ATE273928T1 - Verfahren zur herstellung von trichlorsilan - Google Patents
Verfahren zur herstellung von trichlorsilanInfo
- Publication number
- ATE273928T1 ATE273928T1 AT01967319T AT01967319T ATE273928T1 AT E273928 T1 ATE273928 T1 AT E273928T1 AT 01967319 T AT01967319 T AT 01967319T AT 01967319 T AT01967319 T AT 01967319T AT E273928 T1 ATE273928 T1 AT E273928T1
- Authority
- AT
- Austria
- Prior art keywords
- producing trichlorosilane
- silicon
- catalyst
- grain size
- average grain
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
- C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10045367A DE10045367A1 (de) | 2000-09-14 | 2000-09-14 | Verfahren zur Herstellung von Trichlorsilan |
| PCT/EP2001/010360 WO2002022500A1 (de) | 2000-09-14 | 2001-09-07 | Verfahren zur herstellung von trichlorsilan |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE273928T1 true ATE273928T1 (de) | 2004-09-15 |
Family
ID=7656116
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01967319T ATE273928T1 (de) | 2000-09-14 | 2001-09-07 | Verfahren zur herstellung von trichlorsilan |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20040022713A1 (de) |
| EP (1) | EP1326803B1 (de) |
| AT (1) | ATE273928T1 (de) |
| AU (1) | AU2001287719A1 (de) |
| DE (2) | DE10045367A1 (de) |
| WO (1) | WO2002022500A1 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006098722A1 (en) | 2005-03-09 | 2006-09-21 | Rec Advanced Silicon Materials Llc | Process for the production of hydrochlorosilanes |
| DE102008041974A1 (de) | 2008-09-10 | 2010-03-11 | Evonik Degussa Gmbh | Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen |
| DE102009027730A1 (de) * | 2009-07-15 | 2011-01-27 | Evonik Degussa Gmbh | Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen |
| US8298490B2 (en) * | 2009-11-06 | 2012-10-30 | Gtat Corporation | Systems and methods of producing trichlorosilane |
| JP2013537162A (ja) * | 2010-09-08 | 2013-09-30 | ダウ コーニング コーポレーション | トリハロシランの調製方法 |
| WO2012087795A1 (en) | 2010-12-20 | 2012-06-28 | Memc Electronic Materials, Inc. | Production of polycrystalline silicon in substantially closed-loop processes that involve disproportionation operations |
| DE102011110040B4 (de) * | 2011-04-14 | 2024-07-11 | Evonik Operations Gmbh | Verfahren zur Herstellung von Chlorsilanen mittels hochsiedender Chlorsilane oder chlorsilanhaltiger Gemische |
| CN104736547A (zh) | 2012-08-13 | 2015-06-24 | 道康宁公司 | 通过使氢、卤硅烷和有机卤化物在铜催化剂上以两步法反应制备有机卤硅烷的方法 |
| KR102299593B1 (ko) | 2013-11-12 | 2021-09-09 | 다우 실리콘즈 코포레이션 | 할로실란의 제조 방법 |
| KR101580171B1 (ko) | 2014-01-23 | 2015-12-24 | 한국화학연구원 | 금속 실리사이드 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치 |
| KR102607348B1 (ko) * | 2018-12-18 | 2023-11-29 | 와커 헤미 아게 | 클로로실란을 제조하는 방법 |
| MY206228A (en) * | 2019-04-29 | 2024-12-05 | Wacker Chemie Ag | Process for producing trichlorosilane with structure-optimised silicon particles |
| JP7500378B2 (ja) * | 2020-09-30 | 2024-06-17 | 高純度シリコン株式会社 | トリクロロシランの製造方法 |
| CN113559862B (zh) * | 2021-06-21 | 2022-04-22 | 北京工商大学 | 原子级助剂修饰的CuO复合介晶催化剂及其制备方法 |
| CN114392743A (zh) * | 2022-01-28 | 2022-04-26 | 中国科学院过程工程研究所 | 一种氧化亚铜粉末催化剂及其应用 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2380995A (en) * | 1941-09-26 | 1945-08-07 | Gen Electric | Preparation of organosilicon halides |
| US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| US4526769A (en) * | 1983-07-18 | 1985-07-02 | Motorola, Inc. | Trichlorosilane production process |
| US4504597A (en) * | 1983-11-04 | 1985-03-12 | Scm Corporation | Cupreous catalyst and process making same |
| US4520130A (en) * | 1984-05-08 | 1985-05-28 | Scm Corporation | Halosilane catalyst and process for making same |
| DE3782213T2 (de) * | 1986-07-10 | 1993-03-11 | Chiyoda Chem Eng Construct Co | Verfahren zur enthalogenierung eines halogenids und katalysator hierfuer. |
| DE4104422C2 (de) * | 1991-02-14 | 2000-07-06 | Degussa | Verfahren zur Herstellung von Trichlorsilan aus Siliciumtetrachlorid |
| DE4115183A1 (de) * | 1991-05-09 | 1992-11-12 | Bayer Ag | Feinteiliges silicium mit oberflaechlich gebundenem halogen, verfahren zu dessen herstellung und dessen verwendung |
| DE19654154A1 (de) * | 1995-12-25 | 1997-06-26 | Tokuyama Corp | Verfahren zur Herstellung von Trichlorsilan |
| JP3159029B2 (ja) * | 1996-01-12 | 2001-04-23 | 信越化学工業株式会社 | シラン類の製造方法 |
| US6057469A (en) * | 1997-07-24 | 2000-05-02 | Pechiney Electrometallurgie | Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes |
-
2000
- 2000-09-14 DE DE10045367A patent/DE10045367A1/de not_active Withdrawn
-
2001
- 2001-09-07 AU AU2001287719A patent/AU2001287719A1/en not_active Abandoned
- 2001-09-07 AT AT01967319T patent/ATE273928T1/de not_active IP Right Cessation
- 2001-09-07 EP EP01967319A patent/EP1326803B1/de not_active Expired - Lifetime
- 2001-09-07 US US10/380,320 patent/US20040022713A1/en not_active Abandoned
- 2001-09-07 DE DE50103349T patent/DE50103349D1/de not_active Expired - Lifetime
- 2001-09-07 WO PCT/EP2001/010360 patent/WO2002022500A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| DE50103349D1 (de) | 2004-09-23 |
| AU2001287719A1 (en) | 2002-03-26 |
| EP1326803B1 (de) | 2004-08-18 |
| DE10045367A1 (de) | 2002-03-28 |
| US20040022713A1 (en) | 2004-02-05 |
| WO2002022500A1 (de) | 2002-03-21 |
| EP1326803A1 (de) | 2003-07-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| REN | Ceased due to non-payment of the annual fee |