ATE254192T1 - Verfahren und vorrichtung zur sequentiellen plasmabehandlung - Google Patents

Verfahren und vorrichtung zur sequentiellen plasmabehandlung

Info

Publication number
ATE254192T1
ATE254192T1 AT01401101T AT01401101T ATE254192T1 AT E254192 T1 ATE254192 T1 AT E254192T1 AT 01401101 T AT01401101 T AT 01401101T AT 01401101 T AT01401101 T AT 01401101T AT E254192 T1 ATE254192 T1 AT E254192T1
Authority
AT
Austria
Prior art keywords
plasma treatment
ionisation energy
substrate
energy sources
sources
Prior art date
Application number
AT01401101T
Other languages
English (en)
Inventor
Pascal Colpo
Francois Rossi
Original Assignee
Europ Economic Community
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Europ Economic Community filed Critical Europ Economic Community
Application granted granted Critical
Publication of ATE254192T1 publication Critical patent/ATE254192T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32394—Treating interior parts of workpieces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Radiation-Therapy Devices (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
AT01401101T 2001-04-27 2001-04-27 Verfahren und vorrichtung zur sequentiellen plasmabehandlung ATE254192T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01401101A EP1253216B1 (de) 2001-04-27 2001-04-27 Verfahren und Vorrichtung zur sequentiellen Plasmabehandlung

Publications (1)

Publication Number Publication Date
ATE254192T1 true ATE254192T1 (de) 2003-11-15

Family

ID=8182707

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01401101T ATE254192T1 (de) 2001-04-27 2001-04-27 Verfahren und vorrichtung zur sequentiellen plasmabehandlung

Country Status (13)

Country Link
US (1) US7618686B2 (de)
EP (1) EP1253216B1 (de)
JP (1) JP2004533316A (de)
KR (1) KR20040007516A (de)
AT (1) ATE254192T1 (de)
CA (1) CA2444766C (de)
DE (1) DE60101209T2 (de)
DK (1) DK1253216T3 (de)
ES (1) ES2208530T3 (de)
NO (1) NO20034750L (de)
PT (1) PT1253216E (de)
TW (1) TW593464B (de)
WO (1) WO2002088420A1 (de)

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US10359362B2 (en) 2013-04-15 2019-07-23 Plexense, Inc. Method for manufacturing nanoparticle array, surface plasmon resonance-based sensor and method for analyzing using same
EP3122917B1 (de) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatische beschichtungen für kunststoffbehälter
EP3233303A4 (de) * 2014-12-15 2018-08-22 Plexense, Inc. Oberflächenplasmonendetektionvorrichtungen und -verfahren
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KR20250100790A (ko) 2019-01-22 2025-07-03 어플라이드 머티어리얼스, 인코포레이티드 펄스 전압 파형을 제어하기 위한 피드백 루프
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Also Published As

Publication number Publication date
JP2004533316A (ja) 2004-11-04
KR20040007516A (ko) 2004-01-24
PT1253216E (pt) 2004-04-30
ES2208530T3 (es) 2004-06-16
WO2002088420A1 (en) 2002-11-07
CA2444766A1 (en) 2002-11-07
DE60101209D1 (de) 2003-12-18
EP1253216A1 (de) 2002-10-30
TW593464B (en) 2004-06-21
US20040154541A1 (en) 2004-08-12
CA2444766C (en) 2009-07-14
NO20034750D0 (no) 2003-10-23
DK1253216T3 (da) 2004-03-22
DE60101209T2 (de) 2004-09-02
EP1253216B1 (de) 2003-11-12
US7618686B2 (en) 2009-11-17
NO20034750L (no) 2003-12-22

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