ATE237830T1 - Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit - Google Patents

Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit

Info

Publication number
ATE237830T1
ATE237830T1 AT97942870T AT97942870T ATE237830T1 AT E237830 T1 ATE237830 T1 AT E237830T1 AT 97942870 T AT97942870 T AT 97942870T AT 97942870 T AT97942870 T AT 97942870T AT E237830 T1 ATE237830 T1 AT E237830T1
Authority
AT
Austria
Prior art keywords
c4alkyl
group
unsubstituted
substituted
hydrogen
Prior art date
Application number
AT97942870T
Other languages
English (en)
Inventor
Kurt Dietliker
Martin Kunz
Hitoshi Yamato
Leo Christoph De
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE237830T1 publication Critical patent/ATE237830T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/22—Radicals substituted by doubly bound hetero atoms, or by two hetero atoms other than halogen singly bound to the same carbon atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
    • C07D333/24—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Holo Graphy (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Steroid Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT97942870T 1996-09-02 1997-08-22 Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit ATE237830T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH214796 1996-09-02
PCT/EP1997/004566 WO1998010335A1 (en) 1996-09-02 1997-08-22 Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity

Publications (1)

Publication Number Publication Date
ATE237830T1 true ATE237830T1 (de) 2003-05-15

Family

ID=4226975

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97942870T ATE237830T1 (de) 1996-09-02 1997-08-22 Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit

Country Status (14)

Country Link
EP (1) EP0925529B1 (de)
JP (1) JP3875271B2 (de)
KR (1) KR100686473B1 (de)
CN (1) CN1133901C (de)
AT (1) ATE237830T1 (de)
AU (1) AU726458B2 (de)
BR (1) BR9713311A (de)
CA (1) CA2263254A1 (de)
DE (1) DE69721019T2 (de)
ES (1) ES2194218T3 (de)
ID (1) ID17338A (de)
MY (1) MY118505A (de)
TW (1) TW497011B (de)
WO (1) WO1998010335A1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
DK199901098A (da) * 1998-08-18 2000-02-19 Ciba Sc Holding Ag Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse
TW575792B (en) 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
WO2000014602A1 (en) * 1998-09-04 2000-03-16 Polaroid Corporation Process for forming a color filter
DE69904073T2 (de) * 1998-10-29 2003-07-17 Ciba Speciality Chemicals Holding Inc., Basel Oximderivate und ihre verwendung als latente saüre
US6806024B1 (en) 1999-03-03 2004-10-19 Ciba Specialty Chemicals Corporation Oxime derivatives and the use thereof as photoinitiators
US6576394B1 (en) 2000-06-16 2003-06-10 Clariant Finance (Bvi) Limited Negative-acting chemically amplified photoresist composition
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TW589514B (en) * 2001-09-13 2004-06-01 Matsushita Electric Industrial Co Ltd Pattern formation material and pattern formation method
KR20040089607A (ko) * 2002-02-06 2004-10-21 시바 스페셜티 케미칼스 홀딩 인크. 설포네이트 유도체 및 잠산으로서의 이의 용도
WO2006046398A1 (ja) * 2004-10-29 2006-05-04 Nissan Chemical Industries, Ltd. 光酸発生剤を含む染料含有レジスト組成物及びそれを用いるカラーフィルター
KR20090043591A (ko) * 2006-08-24 2009-05-06 시바 홀딩 인크 Ｕｖ-선량 표시기
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
CN101638374A (zh) * 2008-07-28 2010-02-03 住友化学株式会社 肟类化合物及包含该化合物的抗蚀剂组合物
WO2010112408A1 (en) 2009-03-30 2010-10-07 Basf Se Uv-dose indicator films
JP6605820B2 (ja) * 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物
US12164229B2 (en) * 2018-12-27 2024-12-10 Sumitomo Chemical Company, Limited Resist composition and method for producing resist pattern
CN117720483A (zh) * 2023-11-08 2024-03-19 湖北三峡实验室 一类含芳香性三氟甲肟基磺酸酯结构的光产酸剂及其制备方法和应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123255A (en) * 1977-01-03 1978-10-31 Chevron Research Company O-sulfonyl-alpha-cyano 2,6-dihalobenzaldoximes
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
EP0361907A3 (de) * 1988-09-29 1991-05-02 Hoechst Celanese Corporation Photolack-Zusammensetzung mit Bildumkehr für tiefes UV
US5019488A (en) * 1988-09-29 1991-05-28 Hoechst Celanese Corporation Method of producing an image reversal negative photoresist having a photo-labile blocked imide
DE59309494D1 (de) * 1992-05-22 1999-05-12 Ciba Geigy Ag Hochauflösender I-Linien Photoresist mit höherer Empfindlichkeit
JP3456808B2 (ja) * 1995-09-29 2003-10-14 東京応化工業株式会社 ホトレジスト組成物
JP3587413B2 (ja) * 1995-12-20 2004-11-10 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
JP3665166B2 (ja) * 1996-07-24 2005-06-29 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤

Also Published As

Publication number Publication date
CA2263254A1 (en) 1998-03-12
EP0925529B1 (de) 2003-04-16
ES2194218T3 (es) 2003-11-16
KR100686473B1 (ko) 2007-02-26
BR9713311A (pt) 2000-02-01
JP2000517067A (ja) 2000-12-19
EP0925529A1 (de) 1999-06-30
CN1228851A (zh) 1999-09-15
WO1998010335A1 (en) 1998-03-12
AU726458B2 (en) 2000-11-09
JP3875271B2 (ja) 2007-01-31
CN1133901C (zh) 2004-01-07
DE69721019T2 (de) 2003-12-24
ID17338A (id) 1997-12-18
TW497011B (en) 2002-08-01
DE69721019D1 (de) 2003-05-22
MY118505A (en) 2004-11-30
AU4455297A (en) 1998-03-26
KR20000068387A (ko) 2000-11-25

Similar Documents

Publication Publication Date Title
DE69721019D1 (de) Alkylsulfonyloxime für i-line-photoresists hoher auflösung und empfindlichkeit
KR100258834B1 (en) High resolution i-line photoresist
NL1004387A1 (nl) Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren.
US4232106A (en) Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors
SE9902913L (sv) Ljusaktiverbar komposition
ES2168953A1 (es) Derivados de oxima y su uso como acidos latentes
ATE44383T1 (de) Bisacylphosphinoxide, ihre herstellung und verwendung.
ATE167741T1 (de) Sensibilisatoren für photothermographische elemente
FI822124A0 (fi) Tryckkaensligt eller vaermekaensligt uppteckningsmaterial
ATE63647T1 (de) Negativ arbeitende fotoresistmasse.
SE7906638L (sv) Peptidderivat
DE59107712D1 (de) Säurelabile Lösungsinhibitoren und darauf basierende positiv und negativ arbeitende strahlungsempfindliche Zusammensetzung
ATE15896T1 (de) Pyridazinon-derivate, verfahren zu ihrer herstellung und ihre verwendung als fungizide.
DE59006120D1 (de) Carbonsäurederivate.
ES8205837A1 (es) Un procedimiento para la produccion de derivados de halogeno-triacinilo.
SE8006953L (sv) Heterocykliska foreningar
KR900014932A (ko) 디설파이드를 함유하는 광개시제 조성물 및 이를 함유하는 광경화성 조성물
JPS55161237A (en) Silver halide photographic material
BR8304780A (pt) Mistura fotopolimerizavel e 1,3-diaza-9-tia-antracen-2,4-dionas
ATE256106T1 (de) Positiv arbeitende lichtempfindliche zusammensetzung
TH34656A (th) อัคคิลซัลโฟนิลออกไซม์สำหรับสารต้านทางแสงไอ-ไลน์แยกตัวดีและมีความไวสูง
ES2077359T3 (es) Mono(indoliletilenil)ftalidas.
DE69217148D1 (de) Isoxazole derivate als lichtschutzmittel
SE8106492L (sv) Dioxolansubstituerade 2,6-dinitroaniliner
EP0640605A4 (de)

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties