ATE307846T1 - Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatte - Google Patents

Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatte

Info

Publication number
ATE307846T1
ATE307846T1 AT01130905T AT01130905T ATE307846T1 AT E307846 T1 ATE307846 T1 AT E307846T1 AT 01130905 T AT01130905 T AT 01130905T AT 01130905 T AT01130905 T AT 01130905T AT E307846 T1 ATE307846 T1 AT E307846T1
Authority
AT
Austria
Prior art keywords
printing plate
polymer particles
water
lithographic printing
plate containing
Prior art date
Application number
AT01130905T
Other languages
English (en)
Inventor
Satoshi Hoshi
Koichi Kawamura
Sumiaki Yamasaki
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000401985A external-priority patent/JP2002201283A/ja
Priority claimed from JP2001031189A external-priority patent/JP2002226597A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of ATE307846T1 publication Critical patent/ATE307846T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/12—Powdering or granulating
    • C08J3/14—Powdering or granulating by precipitation from solutions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1025—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials using materials comprising a polymeric matrix containing a polymeric particulate material, e.g. hydrophobic heat coalescing particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/08—Developable by water or the fountain solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
AT01130905T 2000-12-28 2001-12-28 Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatte ATE307846T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000401985A JP2002201283A (ja) 2000-12-28 2000-12-28 ポリマー微粒子の製造方法およびそれを用いた平版印刷用原板
JP2001031189A JP2002226597A (ja) 2001-02-07 2001-02-07 ポリマー微粒子の製造方法および平版印刷用原板

Publications (1)

Publication Number Publication Date
ATE307846T1 true ATE307846T1 (de) 2005-11-15

Family

ID=26607136

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01130905T ATE307846T1 (de) 2000-12-28 2001-12-28 Verfahren zur herstellung feiner polymerpartikel und diese enthaltende lithographische druckplatte

Country Status (4)

Country Link
US (1) US6815137B2 (de)
EP (1) EP1219668B1 (de)
AT (1) ATE307846T1 (de)
DE (1) DE60114352T2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6627556B1 (en) 2002-04-24 2003-09-30 Lsi Logic Corporation Method of chemically altering a silicon surface and associated electrical devices
JP4101632B2 (ja) * 2002-11-01 2008-06-18 株式会社カネカ 硬化性組成物および復元性、クリープ性改善方法
KR101020164B1 (ko) 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
JP4460929B2 (ja) * 2004-03-19 2010-05-12 富士フイルム株式会社 平版印刷原版および平版印刷方法
US20090087783A1 (en) * 2005-08-30 2009-04-02 Mitsui Chemicals, Inc. Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography
WO2007058373A1 (en) * 2005-11-16 2007-05-24 Fujifilm Corporation Surface-hydrophilic structure
JP5094081B2 (ja) * 2005-11-17 2012-12-12 富士フイルム株式会社 親水性部材及びその製造方法
US7879526B2 (en) * 2005-12-26 2011-02-01 Cheil Industries, Inc. Hardmask compositions for resist underlayer films
GB0617859D0 (en) * 2006-09-11 2006-10-18 Syngenta Ltd Compositions for photoprotection
JP2008074972A (ja) * 2006-09-21 2008-04-03 Fujifilm Corp 塗布組成物、親水性部材及びその製造方法
US8012591B2 (en) * 2006-09-21 2011-09-06 Fujifilm Corporation Hydrophilic composition and hydrophilic member
US20080177022A1 (en) * 2006-09-29 2008-07-24 Sumiaki Yamasaki Hydrophilic film forming composition and hydrophilic member
JP2008238711A (ja) * 2007-03-28 2008-10-09 Fujifilm Corp 親水性部材及び下塗り組成物
DE102007018383A1 (de) * 2007-04-17 2008-10-23 Tesa Ag Flächenförmiges Material mit hydrophilen und hydrophoben Bereichen und deren Herstellung
US20090029179A1 (en) * 2007-05-14 2009-01-29 Fujifilm Corporation Two-liquid composition, hydrophilic composition and hydrophilic member
JP2009227809A (ja) * 2008-03-21 2009-10-08 Fujifilm Corp 親水性組成物及び親水性処理部材
US8377624B2 (en) * 2009-03-27 2013-02-19 Eastman Kodak Company Negative-working thermal imageable elements
WO2014059008A1 (en) 2012-10-09 2014-04-17 The Procter & Gamble Company Method of identifying or evaluating beneficial actives and compositions containing the same
CN104703585A (zh) 2012-10-09 2015-06-10 宝洁公司 鉴定协同化妆品组合的方法
KR101758547B1 (ko) 2013-04-24 2017-07-26 헥시온 인코포레이티드 졸-겔 수지를 제조하는 방법
KR101758546B1 (ko) 2013-04-24 2017-07-14 헥시온 인코포레이티드 졸-겔 수지를 제조하는 방법
WO2017002641A1 (ja) * 2015-06-30 2017-01-05 富士フイルム株式会社 印刷用原版、平版印刷版、印刷用捨て版、及び、その積層体
WO2020037177A1 (en) * 2018-08-16 2020-02-20 University Of Kansas Self-healing, omniphobic coatings and related methods

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FR1242020A (fr) * 1958-11-25 1960-09-23 Hoechst Ag Procédé pour isoler de leurs solutions des matières à haut poids moléculaire denature caoutchouteuse
FR1424008A (fr) * 1963-12-05 1966-01-07 Gevaert Photo Prod Nv Procédé d'enregistrement d'informations au moyen d'un matériel sensible à la chaleur et à la pression
JPS523653A (en) * 1975-06-27 1977-01-12 Fuji Photo Film Co Ltd Process for producing fine polymer particles
GB9110417D0 (en) * 1991-05-14 1991-07-03 Du Pont Howson Ltd Improvements in or relating to the formation of images
US5417164A (en) * 1991-07-24 1995-05-23 Nippon Shokubai Co., Ltd. Thermosensitive recording material and thermosensitive recording method
WO1994023954A1 (fr) 1993-04-20 1994-10-27 Asahi Kasei Kogyo Kabushiki Kaisha Cliche original pour lithographie et procede de production de ce cliche
JP3064807B2 (ja) 1993-04-20 2000-07-12 旭化成工業株式会社 平版印刷原版およびその製版方法
JPH1020541A (ja) 1996-07-04 1998-01-23 Fuji Xerox Co Ltd 画像形成材料及びその製造方法並びに画像記録体
EP0832739B1 (de) 1996-09-25 2001-06-20 Agfa-Gevaert N.V. Verfahren zur Herstellung einer lithographischen Druckplatte unter Verwendung eines wärme-empfindlichen Materials
US6427595B1 (en) * 1996-12-19 2002-08-06 Agfa-Gevaert Heat-sensitive imaging element for making lithographic printing plates comprising polymer particles with a specific particle size
US5981151A (en) * 1997-08-01 1999-11-09 Agfa-Gevaert, N.V. Photothermographic material and a method for producing lithographic plates therewith
WO1999010186A1 (fr) 1997-08-22 1999-03-04 Mitsubishi Paper Mills Limited Materiau et procede de formation d'image, procede et dispositif de fabrication d'une plaque d'impression lithographique, procede de realisation d'une telle plaque et procede de fabrication d'une carte de circuits imprimes
EP0925916B1 (de) 1997-12-09 2002-04-10 Agfa-Gevaert Rückstandsfreies Aufzeichnungselement ohne Materialabtrag für die Herstellung von Flachdruckplatten mit unterschiedlicher Farbdichte zwischen Bild und Nicht-Bild
EP0976549B1 (de) 1998-07-31 2003-10-01 Agfa-Gevaert Verarbeitungsfreie thermische Flachdruckplatte mit definierter Nanostruktur
JP3743604B2 (ja) * 1999-03-24 2006-02-08 富士写真フイルム株式会社 平版印刷用原板
US6653042B1 (en) 1999-06-04 2003-11-25 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor, method for producing the same, and method of lithographic printing
US6294595B1 (en) * 1999-08-30 2001-09-25 Nexpress Solutions Llc Polymeric powders and method of preparation
US6323251B1 (en) * 1999-09-24 2001-11-27 3M Innovative Properties Co Thermoplastic/thermoset hybrid foams and methods for making same

Also Published As

Publication number Publication date
DE60114352D1 (de) 2005-12-01
EP1219668A3 (de) 2003-10-29
US20020182529A1 (en) 2002-12-05
EP1219668A2 (de) 2002-07-03
DE60114352T2 (de) 2006-07-20
EP1219668B1 (de) 2005-10-26
US6815137B2 (en) 2004-11-09

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties