ATE126365T1 - Lichtempfindliche semi-wässerig entwickelbare leitfähige kupferzusammensetzung. - Google Patents

Lichtempfindliche semi-wässerig entwickelbare leitfähige kupferzusammensetzung.

Info

Publication number
ATE126365T1
ATE126365T1 AT90115857T AT90115857T ATE126365T1 AT E126365 T1 ATE126365 T1 AT E126365T1 AT 90115857 T AT90115857 T AT 90115857T AT 90115857 T AT90115857 T AT 90115857T AT E126365 T1 ATE126365 T1 AT E126365T1
Authority
AT
Austria
Prior art keywords
conductive copper
copper composition
aqueous developable
developable
semi
Prior art date
Application number
AT90115857T
Other languages
English (en)
Inventor
William John Nebe
James Jerry Osborne
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Application granted granted Critical
Publication of ATE126365T1 publication Critical patent/ATE126365T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/118Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Conductive Materials (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
AT90115857T 1989-08-21 1990-08-18 Lichtempfindliche semi-wässerig entwickelbare leitfähige kupferzusammensetzung. ATE126365T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/396,492 US5047313A (en) 1989-08-21 1989-08-21 Photosensitive semi-aqueous developable copper conductor composition

Publications (1)

Publication Number Publication Date
ATE126365T1 true ATE126365T1 (de) 1995-08-15

Family

ID=23567401

Family Applications (1)

Application Number Title Priority Date Filing Date
AT90115857T ATE126365T1 (de) 1989-08-21 1990-08-18 Lichtempfindliche semi-wässerig entwickelbare leitfähige kupferzusammensetzung.

Country Status (8)

Country Link
US (1) US5047313A (de)
EP (1) EP0414168B1 (de)
JP (1) JPH083057B2 (de)
KR (1) KR910005331A (de)
CN (1) CN1050268A (de)
AT (1) ATE126365T1 (de)
CA (1) CA2023601A1 (de)
DE (1) DE69021463T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3218767B2 (ja) * 1992-01-24 2001-10-15 東レ株式会社 感光性導電ペースト
US5362806A (en) * 1993-01-07 1994-11-08 W. R. Grace & Co.-Conn. Toughened photocurable polymer composition for processible flexographic printing plates
JP3239847B2 (ja) * 1994-11-17 2001-12-17 東レ株式会社 感光性導電ペーストおよび電極の製造方法
WO1998043268A1 (en) * 1997-03-25 1998-10-01 E.I. Du Pont De Nemours And Company Field emitter cathode backplate structures for display panels
JP3947287B2 (ja) * 1997-12-27 2007-07-18 大日本印刷株式会社 感光性導体ペーストおよびこれを用いた転写シート
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
DE69910335T2 (de) * 1998-12-11 2004-07-01 E.I. Du Pont De Nemours And Co., Wilmington Zusammensetzung für ein Silber enthaltendes, lichtempfindliches, leitendes Band und das damit behandelte Band
US20060208621A1 (en) * 1999-09-21 2006-09-21 Amey Daniel I Jr Field emitter cathode backplate structures for display panels
US6783914B1 (en) * 2000-02-25 2004-08-31 Massachusetts Institute Of Technology Encapsulated inorganic resists
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
KR20020078113A (ko) * 2001-04-04 2002-10-18 아이키솔루션(주) 음성, 문자 동시 응답 시스템과 그 제어방법
JP3757886B2 (ja) * 2002-01-25 2006-03-22 株式会社村田製作所 光反応性樹脂組成物、それを用いた回路基板およびセラミック多層基板の製造方法
US7232650B2 (en) * 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US7074349B2 (en) * 2003-01-24 2006-07-11 E. I. Du Pont De Nemours And Company Terminal electrode compositions for multilayer ceramic capacitors
JP3975932B2 (ja) * 2003-02-12 2007-09-12 株式会社村田製作所 光反応性樹脂組成物、回路基板の製造方法、およびセラミック多層基板の製造方法
US7303854B2 (en) * 2003-02-14 2007-12-04 E.I. Du Pont De Nemours And Company Electrode-forming composition for field emission type of display device, and method using such a composition
US20110083874A1 (en) 2009-10-09 2011-04-14 E. I. Du Pont De Nemours And Company Electrode and method for manufacturing the same
US8129088B2 (en) * 2009-07-02 2012-03-06 E.I. Du Pont De Nemours And Company Electrode and method for manufacturing the same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3443944A (en) * 1963-10-23 1969-05-13 United Aircraft Corp Method of depositing conductive patterns on a substrate
US3833384A (en) * 1972-04-26 1974-09-03 Eastman Kodak Co Photopolymerizable compositions and elements and uses thereof
US3923504A (en) * 1973-01-29 1975-12-02 Xerox Corp Migration imaging member and method
US4032698A (en) * 1973-02-02 1977-06-28 E. I. Du Pont De Nemours And Company Polymeric materials with substituted urea end groups
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
US4598037A (en) * 1984-12-21 1986-07-01 E. I. Du Pont De Nemours And Company Photosensitive conductive metal composition
US4613560A (en) * 1984-12-28 1986-09-23 E. I. Du Pont De Nemours And Company Photosensitive ceramic coating composition
US4693959A (en) * 1986-03-07 1987-09-15 E.I. Du Pont De Nemours And Company Adhesion promotion in photoresist lamination and processing
JPS63154773A (ja) * 1986-12-17 1988-06-28 Toyobo Co Ltd 光硬化型導電性焼成ペ−スト
JPS63265979A (ja) * 1987-04-23 1988-11-02 Toyobo Co Ltd 光硬化型導電性焼成ペ−スト
US4908296A (en) * 1988-05-31 1990-03-13 E. I. Du Pont De Nemours And Company Photosensitive semi-aqueous developable ceramic coating composition

Also Published As

Publication number Publication date
EP0414168B1 (de) 1995-08-09
JPH083057B2 (ja) 1996-01-17
EP0414168A2 (de) 1991-02-27
KR910005331A (ko) 1991-03-30
CN1050268A (zh) 1991-03-27
US5047313A (en) 1991-09-10
DE69021463T2 (de) 1996-02-22
EP0414168A3 (en) 1991-04-24
JPH03205462A (ja) 1991-09-06
DE69021463D1 (de) 1995-09-14
CA2023601A1 (en) 1991-02-22

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Legal Events

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