ATE273575T1 - Vorrichtung zur halterung und zum ausbau eines optischen elements - Google Patents
Vorrichtung zur halterung und zum ausbau eines optischen elementsInfo
- Publication number
- ATE273575T1 ATE273575T1 AT01104172T AT01104172T ATE273575T1 AT E273575 T1 ATE273575 T1 AT E273575T1 AT 01104172 T AT01104172 T AT 01104172T AT 01104172 T AT01104172 T AT 01104172T AT E273575 T1 ATE273575 T1 AT E273575T1
- Authority
- AT
- Austria
- Prior art keywords
- optical element
- tubular
- gripping portion
- extraction
- holdering
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 5
- 238000000605 extraction Methods 0.000 abstract 4
- 230000002093 peripheral effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Led Device Packages (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/510,666 US6804284B1 (en) | 2000-02-22 | 2000-02-22 | Optical element holding and extraction device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE273575T1 true ATE273575T1 (de) | 2004-08-15 |
Family
ID=24031672
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01104172T ATE273575T1 (de) | 2000-02-22 | 2001-02-21 | Vorrichtung zur halterung und zum ausbau eines optischen elements |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6804284B1 (de) |
| EP (1) | EP1130698B1 (de) |
| AT (1) | ATE273575T1 (de) |
| DE (1) | DE60104744T2 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6804284B1 (en) * | 2000-02-22 | 2004-10-12 | Tuilaser Ag | Optical element holding and extraction device |
| DE102012005154B4 (de) * | 2012-03-16 | 2017-05-18 | Toptica Photonics Ag | Ausgasarmer Resonator |
| US9927296B2 (en) * | 2013-06-20 | 2018-03-27 | Rosemount Analytical Inc. | Alignment system for laser spectroscopy |
| US11670490B2 (en) | 2017-09-29 | 2023-06-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | Integrated circuit fabrication system with adjustable gas injector |
Family Cites Families (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3400596A (en) | 1966-04-15 | 1968-09-10 | Spectra Physics | Adjustable optical element supporting apparatus |
| US4746201A (en) | 1967-03-06 | 1988-05-24 | Gordon Gould | Polarizing apparatus employing an optical element inclined at brewster's angle |
| US3753144A (en) | 1971-10-18 | 1973-08-14 | W Kearns | Gas laser structure |
| DE2255048A1 (de) | 1972-11-10 | 1974-05-09 | Isco Optische Werke Gmbh | Kunststoff-fassung fuer objektive mit veraenderbarer brennweite |
| US3886474A (en) | 1973-04-30 | 1975-05-27 | Coherent Radiation | Gas laser having an integral optical resonator with external stabilizing means |
| US4423510A (en) | 1979-08-17 | 1983-12-27 | Westinghouse Electric Corp. | Laser tube design incorporating low inductance capacitor |
| US4448385A (en) | 1981-05-12 | 1984-05-15 | Honeywell Inc. | Stable alignment mechanism for laser mirrors |
| DE3130399A1 (de) | 1981-07-31 | 1983-02-17 | Siemens AG, 1000 Berlin und 8000 München | Optischer sender (laser) mit einer justiervorrichtung fuer einen reflektorspiegel des laserresonators |
| JPS5861843A (ja) | 1981-09-12 | 1983-04-13 | Senichi Masuda | 極短パルス高電圧発生装置 |
| DE3212928C2 (de) | 1982-04-07 | 1984-01-26 | Lambda Physik GmbH, 3400 Göttingen | Entladungsgepumpter Laser |
| EP0166028A3 (de) | 1984-06-25 | 1987-04-22 | Siemens Aktiengesellschaft | Justiereinrichtung für einen Reflektorspiegel eines Laserresonators |
| US4686685A (en) | 1985-06-06 | 1987-08-11 | Laser Corporation Of America | Gas laser having thermally stable optical mount |
| DE3541744A1 (de) | 1985-11-26 | 1987-05-27 | Heraeus Gmbh W C | Gaslaser |
| JP2512137Y2 (ja) | 1986-03-28 | 1996-09-25 | 日本電気株式会社 | ガスレ−ザ発振器 |
| US4891818A (en) | 1987-08-31 | 1990-01-02 | Acculase, Inc. | Rare gas-halogen excimer laser |
| US5473162A (en) | 1987-10-26 | 1995-12-05 | Baylor University | Infrared emission detection of a gas |
| JPH02250383A (ja) | 1989-03-24 | 1990-10-08 | Mitsubishi Heavy Ind Ltd | 部分反射鏡角度調整装置 |
| EP0456875A1 (de) | 1990-05-18 | 1991-11-21 | Siemens Aktiengesellschaft | Wellenleiterlaser |
| JPH05152643A (ja) | 1991-07-10 | 1993-06-18 | Mitsubishi Electric Corp | レーザ発振装置 |
| DE4128776A1 (de) | 1991-08-29 | 1993-03-04 | Siemens Ag | Spiegelfassung fuer laser |
| JPH0567823A (ja) | 1991-09-05 | 1993-03-19 | Nec Corp | 放電励起パルスガスレーザ装置 |
| US5373523A (en) | 1992-10-15 | 1994-12-13 | Kabushiki Kaisha Komatsu Seisakusho | Excimer laser apparatus |
| US5443289A (en) * | 1992-11-11 | 1995-08-22 | Guest; John D. | Tube couplings |
| FR2698496B1 (fr) | 1992-11-24 | 1995-02-10 | Laserdot | Tête de laser à gaz, à décharge et circulation transverses, à préionisation corona, et laser la comportant. |
| US5319663A (en) | 1992-12-18 | 1994-06-07 | Lumonics Inc. | Dust precipitation in a gas laser |
| JPH06237034A (ja) | 1993-02-10 | 1994-08-23 | Nec Corp | 放電励起ガスレーザ装置 |
| US5591317A (en) | 1994-02-16 | 1997-01-07 | Pitts, Jr.; M. Michael | Electrostatic device for water treatment |
| US5438587A (en) | 1994-03-31 | 1995-08-01 | Spectranetics | Preionizer for laser assembly |
| US5748663A (en) * | 1994-06-08 | 1998-05-05 | Qsource, Inc. | Retangular discharge gas laser |
| US5585641A (en) | 1995-05-23 | 1996-12-17 | The Regents Of The University Of California | Large area, surface discharge pumped, vacuum ultraviolet light source |
| US5857775A (en) * | 1995-09-05 | 1999-01-12 | Tyco Group S.A.R.L. | Thermometer probe having a watertight seal |
| US5729564A (en) | 1996-07-31 | 1998-03-17 | Visx, Incorporated | Electrostatic precipitator for a gas discharge laser |
| US5771258A (en) | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
| JP3932207B2 (ja) * | 1997-03-14 | 2007-06-20 | デマリア エレクトロオプティックス システムズ アイエヌシー | 無線周波数励起導波レーザ |
| US6018537A (en) | 1997-07-18 | 2000-01-25 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate F2 laser |
| DE29715466U1 (de) | 1997-08-28 | 1997-10-23 | TUI Laser GmbH, 82166 Gräfelfing | Resonatoranordnung für einen Laser |
| DE29716875U1 (de) | 1997-09-19 | 1997-11-20 | TUI Laser AG, 82166 Gräfelfing | Excimerlaser |
| US6151346A (en) | 1997-12-15 | 2000-11-21 | Cymer, Inc. | High pulse rate pulse power system with fast rise time and low current |
| WO1999060674A1 (en) | 1998-05-20 | 1999-11-25 | Cymer, Inc. | RELIABLE MODULAR PRODUCTION QUALITY NARROW-BAND HIGH REP RATE ArF EXCIMER LASER |
| US6567450B2 (en) * | 1999-12-10 | 2003-05-20 | Cymer, Inc. | Very narrow band, two chamber, high rep rate gas discharge laser system |
| US6208674B1 (en) | 1998-09-18 | 2001-03-27 | Cymer, Inc. | Laser chamber with fully integrated electrode feedthrough main insulator |
| US6333775B1 (en) * | 1999-01-13 | 2001-12-25 | Euv Llc | Extreme-UV lithography vacuum chamber zone seal |
| US6359922B1 (en) | 1999-10-20 | 2002-03-19 | Cymer, Inc. | Single chamber gas discharge laser with line narrowed seed beam |
| US6804284B1 (en) * | 2000-02-22 | 2004-10-12 | Tuilaser Ag | Optical element holding and extraction device |
| US6493375B1 (en) * | 2000-02-22 | 2002-12-10 | Tuilaser Ag | Adjustable mounting unit for an optical element of a gas laser |
| US6363094B1 (en) | 2000-06-09 | 2002-03-26 | Cymer, Inc. | Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |
-
2000
- 2000-02-22 US US09/510,666 patent/US6804284B1/en not_active Expired - Fee Related
-
2001
- 2001-02-21 DE DE60104744T patent/DE60104744T2/de not_active Expired - Lifetime
- 2001-02-21 EP EP01104172A patent/EP1130698B1/de not_active Expired - Lifetime
- 2001-02-21 AT AT01104172T patent/ATE273575T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| US6804284B1 (en) | 2004-10-12 |
| DE60104744D1 (de) | 2004-09-16 |
| DE60104744T2 (de) | 2005-09-01 |
| EP1130698A1 (de) | 2001-09-05 |
| EP1130698B1 (de) | 2004-08-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |