AT317625B - Galvanic nickel bath for the deposition of satin nickel coatings - Google Patents
Galvanic nickel bath for the deposition of satin nickel coatingsInfo
- Publication number
- AT317625B AT317625B AT74273A AT74273A AT317625B AT 317625 B AT317625 B AT 317625B AT 74273 A AT74273 A AT 74273A AT 74273 A AT74273 A AT 74273A AT 317625 B AT317625 B AT 317625B
- Authority
- AT
- Austria
- Prior art keywords
- nickel
- deposition
- satin
- galvanic
- coatings
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Paints Or Removers (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19722204171 DE2204171B2 (en) | 1972-01-29 | 1972-01-29 | GALVANIC NICKEL BATH FOR DEPOSITING SILK MATT NICKEL COATINGS |
| US334298A US3865702A (en) | 1972-01-29 | 1973-02-21 | Galvanic nickel bath for depositing silk-dull nickel coats |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AT317625B true AT317625B (en) | 1974-09-10 |
Family
ID=25762635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT74273A AT317625B (en) | 1972-01-29 | 1973-01-29 | Galvanic nickel bath for the deposition of satin nickel coatings |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3865702A (en) |
| AT (1) | AT317625B (en) |
| BE (1) | BE794695A (en) |
| DE (1) | DE2204171B2 (en) |
| FR (1) | FR2169404B1 (en) |
| GB (1) | GB1376552A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19540011C2 (en) * | 1995-10-27 | 1998-09-10 | Lpw Chemie Gmbh | Process for the galvanic deposition of glare-free nickel or nickel alloy deposits |
| JP3954958B2 (en) * | 2002-11-26 | 2007-08-08 | 古河テクノリサーチ株式会社 | Copper foil with resistive layer and circuit board material with resistive layer |
| US20050056542A1 (en) * | 2003-07-04 | 2005-03-17 | Seiko Epson Corporation | Plating tool, plating method, electroplating apparatus, plated product, and method for producing plated product |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2315802A (en) * | 1940-04-20 | 1943-04-06 | Harshaw Chem Corp | Nickel plating |
| NL238451A (en) * | 1958-04-24 | |||
| US2986500A (en) * | 1959-04-21 | 1961-05-30 | Metal & Thermit Corp | Electrodeposition of bright nickel |
-
0
- BE BE794695D patent/BE794695A/en unknown
-
1972
- 1972-01-29 DE DE19722204171 patent/DE2204171B2/en active Granted
-
1973
- 1973-01-29 AT AT74273A patent/AT317625B/en not_active IP Right Cessation
- 1973-01-29 FR FR7303080A patent/FR2169404B1/fr not_active Expired
- 1973-01-29 GB GB445273A patent/GB1376552A/en not_active Expired
- 1973-02-21 US US334298A patent/US3865702A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE2204171A1 (en) | 1973-08-16 |
| US3865702A (en) | 1975-02-11 |
| FR2169404A1 (en) | 1973-09-07 |
| GB1376552A (en) | 1974-12-04 |
| DE2204171B2 (en) | 1976-07-22 |
| FR2169404B1 (en) | 1975-10-31 |
| BE794695A (en) | 1973-05-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EIH | Change in the person of patent owner | ||
| ELJ | Ceased due to non-payment of the annual fee |