ATE232014T1 - Substratbehälter mit schutz gegen physisch- chemische kontamination - Google Patents

Substratbehälter mit schutz gegen physisch- chemische kontamination

Info

Publication number
ATE232014T1
ATE232014T1 AT96939148T AT96939148T ATE232014T1 AT E232014 T1 ATE232014 T1 AT E232014T1 AT 96939148 T AT96939148 T AT 96939148T AT 96939148 T AT96939148 T AT 96939148T AT E232014 T1 ATE232014 T1 AT E232014T1
Authority
AT
Austria
Prior art keywords
box
protection against
substrate container
chemical contamination
against physical
Prior art date
Application number
AT96939148T
Other languages
English (en)
Inventor
Philippe Spinelli
Claude Doche
Jean-Christophe Rostaing
Francois Coeuret
D Apolonia Sylvain Scotto
Original Assignee
Commissariat Energie Atomique
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique, Air Liquide filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE232014T1 publication Critical patent/ATE232014T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1902Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers specially adapted for a single substrate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1911Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by materials, roughness, coatings or the like
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352Polymer or resin containing [i.e., natural or synthetic]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1379Contains vapor or gas barrier, polymer derived from vinyl chloride or vinylidene chloride, or polymer containing a vinyl alcohol unit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/13Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/1352Polymer or resin containing [i.e., natural or synthetic]
    • Y10T428/1379Contains vapor or gas barrier, polymer derived from vinyl chloride or vinylidene chloride, or polymer containing a vinyl alcohol unit
    • Y10T428/1383Vapor or gas barrier, polymer derived from vinyl chloride or vinylidene chloride, or polymer containing a vinyl alcohol unit is sandwiched between layers [continuous layer]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/26Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264Up to 3 mils
    • Y10T428/2651 mil or less

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Packaging Frangible Articles (AREA)
  • Packages (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
AT96939148T 1995-11-20 1996-11-19 Substratbehälter mit schutz gegen physisch- chemische kontamination ATE232014T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9513720A FR2741328B1 (fr) 1995-11-20 1995-11-20 Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique
PCT/FR1996/001828 WO1997019464A1 (fr) 1995-11-20 1996-11-19 Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique

Publications (1)

Publication Number Publication Date
ATE232014T1 true ATE232014T1 (de) 2003-02-15

Family

ID=9484721

Family Applications (1)

Application Number Title Priority Date Filing Date
AT96939148T ATE232014T1 (de) 1995-11-20 1996-11-19 Substratbehälter mit schutz gegen physisch- chemische kontamination

Country Status (8)

Country Link
US (1) US6214425B1 (de)
EP (1) EP0804801B1 (de)
JP (1) JP3992737B2 (de)
KR (1) KR100452927B1 (de)
AT (1) ATE232014T1 (de)
DE (1) DE69626004T2 (de)
FR (1) FR2741328B1 (de)
WO (1) WO1997019464A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10054161C2 (de) * 2000-11-02 2003-05-28 Wacker Siltronic Halbleitermat Verpackung für Halbleiterscheiben und Verfahren zu ihrer Herstellung
JP2003107627A (ja) * 2001-09-26 2003-04-09 Fuji Photo Film Co Ltd 熱現像感光材料、及びその製造方法
US6825051B2 (en) * 2002-05-17 2004-11-30 Asm America, Inc. Plasma etch resistant coating and process
US6974781B2 (en) * 2003-10-20 2005-12-13 Asm International N.V. Reactor precoating for reduced stress and uniform CVD
FR2869452B1 (fr) * 2004-04-21 2006-09-08 Alcatel Sa Dispositif pour le transport de substrats sous atmosphere controlee
FR2869451B1 (fr) * 2004-04-21 2006-07-21 Alcatel Sa Enveloppe de transport a protection par effet thermophorese
JP2006001647A (ja) * 2004-05-18 2006-01-05 Sumitomo Electric Ind Ltd 容器、包装体、容器の製造方法、包装体の製造方法および化合物半導体基板
CN205854798U (zh) * 2016-08-05 2017-01-04 京东方科技集团股份有限公司 一种托盘及显示面板的包装装置
KR102080706B1 (ko) * 2017-11-24 2020-02-24 주성엔지니어링(주) 기판 이송용 트레이 및 그 제조방법
TWI757132B (zh) * 2021-03-26 2022-03-01 迅得機械股份有限公司 半導體物件容器儲存裝置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6059928B2 (ja) * 1980-09-08 1985-12-27 信越化学工業株式会社 塩化ビニル系樹脂成形品の表面処理方法
EP0164583B1 (de) * 1984-05-11 1991-09-25 TERUMO KABUSHIKI KAISHA trading as TERUMO CORPORATION Verfahren zur Herstellung eines Behälters aus syntetischem Harz
JP2573480B2 (ja) * 1985-11-22 1997-01-22 東芝セラミックス 株式会社 半導体熱処理用治具
JP2700316B2 (ja) * 1987-06-10 1998-01-21 三菱電機株式会社 有機物質表面の改質方法
FR2631346B1 (fr) * 1988-05-11 1994-05-20 Air Liquide Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications
FR2673633B1 (fr) * 1991-03-06 1993-06-11 Air Liquide Revetement multicouche pour substrat polycarbonate.
FR2677773B1 (fr) * 1991-06-12 1994-04-29 Air Liquide Procede d'elaboration d'une structure optique et structure optique ainsi realisee.
US5255783A (en) * 1991-12-20 1993-10-26 Fluoroware, Inc. Evacuated wafer container
FR2697000B1 (fr) * 1992-10-16 1994-11-25 Commissariat Energie Atomique Boîte plate de confinement d'un objet plat sous atmosphère spéciale.

Also Published As

Publication number Publication date
DE69626004T2 (de) 2003-11-06
US6214425B1 (en) 2001-04-10
FR2741328A1 (fr) 1997-05-23
DE69626004D1 (de) 2003-03-06
EP0804801A1 (de) 1997-11-05
JP3992737B2 (ja) 2007-10-17
WO1997019464A1 (fr) 1997-05-29
FR2741328B1 (fr) 1997-12-19
KR100452927B1 (ko) 2005-01-05
EP0804801B1 (de) 2003-01-29
JPH10513313A (ja) 1998-12-15
KR19980701533A (ko) 1998-05-15

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties