ATE286154T1 - Verfahren und vorrichtung zur herstellung von hri-filmen - Google Patents
Verfahren und vorrichtung zur herstellung von hri-filmenInfo
- Publication number
- ATE286154T1 ATE286154T1 AT98923878T AT98923878T ATE286154T1 AT E286154 T1 ATE286154 T1 AT E286154T1 AT 98923878 T AT98923878 T AT 98923878T AT 98923878 T AT98923878 T AT 98923878T AT E286154 T1 ATE286154 T1 AT E286154T1
- Authority
- AT
- Austria
- Prior art keywords
- vaporizer
- vapor
- film
- lip
- flexible wall
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Optical Integrated Circuits (AREA)
- Surface Treatment Of Glass (AREA)
- Joining Of Glass To Other Materials (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/869,076 US5951769A (en) | 1997-06-04 | 1997-06-04 | Method and apparatus for making high refractive index (HRI) film |
| PCT/US1998/011139 WO1998055665A1 (en) | 1997-06-04 | 1998-06-02 | Method and apparatus for making high refractive index (hri) film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE286154T1 true ATE286154T1 (de) | 2005-01-15 |
Family
ID=25352879
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT98923878T ATE286154T1 (de) | 1997-06-04 | 1998-06-02 | Verfahren und vorrichtung zur herstellung von hri-filmen |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US5951769A (de) |
| EP (1) | EP1007755B1 (de) |
| AT (1) | ATE286154T1 (de) |
| AU (1) | AU7606498A (de) |
| DE (1) | DE69828411D1 (de) |
| WO (1) | WO1998055665A1 (de) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6447632B1 (en) * | 1998-03-18 | 2002-09-10 | Ebara Corporation | Apparatus and nozzle device for gaseous polishing |
| EP1245036B1 (de) * | 1999-12-13 | 2013-06-19 | Semequip, Inc. | Ionenquelle |
| JP2005029895A (ja) * | 2003-07-04 | 2005-02-03 | Agfa Gevaert Nv | 蒸着装置 |
| US7951421B2 (en) * | 2006-04-20 | 2011-05-31 | Global Oled Technology Llc | Vapor deposition of a layer |
| US20120052189A1 (en) * | 2010-08-30 | 2012-03-01 | Litian Liu | Vapor deposition system |
| JP5709588B2 (ja) * | 2011-03-03 | 2015-04-30 | ホーヤ レンズ マニュファクチャリング フィリピン インク | 蒸着装置 |
| US20130037251A1 (en) * | 2011-08-11 | 2013-02-14 | General Electric Company | Liquid cooled thermal control system and method for cooling an imaging detector |
| CN102978572A (zh) * | 2011-09-07 | 2013-03-20 | 无锡尚德太阳能电力有限公司 | 制备CdTe薄膜的方法及热蒸发设备 |
| KR102054477B1 (ko) * | 2013-04-05 | 2019-12-11 | 삼성디스플레이 주식회사 | 박막 증착 장치 |
| US10184168B2 (en) | 2015-01-20 | 2019-01-22 | Kennametal Inc. | IMC evaporator boat-thermal insulation cartridge assembly |
| US20160208373A1 (en) * | 2015-01-20 | 2016-07-21 | Kennametal Inc. | Imc evaporator boat assembly |
| KR102093687B1 (ko) * | 2015-04-24 | 2020-03-26 | 오츠카 일렉트로닉스 가부시키가이샤 | 광학 측정 장치 및 광학 측정 방법 |
| DE102019110950A1 (de) | 2019-04-29 | 2020-10-29 | Kennametal Inc. | Hartmetallzusammensetzungen und deren Anwendungen |
| WO2023059824A1 (en) * | 2021-10-08 | 2023-04-13 | Entegris, Inc. | Compressible tray for solid chemical vaporizing chamber |
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| US3636916A (en) * | 1966-03-14 | 1972-01-25 | Optical Coating Laboratory Inc | Coating apparatus and system |
| US3578845A (en) * | 1968-02-12 | 1971-05-18 | Trw Inc | Holographic focusing diffraction gratings for spectroscopes and method of making same |
| US3580657A (en) * | 1968-05-14 | 1971-05-25 | Xerox Corp | Blazed surface hologram |
| US3552853A (en) * | 1968-07-01 | 1971-01-05 | Chain Lakes Res Assoc | Hologramic identification system |
| US3690933A (en) * | 1970-05-21 | 1972-09-12 | Republic Steel Corp | Apparatus and method for continuously condensing metal vapor upon a substrate |
| US3703407A (en) * | 1970-12-15 | 1972-11-21 | Rca Corp | Relief phase holograms |
| US3858977A (en) * | 1972-01-18 | 1975-01-07 | Canadian Patents Dev | Optical interference authenticating means |
| US3887742A (en) * | 1972-04-13 | 1975-06-03 | Richard E Reinnagel | Copy resistant documents |
| DE2229476A1 (de) * | 1972-06-16 | 1974-01-03 | Max Planck Gesellschaft | Holographisches aufzeichnungsmaterial fuer infrarotstrahlung |
| US3790245A (en) * | 1972-10-12 | 1974-02-05 | Rca Corp | Double-sided holographic replicas |
| FR2276601A1 (fr) * | 1974-06-27 | 1976-01-23 | France Etat | Filtres de bande et application a la fabrication de lunettes de protection |
| US3939798A (en) * | 1974-12-19 | 1976-02-24 | Texas Instruments Incorporated | Optical thin film coater |
| NL7515010A (nl) * | 1975-01-16 | 1976-07-20 | Siemens Ag | Tegen namaak beveiligde legitimatiekaart. |
| US3971334A (en) * | 1975-03-04 | 1976-07-27 | Xerox Corporation | Coating device |
| US4034211A (en) * | 1975-06-20 | 1977-07-05 | Ncr Corporation | System and method for providing a security check on a credit card |
| JPS5274580A (en) * | 1975-12-19 | 1977-06-22 | Hitachi Ltd | Boat for vacuum evaporation |
| US4168346A (en) * | 1977-01-03 | 1979-09-18 | The Dow Chemical Company | Asbestos treatment with metal tungstates |
| CH626407A5 (de) * | 1977-07-08 | 1981-11-13 | Balzers Hochvakuum | |
| DE2812841A1 (de) * | 1978-03-23 | 1979-09-27 | Siemens Ag | Ausweis mit einem hologramm und verfahren zu seiner herstellung |
| US4403002A (en) * | 1979-12-10 | 1983-09-06 | Fuji Photo Film Co., Ltd. | Vacuum evaporating apparatus |
| IE50670B1 (en) * | 1979-12-24 | 1986-06-11 | Agfa Gevaert Ag | Process for the production of forgery-proof documents |
| US4330604A (en) * | 1980-08-04 | 1982-05-18 | Hughes Aircraft Company | Fabrication of holograms on plastic substrates |
| US4544835A (en) * | 1983-12-29 | 1985-10-01 | Drexler Technology Corporation | Data system containing a high capacity optical contrast laser recordable wallet-size plastic card |
| CH631920A5 (de) * | 1981-05-13 | 1982-09-15 | Fis Organisation Ag | Ausweiskarte. |
| JPS6053745B2 (ja) * | 1981-07-31 | 1985-11-27 | アルバツク成膜株式会社 | 二元蒸着によつて不均質光学的薄膜を形成する方法 |
| CH653161A5 (de) * | 1981-10-27 | 1985-12-13 | Landis & Gyr Ag | Dokument mit einem sicherheitsmerkmal und verfahren zur echtheitspruefung des dokumentes. |
| US4419436A (en) * | 1982-01-22 | 1983-12-06 | Kranser Leonard S | Photosensitive plate |
| US4526132A (en) * | 1982-11-24 | 1985-07-02 | Konishiroku Photo Industry Co., Ltd. | Evaporator |
| JPS59148137A (ja) * | 1983-02-14 | 1984-08-24 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造方法 |
| US4563024A (en) * | 1983-03-16 | 1986-01-07 | Jeffrey Blyth | Hologram identification device |
| US4906315A (en) * | 1983-06-20 | 1990-03-06 | Mcgrew Stephen P | Surface relief holograms and holographic hot-stamping foils, and method of fabricating same |
| US4758296A (en) * | 1983-06-20 | 1988-07-19 | Mcgrew Stephen P | Method of fabricating surface relief holograms |
| CH654596A5 (de) * | 1983-09-05 | 1986-02-28 | Balzers Hochvakuum | Verdampferzelle. |
| US4582431A (en) * | 1983-10-11 | 1986-04-15 | Honeywell Inc. | Optical monitor for direct thickness control of transparent films |
| US4597814A (en) * | 1983-11-22 | 1986-07-01 | U.S. Banknote Corporation | Method for manufacturing card with three-dimensional label incorporated therein |
| US4681780A (en) * | 1983-12-01 | 1987-07-21 | Polaroid Corporation | Continuously cleaned rotary coating mask |
| US4579083A (en) * | 1984-01-21 | 1986-04-01 | Canadian Patents And Development Limited | Automatic variable rate evaporation source for thin film deposition |
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| DE3422910C1 (de) * | 1984-06-20 | 1985-09-05 | Leonhard Kurz GmbH & Co, 8510 Fürth | Praegefolie,insbesondere Heisspraegefolie mit einer Magnetschicht |
| EP0201323B1 (de) * | 1985-05-07 | 1994-08-17 | Dai Nippon Insatsu Kabushiki Kaisha | Artikel mit transparentem Hologramm |
| SE8502821D0 (sv) * | 1985-06-07 | 1985-06-07 | Sten Zeilon | Fyllkroppsanordning |
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| US4646680A (en) * | 1985-12-23 | 1987-03-03 | General Electric Company | Crucible for use in molecular beam epitaxial processing |
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| US4839250A (en) * | 1987-08-10 | 1989-06-13 | Polaroid Corporation, Patent Department | Method of replicating volume phase reflection holograms |
| US5230923A (en) * | 1987-12-17 | 1993-07-27 | Toyo Ink Manufacturing Co., Ltd. | Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film |
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| US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
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| DE3817513C2 (de) * | 1988-05-24 | 1996-01-25 | Leybold Ag | Vorrichtung zum Verdampfen von Metallen |
| US4978804A (en) * | 1988-11-09 | 1990-12-18 | Union Camp Corporation | Processes for the conversion of myrcene to citral |
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| US5093538A (en) * | 1989-06-09 | 1992-03-03 | Union Camp Corporation | Processes for the conversion of myrcene to citral |
| US5083850A (en) * | 1989-08-29 | 1992-01-28 | American Bank Note Holographics, Inc. | Technique of forming a separate information bearing printed pattern on replicas of a hologram or other surface relief diffraction pattern |
| EP0440824B1 (de) * | 1989-08-31 | 1994-12-07 | Dai Nippon Insatsu Kabushiki Kaisha | Hologrammkalender |
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| US5131752A (en) * | 1990-06-28 | 1992-07-21 | Tamarack Scientific Co., Inc. | Method for film thickness endpoint control |
| US5336324A (en) * | 1991-12-04 | 1994-08-09 | Emcore Corporation | Apparatus for depositing a coating on a substrate |
| KR940000259A (ko) * | 1992-06-12 | 1994-01-03 | 게리 리 그리스월드 | 테이프 지지체상에서의 다층 필름 제조 시스템 및 방법 |
| US5351142A (en) * | 1993-04-16 | 1994-09-27 | Crown Roll Leaf, Inc. | Semi-transparent reflective layer for a phase hologram |
| US5695808A (en) * | 1993-04-16 | 1997-12-09 | Crown Roll Leaf Inc. | Method for making transparent reflective films |
| US5759710A (en) * | 1994-08-18 | 1998-06-02 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium with a magnetic layer having a specific oxygen signal strength profile in the thickness direction |
| US5781316A (en) * | 1995-02-28 | 1998-07-14 | Transfer Print Foils, Inc. | Semi-transparent reflective hologram and method of producing same |
-
1997
- 1997-06-04 US US08/869,076 patent/US5951769A/en not_active Expired - Lifetime
-
1998
- 1998-06-02 EP EP98923878A patent/EP1007755B1/de not_active Expired - Lifetime
- 1998-06-02 WO PCT/US1998/011139 patent/WO1998055665A1/en not_active Ceased
- 1998-06-02 AT AT98923878T patent/ATE286154T1/de not_active IP Right Cessation
- 1998-06-02 AU AU76064/98A patent/AU7606498A/en not_active Abandoned
- 1998-06-02 DE DE69828411T patent/DE69828411D1/de not_active Expired - Lifetime
-
1999
- 1999-04-21 US US09/295,859 patent/US6194031B1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| WO1998055665A1 (en) | 1998-12-10 |
| US5951769A (en) | 1999-09-14 |
| EP1007755A1 (de) | 2000-06-14 |
| EP1007755B1 (de) | 2004-12-29 |
| US6194031B1 (en) | 2001-02-27 |
| EP1007755A4 (de) | 2000-10-04 |
| DE69828411D1 (de) | 2005-02-03 |
| AU7606498A (en) | 1998-12-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |