ATE262542T1 - Herstellung von co- und terpolymeren von p- hydroxystyrol und alkylacrylaten - Google Patents

Herstellung von co- und terpolymeren von p- hydroxystyrol und alkylacrylaten

Info

Publication number
ATE262542T1
ATE262542T1 AT99911412T AT99911412T ATE262542T1 AT E262542 T1 ATE262542 T1 AT E262542T1 AT 99911412 T AT99911412 T AT 99911412T AT 99911412 T AT99911412 T AT 99911412T AT E262542 T1 ATE262542 T1 AT E262542T1
Authority
AT
Austria
Prior art keywords
hydroxystyrene
terpolymers
acrylate
tert
alkyl
Prior art date
Application number
AT99911412T
Other languages
English (en)
Inventor
Michael T Sheehan
James R Sounik
Original Assignee
Triquest L P
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Triquest L P filed Critical Triquest L P
Application granted granted Critical
Publication of ATE262542T1 publication Critical patent/ATE262542T1/de

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/039Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/12Hydrolysis
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment
    • C08F8/14Esterification
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/10Copolymer characterised by the proportions of the comonomers expressed as molar percentages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/50Chemical modification of a polymer wherein the polymer is a copolymer and the modification is taking place only on one or more of the monomers present in minority

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT99911412T 1998-05-05 1999-03-15 Herstellung von co- und terpolymeren von p- hydroxystyrol und alkylacrylaten ATE262542T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7293698A 1998-05-05 1998-05-05
PCT/US1999/005667 WO1999057163A1 (en) 1998-05-05 1999-03-15 Preparation of co- and terpolymers of p-hydroxystyrene and alkyl acrylates

Publications (1)

Publication Number Publication Date
ATE262542T1 true ATE262542T1 (de) 2004-04-15

Family

ID=22110669

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99911412T ATE262542T1 (de) 1998-05-05 1999-03-15 Herstellung von co- und terpolymeren von p- hydroxystyrol und alkylacrylaten

Country Status (5)

Country Link
EP (1) EP1076667B1 (de)
AT (1) ATE262542T1 (de)
AU (1) AU3005899A (de)
DE (1) DE69915819T2 (de)
WO (1) WO1999057163A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6759483B2 (en) * 1998-05-05 2004-07-06 Chemfirst Electronic Materials L.P. Preparation of homo-, co- and terpolymers of substituted styrenes
US6537724B1 (en) 1999-11-02 2003-03-25 Hyundai Electronics Industries Co., Ltd. Photoresist composition for resist flow process, and process for forming contact hole using the same
US6787611B2 (en) * 2000-06-27 2004-09-07 Chemfirst Electronic Materials L.P. Purification means
US6864324B2 (en) * 2002-04-19 2005-03-08 Chem First Electronic Materials L.P. Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity
US20040242798A1 (en) * 2003-05-08 2004-12-02 Sounik James R. Photoresist compositions and processes for preparing the same
US7834113B2 (en) 2003-05-08 2010-11-16 E. I. Du Pont De Nemours And Company Photoresist compositions and processes for preparing the same
US7534837B2 (en) * 2005-09-26 2009-05-19 E.I. Du Pont De Nemours And Company Random copolymers of ethylene and 4-vinylphenyl esters and method for preparing the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636540A (en) * 1985-07-08 1987-01-13 Atlantic Richfield Company Purification of polymer solutions
US4689371A (en) * 1986-07-07 1987-08-25 Celanese Corporation Process for the preparation of poly (vinylphenol) from poly (acetoxystyrene)
EP0260104A3 (de) * 1986-09-09 1989-03-15 Celanese Corporation Verfahren zur Herstellung von Polyvinylphenol durch gleichzeitige Methanolyse und Polymerisation von 4-Acetoxystyren
EP0277721A3 (de) * 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsionspolymerisation von 4-Acetoxystyren und Hydrolyse zu Poly(p-vinylphenol)
US4877843A (en) * 1987-09-11 1989-10-31 Hoechst Celanese Corporation Selective hydrolysis of copolymers of para-acetoxy styrene and allyl esters of ethylenically unsaturated acids
JPH0768296B2 (ja) * 1991-11-28 1995-07-26 丸善石油化学株式会社 ビニルフェノール系重合体の金属除去方法
EP0605089B1 (de) * 1992-11-03 1999-01-07 International Business Machines Corporation Photolackzusammensetzung
WO1994014858A1 (en) * 1992-12-29 1994-07-07 Hoechst Celanese Corporation Metal ion reduction in polyhydroxystyrene and photoresists
US5861231A (en) * 1996-06-11 1999-01-19 Shipley Company, L.L.C. Copolymers and photoresist compositions comprising copolymer resin binder component

Also Published As

Publication number Publication date
AU3005899A (en) 1999-11-23
DE69915819T2 (de) 2005-01-27
DE69915819D1 (de) 2004-04-29
HK1033467A1 (en) 2001-08-31
EP1076667B1 (de) 2004-03-24
EP1076667A1 (de) 2001-02-21
WO1999057163A1 (en) 1999-11-11

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