ATE300757T1 - Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung - Google Patents

Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung

Info

Publication number
ATE300757T1
ATE300757T1 AT01939301T AT01939301T ATE300757T1 AT E300757 T1 ATE300757 T1 AT E300757T1 AT 01939301 T AT01939301 T AT 01939301T AT 01939301 T AT01939301 T AT 01939301T AT E300757 T1 ATE300757 T1 AT E300757T1
Authority
AT
Austria
Prior art keywords
data storage
colloidal metal
producing
storage medium
medium containing
Prior art date
Application number
AT01939301T
Other languages
English (en)
Inventor
Erdem A Cetin
Richard T Ingwall
Richard A Minns
David A Waldman
Larry C Takiff
Original Assignee
Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aprilis Inc filed Critical Aprilis Inc
Application granted granted Critical
Publication of ATE300757T1 publication Critical patent/ATE300757T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/004—Recording, reproducing or erasing methods; Read, write or erase circuits therefor
    • G11B7/0065—Recording, reproducing or erasing by using optical interference patterns, e.g. holograms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Holo Graphy (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Epoxy Resins (AREA)
  • Optical Recording Or Reproduction (AREA)
AT01939301T 2000-05-23 2001-05-23 Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung ATE300757T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20637000P 2000-05-23 2000-05-23
PCT/US2001/016635 WO2001090817A2 (en) 2000-05-23 2001-05-23 Data storage medium comprising colloidal metal and preparation process thereof

Publications (1)

Publication Number Publication Date
ATE300757T1 true ATE300757T1 (de) 2005-08-15

Family

ID=22766074

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01939301T ATE300757T1 (de) 2000-05-23 2001-05-23 Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung

Country Status (7)

Country Link
US (3) US7297448B2 (de)
EP (1) EP1292859B1 (de)
JP (1) JP2003534569A (de)
AT (1) ATE300757T1 (de)
AU (1) AU2001264832A1 (de)
DE (1) DE60112292T2 (de)
WO (1) WO2001090817A2 (de)

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EP1598699A3 (de) 2000-05-23 2009-05-20 Aprilis, Inc. Datenspeichermedium das ein kolloidales Metall enthält und Verfahren zur Herstellung
DE60120432T2 (de) * 2000-08-28 2007-01-04 Aprilis, Inc., Maynard Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind
AU2258302A (en) * 2000-12-11 2002-06-24 Jsr Corp Radiation-sensitive composition changing in refractive index and method of changing refractive index
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US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
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US8048981B2 (en) * 2005-09-20 2011-11-01 General Electric Company Thermally curable compositions and method
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GB0818556D0 (en) * 2008-10-09 2008-11-19 Cambridge Entpr Ltd Method of production of a holographic sensor
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US10248020B2 (en) * 2012-12-28 2019-04-02 Rohm And Haas Electronic Materials Llc Acid generators and photoresists comprising same
JP6724295B2 (ja) * 2015-05-19 2020-07-15 凸版印刷株式会社 高屈折率パターン形成用組成物、これを用いた積層体、光学素子および高屈折率パターン形成方法
JP7168446B2 (ja) 2015-10-30 2022-11-09 クアルコム，インコーポレイテッド スケーラブルな無線周波数フロントエンドのためのビームフォーミングアーキテクチャ
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CN106739428B (zh) * 2016-12-07 2018-12-14 武汉华工图像技术开发有限公司 一种全息金属模压母版的制作方法
US11619880B2 (en) * 2019-05-17 2023-04-04 The Regents Of The University Of Colorado Holographic photopolymer compositions and composites
DE102020115042B4 (de) 2020-06-05 2023-12-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Verfahren und photosensitives Material zum Herstellen einer elektrisch leitenden Vorrichtung

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Also Published As

Publication number Publication date
US7297448B2 (en) 2007-11-20
US20090325079A1 (en) 2009-12-31
WO2001090817A3 (en) 2002-06-20
US20080044737A1 (en) 2008-02-21
JP2003534569A (ja) 2003-11-18
US20030152842A1 (en) 2003-08-14
DE60112292D1 (de) 2005-09-01
AU2001264832A1 (en) 2001-12-03
EP1292859B1 (de) 2005-07-27
DE60112292T2 (de) 2006-06-01
WO2001090817A2 (en) 2001-11-29
EP1292859A2 (de) 2003-03-19

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