ATE115519T1 - Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich. - Google Patents

Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich.

Info

Publication number
ATE115519T1
ATE115519T1 AT91906293T AT91906293T ATE115519T1 AT E115519 T1 ATE115519 T1 AT E115519T1 AT 91906293 T AT91906293 T AT 91906293T AT 91906293 T AT91906293 T AT 91906293T AT E115519 T1 ATE115519 T1 AT E115519T1
Authority
AT
Austria
Prior art keywords
production
silicon dioxide
high purity
particle sizes
purity silicon
Prior art date
Application number
AT91906293T
Other languages
English (en)
Inventor
Jameel Menashi
Kenneth C Koehlert
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23946216&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE115519(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Cabot Corp filed Critical Cabot Corp
Application granted granted Critical
Publication of ATE115519T1 publication Critical patent/ATE115519T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
    • C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Structural Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Power Conversion In General (AREA)
AT91906293T 1990-03-02 1991-02-28 Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich. ATE115519T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/490,005 US5063179A (en) 1990-03-02 1990-03-02 Process for making non-porous micron-sized high purity silica

Publications (1)

Publication Number Publication Date
ATE115519T1 true ATE115519T1 (de) 1994-12-15

Family

ID=23946216

Family Applications (1)

Application Number Title Priority Date Filing Date
AT91906293T ATE115519T1 (de) 1990-03-02 1991-02-28 Verfahren zur herstellung von dichtem hochreinem siliciumdioxid mit partikelgrössen im mikrometerbereich.

Country Status (7)

Country Link
US (1) US5063179A (de)
EP (1) EP0517841B1 (de)
JP (1) JP3274466B2 (de)
AT (1) ATE115519T1 (de)
AU (1) AU7481291A (de)
DE (1) DE69105955T2 (de)
WO (1) WO1991013040A1 (de)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2693451B1 (fr) * 1992-07-07 1994-08-19 Alcatel Nv Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique.
US5888587A (en) * 1992-07-07 1999-03-30 Alcatel N.V. Method of manufacturing silica powder and use of such powder in making an optical fiber preform
IT1256064B (it) * 1992-07-28 1995-11-27 Donegani Guido Ist Metodo per la preparazione di geli porosi contenenti boro
AU701603B2 (en) * 1994-04-25 1999-02-04 Minnesota Mining And Manufacturing Company Compositions comprising fused particulates and methods of making them
US5650129A (en) * 1994-05-03 1997-07-22 Korea Atomic Energy Research Institute Light weight silica balls with a dense outer layer and method of making the same
US6296826B1 (en) * 1994-12-30 2001-10-02 Shin-Etsu Quartz Products Co., Ltd. Method for the preparation of vitrified silica particles
US6045913A (en) * 1995-11-01 2000-04-04 Minnesota Mining And Manufacturing Company At least partly fused particulates and methods of making them by flame fusion
US6254981B1 (en) 1995-11-02 2001-07-03 Minnesota Mining & Manufacturing Company Fused glassy particulates obtained by flame fusion
JP3693405B2 (ja) * 1996-03-18 2005-09-07 信越石英株式会社 二酸化けい素中の不純物量の分析方法
EP0807610B1 (de) * 1996-05-14 2001-06-20 Lucent Technologies Inc. Sol-Gel Verfahren zur Herstellung von Silica-Glas
FR2766170B1 (fr) * 1997-07-17 1999-09-24 Alsthom Cge Alcatel Procede ameliore de fabrication d'une poudre de silice
US6228340B1 (en) 1997-08-25 2001-05-08 The Regents Of The University Of California Method for the production of macroporous ceramics
KR100230457B1 (ko) * 1997-10-02 1999-11-15 윤종용 실리카 글래스 조성물 및 이를 이용한 실리카 글래스 제조방법
US6360562B1 (en) * 1998-02-24 2002-03-26 Superior Micropowders Llc Methods for producing glass powders
US6099894A (en) 1998-07-27 2000-08-08 Frisby Technologies, Inc. Gel-coated microcapsules
DE19936059A1 (de) * 1999-07-30 2001-02-01 J Peter Guggenbichler Verfahren zur Herstellung von antimikrobiellen Kunststoffkörpern
DE19937861C2 (de) * 1999-08-13 2003-03-20 Heraeus Quarzglas Verfahren für die Herstellung dichter Quarzglas-Körnung
GB2355711B (en) 1999-10-27 2003-12-24 Agilent Technologies Inc Porous silica microsphere scavengers
US6441078B1 (en) * 2000-03-08 2002-08-27 E. I. Du Pont De Nemours And Company Aqueous powder coat dispersions, process for their preparation and their use
US6679945B2 (en) * 2000-08-21 2004-01-20 Degussa Ag Pyrogenically prepared silicon dioxide
FR2825357B1 (fr) * 2001-05-31 2004-04-30 Cit Alcatel Procede de dopage de la silice par du fluor
JP3801933B2 (ja) * 2002-03-15 2006-07-26 湖北工業株式会社 光学部材の製造方法
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
ITNO20030005A1 (it) * 2003-03-21 2004-09-22 Novara Technology Srl VETRI DI SiO2 AD ALTA OMOGENEITA'.
ITNO20030006A1 (it) * 2003-03-21 2004-09-22 Novara Technology Srl Articoli a base di ossido di silicio.
CN100475692C (zh) * 2003-05-06 2009-04-08 株式会社德山 疏水性热解法二氧化硅
RU2006102493A (ru) * 2003-06-30 2006-06-27 Шелл Интернэшнл Рисерч Маатсхаппий Б.В. (NL) Получение катализатора
DE10342828A1 (de) * 2003-09-17 2005-04-14 Degussa Ag Hochreines, pyrogen hergestelltes Siliciumdioxid
DE10358065A1 (de) * 2003-12-11 2005-07-28 Wacker-Chemie Gmbh Vorrichtung zur Herstellung von Fused Silica
EP1700828A1 (de) * 2005-03-09 2006-09-13 Degussa AG Verfahren zur Herstellung von Glaskörpern ultrahoher Reinheit und optischer Qualität
EP1966410B1 (de) * 2005-09-26 2018-12-26 Planar Solutions LLC Ultrareines kolloidales siliciumdioxid zur verwendung beim chemisch-mechanischen polieren
DE102006058799A1 (de) * 2006-12-13 2008-06-19 Wacker Chemie Ag Verfahren zur Herstellung von stabilen Binder-freien hochreinen Formkörpern aus Metalloxiden und deren Anwendung
EP2014622B1 (de) * 2007-07-06 2017-01-18 Evonik Degussa GmbH Verfahren zur Herstellung eines Kieselglasgranulats
EP2011769A1 (de) 2007-07-06 2009-01-07 Evonik Degussa GmbH Gesintertes, hochreines Siliciumdioxid enthaltendes Granulat
DE102007031633A1 (de) 2007-07-06 2009-01-08 Evonik Degussa Gmbh Verfahren zur Herstellung von hochreinem Siliciumdioxidgranulat
DE102007049158A1 (de) 2007-10-13 2009-04-16 Evonik Degussa Gmbh Verwendung von Kieselglasgranulaten
US8197782B2 (en) * 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
DE102011004532A1 (de) 2011-02-22 2012-08-23 Evonik Degussa Gmbh Hochreines Siliciumdioxidgranulat für Quarzglasanwendungen
CN105636917B (zh) * 2013-08-13 2018-11-02 德拉克通信科技公司 光纤预制件和由初级预制件制造此类光纤预制件的方法
US11053152B2 (en) 2015-12-18 2021-07-06 Heraeus Quarzglas Gmbh & Co. Kg Spray granulation of silicon dioxide in the preparation of quartz glass
US11952303B2 (en) 2015-12-18 2024-04-09 Heraeus Quarzglas Gmbh & Co. Kg Increase in silicon content in the preparation of quartz glass
US11492282B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies with dew point monitoring in the melting oven
EP3390290B1 (de) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Herstellung eines opaken quarzglaskörpers
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
CN108698894A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在多腔式烘箱中制备石英玻璃体
WO2017103115A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung eines quarzglaskörpers in einem schmelztiegel aus refraktärmetall
US10676388B2 (en) 2015-12-18 2020-06-09 Heraeus Quarzglas Gmbh & Co. Kg Glass fibers and pre-forms made of homogeneous quartz glass
TWI794149B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 石英玻璃粉粒、不透明成型體及彼等之製備方法
JP7044454B2 (ja) 2015-12-18 2022-03-30 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製
GB2552704A (en) * 2016-08-04 2018-02-07 Univ Bath Biomolecule preservation

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3301635A (en) * 1965-07-01 1967-01-31 Du Pont Molded amorphous silica bodies and molding powders for manufacture of same
US3501269A (en) * 1967-04-20 1970-03-17 Grace W R & Co Process for preparing silica gel
US4105427A (en) * 1977-04-25 1978-08-08 Corning Glass Works Process for dewatering porous glass
DE2935347A1 (de) * 1979-08-31 1981-03-26 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von glas fuer glasfaserlichtwellenleiter geringer daempfung
JPS5858292B2 (ja) * 1980-01-21 1983-12-24 株式会社日立製作所 シリカガラスの製造方法
US4419115A (en) * 1981-07-31 1983-12-06 Bell Telephone Laboratories, Incorporated Fabrication of sintered high-silica glasses
US4459245A (en) * 1982-01-19 1984-07-10 The United States Of America As Represented By The United States Department Of Energy Method and apparatus for controlled size distribution of gel microspheres formed from aqueous dispersions
GB2140408B (en) * 1982-12-23 1987-03-18 Suwa Seikosha Kk Process for producing quartz glass
DE3302745A1 (de) * 1983-01-27 1984-08-02 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur herstellung von gegenstaenden aus hochreinem synthetischem quarzglas
US4574063A (en) * 1983-05-09 1986-03-04 Corning Glass Works Method of forming glass or ceramic article
US4840653A (en) * 1983-12-22 1989-06-20 American Telephone And Telegraph Company, At&T Bell Laboratories Fabrication of high-silica glass article
US4810415A (en) * 1985-09-24 1989-03-07 Dresser Industries, Inc. Process for manufacturing ultra pure silica and resulting encapsulated products
JPH03291807A (ja) * 1990-04-09 1991-12-24 Sumitomo Bakelite Co Ltd 異方導電ペースト

Also Published As

Publication number Publication date
DE69105955T2 (de) 1995-04-20
EP0517841B1 (de) 1994-12-14
DE69105955D1 (de) 1995-01-26
JPH05505167A (ja) 1993-08-05
EP0517841A4 (en) 1993-01-27
JP3274466B2 (ja) 2002-04-15
WO1991013040A1 (en) 1991-09-05
AU7481291A (en) 1991-09-18
EP0517841A1 (de) 1992-12-16
US5063179A (en) 1991-11-05

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