ATE273928T1 - Verfahren zur herstellung von trichlorsilan - Google Patents

Verfahren zur herstellung von trichlorsilan

Info

Publication number
ATE273928T1
ATE273928T1 AT01967319T AT01967319T ATE273928T1 AT E273928 T1 ATE273928 T1 AT E273928T1 AT 01967319 T AT01967319 T AT 01967319T AT 01967319 T AT01967319 T AT 01967319T AT E273928 T1 ATE273928 T1 AT E273928T1
Authority
AT
Austria
Prior art keywords
producing trichlorosilane
silicon
catalyst
grain size
average grain
Prior art date
Application number
AT01967319T
Other languages
English (en)
Inventor
Andreas Bulan
Rainer Weber
Leslaw Mleczko
Original Assignee
Solarworld Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Solarworld Ag filed Critical Solarworld Ag
Application granted granted Critical
Publication of ATE273928T1 publication Critical patent/ATE273928T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
    • C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT01967319T 2000-09-14 2001-09-07 Verfahren zur herstellung von trichlorsilan ATE273928T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10045367A DE10045367A1 (de) 2000-09-14 2000-09-14 Verfahren zur Herstellung von Trichlorsilan
PCT/EP2001/010360 WO2002022500A1 (de) 2000-09-14 2001-09-07 Verfahren zur herstellung von trichlorsilan

Publications (1)

Publication Number Publication Date
ATE273928T1 true ATE273928T1 (de) 2004-09-15

Family

ID=7656116

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01967319T ATE273928T1 (de) 2000-09-14 2001-09-07 Verfahren zur herstellung von trichlorsilan

Country Status (6)

Country Link
US (1) US20040022713A1 (de)
EP (1) EP1326803B1 (de)
AT (1) ATE273928T1 (de)
AU (1) AU2001287719A1 (de)
DE (2) DE10045367A1 (de)
WO (1) WO2002022500A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4813545B2 (ja) * 2005-03-09 2011-11-09 アールイーシー シリコン インコーポレイテッド ヒドロクロロシランの製造方法
DE102008041974A1 (de) 2008-09-10 2010-03-11 Evonik Degussa Gmbh Vorrichtung, deren Verwendung und ein Verfahren zur energieautarken Hydrierung von Chlorsilanen
DE102009027730A1 (de) 2009-07-15 2011-01-27 Evonik Degussa Gmbh Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen
US8298490B2 (en) * 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
US8765090B2 (en) * 2010-09-08 2014-07-01 Dow Corning Corporation Method for preparing a trihalosilane
US8956584B2 (en) 2010-12-20 2015-02-17 Sunedison, Inc. Production of polycrystalline silicon in substantially closed-loop processes that involve disproportionation operations
DE102011110040B4 (de) * 2011-04-14 2024-07-11 Evonik Operations Gmbh Verfahren zur Herstellung von Chlorsilanen mittels hochsiedender Chlorsilane oder chlorsilanhaltiger Gemische
JP2015524824A (ja) 2012-08-13 2015-08-27 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ 銅触媒上での２工程プロセスで水素、ハロシラン、及び有機ハロゲン化物を反応させることによって、オルガノハロシランを調製する方法
CN105705507B (zh) 2013-11-12 2018-08-31 美国陶氏有机硅公司 制备卤代硅烷的方法
KR101580171B1 (ko) 2014-01-23 2015-12-24 한국화학연구원 금속 실리사이드 표면개질 방법, 표면개질된 금속 실리사이드를 이용한 삼염화실란의 제조방법 및 제조장치
WO2020125944A1 (de) * 2018-12-18 2020-06-25 Wacker Chemie Ag Verfahren zur herstellung von chlorsilanen
MY206228A (en) * 2019-04-29 2024-12-05 Wacker Chemie Ag Process for producing trichlorosilane with structure-optimised silicon particles
JP7500378B2 (ja) * 2020-09-30 2024-06-17 高純度シリコン株式会社 トリクロロシランの製造方法
CN113559862B (zh) * 2021-06-21 2022-04-22 北京工商大学 原子级助剂修饰的CuO复合介晶催化剂及其制备方法
CN114392743A (zh) * 2022-01-28 2022-04-26 中国科学院过程工程研究所 一种氧化亚铜粉末催化剂及其应用

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2380995A (en) * 1941-09-26 1945-08-07 Gen Electric Preparation of organosilicon halides
US4676967A (en) * 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
US4504597A (en) * 1983-11-04 1985-03-12 Scm Corporation Cupreous catalyst and process making same
US4520130A (en) * 1984-05-08 1985-05-28 Scm Corporation Halosilane catalyst and process for making same
DE3782213T2 (de) * 1986-07-10 1993-03-11 Chiyoda Chem Eng Construct Co Verfahren zur enthalogenierung eines halogenids und katalysator hierfuer.
DE4104422C2 (de) * 1991-02-14 2000-07-06 Degussa Verfahren zur Herstellung von Trichlorsilan aus Siliciumtetrachlorid
DE4115183A1 (de) * 1991-05-09 1992-11-12 Bayer Ag Feinteiliges silicium mit oberflaechlich gebundenem halogen, verfahren zu dessen herstellung und dessen verwendung
DE19654154A1 (de) * 1995-12-25 1997-06-26 Tokuyama Corp Verfahren zur Herstellung von Trichlorsilan
JP3159029B2 (ja) * 1996-01-12 2001-04-23 信越化学工業株式会社 シラン類の製造方法
US6057469A (en) * 1997-07-24 2000-05-02 Pechiney Electrometallurgie Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes

Also Published As

Publication number Publication date
EP1326803B1 (de) 2004-08-18
WO2002022500A1 (de) 2002-03-21
DE50103349D1 (de) 2004-09-23
EP1326803A1 (de) 2003-07-16
US20040022713A1 (en) 2004-02-05
DE10045367A1 (de) 2002-03-28
AU2001287719A1 (en) 2002-03-26

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Legal Events

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REN Ceased due to non-payment of the annual fee