ATE160387T1 - Verfahren zum herstellen eines targetelementes zur katodenzerstäubung - Google Patents

Verfahren zum herstellen eines targetelementes zur katodenzerstäubung

Info

Publication number
ATE160387T1
ATE160387T1 AT93902319T AT93902319T ATE160387T1 AT E160387 T1 ATE160387 T1 AT E160387T1 AT 93902319 T AT93902319 T AT 93902319T AT 93902319 T AT93902319 T AT 93902319T AT E160387 T1 ATE160387 T1 AT E160387T1
Authority
AT
Austria
Prior art keywords
target element
temperature
sputting
catode
producing
Prior art date
Application number
AT93902319T
Other languages
English (en)
Inventor
Guy Campet
Maurice Bourrel
Claude Delmas
Joseph Portier
Jean Salardenne
Original Assignee
Elf Aquitaine
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elf Aquitaine filed Critical Elf Aquitaine
Application granted granted Critical
Publication of ATE160387T1 publication Critical patent/ATE160387T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Inorganic Insulating Materials (AREA)
AT93902319T 1991-12-13 1992-12-11 Verfahren zum herstellen eines targetelementes zur katodenzerstäubung ATE160387T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9115537A FR2685011B1 (fr) 1991-12-13 1991-12-13 Procede de preparation d'un element de cible pour pulverisation cathodique et cibles, notamment de grande surface, realisees a partir de cet element.

Publications (1)

Publication Number Publication Date
ATE160387T1 true ATE160387T1 (de) 1997-12-15

Family

ID=9420053

Family Applications (1)

Application Number Title Priority Date Filing Date
AT93902319T ATE160387T1 (de) 1991-12-13 1992-12-11 Verfahren zum herstellen eines targetelementes zur katodenzerstäubung

Country Status (8)

Country Link
US (1) US5507897A (de)
EP (1) EP0616648B1 (de)
JP (1) JPH07502076A (de)
AT (1) ATE160387T1 (de)
CA (1) CA2125670A1 (de)
DE (1) DE69223257D1 (de)
FR (1) FR2685011B1 (de)
WO (1) WO1993012264A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5487822A (en) * 1993-11-24 1996-01-30 Applied Materials, Inc. Integrated sputtering target assembly
US5433835B1 (en) * 1993-11-24 1997-05-20 Applied Materials Inc Sputtering device and target with cover to hold cooling fluid
EP0852266B1 (de) * 1995-08-23 2004-10-13 Asahi Glass Ceramics Co., Ltd. Target, verfahren zu dessen herstellung und herstellung hochrefraktiver filme
US5830336A (en) * 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
US6340415B1 (en) 1998-01-05 2002-01-22 Applied Materials, Inc. Method and apparatus for enhancing a sputtering target's lifetime
US20060006064A1 (en) * 2004-07-09 2006-01-12 Avi Tepman Target tiles in a staggered array
US7550066B2 (en) * 2004-07-09 2009-06-23 Applied Materials, Inc. Staggered target tiles
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
US7550055B2 (en) * 2005-05-31 2009-06-23 Applied Materials, Inc. Elastomer bonding of large area sputtering target
EP1849887A1 (de) * 2006-04-26 2007-10-31 Sulzer Metco AG Target für eine Sputterquelle
EP3360855B1 (de) 2006-05-18 2020-03-18 Hydro-Quebec Herstellungsverfahren von keramiken, so erhaltene keramiken und ihre verwendung als zielscheibe für kathodenzerstäubung
US9782949B2 (en) 2008-05-30 2017-10-10 Corning Incorporated Glass laminated articles and layered articles
JP5385883B2 (ja) * 2010-10-05 2014-01-08 株式会社神戸製鋼所 ターゲット接合体
EP2699708B1 (de) * 2011-04-21 2018-11-14 View, Inc. Lithium-sputtertarget
CN109097746A (zh) 2011-06-30 2018-12-28 唯景公司 溅射靶和溅射方法
US9765426B1 (en) * 2012-04-20 2017-09-19 Applied Materials, Inc. Lithium containing composite metallic sputtering targets
TWI636147B (zh) * 2017-09-14 2018-09-21 財團法人金屬工業研究發展中心 複合靶材
US11274065B2 (en) * 2018-06-13 2022-03-15 Fuelcell Energy, Inc. Ceramic felt material for high-temperature fuel cells
JP7298490B2 (ja) * 2020-01-20 2023-06-27 株式会社デンソー ターゲットの製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5630713B2 (de) * 1973-04-04 1981-07-16
CH601492A5 (de) * 1976-02-06 1978-07-14 Bbc Brown Boveri & Cie
DE2933835C2 (de) * 1979-08-21 1987-02-19 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Befestigen von in Scheiben- oder Plattenform vorliegenden Targetmaterialien auf Kühlteller für Aufstäubanlagen
CH646459A5 (de) * 1982-03-22 1984-11-30 Balzers Hochvakuum Rechteckige targetplatte fuer kathodenzerstaeubungsanlagen.
JPS6078423A (ja) * 1983-10-05 1985-05-04 Matsushita Electric Ind Co Ltd 光学発色素子
JPS61136673A (ja) * 1984-12-07 1986-06-24 Sumitomo Special Metals Co Ltd スパツタリング用タ−ゲツト材
JPS62243762A (ja) * 1986-04-16 1987-10-24 Seiko Epson Corp スパツタリングタ−ゲツト用バツキングプレ−ト
JPS6335769A (ja) * 1986-07-29 1988-02-16 Seiko Epson Corp スパツタリング用タ−ゲツト
DE68924095T2 (de) * 1988-05-16 1996-04-04 Tosoh Corp Verfahren zur Herstellung eines Sputtertargets zur Erzeugung einer elektrisch leitenden, durchsichtigen Schicht.
JPH028364A (ja) * 1988-06-24 1990-01-11 Matsushita Electric Ind Co Ltd スパッタ用ターゲット及びその製造方法
US5071800A (en) * 1989-02-28 1991-12-10 Tosoh Corporation Oxide powder, sintered body, process for preparation thereof and targe composed thereof
US4962071A (en) * 1989-05-01 1990-10-09 Tektronix, Inc. Method of fabricating a sintered body of indium tin oxide
US5086351A (en) * 1989-07-13 1992-02-04 M&T Chemicals, Inc. Electrochromic elements, materials for use in such element, processes for making such elements and such materials and use of such element in an electrochromic glass device
US5091221A (en) * 1990-08-22 1992-02-25 Industrial Technology Research Institute Method for preparing superconductor sputtering target
JPH0774436B2 (ja) * 1990-09-20 1995-08-09 富士通株式会社 薄膜形成方法

Also Published As

Publication number Publication date
CA2125670A1 (fr) 1993-06-24
FR2685011A1 (fr) 1993-06-18
DE69223257D1 (de) 1998-01-02
EP0616648A1 (de) 1994-09-28
US5507897A (en) 1996-04-16
WO1993012264A1 (fr) 1993-06-24
JPH07502076A (ja) 1995-03-02
FR2685011B1 (fr) 1994-02-04
EP0616648B1 (de) 1997-11-19

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