Classifications

• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/32—Holograms used as optical elements
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/70—Microphotolithographic exposure; Apparatus therefor
  • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
• • G—PHYSICS
  • G06—COMPUTING OR CALCULATING; COUNTING
  • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
  • G06V10/00—Arrangements for image or video recognition or understanding
  • G06V10/88—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters
  • G06V10/89—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators
  • G06V10/893—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators characterised by the kind of filter
  • G06V10/895—Image or video recognition using optical means, e.g. reference filters, holographic masks, frequency domain filters or spatial domain filters using frequency domain filters, e.g. Fourier masks implemented on spatial light modulators characterised by the kind of filter the filter being related to phase processing, e.g. phase-only filters
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
  • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
  • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
  • H10P76/2041—Photolithographic processes
  • H10P76/2042—Photolithographic processes using lasers

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Mathematical Physics (AREA)
• Multimedia (AREA)
• Theoretical Computer Science (AREA)
• Optics & Photonics (AREA)
• Holo Graphy (AREA)

Applications Claiming Priority (2)

Publications (1)

Family

ID=25753128

Family Applications (1)

Country Status (7)

Families Citing this family (4)

• 1967
  • 1967-08-05 DE DE19671572805 patent/DE1572805B1/en not_active Withdrawn
• 1968
  • 1968-08-01 NL NL6810976A patent/NL6810976A/xx unknown
  • 1968-08-02 AT AT754468A patent/AT293058B/en not_active IP Right Cessation
  • 1968-08-02 GB GB1227151D patent/GB1227151A/en not_active Expired
  • 1968-08-02 CH CH1160368A patent/CH509609A/en not_active IP Right Cessation
  • 1968-08-05 BE BE719091D patent/BE719091A/xx unknown
  • 1968-08-05 FR FR1579159D patent/FR1579159A/fr not_active Expired

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