ATE136400T1 - Strahlaustaster mit hoher präzision - Google Patents

Strahlaustaster mit hoher präzision

Info

Publication number
ATE136400T1
ATE136400T1 AT92108974T AT92108974T ATE136400T1 AT E136400 T1 ATE136400 T1 AT E136400T1 AT 92108974 T AT92108974 T AT 92108974T AT 92108974 T AT92108974 T AT 92108974T AT E136400 T1 ATE136400 T1 AT E136400T1
Authority
AT
Austria
Prior art keywords
blanker
clarifier
delay line
high precision
line length
Prior art date
Application number
AT92108974T
Other languages
English (en)
Inventor
Mark Gesley
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Application granted granted Critical
Publication of ATE136400T1 publication Critical patent/ATE136400T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Laser Beam Processing (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Optical Elements Other Than Lenses (AREA)
AT92108974T 1991-05-29 1992-05-27 Strahlaustaster mit hoher präzision ATE136400T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/706,612 US5276330A (en) 1991-05-29 1991-05-29 High accuracy beam blanker

Publications (1)

Publication Number Publication Date
ATE136400T1 true ATE136400T1 (de) 1996-04-15

Family

ID=24838342

Family Applications (1)

Application Number Title Priority Date Filing Date
AT92108974T ATE136400T1 (de) 1991-05-29 1992-05-27 Strahlaustaster mit hoher präzision

Country Status (7)

Country Link
US (1) US5276330A (de)
EP (1) EP0516098B1 (de)
JP (1) JP2670938B2 (de)
KR (1) KR100194125B1 (de)
AT (1) ATE136400T1 (de)
CA (1) CA2069767C (de)
DE (1) DE69209561T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5412218A (en) * 1993-02-26 1995-05-02 Etec Systems, Inc. Differential virtual ground beam blanker
US5534699A (en) * 1995-07-26 1996-07-09 National Electrostatics Corp. Device for separating and recombining charged particle beams
US6521896B1 (en) * 2000-06-01 2003-02-18 Applied Materials, Inc. Blanker assembly employing dielectric material
US7435956B2 (en) * 2004-09-10 2008-10-14 Multibeam Systems, Inc. Apparatus and method for inspection and testing of flat panel display substrates
US7928404B2 (en) * 2003-10-07 2011-04-19 Multibeam Corporation Variable-ratio double-deflection beam blanker
GB2414857B (en) * 2004-06-03 2009-02-25 Nanobeam Ltd Apparatus for blanking a charged particle beam
US7456402B2 (en) * 2004-09-10 2008-11-25 Multibeam Systems, Inc. Detector optics for multiple electron beam test system
KR101417603B1 (ko) * 2013-02-28 2014-07-09 선문대학교 산학협력단 더블 어라인너를 구비한 초소형 컬럼

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2045238A5 (de) * 1969-06-26 1971-02-26 Commissariat Energie Atomique
DE2743200A1 (de) * 1977-09-26 1979-04-05 Siemens Ag Verbesserung an einer vorrichtung zur elektronenstrahleintastung
GB1598867A (en) * 1978-05-24 1981-09-23 Nat Res Dev Deflection blanking of electron beams
US4560878A (en) * 1980-05-19 1985-12-24 Hughes Aircraft Company Electron and ion beam-shaping apparatus
DD158726A3 (de) * 1980-07-01 1983-02-02 Georg Kuschel Elektrostatisches ablenksystem
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
DE3227426A1 (de) * 1982-07-22 1984-01-26 Siemens AG, 1000 Berlin und 8000 München Ablenkstruktur fuer ein korpuskularstrahl-austastsystem und verfahren zu seinem betrieb
GB2196175B (en) * 1986-10-03 1990-10-17 Trialsite Ltd Production of pulsed electron beams
JPH02165549A (ja) * 1988-12-16 1990-06-26 Jeol Ltd 荷電粒子ビームブランキング装置

Also Published As

Publication number Publication date
EP0516098B1 (de) 1996-04-03
JPH05226231A (ja) 1993-09-03
CA2069767A1 (en) 1992-11-30
KR920022365A (ko) 1992-12-19
CA2069767C (en) 2001-04-10
US5276330A (en) 1994-01-04
KR100194125B1 (ko) 1999-06-15
DE69209561T2 (de) 1996-09-19
EP0516098A1 (de) 1992-12-02
DE69209561D1 (de) 1996-05-09
JP2670938B2 (ja) 1997-10-29

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Legal Events

Date Code Title Description
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