“外”等指示的方位或位置关系仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。当被描述对象的绝对位置改变后，则该相对位置关系也可能相应地改变。
此外，本发明中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性，而只是用来区分不同的部分。“垂直”并不是严格意义上的垂直，而是在误差允许范围之内。“平行”并不是严格意义上的平行，而是在误差允许范围之内。“包括”或者“包含”等类似的词语意指在该词前的要素涵盖在该词后列举的要素，并不排除也涵盖其他要素的可能。
还需要说明的是，在本发明的描述中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或一体地连接；可以是直接相连，也可以通过中间媒介间接相连。对于本领域的普通技术人员而言，可视具体情况理解上述术语在本发明中的具体含义。当描述到特定器件位于第一器件和第二器件之间时，在该特定器件与第一器件或第二器件之间可以存在居间器件，也可以不存在居间器件。
本发明使用的所有术语与本发明所属领域的普通技术人员理解的含义相同，除非另外特别定义。还应当理解，在诸如通用字典中定义的术语应当被解释为具有与它们在相关技术的上下文中的含义相一致的含义，而不应用理想化或极度形式化的意义来解释，除非这里明确地这样定义。
对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论，但在适当情况下，技术、方法和设备应当被视为说明书的一部分。
需要说明的是，本发明中，提供的气体处理装置用于对待处理气体(例如硫磺尾气、循环气、天然气、二氧化碳等)进行净化，吸收其中的有害物质，使用时，向筒体内通入的吸收液根据不同待处理气体进行确定。
图1示出了本发明气体处理装置的第一种实施方式的结构示意图。如图1所示，气体处理装置包括筒体13、连接在筒体13上端的上封头14和连接在筒体13下端的下封头15。其中：上封头14的上部设置有排气管1，下封头15的下部设置有排液管8；筒体13的靠近上封头14的位置设置有进液管3，进液管3的出液端伸入筒体13内，进液管3的出液端连接有吸收液喷头10，用于向下喷淋吸收液；筒体13的靠近下封头15的位置设置有进气管6，进气管6的出气端伸入筒体13内，用于向筒体13内输入待处理气体；进气管6的出气端连接有微气泡发生内件9，微气泡发生内件9用于将来自出气端的待处理气体形成微气泡并将其混入吸收液中；微气泡发生内件9上方的筒体内设置有返混内件5，返混内件5用于在向上的微气泡流的作用下使吸收液形成返混的涡流。
本发明通过上述技术方案，在筒体13内从下至上依次设置微气泡发生内件9和返混内件5，两者结合形成微观-宏观尺度双强化的增强气体吸收内件，其中，通过微气泡 发生内件9产生微气泡，增强微观气液相接触；然后利用返混内件5使微观强化接触后的气液相形成宏观尺度的返混涡流；这种组合强化内件，同时从微观气液接触以及宏观气液整体流动两方面进行结合，能够增强返混，增大传质系数，增加气液相接触的停留时间，从而有效提高气体吸收效果。相比于板式塔结构，本发明提供的气体处理装置不需要大量的塔板等构件，实现了板式吸收塔结构向新型吸收装置的转变，既简化了装置的结构，又提高了空间利用率，在节约成本的同时降低了整个装置的压降，减少了能量损失，提高了装置的安全性。
另外，通过采用吸收液喷头10向下喷淋吸收液，在装置上部的气液接触中，气相为连续相，液相为喷洒在待处理气体中的分散相；在装置下部的气液接触中，液相为连续相，气相为分散相；不仅提高了传质效率，而且合理利用了装置空间。
在图1所示的气体处理装置中，气体处理装置还包括除沫机构，除沫机构安装在筒体13的内壁上。具体地，除沫机构包括上除沫器2、中除沫器4和下除沫器7，上除沫器2位于进液管3上方，中除沫器4位于进液管3下方，下除沫器7位于进气管6的下方。
其中，作为优选，上封头14的最下端与进液管3之间的距离为150～300mm，例如200mm，以便于在该间距内设置除沫器，并有足够的距离消除雾沫夹带。返混内件5的最下端与微气泡发生内件9的上端气泡出口之间的距离为200～800mm，例如500mm，这样既可以使气相在进入返混内件5之前形成稳定的微气泡，同时还能保证微气泡流在进入返混内件5中时具有一定的初始动能和流动速度。可以理解的是，筒体13上设置有进气口(图中未标示)和进液口(图中未标示)，进液口靠近上封头14设置并位于上封头14之下150～300mm，进液管3通过进液口并垂直于筒体伸入筒体内部中心。进气管6通过进气口并垂直于筒体伸入筒体内部中心。在一些实施方式中，为了便于微气泡发生内件9的安装，进气管6的出气端可以在筒体内部中心处进行90°向上弯折(参见图1、图3和图5)。
结合图2所示的气体处理装置的运行流程示意图，筒体13和上封头14、下封头15之间共同围成供气体吸收的反应腔室，反应腔室内具有吸收液区，微气泡发生内件9和返混内件5位于吸收液区内，吸收液喷头10位于吸收液区的上方。连接于上封头14顶部的排气管1以供气体在经吸收处理后形成的洁净气体排出，连接于下封头15底部的排液管8以供吸收后的富吸收液排出。
下面结合图1和图2对上述气体处理装置的作用过程做具体描述：
S1、开启吸收液喷头10向筒体13内通入一定量的吸收液，吸收液在筒体13内累积一定的液层形成吸收液区，吸收液区的液位高于返混内件5，具体高度为返混内件5之上200mm至中除沫器4之间；
S2：开启进气管6的阀门，待处理气体通过进气管6以及微气泡发生内件9进入筒体13内，气体经微气泡发生内件9在筒体13下部的吸收液区内形成微气泡，气液两相相接触进行气体吸收处理的第一次反应，待处理气体气泡由于浮力的因素向上移动；随后气相在吸收液中向上移动经过返混内件5，形成返混涡流，延长气液相传质时间，随后气相向上流动；
S3：微气泡经吸收液区逸出后形成连续相气体向筒体13上部移动，此时，吸收液喷头10喷出的吸收液在连续相气体之中向下喷淋，与连续气相逆流接触，对气体待处理组分进行二次反应吸收；
S4：二次反应后形成的洁净气体经过上除沫器2后自顶部的排气管1排出，进入后续流程，吸收液自装置底部的排液管7排出。
上述气体处理装置可以通过返混延长气液相停留时间，使气液两相充分接触，同 时维持床层稳定，提高传质效率，并大大减少装置规模以及成本。
图3示出了本发明气体处理装置的第二种实施方式的结构示意图，该实施方式的气体处理装置与第一种实施方式的气体处理装置类似，区别仅在于该气体处理装置包括多个返混内件5，多个返混内件5沿筒体13的高度方向相互间隔设置，以对吸收液区的气液两相流动进行多级返混扰流。多个返混内件5均设置在吸收液区中，具体数量可以为1～4个，如可以为1个、2个、3个、4个。具体地，图3中显示出两个返混内件5。在实际应用中，可根据筒体13的高度选择返混内件5的数量。
图4出了本发明气体处理装置的第三种实施方式的结构示意图，该实施方式的气体处理装置与第一种实施方式的气体处理装置类似，区别仅在于该气体处理装置还包括折流挡板11，折流挡板11设置在返混内件5和进液管3之间的筒体内壁上。具体地，如图4所示的气体处理装置包括从筒体13的内壁沿径向向内延伸的多个折流挡板11，多个折流挡板11沿筒体13的高度方向相互间隔排布，并形成供气液相流动并接触传质的蛇形通道。
下面参照图4对上述气体处理装置的作用过程做具体描述：
S1、开启吸收液喷头10向筒体13内通入一定量的吸收液，吸收液在筒体13内累积一定的液层形成吸收液区，吸收液区的液位高于返混内件5，具体高度为返混内件5之上200mm至中除沫器4之间；
S2：开启进气管6的阀门，待处理气体通过进气管6以及微气泡发生内件9进入筒体13内，气体经微气泡发生内件9在筒体下部的吸收液区内形成微气泡，气液两相相接触进行气体吸收处理的第一次反应，待处理气体气泡由于浮力的因素向上移动；随后气相在吸收液中向上移动经过返混内件5，形成返混涡流，延长气液相传质时间，随后气相向上流动；
S3：微气泡经吸收液区逸出后形成连续相气体向筒体上部移动，此时，吸收液喷头10喷出的吸收液在连续相气体之中向下喷淋，与连续气相逆流接触，对气体待处理组分进行二次反应吸收；
S4：二次反应后形成的洁净气体经过上除沫器2后自顶部的排气管1排出，进入后续流程，吸收液自装置底部的排液管7排出。
图5示出了本发明气体处理装置的第四种实施方式的结构示意图。该实施方式的气体处理装置与第三种实施方式的气体处理装置类似，区别仅在于：微气泡发生内件9与返混内件5之间的筒体内设置有文丘里混合内件12，所述文丘里混合内件12用于将来自微气泡发生内件9的微气泡流进一步破碎增速后向上输出。
上述实施方式通过在筒体13内从下至上依次设置微气泡发生内件9、文丘里混合内件12以及返混内件5，三者结合形成微观-宏观尺度双强化的增强气体吸收内件，其中，通过微气泡发生内件9产生微气泡，增强微观气液相接触；同时利用文丘里混合内件12进一步破碎微气泡增加气液接触并形成高速微气泡流增强返混，最后利用返混内件5使微观强化接触后的气液相形成宏观尺度的返混涡流；这种组合强化内件，同时从微观气液接触以及宏观气液整体流动两方面进行结合，能够增强返混，增大传质系数，传质更充分，湍动程度增加，增加气液相接触的停留时间，从而有效提高气体吸收效果。
其中，作为优选，上封头14的最下端与进液管3之间的距离为150～300mm，例如250mm，以便于在该间距内设置除沫器，并有足够的距离消除雾沫夹带。文丘里混合内件12的最下端与微气泡发生内件9的上端气泡出口之间的距离为100～500mm，例如350mm，以便于收集从微气泡发生内件9的上端气泡出口出来的所有气体。
下面参照图5对上述气体处理装置的作用过程做具体描述：
S1、开启吸收液喷头10向筒体13内通入一定量的吸收液，吸收液在筒体13内累 积一定的液层形成吸收液区，吸收液区的液位高于返混内件5，具体高度为返混内件5之上200mm至中除沫器4之间；
S2：开启进气管6的阀门，待处理气体通过进气管6以及微气泡发生内件9进入筒体内，待处理气体经由微气泡发生内件9形成微气泡并混入吸收液中，气液两相进行微观接触传质；之后微气泡经文丘里混合内件12进一步破碎成更小更多的微气泡并在装置下部的吸收液区内形成微气泡流，气液两相相接触进行气体吸收处理，随后微气泡流在吸收液中向上移动经过返混内件5，形成返混涡流，延长气液相传质时间，随后气相向上流动；
S3：微气泡经吸收液区逸出后形成连续相气体向筒体上部移动，此时，吸收液喷头10喷出的吸收液在连续相气体之中向下喷淋，与连续气相逆流接触，对气体待处理组分进行再次反应吸收；
S4：二次反应后形成的洁净气体经过上除沫器2后自顶部的排气管1排出，进入后续流程，吸收液自装置底部的排液管7排出。
相比于板式塔结构，本发明提供的气体处理装置不需要大量的塔板等构件，实现了板式吸收塔结构向新型吸收装置的转变，既简化了装置的结构，又提高了空间利用率，在节约成本的同时降低了整个装置的压降，减少了能量损失，提高了装置的安全性。
显然，本发明提供的各气体处理装置具体如下特点：
本发明运用气液两相传质过程中的两种不同形式，在装置下部的吸收液区，气体中需要吸收的组分浓度最高，待吸收气体以大量气泡形式存在于吸收液中，吸收液为连续相，气体为分散相，气液之间的接触面积大，传质效率高，气体与吸收液一次反应，对气体中的待吸收组分进行快速反应。在吸收液区设置一组或者多组返混内件，使吸收液区进行返混流动，增大停留传质时间、提高湍动程度。在装置上部，由吸收液喷头10喷出吸收液滴，对连续的气相进行进一步吸收，此时对待处理组分进行二次反应。
同时，刚进入装置的气体含有较高浓度的待处理组分，利用吸收液区内的吸收液进行反应吸收，气体在吸收液区逸出后，待处理组分的含量已有所降低，利用吸收液滴进行反应吸收。因此，本发明在对气体中某成分进行充分吸收、提高传质效率的同时，还对装置空间进行了合理利用，相对于现有技术中的板式塔结构，本反应器简化了装置的结构，无需设置塔结构，降低了操作停留时间压力。
此外，本发明在吸收液区中设置一个或多个返混内件，利用自下而上的气体推动力，使吸收液区中形成一次或者多次返混流动，增加气液相接触时间，湍动程度增加，提高传质系数，传质更充分；同时，还可以维持床层稳定，保证反应的可控，保持较小压降。
在本发明中，上述各气体处理装置的实施方式中提到的微气泡发生内件9、文丘里混合内件12、返混内件5、吸收液喷头10以及除沫机构可具有任意适当的结构，只要能实现其功能即可。然而，同时本发明也提供了这些部件的一些优选的实施方式。
参见图11所示的微气泡发生内件9的实施方式，微气泡发生内件9可包括内件主体900和潜液泵910，内件主体900包括从下至上依次连通的第一变径混合腔920、缩颈安装腔970以及第二变径混合腔950，第一变径混合腔920背离缩颈安装腔970的一端形成液相入口，第一变径混合腔920内设置有锥形腔体960，锥形腔体960朝向缩颈安装腔970的一端开口，缩颈安装腔970内填充有第一混合芯940，内件主体900还包括进气支管930，进气支管930的一端与进气管6的出气端连接，进气支管930的另一端与锥形腔体960连通，潜液泵910的出口与液相入口连通。微气泡发生内件9通过气相管线和液相管线同时相连接固定，能够保证微气泡发生内件9的稳固安装。通过在第一变径混合腔920内设置锥形腔体960，锥形腔体960可以和第一变径混合腔920形成 缩颈流道，降低液相进入第一变径混合腔920的流动阻力，改变液相流体流通面积，造成流速增加，切割第一变径混合腔920中的气体进行初步破碎，从而有效提高微气泡产生效果。
其中，第一变径混合腔920和第二变径混合腔950均为变径结构，第一变径混合腔920和第二变径混合腔950分别与缩颈安装腔970连接的一端均为小径端，即在气液流动方向上形成缩径、扩径的结构形式。潜液泵910可设置在装置内的底部。
具体地，参照图11，第一变径混合腔920包括从下至上相连通的圆柱段和圆锥段，圆锥段的最大直径与圆柱段的直径相等；缩颈安装腔970的直径与圆锥段的最小直径相等，第二变径混合腔950设置为从下至上直径渐扩，第二变径混合腔950的最小直径与缩颈安装腔970的直径相等。锥形腔体960包括从下至上相连通的第一锥形段和第二锥形段，进气支管930与第一锥形段连通。
其中，作为优选，第一锥形段的锥度大于第二锥形段的锥度。
上述实施方式中，微气泡发生内件9的最细处设置第一混合芯940，同时连接一个潜液泵910，潜液泵设置在装置内部靠底部的地方，将筒体中的吸收液通过泵循环注入微气泡发生内件9的第一变径混合腔920的液相入口处，自进气管6而来的气相通过进气支管930进入位于第一变径混合腔920内的锥形腔体960中，气液相在锥形腔体960的开口端进行冲击混合，此时气泡较大，气泡经过第一混合芯940后破碎成较小的微气泡，并通过第二变径混合腔950的气液混合出口处离开微气泡发生内件9。
在其他优选实施方式中，微气泡发生内件9由多孔材质制成，其形状可以根据需求选择管状、半球型、圆盘形等不同形状，优选为球或者半球型以增大表面积，气体向四周扩散更加均匀。微气泡发生内件9与进气管6的连接方式可以为螺栓连接、法兰连接等形式。微气泡发生内件9可以为316不锈钢材质。待处理气体经微气泡发生内件9后在吸收液中形成大量气泡，微气泡发生内件9也可采用专利号为201410081189.1的中国发明专利公开的强化加氢工艺的微气泡发生器。
参见图10所示的文丘里混合内件12的实施方式，文丘里混合内件12包括从下至上依次连接的集气口121、腔体结构以及混合扩径口125，集气口121设置为从下至上直径渐缩(即外扩的喇叭形)，混合扩径口125设置为从下至上(也是气体流动方向)直径渐扩，腔体结构内设置有与混合扩径口125底部相连通的缩颈段123以及与缩颈段123底部相连通的变径段122(沿着气体流动方向从下至上缩径)，缩颈段123内填充有第二混合芯124。这种文丘里混合内件结构简单、紧凑、不易损坏，同时还增加了装置中的气液湍动程度，提高了传质系数和传质效率。其中，通过在文丘里混合内件12最细处设置第二混合芯124，气相可在气浮作用下进入集气口121中，并通过集气口121进入变径段122中，并在缩颈段123经过第二混合芯124对气泡进行压缩破碎，气泡经过第二混合芯124后，通过混合扩径口125发生压力变化进一步破碎分散，离开文丘里混合内件。
其中，文丘里混合内件12还可包括连接腿126，连接腿126连接于混合扩径口125的顶部与返混内件5的底部之间。也就是说，文丘里混合内件12通过连接腿126连接于返混内件5。作为优选，连接腿126的数量不少于3个，具体可以为3个、4个、5个、6个等。
参见图6所示的返混内件5的实施方式，返混内件5为筒式结构，包括内筒530以及安装在内筒530内壁上的分配盘510，内筒530与筒体13同轴设置，且内筒530的外壁与筒体13的内壁之间具有间距。
其中，为了保证返混内件5能够形成返混流动，作为优选，内筒530的高度为500～1500mm，更优选地，内筒530的高度可以为500mm、600mm、700mm、800mm、 900mm、1000mm、1100mm、1200mm、1300mm、1400mm、1500mm等。内筒530的外壁与筒体13的内壁之间的间距为100～200mm，更优选地，该间距可以为100mm、110mm、120mm、130mm、140mm、150mm、160mm、170mm、180mm、190mm、200mm等。
参见图7所示的返混内件5的实施方式，返混内件5包括内筒530以及安装在内筒530内壁上的分配盘510和筛板520，筛板520平行且间隔地设置于分配盘510的上方。
需要特别强调的是，返混内件5安装于筒体13的内壁上，其可以依托于分配盘510的侧边伸出的结构连接安装于筒体的内壁，也可以依托于筛板520侧边伸出的结构连接安装于筒体的内壁，其伸出结构可以是常见的内件安装结构形式，本发明中并不对其具体形式做描述和限定，其是本领域技术人员所具备的常规技术手段。
其中，如图9所示，分配盘510上均匀开设有多个轴向通孔，每个轴向通孔中设置有管式分配器511(也称分配管)。如图8所示，筛板520上开设有多个条形栅格521。具体的，气泡经过返混内件5的位于最下部的分配盘510，气泡从分配盘510中的分配管进入返混内件5中，分配盘510可以对吸收液中的大量气泡进行均布稳定，气泡被分配均布后继续上升经过筛板520，筛板520可对返混内件5中的流体进行稳定，减少扰动；由于自下而上的气体推动的作用，带动吸收液自中心向四周扰动返混，即吸收液区中的液体会在内筒530和筒体13之中形成返混流动，内筒530中的吸收液会通过内筒530与筒体13之间的间隔回流在整个返混内件处形成返混区域。
参见图12和图13所示的吸收液喷头10的实施方式，吸收液喷头10包括喷水板101和设置在喷水板101上的喷水口102。作为优选，喷水口102的轴向与水平方向的夹角为40°～50°，进一步优选45°。喷水板101的横截面为圆形，喷水口102的数量为多个并设置在喷水板101的下表面，多个喷水口102在喷水板101上形成环形喷水阵列，环形喷水阵列与喷水板101同心分布，环形喷水阵列的数量为多条。
参见图1-图5所示的除沫机构的实施方式，除沫机构包括上除沫器2、中除沫器4和下除沫器7，上除沫器2位于进液管3上方，中除沫器4位于进液管3和折流挡板11之间(在没有折流挡板11的情况下，中除沫器4位于进液管3和返混内件5之间)，下除沫器7位于进气管6的下方。
其中，上除沫器2、中除沫器4和下除沫器7均为横向设置在筒体内的丝网结构。
作为优选，上除沫器2的丝网孔径为1～5mm，丝径为0.5～2mm，厚度为50～100mm。例如，上除沫器2的丝网孔径可以为1mm、2mm、3mm、4mm、5mm等，丝径可以为0.5mm、1mm、1.5mm、2mm，厚度可以为50mm、60mm、70mm、80mm、90mm、100mm等。上除沫器2用于对进入排气管1的气相进行除沫，保证排出装置外的气体较为纯净。
作为优选，中除沫器4的丝网孔径为1mm～5mm，丝径为0.5mm～2mm，厚度为100～200mm。例如，中除沫器4的丝网孔径可以为1mm、2mm、3mm、4mm、5mm等，丝径可以为0.5mm、1mm、1.5mm、2mm，厚度可以为100mm、110mm、120mm、130mm、140mm、150mm、160mm、170mm、180mm、190mm、200mm等。中除沫器4可以消除装置中向上移动的气相中夹带的泡沫，防止对吸收液的喷洒效果造成影响。
下除沫器7的丝网孔径为2mm～8mm，丝径为0.5mm～2mm，厚度为100～200mm。例如，下除沫器7的丝网孔径可以为2mm、3mm、4mm、5mm、6mm、7mm、8mm，丝径可以为0.5mm、1mm、1.5mm、2mm，厚度可以为100mm、110mm、120mm、130mm、140mm、150mm、160mm、170mm、180mm、190mm、200mm等。下除沫器7位于装置的下封头15内部，可以消除自装置底部离开的液相中的泡沫。
另外，需要说明的是，本发明中的第一和第二混合芯为规整填料，材质为不锈钢。 本发明中，为了产生微气泡，微气泡发生内件9和文丘里混合内件12的用于出气的孔径(具体地，例如第一和第二混合芯中的孔的孔径)需为微米级，例如0.5-3μm。
下面通过实施例和对比例介绍本发明的气体处理装置相比于现有技术中板式吸收塔的有益效果。
实施例1和实施例2均采用图5所示气体处理装置对含硫尾气进行吸收处理，对比例采用现有技术中的板式吸收塔对相同组分的含硫尾气进行吸收处理，具体对比见下表。
通过上表可以看出，处理相同组分的含硫尾气，相较于对比例，实施例保证处理要求的前提下，可以显著降低反应器高度以及减少吸收液用量。
实施例1在达到同样处理要求的条件下，可以减少吸收液用量25％左右。实施例2在达到同样处理要求的条件下，可以降低反应器高度15％左右。实施例1和2的传质系数相较于对比例有较大提升。
本发明还提供一种气体处理方法，所述方法包括以下步骤：
S1、使待处理气体以微气泡的形式通入吸收液区中进行一次反应；
S2、使所述吸收液区中的吸收液在向上流动的微气泡流的作用下形成返混的涡流；
S3、从所述吸收液区的上方向下喷淋吸收液，使得从所述吸收液区逸出的气体在向上流动的过程中与向下喷淋的吸收液进行二次反应。
本发明的气体处理方法，通过上述技术方案，使待处理气体以微气泡的形式通入吸收液区中，吸收液区中的吸收液为连续相，气体为分散相，气液之间接触面积大，传质效率高，气体与吸收液一次反应，对气体中的待吸收组分进行快速反应；通过从吸收液区的上方向下喷淋吸收液，使得从吸收液区逸出的气体在向上流动的过程中与向下喷淋的吸收液进行二次反应，气体为连续相，液体为喷洒在气体中的分散相，气液之间接触面积大，传质效率高。因此，本发明的气体处理方法在对气体中某成分进行充分吸收、提高传质效率的同时，还提高了空间利用。
在一些实施方式中，所述方法还包括：在所述步骤S2之前对所述微气泡流进一步破碎增速。
所述方法可以采用本发明的气体处理装置进行，所述气体处理装置的处理过程及优点相应地体现在所述方法中。
当然，在其他实施方式中，所述方法也可以采用其他任意适当的气体处理装置进行。
至此，已经详细描述了本发明的各实施方式。为了避免遮蔽本发明的构思，没有描述本领域所公知的一些细节。本领域技术人员根据上面的描述，完全可以明白如何实施这里公开的技术方案。
虽然已经通过示例对本发明的一些特定实施方式进行了详细说明，但是本领域的 技术人员应该理解，以上示例仅是为了进行说明，而不是为了限制本发明的范围。本领域的技术人员应该理解，可在不脱离本发明的范围和精神的情况下，对以上实施方式进行修改或者对部分技术特征进行等同替换。尤其是，只要不存在结构冲突，各个实施方式中所提到的各项技术特征均可以任意方式组合起来。

Claims (15)

  1. 一种气体处理装置，包括筒体(13)、连接在所述筒体(13)上端的上封头(14)和连接在所述筒体(13)下端的下封头(15)，其特征在于：
    所述筒体(13)的靠近所述上封头(14)的位置设置有进液管(3)，所述进液管(3)的出液端伸入所述筒体(13)内，所述出液端连接有吸收液喷头(10)，用于向下喷淋吸收液；
    所述筒体(13)的靠近所述下封头(15)的位置设置有进气管(6)，所述进气管(6)的出气端伸入所述筒体(13)内，用于向所述筒体(13)内输入待处理气体；
    所述进气管(6)的出气端连接有微气泡发生内件(9)，所述微气泡发生内件(9)用于将来自所述出气端的待处理气体形成微气泡并将其混入吸收液中；
    所述微气泡发生内件(9)上方的筒体内设置有返混内件(5)，所述返混内件(5)用于在向上的微气泡流的作用下使吸收液形成返混的涡流。
  2. 根据权利要求1所述的气体处理装置，其特征在于，所述微气泡发生内件(9)包括内件主体(900)和潜液泵(910)，所述内件主体(900)包括从下至上依次连通的第一变径混合腔(920)、缩颈安装腔(970)以及第二变径混合腔(950)，所述第一变径混合腔(920)背离所述缩颈安装腔(970)的一端形成液相入口，所述第一变径混合腔(920)内设置有锥形腔体(960)，所述锥形腔体(960)朝向所述缩颈安装腔(970)的一端开口，所述缩颈安装腔(970)内填充有第一混合芯(940)，所述内件主体(900)还包括进气支管(930)，所述进气支管(930)的一端与所述进气管(6)的出气端连接，所述进气支管(930)的另一端与所述锥形腔体(960)连通，所述潜液泵(910)的出口与所述液相入口连通。
  3. 根据权利要求2所述的气体处理装置，其特征在于，所述第一变径混合腔(920)和所述第二变径混合腔(950)分别与所述缩颈安装腔(970)连接的一端均为小径端。
  4. 根据权利要求3所述的气体处理装置，其特征在于，所述第一变径混合腔(920)包括从下至上相连通的圆柱段和圆锥段，所述圆锥段的最大直径与所述圆柱段的直径相等；所述缩颈安装腔(970)的直径与所述圆锥段的最小直径相等，所述第二变径混合腔(950)设置为从下至上直径渐扩，所述第二变径混合腔(950)的最小直径与所述缩颈安装腔(970)的直径相等。
  5. 根据权利要求4所述的气体处理装置，其特征在于，所述锥形腔体(960)包括从下至上相连通的第一锥形段和第二锥形段，所述进气支管(930)与所述第一锥形段连通；
    优选地，所述第一锥形段的锥度大于所述第二锥形段的锥度。
  6. 根据权利要求1-5中任一项所述的气体处理装置，其特征在于，所述微气泡发生内件(9)与所述返混内件(5)之间的筒体内设置有文丘里混合内件(12)，所述文丘里混合内件(12)用于将来自所述微气泡发生内件(9)的微气泡流进一步破碎增速后向上输出。
  7. 根据权利要求6所述的气体处理装置，其特征在于，所述文丘里混合内件(12)包括从下至上依次连接的集气口(121)、腔体结构以及混合扩径口(125)，所述集气口(121)设置为从下至上直径渐缩，所述混合扩径口(125)设置为从下至上直径渐扩，所述腔体结构内设置有与所述混合扩径口(125)底部相连通的缩颈段(123)以及与所述缩颈段(123)底部相连通的变径段(122)，所述缩颈段(123)内填充有第二混合芯(124)；
    优选地，所述文丘里混合内件(12)还包括连接腿(126)，所述连接腿(126)连接于所述混合扩径口(125)的顶部与所述返混内件(5)的底部之间。
  8. 根据权利要求1-7中任一项所述的气体处理装置，其特征在于，所述返混内件(5)包括内筒(530)以及安装在所述内筒(530)内壁上的分配盘(510)，所述内筒(530)与所述筒体(13)同轴设置，且所述内筒(530)的外壁与所述筒体(13)的内壁之间具有间距；和/或
    所述上封头(14)的上部设置有排气管(1)，所述下封头(15)的下部设置有排液管(8)。
  9. 根据权利要求8所述的气体处理装置，其特征在于，所述内筒(530)的高度为500～1500mm，所述内筒(530)的外壁与所述筒体(13)的内壁之间的间距为100～200mm；和/或
    所述返混内件(5)还包括安装在所述内筒(530)内壁上的筛板(520)，所述筛板(520)间隔地设置于所述分配盘(510)的上方。
  10. 根据权利要求9所述的气体处理装置，其特征在于，所述分配盘(510)上开设有多个轴向通孔，每个所述轴向通孔中设置有管式分配器(511)；和/或所述筛板(520)上开设有多个条形栅格(521)。
  11. 根据权利要求1-10中任一项所述的气体处理装置，其特征在于，所述返混内件(5)和所述进液管(3)之间的筒体内壁上设置有折流挡板(11)，和/或所述筒体(13)的内壁上还安装有除沫机构。
  12. 根据权利要求11所述的气体处理装置，其特征在于，所述除沫机构包括上除沫器(2)、中除沫器(4)和下除沫器(7)，所述上除沫器(2)位于所述进液管(3)上方，所述中除沫器(4)位于所述进液管(3)和所述折流挡板(11)之间，所述下除沫器(7)位于所述进气管(6)的下方。
  13. 根据权利要求12所述的气体处理装置，其特征在于，所述上除沫器(2)、中除沫器(4)和下除沫器(7)均为丝网结构，
    所述上除沫器(2)的丝网孔径为1～5mm，丝径为0.5～2mm，厚度为50～100mm；
    所述中除沫器(4)的丝网孔径为1mm～5mm，丝径为0.5mm～2mm，厚度为100～200mm；
    所述下除沫器(7)的丝网孔径为2mm～8mm，丝径为0.5mm～2mm，厚度为100～200mm。
  14. 一种气体处理方法，其特征在于，所述方法包括以下步骤：
    S1、使待处理气体以微气泡的形式通入吸收液区中进行一次反应；
    S2、使所述吸收液区中的吸收液在向上流动的微气泡流的作用下形成返混的涡流；
    S3、从所述吸收液区的上方向下喷淋吸收液，使得从所述吸收液区逸出的气体在向上流动的过程中与向下喷淋的吸收液进行二次反应。
  15. 根据权利要求14所述的气体处理方法，其特征在于，所述方法还包括：在所述步骤S2之前对所述微气泡流进一步破碎增速；和/或
    所述方法采用权利要求1-13中任一项所述的气体处理装置进行。
PCT/CN2023/140737 2023-03-08 2023-12-21 气体处理装置和气体处理方法 Ceased WO2024183412A1 (zh)

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