ATE231609T1 - Vorrichtung und verfahren zur evaluation eines ziels grosser als die messapertur eines sensors - Google Patents
Vorrichtung und verfahren zur evaluation eines ziels grosser als die messapertur eines sensorsInfo
- Publication number
- ATE231609T1 ATE231609T1 AT00945111T AT00945111T ATE231609T1 AT E231609 T1 ATE231609 T1 AT E231609T1 AT 00945111 T AT00945111 T AT 00945111T AT 00945111 T AT00945111 T AT 00945111T AT E231609 T1 ATE231609 T1 AT E231609T1
- Authority
- AT
- Austria
- Prior art keywords
- sensor
- evaluation
- measuring aperture
- wavefront
- target larger
- Prior art date
Links
- 238000011156 evaluation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
- G01B11/005—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates coordinate measuring machines
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0422—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using light concentrators, collectors or condensers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Measuring Arrangements Characterized By The Use Of Fluids (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/340,502 US6184974B1 (en) | 1999-07-01 | 1999-07-01 | Apparatus and method for evaluating a target larger than a measuring aperture of a sensor |
| PCT/US2000/018262 WO2001002822A1 (en) | 1999-07-01 | 2000-06-30 | Apparatus and method for evaluating a target larger than a measuring aperture of a sensor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE231609T1 true ATE231609T1 (de) | 2003-02-15 |
Family
ID=23333644
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00945111T ATE231609T1 (de) | 1999-07-01 | 2000-06-30 | Vorrichtung und verfahren zur evaluation eines ziels grosser als die messapertur eines sensors |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6184974B1 (de) |
| EP (1) | EP1192433B1 (de) |
| JP (1) | JP4647867B2 (de) |
| KR (1) | KR100685574B1 (de) |
| AT (1) | ATE231609T1 (de) |
| AU (1) | AU5910000A (de) |
| DE (1) | DE60001280T2 (de) |
| MY (1) | MY128215A (de) |
| WO (1) | WO2001002822A1 (de) |
Families Citing this family (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6819414B1 (en) | 1998-05-19 | 2004-11-16 | Nikon Corporation | Aberration measuring apparatus, aberration measuring method, projection exposure apparatus having the same measuring apparatus, device manufacturing method using the same measuring method, and exposure method |
| US6376819B1 (en) * | 1999-07-09 | 2002-04-23 | Wavefront Sciences, Inc. | Sub-lens spatial resolution Shack-Hartmann wavefront sensing |
| DE19938203A1 (de) * | 1999-08-11 | 2001-02-15 | Aesculap Meditec Gmbh | Verfahren und Vorrichtung zur Korrektur von Sehfehlern des menschlichen Auges |
| US6624896B1 (en) * | 1999-10-18 | 2003-09-23 | Wavefront Sciences, Inc. | System and method for metrology of surface flatness and surface nanotopology of materials |
| JP4549468B2 (ja) * | 1999-12-28 | 2010-09-22 | 株式会社トプコン | レンズメータ |
| US7161128B2 (en) * | 2000-07-14 | 2007-01-09 | Adaptive Optics Associates, Inc. | Optical instrument employing a wavefront sensor capable of coarse and fine phase measurement capabilities during first and second modes of operation |
| US6649895B1 (en) | 2000-07-14 | 2003-11-18 | Adaptive Optics Associates, Inc. | Dispersed Hartmann sensor and method for mirror segment alignment and phasing |
| US6548797B1 (en) * | 2000-10-20 | 2003-04-15 | Nikon Corporation | Apparatus and method for measuring a wavefront using a screen with apertures adjacent to a multi-lens array |
| US6577447B1 (en) | 2000-10-20 | 2003-06-10 | Nikon Corporation | Multi-lens array of a wavefront sensor for reducing optical interference and method thereof |
| JPWO2002052620A1 (ja) * | 2000-12-22 | 2004-04-30 | 株式会社ニコン | 波面収差測定装置、波面収差測定方法、露光装置及びマイクロデバイスの製造方法 |
| JP2002198279A (ja) | 2000-12-25 | 2002-07-12 | Nikon Corp | 位置検出方法、光学特性測定方法、光学特性測定装置、露光装置、及びデバイス製造方法 |
| JP2002202220A (ja) | 2000-12-27 | 2002-07-19 | Nikon Corp | 位置検出方法、位置検出装置、光学特性測定方法、光学特性測定装置、露光装置、及びデバイス製造方法 |
| JP4345098B2 (ja) * | 2001-02-06 | 2009-10-14 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| JP2002250677A (ja) * | 2001-02-23 | 2002-09-06 | Nikon Corp | 波面収差測定方法、波面収差測定装置、露光装置、デバイス製造方法、及びデバイス |
| US6724479B2 (en) | 2001-09-28 | 2004-04-20 | Infineon Technologies Ag | Method for overlay metrology of low contrast features |
| WO2003068057A2 (en) * | 2002-02-11 | 2003-08-21 | Visx, Inc. | Method and device for calibrating an optical wavefront system |
| US8911086B2 (en) | 2002-12-06 | 2014-12-16 | Amo Manufacturing Usa, Llc | Compound modulation transfer function for laser surgery and other optical applications |
| US7338165B2 (en) * | 2003-06-20 | 2008-03-04 | Visx, Incorporated | Systems and methods for prediction of objective visual acuity based on wavefront measurements |
| MXPA05010791A (es) * | 2003-04-09 | 2005-12-15 | Visx Inc | Analizador de calibracion de frente de onda y metodos de uso del mismo. |
| US7057806B2 (en) * | 2003-05-09 | 2006-06-06 | 3M Innovative Properties Company | Scanning laser microscope with wavefront sensor |
| US7175278B2 (en) * | 2003-06-20 | 2007-02-13 | Visx, Inc. | Wavefront reconstruction using fourier transformation and direct integration |
| US7168807B2 (en) | 2003-06-20 | 2007-01-30 | Visx, Incorporated | Iterative fourier reconstruction for laser surgery and other optical applications |
| US8596787B2 (en) | 2003-06-20 | 2013-12-03 | Amo Manufacturing Usa, Llc | Systems and methods for prediction of objective visual acuity based on wavefront measurements |
| EP1491855A1 (de) * | 2003-06-23 | 2004-12-29 | Leica Geosystems AG | Optischer Neigungsmesser |
| US7230717B2 (en) * | 2003-08-28 | 2007-06-12 | 4D Technology Corporation | Pixelated phase-mask interferometer |
| US7088457B1 (en) * | 2003-10-01 | 2006-08-08 | University Of Central Florida Research Foundation, Inc. | Iterative least-squares wavefront estimation for general pupil shapes |
| BRPI0416349A (pt) * | 2003-11-10 | 2007-04-10 | Visx Inc | método, dispositivo de teste para testar uma medição de alinhamento entre um dispositivo diagnóstico e um sistema refrativo a laser, método de fabricar um dispositivo de teste, e, kit para testar um alinhamento entre um dispositivo diagnóstico e um sistema refrativo a laser |
| US7187815B1 (en) * | 2004-10-01 | 2007-03-06 | Sandia Corporation | Relaying an optical wavefront |
| US7268937B1 (en) | 2005-05-27 | 2007-09-11 | United States Of America As Represented By The Secretary Of The Air Force | Holographic wavefront sensor |
| US7331674B2 (en) * | 2005-09-02 | 2008-02-19 | Visx, Incorporated | Calculating Zernike coefficients from Fourier coefficients |
| JP2007085788A (ja) * | 2005-09-20 | 2007-04-05 | Nikon Corp | ハルトマンセンサ |
| WO2007070006A1 (en) * | 2005-12-13 | 2007-06-21 | Agency For Science, Technology And Research | Optical wavefront sensor |
| WO2007106657A2 (en) | 2006-03-14 | 2007-09-20 | Amo Manufacturing Usa, Llc | Spatial frequency wavefront sensor system and method |
| AU2007227371B2 (en) * | 2006-03-23 | 2012-02-02 | Amo Manufacturing Usa, Llc | Systems and methods for wavefront reconstruction for aperture with arbitrary shape |
| CA2648305C (en) * | 2006-04-07 | 2012-10-16 | Amo Wavefront Sciences, Llc | Geometric measurement system and method of measuring a geometric characteristic of an object |
| US20080100850A1 (en) * | 2006-10-31 | 2008-05-01 | Mitutoyo Corporation | Surface height and focus sensor |
| US7728961B2 (en) * | 2006-10-31 | 2010-06-01 | Mitutoyo Coporation | Surface height and focus sensor |
| DE102006062600B4 (de) | 2006-12-29 | 2023-12-21 | Endress + Hauser Flowtec Ag | Verfahren zum Inbetriebnehmen und/oder Überwachen eines In-Line-Meßgeräts |
| FR2920536B1 (fr) * | 2007-08-29 | 2010-03-12 | Thales Sa | Dispositif de mesure de la fonction de transfert de modulation d'instruments optiques de grande dimension |
| US7723657B2 (en) | 2007-11-16 | 2010-05-25 | Mitutoyo Corporation | Focus detection apparatus having extended detection range |
| CN102803930B (zh) * | 2009-06-24 | 2016-04-27 | 皇家飞利浦电子股份有限公司 | 具有聚焦光学器件的光生物传感器 |
| JP5416025B2 (ja) * | 2010-04-22 | 2014-02-12 | 株式会社神戸製鋼所 | 表面形状測定装置および半導体ウェハ検査装置 |
| US10132925B2 (en) | 2010-09-15 | 2018-11-20 | Ascentia Imaging, Inc. | Imaging, fabrication and measurement systems and methods |
| WO2012037343A1 (en) * | 2010-09-15 | 2012-03-22 | Ascentia Imaging, Inc. | Imaging, fabrication, and measurement systems and methods |
| JP2013002819A (ja) * | 2011-06-10 | 2013-01-07 | Horiba Ltd | 平面度測定装置 |
| CN102435420A (zh) * | 2011-09-20 | 2012-05-02 | 浙江师范大学 | 光学元件中频误差的检测方法 |
| US8774549B2 (en) * | 2011-09-30 | 2014-07-08 | Stmicroelectronics, Inc. | Compression error handling for temporal noise reduction |
| US9739864B2 (en) | 2012-01-03 | 2017-08-22 | Ascentia Imaging, Inc. | Optical guidance systems and methods using mutually distinct signal-modifying |
| CN107861102B (zh) | 2012-01-03 | 2021-08-20 | 阿森蒂亚影像有限公司 | 编码定位系统、方法和装置 |
| JP5888998B2 (ja) * | 2012-01-18 | 2016-03-22 | キヤノン株式会社 | 波面傾斜分布測定方法および波面傾斜分布測定装置 |
| US8593622B1 (en) | 2012-06-22 | 2013-11-26 | Raytheon Company | Serially addressed sub-pupil screen for in situ electro-optical sensor wavefront measurement |
| JP6030471B2 (ja) * | 2013-02-18 | 2016-11-24 | 株式会社神戸製鋼所 | 形状測定装置 |
| US9444995B2 (en) | 2013-10-11 | 2016-09-13 | Mitutoyo Corporation | System and method for controlling a tracking autofocus (TAF) sensor in a machine vision inspection system |
| CN104198164B (zh) * | 2014-09-19 | 2017-02-15 | 中国科学院光电技术研究所 | 一种基于哈特曼波前检测原理的检焦方法 |
| US9740190B2 (en) | 2014-10-09 | 2017-08-22 | Mitutoyo Corporation | Method for programming a three-dimensional workpiece scan path for a metrology system |
| US10126114B2 (en) | 2015-05-21 | 2018-11-13 | Ascentia Imaging, Inc. | Angular localization system, associated repositionable mechanical structure, and associated method |
| JP6448497B2 (ja) * | 2015-08-03 | 2019-01-09 | 三菱電機株式会社 | 波面センサ、波面測定方法および光モジュール位置決め方法 |
| DE102016210966A1 (de) | 2016-06-20 | 2017-12-21 | Micro-Epsilon Optronic Gmbh | Verfahren und Vorrichtung zur Vermessung einer gekrümmten Wellenfront mit mindestens einem Wellenfrontsensor |
| CN107179605A (zh) * | 2017-07-04 | 2017-09-19 | 成都安的光电科技有限公司 | 望远镜调焦系统及方法 |
| CN110207932B (zh) * | 2019-05-15 | 2024-05-10 | 中国科学院西安光学精密机械研究所 | 一种高速风洞纹影仪焦斑监测减震方法及系统 |
| US11231375B2 (en) * | 2019-05-20 | 2022-01-25 | Wisconsin Alumni Research Foundation | Apparatus for high-speed surface relief measurement |
| CN110987377B (zh) * | 2019-12-18 | 2021-12-21 | 中国空间技术研究院 | 空间光学相机的光轴角度测量方法 |
| KR20230025438A (ko) * | 2020-06-17 | 2023-02-21 | 코닝 인코포레이티드 | 유리 기반 기판의 피처를 측정하는 방법 및 장치 |
| CN114543695A (zh) * | 2022-02-08 | 2022-05-27 | 南京中安半导体设备有限责任公司 | 哈特曼测量装置及其测量方法和晶圆几何参数测量装置 |
| CN119284700B (zh) * | 2024-09-13 | 2026-01-13 | 珠海格力电子元器件有限公司 | 一种天车装置和晶圆盒运输方法 |
| CN120521741B (zh) * | 2025-07-24 | 2025-11-28 | 中国工程物理研究院应用电子学研究所 | 一种光束波前测量装置、光束波前测量装置的控制方法 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4141652A (en) * | 1977-11-25 | 1979-02-27 | Adaptive Optics Associates, Inc. | Sensor system for detecting wavefront distortion in a return beam of light |
| DE3413420C2 (de) * | 1984-04-10 | 1986-06-26 | Messerschmitt-Bölkow-Blohm GmbH, 8012 Ottobrunn | Sensor zur Ermittlung von Bildfehlern |
| JPH0814484B2 (ja) * | 1985-04-09 | 1996-02-14 | 株式会社ニコン | パタ−ン位置測定装置 |
| US4689491A (en) * | 1985-04-19 | 1987-08-25 | Datasonics Corp. | Semiconductor wafer scanning system |
| US4737621A (en) * | 1985-12-06 | 1988-04-12 | Adaptive Optics Assoc., Inc. | Integrated adaptive optical wavefront sensing and compensating system |
| JP2892075B2 (ja) * | 1990-01-31 | 1999-05-17 | 末三 中楯 | 屈折率分布、透過波面の測定方法およびこの方法に用いる測定装置 |
| DE4003699A1 (de) * | 1990-02-07 | 1991-08-22 | Wild Heerbrugg Ag | Verfahren und anordnung zur pruefung optischer komponenten oder systeme |
| DE4003698C2 (de) * | 1990-02-07 | 1994-09-08 | Wild Heerbrugg Ag | Wellenfrontsensor |
| US5164578A (en) * | 1990-12-14 | 1992-11-17 | United Technologies Corporation | Two-dimensional OCP wavefront sensor employing one-dimensional optical detection |
| US5293216A (en) * | 1990-12-31 | 1994-03-08 | Texas Instruments Incorporated | Sensor for semiconductor device manufacturing process control |
| US5287165A (en) * | 1991-09-30 | 1994-02-15 | Kaman Aerospace Corporation | High sensitivity-wide dynamic range optical tilt sensor |
| US5333049A (en) * | 1991-12-06 | 1994-07-26 | Hughes Aircraft Company | Apparatus and method for interferometrically measuring the thickness of thin films using full aperture irradiation |
| US5233174A (en) * | 1992-03-11 | 1993-08-03 | Hughes Danbury Optical Systems, Inc. | Wavefront sensor having a lenslet array as a null corrector |
| US5493391A (en) * | 1994-07-11 | 1996-02-20 | Sandia Corporation | One dimensional wavefront distortion sensor comprising a lens array system |
| JPH0884104A (ja) * | 1994-09-09 | 1996-03-26 | Toshiba Corp | 無線通信装置 |
| US5563709A (en) * | 1994-09-13 | 1996-10-08 | Integrated Process Equipment Corp. | Apparatus for measuring, thinning and flattening silicon structures |
| US5629765A (en) * | 1995-12-15 | 1997-05-13 | Adaptive Optics Associates, Inc. | Wavefront measuring system with integral geometric reference (IGR) |
| JP3405132B2 (ja) * | 1997-07-02 | 2003-05-12 | 三菱電機株式会社 | コヒーレント光源の波面測定法 |
-
1999
- 1999-07-01 US US09/340,502 patent/US6184974B1/en not_active Expired - Lifetime
-
2000
- 2000-06-30 WO PCT/US2000/018262 patent/WO2001002822A1/en not_active Ceased
- 2000-06-30 AU AU59100/00A patent/AU5910000A/en not_active Abandoned
- 2000-06-30 AT AT00945111T patent/ATE231609T1/de not_active IP Right Cessation
- 2000-06-30 DE DE60001280T patent/DE60001280T2/de not_active Expired - Lifetime
- 2000-06-30 EP EP00945111A patent/EP1192433B1/de not_active Expired - Lifetime
- 2000-06-30 JP JP2001508019A patent/JP4647867B2/ja not_active Expired - Fee Related
- 2000-06-30 KR KR1020017016960A patent/KR100685574B1/ko not_active Expired - Fee Related
- 2000-07-03 MY MYPI20003027A patent/MY128215A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP1192433A1 (de) | 2002-04-03 |
| WO2001002822A1 (en) | 2001-01-11 |
| KR20020025098A (ko) | 2002-04-03 |
| JP4647867B2 (ja) | 2011-03-09 |
| DE60001280T2 (de) | 2004-01-22 |
| EP1192433B1 (de) | 2003-01-22 |
| DE60001280D1 (de) | 2003-02-27 |
| US6184974B1 (en) | 2001-02-06 |
| AU5910000A (en) | 2001-01-22 |
| JP2003503726A (ja) | 2003-01-28 |
| KR100685574B1 (ko) | 2007-02-22 |
| MY128215A (en) | 2007-01-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |