ATE160901T1 - Kathodenzerstäubungs-drehkathode mit mehreren targets - Google Patents

Kathodenzerstäubungs-drehkathode mit mehreren targets

Info

Publication number
ATE160901T1
ATE160901T1 AT95402127T AT95402127T ATE160901T1 AT E160901 T1 ATE160901 T1 AT E160901T1 AT 95402127 T AT95402127 T AT 95402127T AT 95402127 T AT95402127 T AT 95402127T AT E160901 T1 ATE160901 T1 AT E160901T1
Authority
AT
Austria
Prior art keywords
rotating cathode
sputting
multiple target
tube
cylinders
Prior art date
Application number
AT95402127T
Other languages
English (en)
Inventor
Louis Dresse
Original Assignee
Saint Gobain Vitrage
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Vitrage filed Critical Saint Gobain Vitrage
Application granted granted Critical
Publication of ATE160901T1 publication Critical patent/ATE160901T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3414Targets
    • H01J37/3423Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3414Targets
    • H01J37/3426Material
    • H01J37/3429Plural materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3447Collimators, shutters, apertures

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Microwave Tubes (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Solid Thermionic Cathode (AREA)
AT95402127T 1994-09-22 1995-09-21 Kathodenzerstäubungs-drehkathode mit mehreren targets ATE160901T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9411319A FR2725073B1 (fr) 1994-09-22 1994-09-22 Cathode rotative de pulverisation cathodique a plusieurs cibles

Publications (1)

Publication Number Publication Date
ATE160901T1 true ATE160901T1 (de) 1997-12-15

Family

ID=9467173

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95402127T ATE160901T1 (de) 1994-09-22 1995-09-21 Kathodenzerstäubungs-drehkathode mit mehreren targets

Country Status (5)

Country Link
EP (1) EP0703599B1 (de)
AT (1) ATE160901T1 (de)
DE (1) DE69501139T2 (de)
ES (1) ES2111378T3 (de)
FR (1) FR2725073B1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10213043B4 (de) * 2002-03-22 2008-10-30 Von Ardenne Anlagentechnik Gmbh Rohrmagnetron und seine Verwendung
EP1626432A1 (de) * 2004-08-10 2006-02-15 Applied Films GmbH & Co. KG Magnetronsputtereinrichtung, Zylinderkathode und Verfahren zur Aufbringung von dünnen Schichten aus unterschiedlichen Materialien auf einem Substrat
PL1626433T3 (pl) * 2004-08-10 2007-06-29 Applied Mat Gmbh & Co Kg Urządzenie do rozpylania magnetronowego, cylindryczna katoda i sposób nakładania cienkich warstw wieloskładnikowych na podłoże
DE502005000983D1 (de) * 2005-05-13 2007-08-16 Applied Materials Gmbh & Co Kg Verfahren zum Betreiben einer Sputterkathode mit einem Target
US7842355B2 (en) 2005-11-01 2010-11-30 Applied Materials, Inc. System and method for modulation of power and power related functions of PECVD discharge sources to achieve new film properties
EP1804275B1 (de) 2005-12-22 2009-03-11 Applied Materials GmbH & Co. KG Zerstäubungsvorrichtung mit einer Rohrkathode und Verfahren zum Betreiben dieser Zerstäubungsvorrichtung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57145983A (en) * 1981-03-04 1982-09-09 Murata Mfg Co Ltd Coaxial barrel sputtering device
US4424916A (en) 1981-06-11 1984-01-10 Pearson Donald L Toothpaste dispenser
US4443318A (en) 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
JPS63266062A (ja) * 1987-04-23 1988-11-02 Sumitomo Metal Mining Co Ltd 多元素スパツタ薄膜の製造方法及びスパツタ装置
EP0393344A1 (de) 1989-04-20 1990-10-24 Balzers Aktiengesellschaft Haltevorrichtung für Targets von Zerstäubungsquellen und Verfahren zum Festhalten eines Targets in einer Halterung
BE1003701A3 (fr) * 1990-06-08 1992-05-26 Saint Roch Glaceries Cathode rotative.
GB9121665D0 (en) * 1991-10-11 1991-11-27 Boc Group Plc Sputtering processes and apparatus
JPH05263225A (ja) * 1992-03-18 1993-10-12 Asahi Glass Co Ltd スパッタリング方法

Also Published As

Publication number Publication date
EP0703599A1 (de) 1996-03-27
DE69501139D1 (de) 1998-01-15
ES2111378T3 (es) 1998-03-01
FR2725073B1 (fr) 1996-12-20
DE69501139T2 (de) 1998-05-28
FR2725073A1 (fr) 1996-03-29
EP0703599B1 (de) 1997-12-03

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee