ATE115519T1 - Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich. - Google Patents

Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich.

Info

Publication number
ATE115519T1
ATE115519T1 AT91906293T AT91906293T ATE115519T1 AT E115519 T1 ATE115519 T1 AT E115519T1 AT 91906293 T AT91906293 T AT 91906293T AT 91906293 T AT91906293 T AT 91906293T AT E115519 T1 ATE115519 T1 AT E115519T1
Authority
AT
Austria
Prior art keywords
production
silicon dioxide
high purity
particle sizes
purity silicon
Prior art date
Application number
AT91906293T
Other languages
English (en)
Inventor
Jameel Menashi
Kenneth C Koehlert
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23946216&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE115519(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Cabot Corp filed Critical Cabot Corp
Application granted granted Critical
Publication of ATE115519T1 publication Critical patent/ATE115519T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Power Conversion In General (AREA)
AT91906293T 1990-03-02 1991-02-28 Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich. ATE115519T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/490,005 US5063179A (en) 1990-03-02 1990-03-02 Process for making non-porous micron-sized high purity silica

Publications (1)

Publication Number Publication Date
ATE115519T1 true ATE115519T1 (de) 1994-12-15

Family

ID=23946216

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91906293T ATE115519T1 (de) 1990-03-02 1991-02-28 Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich.

Country Status (7)

Country Link
US (1) US5063179A (de)
EP (1) EP0517841B1 (de)
JP (1) JP3274466B2 (de)
AT (1) ATE115519T1 (de)
AU (1) AU7481291A (de)
DE (1) DE69105955T2 (de)
WO (1) WO1991013040A1 (de)

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US6441078B1 (en) * 2000-03-08 2002-08-27 E. I. Du Pont De Nemours And Company Aqueous powder coat dispersions, process for their preparation and their use
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FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
JP3801933B2 (ja) * 2002-03-15 2006-07-26 湖北工業株式会社 光学部材の製造方法
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DE10342828A1 (de) * 2003-09-17 2005-04-14 Degussa Ag Hochreines, pyrogen hergestelltes Siliciumdioxid
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EP1700828A1 (de) * 2005-03-09 2006-09-13 Degussa AG Verfahren zur Herstellung von Glaskörpern ultrahoher Reinheit und optischer Qualität
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DE102006058799A1 (de) * 2006-12-13 2008-06-19 Wacker Chemie Ag Verfahren zur Herstellung von stabilen Binder-freien hochreinen Formkörpern aus Metalloxiden und deren Anwendung
EP2014622B1 (de) * 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
EP2011769A1 (de) 2007-07-06 2009-01-07 Evonik Degussa GmbH Gesintertes, hochreines Siliciumdioxid enthaltendes Granulat
DE102007031633A1 (de) 2007-07-06 2009-01-08 Evonik Degussa Gmbh Verfahren zur Herstellung von hochreinem Siliciumdioxidgranulat
DE102007049158A1 (de) 2007-10-13 2009-04-16 Evonik Degussa Gmbh Verwendung von Kieselglasgranulaten
US8197782B2 (en) * 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
DE102011004532A1 (de) 2011-02-22 2012-08-23 Evonik Degussa Gmbh Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen
ES2699819T3 (es) * 2013-08-13 2019-02-12 Draka Comteq Bv Preforma de fibra óptica y procedimiento para la fabricación dicha preforma de fibra óptica a partir de una preforma primaria
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
TWI840318B (zh) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
WO2017103153A1 (de) * 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
GB2552704A (en) * 2016-08-04 2018-02-07 Univ Bath Biomolecule preservation

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Also Published As

Publication number Publication date
EP0517841A1 (de) 1992-12-16
EP0517841A4 (en) 1993-01-27
DE69105955T2 (de) 1995-04-20
JP3274466B2 (ja) 2002-04-15
AU7481291A (en) 1991-09-18
US5063179A (en) 1991-11-05
JPH05505167A (ja) 1993-08-05
EP0517841B1 (de) 1994-12-14
DE69105955D1 (de) 1995-01-26
WO1991013040A1 (en) 1991-09-05

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