ATE100827T1 - Haertbare polymere. - Google Patents
Haertbare polymere.Info
- Publication number
- ATE100827T1 ATE100827T1 AT87304584T AT87304584T ATE100827T1 AT E100827 T1 ATE100827 T1 AT E100827T1 AT 87304584 T AT87304584 T AT 87304584T AT 87304584 T AT87304584 T AT 87304584T AT E100827 T1 ATE100827 T1 AT E100827T1
- Authority
- AT
- Austria
- Prior art keywords
- thermal
- prepolymer
- curable polymers
- utilisable
- maleated
- Prior art date
Links
- 229920000642 polymer Polymers 0.000 title 1
- 230000005855 radiation Effects 0.000 abstract 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- 239000004215 Carbon black (E152) Substances 0.000 abstract 1
- 239000000853 adhesive Substances 0.000 abstract 1
- 230000001070 adhesive effect Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 150000002430 hydrocarbons Chemical class 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 239000000565 sealant Substances 0.000 abstract 1
- 229920001187 thermosetting polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
- C08C19/00—Chemical modification of rubber
- C08C19/30—Addition of a reagent which reacts with a hetero atom or a group containing hetero atoms of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/04—Polymers provided for in subclasses C08C or C08F
- C08F290/048—Polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Sealing Material Composition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US86651586A | 1986-05-23 | 1986-05-23 | |
| EP87304584A EP0246918B1 (de) | 1986-05-23 | 1987-05-22 | Härtbare Polymere |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE100827T1 true ATE100827T1 (de) | 1994-02-15 |
Family
ID=25347773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT87304584T ATE100827T1 (de) | 1986-05-23 | 1987-05-22 | Haertbare polymere. |
Country Status (8)
| Country | Link |
|---|---|
| EP (1) | EP0246918B1 (de) |
| JP (1) | JPS62280204A (de) |
| AT (1) | ATE100827T1 (de) |
| AU (1) | AU7310587A (de) |
| BR (1) | BR8702475A (de) |
| DE (1) | DE3788897T2 (de) |
| NZ (1) | NZ219854A (de) |
| ZA (1) | ZA872282B (de) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4857434A (en) * | 1986-09-23 | 1989-08-15 | W. R. Grace & Co. | Radiation curable liquid (meth) acrylated polymeric hydrocarbon maleate prepolymers and formulations containing same |
| DE3710343A1 (de) * | 1987-03-28 | 1988-10-06 | Basf Lacke & Farben | Verzweigtes acrylatcopolymerisat mit polisierbaren doppelbindungen und verfahren zur herstellung des acrylatcopolymerisats |
| ES2051985T3 (es) * | 1988-06-15 | 1994-07-01 | Akzo Nv | Composicion de revestimiento liquida curable a temperatura ambiente. |
| KR0183393B1 (ko) * | 1989-05-09 | 1999-05-15 | 오노 알버어스 | 관능화된 탄성 중합체 및 이를 제조하기 위한 방법 |
| WO1997012918A1 (en) | 1995-10-06 | 1997-04-10 | Nippon Shokubai Co., Ltd. | (meth)acrylic syrup, process for preparing the same, and process for preparing molding material containing (meth)acrylic syrup |
| CN1152061C (zh) * | 1998-02-27 | 2004-06-02 | 钟渊化学工业株式会社 | 丙烯酰基或甲基丙烯酰基封端的乙烯基聚合物及其用途 |
| US7241540B2 (en) * | 2004-04-27 | 2007-07-10 | Kraton Polymers U.S. Llc | Photocurable compositions and flexographic printing plates comprising the same |
| EP3026065B1 (de) * | 2013-12-04 | 2017-11-01 | Kuraray Co., Ltd. | Modifizierter flüssiger dienkautschuk und herstellungsverfahren dafür |
| KR102365812B1 (ko) | 2014-12-25 | 2022-02-21 | 주식회사 쿠라레 | 변성 액상 디엔계 고무 및 그 변성 액상 디엔계 고무를 함유하는 수지 조성물 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51116893A (en) * | 1975-04-08 | 1976-10-14 | Ube Ind Ltd | Photo-setting compositions |
| AU507014B2 (en) * | 1975-11-05 | 1980-01-31 | Hercules Inc. | Photopolymer compositions |
-
1987
- 1987-03-27 ZA ZA872282A patent/ZA872282B/xx unknown
- 1987-04-02 NZ NZ219854A patent/NZ219854A/xx unknown
- 1987-05-14 BR BR8702475A patent/BR8702475A/pt unknown
- 1987-05-15 AU AU73105/87A patent/AU7310587A/en not_active Abandoned
- 1987-05-20 JP JP62121432A patent/JPS62280204A/ja active Pending
- 1987-05-22 EP EP87304584A patent/EP0246918B1/de not_active Expired - Lifetime
- 1987-05-22 DE DE87304584T patent/DE3788897T2/de not_active Expired - Fee Related
- 1987-05-22 AT AT87304584T patent/ATE100827T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| NZ219854A (en) | 1990-07-26 |
| DE3788897D1 (de) | 1994-03-10 |
| AU7310587A (en) | 1987-11-26 |
| EP0246918A1 (de) | 1987-11-25 |
| JPS62280204A (ja) | 1987-12-05 |
| DE3788897T2 (de) | 1994-05-05 |
| ZA872282B (en) | 1987-11-25 |
| BR8702475A (pt) | 1988-02-23 |
| EP0246918B1 (de) | 1994-01-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |