ATA140199A - Interferometrische einrichtung zur messung der lage eines reflektierenden objektes - Google Patents

Interferometrische einrichtung zur messung der lage eines reflektierenden objektes

Info

Publication number
ATA140199A
ATA140199A AT140199A AT140199A ATA140199A AT A140199 A ATA140199 A AT A140199A AT 140199 A AT140199 A AT 140199A AT 140199 A AT140199 A AT 140199A AT A140199 A ATA140199 A AT A140199A
Authority
AT
Austria
Prior art keywords
measuring
reflective object
interferometric device
interferometric
reflective
Prior art date
Application number
AT140199A
Other languages
English (en)
Other versions
AT407800B (de
Inventor
Johannes Trautner
Gerhard Dr Leuchs
Original Assignee
Gerhard Dr Leuchs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gerhard Dr Leuchs filed Critical Gerhard Dr Leuchs
Priority to AT140199A priority Critical patent/AT407800B/de
Priority to DE2000138346 priority patent/DE10038346A1/de
Publication of ATA140199A publication Critical patent/ATA140199A/de
Application granted granted Critical
Publication of AT407800B publication Critical patent/AT407800B/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02012—Interferometers characterised by controlling or generating intrinsic radiation properties using temporal intensity variation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02075—Reduction or prevention of errors; Testing; Calibration of particular errors
    • G01B9/02082—Caused by speckles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/06213—Amplitude modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068—Stabilisation of laser output parameters
    • H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068—Stabilisation of laser output parameters
    • H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
    • H01S5/06832—Stabilising during amplitude modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/068—Stabilisation of laser output parameters
    • H01S5/0683—Stabilisation of laser output parameters by monitoring the optical output parameters
    • H01S5/0687—Stabilising the frequency of the laser

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
AT140199A 1999-08-16 1999-08-16 Interferometrische einrichtung zur messung der lage eines reflektierenden objektes AT407800B (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AT140199A AT407800B (de) 1999-08-16 1999-08-16 Interferometrische einrichtung zur messung der lage eines reflektierenden objektes
DE2000138346 DE10038346A1 (de) 1999-08-16 2000-08-05 Interferometrische Einrichtung zur Messung der Lage eines reflektierenden Objektes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT140199A AT407800B (de) 1999-08-16 1999-08-16 Interferometrische einrichtung zur messung der lage eines reflektierenden objektes

Publications (2)

Publication Number Publication Date
ATA140199A true ATA140199A (de) 2000-10-15
AT407800B AT407800B (de) 2001-06-25

Family

ID=3513100

Family Applications (1)

Application Number Title Priority Date Filing Date
AT140199A AT407800B (de) 1999-08-16 1999-08-16 Interferometrische einrichtung zur messung der lage eines reflektierenden objektes

Country Status (2)

Country Link
AT (1) AT407800B (de)
DE (1) DE10038346A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113587844A (zh) * 2021-07-27 2021-11-02 中国科学院长春光学精密机械与物理研究所 移相干涉测量系统及测量方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005051245A (ja) 2003-07-30 2005-02-24 Asml Netherlands Bv リソグラフィ装置
ATE513229T1 (de) * 2008-12-12 2011-07-15 Lambda 4 Entwicklungen Gmbh Verfahren zur bestimmung der entfernung zwischen zwei objekten
EP2710398B1 (de) 2011-05-18 2017-03-29 Lambda: 4 Entwicklungen GmbH Verfahren zur bestimmung des standortes eines empfängers
US20150131078A1 (en) * 2013-11-08 2015-05-14 The Boeing Company Synthetic wave laser ranging sensors and methods
US9025141B1 (en) * 2013-11-08 2015-05-05 The Boeing Company Position determination using synthetic wave laser ranging
KR20210013577A (ko) 2018-05-18 2021-02-04 더 리젠츠 오브 더 유니버시티 오브 미시건 주파수 변조 간섭계를 위한 경로 변동 모니터링

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113587844A (zh) * 2021-07-27 2021-11-02 中国科学院长春光学精密机械与物理研究所 移相干涉测量系统及测量方法

Also Published As

Publication number Publication date
AT407800B (de) 2001-06-25
DE10038346A1 (de) 2001-06-13

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee