Classifications

• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
  • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
  • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
  • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
  • H10P14/6326—Deposition processes
  • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
  • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
  • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
  • B05D1/00—Processes for applying liquids or other fluent materials
  • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
  • B05D1/005—Spin coating
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/16—Coating processes; Apparatus therefor
  • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Coating Apparatus (AREA)
• Application Of Or Painting With Fluid Materials (AREA)
• Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
• Centrifugal Separators (AREA)

Applications Claiming Priority (3)

Publications (1)

Family

ID=27127975

Family Applications (1)

Country Status (7)

Families Citing this family (8)

Family Cites Families (11)

• 1998
  • 1998-05-28 TW TW087108318A patent/TW391893B/zh not_active IP Right Cessation
  • 1998-05-29 JP JP50094499A patent/JP4108767B2/ja not_active Expired - Fee Related
  • 1998-05-29 WO PCT/US1998/010958 patent/WO1998053923A1/en not_active Ceased
  • 1998-05-29 AT AT98926126T patent/ATE303872T1/de active
  • 1998-05-29 DE DE69831496T patent/DE69831496T2/de not_active Expired - Lifetime
  • 1998-05-29 AU AU78034/98A patent/AU7803498A/en not_active Abandoned
  • 1998-05-29 EP EP98926126A patent/EP1015136B1/de not_active Expired - Lifetime

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