ATE297817T1 - Gemusterte beschichtung mit komprimiertem kohlendioxid - Google Patents

Gemusterte beschichtung mit komprimiertem kohlendioxid

Info

Publication number
ATE297817T1
ATE297817T1 AT01999437T AT01999437T ATE297817T1 AT E297817 T1 ATE297817 T1 AT E297817T1 AT 01999437 T AT01999437 T AT 01999437T AT 01999437 T AT01999437 T AT 01999437T AT E297817 T1 ATE297817 T1 AT E297817T1
Authority
AT
Austria
Prior art keywords
carbon dioxide
compressed carbon
patterned coating
patterned
solvent phase
Prior art date
Application number
AT01999437T
Other languages
English (en)
Inventor
Wilhelm T S Huck
Andrew B Holmes
Christine K Luscombe
Jonathan Seville
Regina Santos
Bushra Al-Duri
Filipe Gaspar
Gary Leeke
Tiejun Lu
Original Assignee
Holmes Andrew Bruce
Bushra Al-Duri
Filipe Gaspar
Gary Leeke
Tiejun Lu
Regina Santos
Jonathan Seville
Huck Wilhelm Theodorus Stefanu
Luscombe Christine Keiko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0029673A external-priority patent/GB0029673D0/en
Application filed by Holmes Andrew Bruce, Bushra Al-Duri, Filipe Gaspar, Gary Leeke, Tiejun Lu, Regina Santos, Jonathan Seville, Huck Wilhelm Theodorus Stefanu, Luscombe Christine Keiko filed Critical Holmes Andrew Bruce
Application granted granted Critical
Publication of ATE297817T1 publication Critical patent/ATE297817T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
    • H10P14/687—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC the materials being fluorocarbon compounds, e.g. (CHxFy) n or polytetrafluoroethylene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B05D1/025—Processes for applying liquids or other fluent materials performed by spraying using gas close to its critical state
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2401/00—Form of the coating product, e.g. solution, water dispersion, powders or the like
    • B05D2401/90—Form of the coating product, e.g. solution, water dispersion, powders or the like at least one component of the composition being in supercritical state or close to supercritical state
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
AT01999437T 2000-12-06 2001-12-06 Gemusterte beschichtung mit komprimiertem kohlendioxid ATE297817T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0029673A GB0029673D0 (en) 2000-12-06 2000-12-06 Patterned deposition using compressed Co
GB0115538A GB0115538D0 (en) 2000-12-06 2001-06-26 Patterned deposition using compressed CO2
PCT/GB2001/005402 WO2002045868A2 (en) 2000-12-06 2001-12-06 Patterned deposition using compressed carbon dioxide

Publications (1)

Publication Number Publication Date
ATE297817T1 true ATE297817T1 (de) 2005-07-15

Family

ID=26245382

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01999437T ATE297817T1 (de) 2000-12-06 2001-12-06 Gemusterte beschichtung mit komprimiertem kohlendioxid

Country Status (7)

Country Link
US (2) US20040052944A1 (de)
EP (1) EP1341616B1 (de)
JP (1) JP2004524948A (de)
AT (1) ATE297817T1 (de)
AU (1) AU2002220903A1 (de)
DE (1) DE60111564T2 (de)
WO (1) WO2002045868A2 (de)

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US6595630B2 (en) * 2001-07-12 2003-07-22 Eastman Kodak Company Method and apparatus for controlling depth of deposition of a solvent free functional material in a receiver
EP1425355A1 (de) * 2001-07-12 2004-06-09 Eastman Kodak Company Eine komprimierte flüssige zusammensetzung
US20030107614A1 (en) 2001-12-06 2003-06-12 Eastman Kodak Company Method and apparatus for printing
US20040043140A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
US20040043138A1 (en) * 2002-08-21 2004-03-04 Ramesh Jagannathan Solid state lighting using compressed fluid coatings
US6780249B2 (en) * 2002-12-06 2004-08-24 Eastman Kodak Company System for producing patterned deposition from compressed fluid in a partially opened deposition chamber
EP1427033A3 (de) * 2002-12-06 2008-07-09 Eastman Kodak Company Formulierung einer kompremierten Flüssigkeit, die ein Elektrontransport-, Lochinjektions-, Lochleiter- und elektrolumineszierendes Material enthält
US6927415B2 (en) 2002-12-06 2005-08-09 Eastman Kodak Company Compressed fluid formulation containing electron transporting material
US20040108060A1 (en) * 2002-12-06 2004-06-10 Eastman Kodak Company System for producing patterned deposition from compressed fluids
US6896827B2 (en) 2002-12-06 2005-05-24 Eastman Kodak Company Compressed fluid formulation containing electroluminescent polymeric material
US6843556B2 (en) * 2002-12-06 2005-01-18 Eastman Kodak Company System for producing patterned deposition from compressed fluid in a dual controlled deposition chamber
US6896723B2 (en) 2002-12-06 2005-05-24 Eastman Kodak Company Compressed fluid formulation containing hole transporting material
US20040108061A1 (en) * 2002-12-06 2004-06-10 Eastman Kodak Company Apparatus and method for making a light-emitting display
US6790483B2 (en) * 2002-12-06 2004-09-14 Eastman Kodak Company Method for producing patterned deposition from compressed fluid
US7153539B2 (en) 2003-06-24 2006-12-26 Eastman Kodak Company Apparatus and method of color tuning a light-emitting display
US7273643B2 (en) 2003-06-24 2007-09-25 Eastman Kodak Company Article having multiple spectral deposits
US20040263597A1 (en) 2003-06-24 2004-12-30 Eastman Kodak Company Apparatus and method of producing multiple spectral deposits from a mixture of a compressed fluid and a marking material
US7044376B2 (en) 2003-07-23 2006-05-16 Eastman Kodak Company Authentication method and apparatus for use with compressed fluid printed swatches
JP2005118984A (ja) * 2003-09-25 2005-05-12 Kagawa Industry Support Foundation 微粒子の配列制御方法およびその装置
GB0406125D0 (en) 2004-03-18 2004-04-21 Univ Cambridge Tech Methods of amination
WO2006126735A1 (en) * 2005-05-27 2006-11-30 Fujifilm Corporation Method for producing self-assembled construction
GB2461527B (en) * 2008-07-01 2011-08-03 Limited Cambridge Display Technology Organic electronic device
TW201043729A (en) * 2009-06-15 2010-12-16 Nat Univ Chung Cheng Method and system of forming film by employing supercritical vapor deposition
JP6140329B1 (ja) * 2016-04-06 2017-05-31 長瀬産業株式会社 塗装装置及び塗装方法
JP6844621B2 (ja) * 2016-07-11 2021-03-17 コニカミノルタ株式会社 塗布液、その製造方法、電子デバイス作製用インク、電子デバイス、有機エレクトロルミネッセンス素子、及び光電変換素子

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US4737384A (en) * 1985-11-01 1988-04-12 Allied Corporation Deposition of thin films using supercritical fluids
ATE94782T1 (de) * 1987-12-21 1993-10-15 Union Carbide Corp Verwendung von superkritischen fluessigkeiten als verduenner beim aufspruehen von ueberzuegen.
US5215253A (en) * 1990-08-30 1993-06-01 Nordson Corporation Method and apparatus for forming and dispersing single and multiple phase coating material containing fluid diluent
CA2082565A1 (en) * 1991-11-12 1993-05-13 John N. Argyropoulos Polyester particularly suitable for use in coating compositions which are sprayed with compressed fluids as viscosity reducing diluents
US5290603A (en) * 1992-12-18 1994-03-01 Union Carbide Chemicals & Plastics Technology Corporation Method for spraying polymeric compositions with reduced solvent emission and enhanced atomization
US5908721A (en) * 1996-02-09 1999-06-01 Sharp Kabushiki Kaisha Using light-shading colored ink capable of changing from hydrophilic to hydrophobic
US5789027A (en) * 1996-11-12 1998-08-04 University Of Massachusetts Method of chemically depositing material onto a substrate
JP3899566B2 (ja) * 1996-11-25 2007-03-28 セイコーエプソン株式会社 有機ｅｌ表示装置の製造方法
EP1023127A1 (de) * 1997-10-10 2000-08-02 Union Carbide Chemicals & Plastics Technology Corporation Aufsprühen von einer hilfsmittelzusammensetzung auf bahnförmige materialien
US6087196A (en) * 1998-01-30 2000-07-11 The Trustees Of Princeton University Fabrication of organic semiconductor devices using ink jet printing
GB9808806D0 (en) * 1998-04-24 1998-06-24 Cambridge Display Tech Ltd Selective deposition of polymer films
US6090474A (en) * 1998-09-01 2000-07-18 International Business Machines Corporation Flowable compositions and use in filling vias and plated through-holes
US6083565A (en) * 1998-11-06 2000-07-04 North Carolina State University Method for meniscus coating with liquid carbon dioxide
CN100483774C (zh) * 1999-12-21 2009-04-29 造型逻辑有限公司 半导体器件及其形成方法
JP3457655B2 (ja) * 2000-10-10 2003-10-20 花王株式会社 複合化粒子の製造法
GB2371248A (en) * 2000-12-04 2002-07-24 Seiko Epson Corp Fabrication of self-assembled monolayers
EP1425355A1 (de) * 2001-07-12 2004-06-09 Eastman Kodak Company Eine komprimierte flüssige zusammensetzung
JP4139663B2 (ja) * 2002-09-27 2008-08-27 ハリマ化成株式会社 ナノ粒子の超臨界流体中分散液を用いる微細配線パターンの形成方法

Also Published As

Publication number Publication date
EP1341616A2 (de) 2003-09-10
EP1341616B1 (de) 2005-06-15
WO2002045868A3 (en) 2002-11-14
US20080069734A1 (en) 2008-03-20
DE60111564D1 (de) 2005-07-21
WO2002045868A2 (en) 2002-06-13
DE60111564T2 (de) 2006-05-11
AU2002220903A1 (en) 2002-06-18
US20040052944A1 (en) 2004-03-18
JP2004524948A (ja) 2004-08-19

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Legal Events

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