ATA153198A - Verfahren zur herstellung einer hochreinen tantalverbindung - Google Patents
Verfahren zur herstellung einer hochreinen tantalverbindungInfo
- Publication number
- ATA153198A ATA153198A AT0153198A AT153198A ATA153198A AT A153198 A ATA153198 A AT A153198A AT 0153198 A AT0153198 A AT 0153198A AT 153198 A AT153198 A AT 153198A AT A153198 A ATA153198 A AT A153198A
- Authority
- AT
- Austria
- Prior art keywords
- tantalic
- compound
- producing
- highly pure
- pure
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G35/00—Compounds of tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/24—Obtaining niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/82—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by IR- or Raman-data
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/89—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by mass-spectroscopy
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/928,369 US6010676A (en) | 1997-09-12 | 1997-09-12 | Method for making a highly pure tantalum compound |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| ATA153198A true ATA153198A (de) | 2002-05-15 |
| AT409959B AT409959B (de) | 2002-12-27 |
Family
ID=25456152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT0153198A AT409959B (de) | 1997-09-12 | 1998-09-10 | Verfahren zur herstellung einer hochreinen tantalverbindung |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6010676A (de) |
| AT (1) | AT409959B (de) |
| DE (1) | DE19841774B4 (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6323055B1 (en) * | 1998-05-27 | 2001-11-27 | The Alta Group, Inc. | Tantalum sputtering target and method of manufacture |
| US6348113B1 (en) | 1998-11-25 | 2002-02-19 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
| CN1213949C (zh) * | 1999-12-28 | 2005-08-10 | 三井金属矿业株式会社 | 氟化钽酸钾结晶的制造方法及氟化钽酸钾结晶 |
| WO2001096620A2 (en) | 2000-05-22 | 2001-12-20 | Cabot Corporation | High purity niobium and products containing the same, and methods of making the same |
| US6383459B1 (en) | 2000-08-31 | 2002-05-07 | Osram Sylvania Inc. | Method for purifying a tantalum compound using a fluoride compound and sulfuric acid |
| US7182925B2 (en) * | 2003-04-24 | 2007-02-27 | Osram Sylvania Inc. | Tantalum concentrates dissolution and purification method |
| WO2009052007A1 (en) * | 2007-10-15 | 2009-04-23 | Hi-Temp Specialty Metals, Inc. | Method for the production of tantalum powder using reclaimed scrap as source material |
| RU2623522C1 (ru) * | 2016-04-21 | 2017-06-27 | Общество с ограниченной ответственностью "Научно-производственная компания "Русредмет" (ООО "НПК "Русредмет") | Способ получения фтортанталата калия из танталсодержащих растворов |
| CN119255968A (zh) * | 2024-08-21 | 2025-01-03 | 宁夏东方钽业股份有限公司 | 一种五氧化二钽粉末及其制备方法和用途 |
| CN120028120B (zh) * | 2025-03-11 | 2025-12-12 | 国标(北京)检验认证有限公司 | 一种痕量元素分析用纯钽标准样品的制备方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1066188B (de) * | 1959-10-01 | Buss A.G., Basel (Schweiz) | Verfahren zur Herstellung von Fluoriden und Doppelfluoriden | |
| US3117833A (en) * | 1958-09-25 | 1964-01-14 | Fansteel Metallurgical Corp | Process of purifying and separating columbium and tantalum values from each other |
| US3712939A (en) * | 1971-03-29 | 1973-01-23 | Union Carbide Corp | Method for recovering tantalum and/or columbium |
| US3907976A (en) * | 1974-11-29 | 1975-09-23 | Mallinckrodt Inc | Continuous process for preparing potassium fluotantalate crystals |
| DE2537354C3 (de) * | 1975-08-21 | 1978-03-09 | Fa. Hermann C. Starck Berlin, 1000 Berlin | Verfahren zur Herstellung von kristallinem Kaliumtantalfluorid |
| JPS56114831A (en) * | 1980-02-15 | 1981-09-09 | Toshiba Corp | Recovery of tantalum from scrap containing tantalum |
| US4663130A (en) * | 1983-11-14 | 1987-05-05 | Cabot Corporation | Process for dissolving tantalum/columbium materials containing alkali metal impurities |
| US4537750A (en) * | 1984-02-29 | 1985-08-27 | Gte Products Corporation | Process for producing high purity tantalum oxide |
| JPS61146717A (ja) * | 1984-12-18 | 1986-07-04 | Sumitomo Chem Co Ltd | タンタルの精製方法 |
| JPS62241824A (ja) * | 1986-04-10 | 1987-10-22 | Sumitomo Chem Co Ltd | タンタルとニオブの分離精製方法 |
| JPH01313333A (ja) * | 1988-06-13 | 1989-12-18 | Central Glass Co Ltd | 高純度水酸化ニオブまたは水酸化タンタルの製造方法 |
| DE3904292A1 (de) * | 1989-02-14 | 1990-08-16 | Starck Hermann C Fa | Hochreines tantalpentoxid sowie verfahren zu dessen herstellung |
| US5635146A (en) * | 1995-11-30 | 1997-06-03 | Osram Sylvania Inc. | Method for the dissolution and purification of tantalum pentoxide |
-
1997
- 1997-09-12 US US08/928,369 patent/US6010676A/en not_active Expired - Fee Related
-
1998
- 1998-09-10 AT AT0153198A patent/AT409959B/de not_active IP Right Cessation
- 1998-09-11 DE DE19841774A patent/DE19841774B4/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| AT409959B (de) | 2002-12-27 |
| DE19841774B4 (de) | 2008-07-24 |
| US6010676A (en) | 2000-01-04 |
| DE19841774A1 (de) | 1999-03-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE69906491D1 (de) | VERFAHREN ZUR HERSTELLUNG EINER SiCOI-STRUKTUR | |
| DE69619691D1 (de) | Verfahren zur herstellung einer beugungsstruktur | |
| DE69730940D1 (de) | Verfahren zur herstellung einer halbleiteranordnung | |
| DE69823027D1 (de) | Verfahren zur herstellung einer waschmittelzusammensetzung | |
| ATE259315T1 (de) | Verfahren zur herstellung einer stossanfängeranordnung | |
| DE69801560D1 (de) | Verfahren zur herstellung einer katalysatorzusammenstellung | |
| ATA186898A (de) | Verfahren zur herstellung einer cellulosecarbamatlösung | |
| DE69932665D1 (de) | Verfahren zur Herstellung einer Verbindungsstruktur | |
| DE69504104D1 (de) | Verbessertes verfahren zur herstellung einer weichen spitze | |
| DE69828198D1 (de) | Verfahren zur herstellung einer thermoplastischen beschichtung | |
| DE69840399D1 (de) | Verfahren zur Herstellung einer Gate-Elektrode | |
| DE69727655D1 (de) | Verfahren zur herstellung einer cdte-schicht | |
| DE69701890D1 (de) | Verfahren zur herstellung einer abbindenden zusammensetzung | |
| DE59914827D1 (de) | Verfahren zur herstellung einer bond-draht-verbindung | |
| DE69836401D1 (de) | Verfahren zur Herstellung einer Halbleiteranordnung | |
| DE69831195D1 (de) | Verfahren zur Herstellung einer Phasenverzögerungsfolie | |
| DE59813165D1 (de) | Verfahren zur Herstellung einer Vakuumkammer | |
| DE69615052D1 (de) | Verfahren zur herstellung einer benzimidazolverbindung | |
| DE69626526D1 (de) | Verfahren zur herstellung einer kautschukzusammensetzung | |
| DE69607546D1 (de) | Verfahren zur Herstellung einer Schaltungsanordnung | |
| DE69940737D1 (de) | Verfahren zur herstellung einer halbleiteranordnung | |
| DE69701731D1 (de) | Verfahren zur herstellung einer waschmittelzusammensetzung | |
| DE69827966D1 (de) | Verfahren zur herstellung einer querfaserbahn | |
| DE69840320D1 (de) | Verfahren zur Herstellung einer Gateelektrode | |
| DE59800621D1 (de) | Verfahren zur Herstellung einer mikromechanischen Halbleiteranordnung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ELJ | Ceased due to non-payment of the annual fee |