ATE189533T1 - Strahlungsempfindliche polymere - Google Patents

Strahlungsempfindliche polymere

Info

Publication number: ATE189533T1
Authority: AT; Austria
Prior art keywords: alkyl; halogen; unsubstituted; substituted; nitro groups
Prior art date: 1991-12-10

Application number

AT92810945T

Other languages

English (en)

Inventor

Alfred Dr Steinmann

Original Assignee

Arch Spec Chem Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-12-10

Filing date

1992-12-02

Publication date

2000-02-15

1992-12-02 Application filed by Arch Spec Chem Inc filed Critical Arch Spec Chem Inc

2000-02-15 Application granted granted Critical

2000-02-15 Publication of ATE189533T1 publication Critical patent/ATE189533T1/de

Links

229920000642 polymer Polymers 0.000 title abstract 4
230000005855 radiation Effects 0.000 title abstract 2
229910052736 halogen Chemical group 0.000 abstract 9
150000002367 halogens Chemical group 0.000 abstract 9
125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 7
125000004093 cyano group Chemical group *C#N 0.000 abstract 6
229910052739 hydrogen Inorganic materials 0.000 abstract 6
239000001257 hydrogen Substances 0.000 abstract 6
125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 5
125000000229 (C1-C4)alkoxy group Chemical group 0.000 abstract 4
150000002431 hydrogen Chemical group 0.000 abstract 4
125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 3
125000001624 naphthyl group Chemical group 0.000 abstract 3
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 3
125000004400 (C1-C12) alkyl group Chemical group 0.000 abstract 2
125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 2
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 2
239000000203 mixture Substances 0.000 abstract 2
-1 propylene, butylene Chemical class 0.000 abstract 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 abstract 1
PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical group FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 abstract 1
238000005227 gel permeation chromatography Methods 0.000 abstract 1
125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
238000004519 manufacturing process Methods 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
- C08F12/22—Oxygen
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Chemical & Material Sciences (AREA)
Spectroscopy & Molecular Physics (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Emergency Medicine (AREA)
General Physics & Mathematics (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Polymerisation Methods In General (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Materials For Photolithography (AREA)
Compositions Of Macromolecular Compounds (AREA)
Structure Of Printed Boards (AREA)

AT92810945T 1991-12-10 1992-12-02 Strahlungsempfindliche polymere ATE189533T1 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CH362691		1991-12-10

Publications (1)

Publication Number	Publication Date
ATE189533T1 true ATE189533T1 (de)	2000-02-15

Family

ID=4260026

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AT92810945T ATE189533T1 (de)	1991-12-10	1992-12-02	Strahlungsempfindliche polymere

Country Status (7)

Country	Link
EP (1)	EP0546997B1 (de)
JP (1)	JPH05279425A (de)
AT (1)	ATE189533T1 (de)
BR (1)	BR9204961A (de)
CA (1)	CA2084856A1 (de)
DE (1)	DE59209808D1 (de)
TW (1)	TW224165B (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP1231205A4 (de)	1999-11-15	2004-05-26	Jsr Corp	Vinylphenylpropionsäure-derivate, verfahren zu deren herstellung, daraus hergestellte polymere und strahlungsempfindliche harzzusammensetzung
JP4905786B2 (ja) *	2007-02-14	2012-03-28	富士フイルム株式会社	レジスト組成物及びそれを用いたパターン形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS58203433A (ja) *	1982-05-21	1983-11-26	Fuji Photo Film Co Ltd	感光性組成物
DE69125634T2 (de) *	1990-01-30	1998-01-02	Wako Pure Chem Ind Ltd	Chemisch verstärktes Photolack-Material
EP0467841A3 (en) *	1990-07-18	1992-10-28	Ciba-Geigy Ag	Benzoic acid ester comprising an olefinically unsaturated substituant

1992
- 1992-12-02 EP EP92810945A patent/EP0546997B1/de not_active Expired - Lifetime
- 1992-12-02 DE DE59209808T patent/DE59209808D1/de not_active Expired - Fee Related
- 1992-12-02 AT AT92810945T patent/ATE189533T1/de not_active IP Right Cessation
- 1992-12-08 CA CA002084856A patent/CA2084856A1/en not_active Abandoned
- 1992-12-09 BR BR9204961A patent/BR9204961A/pt not_active Application Discontinuation
- 1992-12-10 TW TW081109897A patent/TW224165B/zh active
- 1992-12-10 JP JP4352696A patent/JPH05279425A/ja active Pending

Also Published As

Publication number	Publication date
EP0546997A1 (de)	1993-06-16
TW224165B (de)	1994-05-21
CA2084856A1 (en)	1993-06-11
EP0546997B1 (de)	2000-02-02
DE59209808D1 (de)	2000-03-09
BR9204961A (pt)	1993-06-15
JPH05279425A (ja)	1993-10-26

Similar Documents

Publication	Publication Date	Title
ATE149541T1 (de)	1997-03-15	Alkenylgruppen aufweisende siloxancopolymere, deren herstellung und verwendung
JPS5491546A (en)	1979-07-20	Cold-setting composition
SE8902853D0 (sv)	1989-08-28	Komposition paa basis av amfotera polymerer och anjoniska polymerer, avsedd foer behandling av keratinfibrer
ATE415436T1 (de)	2008-12-15	Polyhydroxyalkanoat
Chen et al.	1996	Copolymers derived from 7-acryloyloxy-4-methylcoumarin and acrylates: 2. Reversible photocrosslinking and photocleavage
BR9607107A (pt)	1997-11-04	Polímeros reticulados contendo grupos uretano
ATE183924T1 (de)	1999-09-15	Cholesterinspiegelsenkendes mittel
NO960479L (no)	1996-08-08	Stabilisering av en polymer
ATE90954T1 (de)	1993-07-15	Verwendung eines amorphen aromatischen thermoplastischen polymeren.
ES2054750T3 (es)	1994-08-16	Estabilizantes de uv unidos a polimeros.
BR9606944A (pt)	1997-12-23	Polímeros reticulados contendo estruturas salinas
DE59704152D1 (de)	2001-08-30	Flammgeschützte formmassen
ATE181774T1 (de)	1999-07-15	Vernetzte getönte polymere
EP0718316A3 (de)	1996-07-03	Vernetzte Polymere
HK55189A (en)	1989-07-21	Polymeric compounds containing piperidine and triazine radicals, process for their preparation, and their use as stabilisers for synthetic polymers
ATE231716T1 (de)	2003-02-15	Kosmetische zusammensetzungen enthaltend ein kationisches polymer mit niedrigem molekulargewicht und einem silikon sowie deren verwendungen
DK0459256T3 (da)	1995-08-21	Oxazolidiononer
ES2138219T3 (es)	2000-01-01	Compuestos fotoactivos positivos basados en grupos 2,6-dinitrobencilo.
DE59209808D1 (de)	2000-03-09	Strahlungsempfindliche Polymere
KR870007447A (ko)	1987-08-19	유기금속중합체
MX9703449A (es)	1998-07-31	Polimero cationico.
ES2052552T3 (es)	1994-07-16	Polimeros hidrogel.
DK0456133T3 (da)	1995-05-22	Hydrazoner
ES449304A1 (es)	1977-08-16	Metodo para la preparacion de sulfolaniloxialcohilhpeta al- cohicilciclotetra-siloxanos.
Bosch et al.	1990	Polymer Synthesis by Photochemistry. II. Step Polymerisation and Applications

Legal Events

Date	Code	Title	Description
2002-03-15	REN	Ceased due to non-payment of the annual fee