ATE208228T1 - Membranvergütung und porenverkleinerung unter verwendung von ozonunterstütztem chemischem abscheiden aus der dampfphase an grenzflächen - Google Patents

Membranvergütung und porenverkleinerung unter verwendung von ozonunterstütztem chemischem abscheiden aus der dampfphase an grenzflächen

Info

Publication number
ATE208228T1
ATE208228T1 AT95926195T AT95926195T ATE208228T1 AT E208228 T1 ATE208228 T1 AT E208228T1 AT 95926195 T AT95926195 T AT 95926195T AT 95926195 T AT95926195 T AT 95926195T AT E208228 T1 ATE208228 T1 AT E208228T1
Authority
AT
Austria
Prior art keywords
ozone
vapor phase
boundary surfaces
chemical deposition
assisted chemical
Prior art date
Application number
AT95926195T
Other languages
English (en)
Inventor
James A Mchenry
Harry W Deckman
Edward W Corcoran Jr
Frank W Lai
Horst Witzke
Original Assignee
Exxonmobil Res & Eng Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Exxonmobil Res & Eng Co filed Critical Exxonmobil Res & Eng Co
Application granted granted Critical
Publication of ATE208228T1 publication Critical patent/ATE208228T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0081—After-treatment of organic or inorganic membranes
    • B01D67/0088—Physical treatment with compounds, e.g. swelling, coating or impregnation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
    • B01D65/10—Testing of membranes or membrane apparatus; Detecting or repairing leaks
    • B01D65/106—Repairing membrane apparatus or modules
    • B01D65/108—Repairing membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0044—Inorganic membrane manufacture by chemical reaction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0072—Inorganic membrane manufacture by deposition from the gaseous phase, e.g. sputtering, CVD, PVD
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/0213—Silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/028—Molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
    • B01D71/02—Inorganic material
    • B01D71/028—Molecular sieves
    • B01D71/0281—Zeolites
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/08—Specific temperatures applied
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/08—Specific temperatures applied
    • B01D2323/081—Heating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Catalysts (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
AT95926195T 1994-07-08 1995-07-10 Membranvergütung und porenverkleinerung unter verwendung von ozonunterstütztem chemischem abscheiden aus der dampfphase an grenzflächen ATE208228T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/272,360 US5672388A (en) 1994-07-08 1994-07-08 Membrane reparation and poer size reduction using interfacial ozone assisted chemical vapor deposition
PCT/US1995/008512 WO1996001682A1 (en) 1994-07-08 1995-07-10 Membrane reparation and pore size reduction using interfacial ozone assisted chemical vapor deposition

Publications (1)

Publication Number Publication Date
ATE208228T1 true ATE208228T1 (de) 2001-11-15

Family

ID=23039468

Family Applications (1)

Application Number Title Priority Date Filing Date
AT95926195T ATE208228T1 (de) 1994-07-08 1995-07-10 Membranvergütung und porenverkleinerung unter verwendung von ozonunterstütztem chemischem abscheiden aus der dampfphase an grenzflächen

Country Status (12)

Country Link
US (1) US5672388A (de)
EP (1) EP0769980B1 (de)
JP (1) JP3954097B2 (de)
AT (1) ATE208228T1 (de)
AU (1) AU701459B2 (de)
CA (1) CA2191888A1 (de)
DE (1) DE69523760T2 (de)
IL (1) IL114112A0 (de)
MX (1) MX9700126A (de)
TW (1) TW312708B (de)
WO (1) WO1996001682A1 (de)
ZA (1) ZA955235B (de)

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US7727596B2 (en) * 2004-07-21 2010-06-01 Worcester Polytechnic Institute Method for fabricating a composite gas separation module
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KR101638338B1 (ko) * 2014-11-25 2016-07-12 고려대학교 산학협력단 화학 기상 증착법을 통해 기공 크기가 제어된 실리카 카바자이트 제올라이트 분리막의 제조방법 및 이로부터 제조된 기공 크기가 제어된 실리카 카바자이트 제올라이트 분리막
JP2019508241A (ja) * 2016-03-01 2019-03-28 フラウンホーファー ゲゼルシャフト ツア フェルデルング デア アンゲヴァンテン フォルシュング エー ファウ 透過膜及び透過膜を作成する方法
WO2020006484A1 (en) 2018-06-28 2020-01-02 Massachusetts Institute Of Technology Coatings to improve the selectivity of atomically thin membranes
KR102293676B1 (ko) * 2020-01-15 2021-08-26 고려대학교 산학협력단 Mfi 제올라이트 분리막 내 결함구조를 조절하는 방법
CN114522579B (zh) * 2022-02-18 2023-10-24 中南大学 一种磷酸铁锂材料前驱体制备用搅拌装置

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Also Published As

Publication number Publication date
JP3954097B2 (ja) 2007-08-08
DE69523760D1 (de) 2001-12-13
WO1996001682A1 (en) 1996-01-25
AU701459B2 (en) 1999-01-28
JPH10502573A (ja) 1998-03-10
EP0769980A1 (de) 1997-05-02
EP0769980B1 (de) 2001-11-07
DE69523760T2 (de) 2002-08-01
MX9700126A (es) 1997-06-28
IL114112A0 (en) 1995-10-31
TW312708B (de) 1997-08-11
US5672388A (en) 1997-09-30
AU3003895A (en) 1996-02-09
CA2191888A1 (en) 1996-01-25
ZA955235B (en) 1996-04-01

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