ATE227242T1 - Vorratsbehälter für flüssige, hochreine substanzen mit einer einrichtung zur reinigung der anschlussstücke und rohrleitungen des vorratsbehälters - Google Patents

Vorratsbehälter für flüssige, hochreine substanzen mit einer einrichtung zur reinigung der anschlussstücke und rohrleitungen des vorratsbehälters

Info

Publication number
ATE227242T1
ATE227242T1 AT01108033T AT01108033T ATE227242T1 AT E227242 T1 ATE227242 T1 AT E227242T1 AT 01108033 T AT01108033 T AT 01108033T AT 01108033 T AT01108033 T AT 01108033T AT E227242 T1 ATE227242 T1 AT E227242T1
Authority
AT
Austria
Prior art keywords
storage tank
storage vessel
cleaning
vessel
shut
Prior art date
Application number
AT01108033T
Other languages
English (en)
Inventor
Christoph Dr Scholz
Original Assignee
Cs Clean Systems Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cs Clean Systems Ag filed Critical Cs Clean Systems Ag
Priority claimed from EP01108033A external-priority patent/EP1245527B1/de
Application granted granted Critical
Publication of ATE227242T1 publication Critical patent/ATE227242T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT01108033T 2001-03-29 2001-03-29 Vorratsbehälter für flüssige, hochreine substanzen mit einer einrichtung zur reinigung der anschlussstücke und rohrleitungen des vorratsbehälters ATE227242T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01108033A EP1245527B1 (de) 2001-03-29 2001-03-29 Vorratsbehälter für flüssige, hochreine Substanzen mit einer Einrichtung zur Reinigung der Anschlussstücke und Rohrleitungen des Vorratsbehälters

Publications (1)

Publication Number Publication Date
ATE227242T1 true ATE227242T1 (de) 2002-11-15

Family

ID=8176998

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01108033T ATE227242T1 (de) 2001-03-29 2001-03-29 Vorratsbehälter für flüssige, hochreine substanzen mit einer einrichtung zur reinigung der anschlussstücke und rohrleitungen des vorratsbehälters

Country Status (5)

Country Link
JP (1) JP4146148B2 (de)
KR (1) KR100863082B1 (de)
CN (1) CN1214956C (de)
AT (1) ATE227242T1 (de)
SG (1) SG104305A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005131632A (ja) 2003-10-08 2005-05-26 Adeka Engineering & Consutruction Co Ltd 流体供給装置
CN103184412A (zh) * 2011-12-27 2013-07-03 鸿富锦精密工业（深圳）有限公司 真空镀膜机清洗设备
CN107448273B (zh) * 2017-07-18 2021-02-19 中国电建集团河南工程公司 一种管道系统冲洗设备及燃机油系统化学清洗方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4723967A (en) * 1987-04-27 1988-02-09 Advanced Technology Materials, Inc. Valve block and container for semiconductor source reagent dispensing and/or purification
US5108015A (en) * 1990-07-06 1992-04-28 Fluoroware, Inc. Multiple tube to bung coupling
DE4142567C1 (de) * 1991-12-21 1993-06-09 Burdosa Ing. Herwig Burgert, 6305 Buseck, De
US6098848A (en) * 1997-12-25 2000-08-08 Nisso Engineering Co., Ltd Method and apparatus for connecting a fluid reservoir with pipelines

Also Published As

Publication number Publication date
KR100863082B1 (ko) 2008-10-13
CN1378966A (zh) 2002-11-13
JP4146148B2 (ja) 2008-09-03
CN1214956C (zh) 2005-08-17
SG104305A1 (en) 2004-06-21
JP2002343719A (ja) 2002-11-29
KR20020077031A (ko) 2002-10-11

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee