ATE112294T1 - Verfahren zur erniedrigung der dielektrizitätskonstante von polyimiden mit hilfe von diaminosäurezusätzen. - Google Patents
Verfahren zur erniedrigung der dielektrizitätskonstante von polyimiden mit hilfe von diaminosäurezusätzen.Info
- Publication number
- ATE112294T1 ATE112294T1 AT89909672T AT89909672T ATE112294T1 AT E112294 T1 ATE112294 T1 AT E112294T1 AT 89909672 T AT89909672 T AT 89909672T AT 89909672 T AT89909672 T AT 89909672T AT E112294 T1 ATE112294 T1 AT E112294T1
- Authority
- AT
- Austria
- Prior art keywords
- polyimides
- lowering
- acid additives
- diamino acid
- dielectricity constant
- Prior art date
Links
- 239000004642 Polyimide Substances 0.000 title abstract 4
- 229920001721 polyimide Polymers 0.000 title abstract 4
- 239000002253 acid Substances 0.000 title abstract 2
- 239000000654 additive Substances 0.000 title abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 150000004984 aromatic diamines Chemical class 0.000 abstract 1
- 230000005494 condensation Effects 0.000 abstract 1
- 238000009833 condensation Methods 0.000 abstract 1
- 239000000615 nonconductor Substances 0.000 abstract 1
- 229920005575 poly(amic acid) Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
- C08G73/1071—Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/303—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
- H01B3/306—Polyimides or polyesterimides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/38—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes condensation products of aldehydes with amines or amides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Formation Of Insulating Films (AREA)
- Organic Insulating Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/239,259 US4895972A (en) | 1988-09-01 | 1988-09-01 | Process for lowering the dielectric constant of polyimides using diamic acid additives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE112294T1 true ATE112294T1 (de) | 1994-10-15 |
Family
ID=22901356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT89909672T ATE112294T1 (de) | 1988-09-01 | 1989-08-23 | Verfahren zur erniedrigung der dielektrizitätskonstante von polyimiden mit hilfe von diaminosäurezusätzen. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US4895972A (de) |
| EP (1) | EP0386207B1 (de) |
| JP (1) | JPH068360B2 (de) |
| KR (1) | KR900701877A (de) |
| AT (1) | ATE112294T1 (de) |
| AU (1) | AU623684B2 (de) |
| CA (1) | CA1334362C (de) |
| DE (2) | DE68918576T4 (de) |
| WO (1) | WO1990002767A1 (de) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5428102A (en) * | 1987-07-15 | 1995-06-27 | The United States Of America As Represented By The United States National Aeronautics And Space Administration | Low dielectric polyimides |
| US5338826A (en) * | 1987-07-15 | 1994-08-16 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administation | Structures from low dielectric polyimides |
| US5137751A (en) * | 1990-03-09 | 1992-08-11 | Amoco Corporation | Process for making thick multilayers of polyimide |
| CA2040994A1 (en) * | 1990-05-08 | 1991-11-09 | David D. Ngo | Photoimageable polyimide coating |
| US5427862A (en) * | 1990-05-08 | 1995-06-27 | Amoco Corporation | Photocurable polyimide coated glass fiber |
| US5147966A (en) * | 1990-07-31 | 1992-09-15 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Polyimide molding powder, coating, adhesive and matrix resin |
| US5219977A (en) * | 1990-12-17 | 1993-06-15 | E. I. Du Pont De Nemours And Company | Tetrapolyimide film containing oxydipthalic dianhydride |
| CA2057420A1 (en) * | 1990-12-17 | 1992-06-18 | John A. Kreuz | Tetrapolyimide film containing oxydiphthalic dianhydride |
| US5243024A (en) * | 1990-12-21 | 1993-09-07 | Amoco Corporation | High moduli polyimides |
| US5218077A (en) * | 1991-08-26 | 1993-06-08 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Diphenylmethane-containing dianhydride and polyimides prepared therefrom |
| US5212283A (en) * | 1992-03-03 | 1993-05-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Polyimides containing the cyclobutene-3, 4-dione moiety |
| US5502156A (en) * | 1994-07-28 | 1996-03-26 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Electrically conducting polyimide film containing tin complexes |
| US5741883A (en) * | 1994-12-16 | 1998-04-21 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Tough, soluble, aromatic, thermoplastic copolyimides |
| US5644022A (en) * | 1995-02-14 | 1997-07-01 | The United States Of America As Represented By The Admninistrator Of The National Aeronautics And Space Administration | Copolyimides prepared from 3,4'-oxydianiline and 1,3-bis(3-aminophenoxy) benzene with 3,3'-4,4'-biphenylcarboxylic dianhydride having reactive endgroups |
| US5866676A (en) * | 1995-02-14 | 1999-02-02 | The United States Of America As Represented By The United States National Aeronautics And Space Administration | Copolyimides prepared from 3,4'-oxydianiline and 1,3-bis(3-aminophenoxy) benzene with 3,3', 4, 4'-biphenylcarboxylic dianhydride |
| US6277203B1 (en) | 1998-09-29 | 2001-08-21 | Lam Research Corporation | Method and apparatus for cleaning low K dielectric and metal wafer surfaces |
| WO2003087194A1 (en) * | 2002-04-05 | 2003-10-23 | United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Polyimides from 2,3,3',4'-biphenyltetracarboxylic dianhydride and aromatic diamines |
| TWI418602B (zh) * | 2007-06-25 | 2013-12-11 | 布魯爾科技公司 | 高溫旋塗暫時結合組成物 |
| KR101543478B1 (ko) | 2010-12-31 | 2015-08-10 | 코오롱인더스트리 주식회사 | 투명 폴리이미드 필름 및 그 제조방법 |
| KR101509831B1 (ko) | 2010-12-31 | 2015-04-08 | 코오롱인더스트리 주식회사 | 폴리이미드 필름의 제조방법 |
| WO2014182292A1 (en) | 2013-05-08 | 2014-11-13 | Empire Technology Development Llc | Polarizing liquid crystal alignment layers and display |
| WO2015099478A1 (ko) | 2013-12-26 | 2015-07-02 | 코오롱인더스트리 주식회사 | 투명 폴리아마이드-이미드 수지 및 이를 이용한 필름 |
| KR102227672B1 (ko) | 2014-12-31 | 2021-03-16 | 코오롱인더스트리 주식회사 | 폴리아마이드-이미드 전구체, 폴리아마이드-이미드 필름 및 이를 포함하는 표시소자 |
| CN105601921B (zh) * | 2016-01-26 | 2018-02-27 | 华南理工大学 | 低介电常数增强氧化石墨烯/聚酰亚胺复合膜的制备方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3356648A (en) * | 1966-10-13 | 1967-12-05 | Du Pont | Polyamide-acids and polyimides from hexafluoropropylidine bridged diamine |
| US4180648A (en) * | 1978-05-15 | 1979-12-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Crystalline polyimides |
| US4444979A (en) * | 1983-02-25 | 1984-04-24 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Polyphenylene ethers with imide linking groups |
| US4595548A (en) * | 1984-08-23 | 1986-06-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Process for preparing essentially colorless polyimide film containing phenoxy-linked diamines |
| US4687785A (en) * | 1985-08-27 | 1987-08-18 | Thermal Science, Inc. | Thermally adaptive polymers and prepolymers and methods of making in which an imide is formed from a polyanhydride oligomer and an isocyanate |
| EP0299865B1 (de) * | 1987-07-15 | 1998-01-07 | National Aeronautics And Space Administration | Verfahren zur Herstellung von wenig dielektrischen Polyimiden |
| US4937316A (en) * | 1988-02-25 | 1990-06-26 | Amdahl Corporation | Process for preparing polyimides |
| US5041520A (en) * | 1988-07-05 | 1991-08-20 | Mitsui Toatsu Chemicals, Inc. | Process for preparing polyimide having excellent high temperature stability |
-
1988
- 1988-09-01 US US07/239,259 patent/US4895972A/en not_active Expired - Fee Related
-
1989
- 1989-08-23 DE DE68918576T patent/DE68918576T4/de not_active Expired - Lifetime
- 1989-08-23 AT AT89909672T patent/ATE112294T1/de active
- 1989-08-23 DE DE68918576A patent/DE68918576D1/de not_active Expired - Fee Related
- 1989-08-23 EP EP89909672A patent/EP0386207B1/de not_active Expired - Lifetime
- 1989-08-23 KR KR1019900700912A patent/KR900701877A/ko not_active Ceased
- 1989-08-23 JP JP1509061A patent/JPH068360B2/ja not_active Expired - Lifetime
- 1989-08-23 AU AU41807/89A patent/AU623684B2/en not_active Ceased
- 1989-08-23 WO PCT/US1989/003575 patent/WO1990002767A1/en not_active Ceased
- 1989-08-31 CA CA000609984A patent/CA1334362C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE68918576T4 (de) | 1995-10-12 |
| WO1990002767A1 (en) | 1990-03-22 |
| EP0386207B1 (de) | 1994-09-28 |
| EP0386207A4 (en) | 1992-01-29 |
| AU4180789A (en) | 1990-04-02 |
| CA1334362C (en) | 1995-02-14 |
| DE68918576D1 (de) | 1994-11-03 |
| EP0386207A1 (de) | 1990-09-12 |
| KR900701877A (ko) | 1990-12-04 |
| JPH068360B2 (ja) | 1994-02-02 |
| AU623684B2 (en) | 1992-05-21 |
| US4895972A (en) | 1990-01-23 |
| DE68918576T2 (de) | 1995-05-11 |
| JPH03503065A (ja) | 1991-07-11 |
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