ATE308071T1 - Verfahren und vorrichtung zur korrektur von abbe fehlern - Google Patents
Verfahren und vorrichtung zur korrektur von abbe fehlernInfo
- Publication number
- ATE308071T1 ATE308071T1 AT01901835T AT01901835T ATE308071T1 AT E308071 T1 ATE308071 T1 AT E308071T1 AT 01901835 T AT01901835 T AT 01901835T AT 01901835 T AT01901835 T AT 01901835T AT E308071 T1 ATE308071 T1 AT E308071T1
- Authority
- AT
- Austria
- Prior art keywords
- axis
- sensor readings
- split
- present
- abbe errors
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Program-control systems
- G05B19/02—Program-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
- G05B19/39—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using a combination of the means covered by at least two of the preceding groups G05B19/21, G05B19/27 and G05B19/33
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/042—Automatically aligning the laser beam
- B23K26/043—Automatically aligning the laser beam along the beam path, i.e. alignment of laser beam axis relative to laser beam apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Program-control systems
- G05B19/02—Program-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form
- G05B19/404—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of program data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0008—Apparatus or processes for manufacturing printed circuits for aligning or positioning of tools relative to the circuit board
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Automation & Control Theory (AREA)
- Manufacturing & Machinery (AREA)
- Human Computer Interaction (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of Position Or Direction (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Radar Systems Or Details Thereof (AREA)
- Automatic Control Of Machine Tools (AREA)
- Attitude Control For Articles On Conveyors (AREA)
- Navigation (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17599300P | 2000-01-11 | 2000-01-11 | |
| PCT/US2001/000484 WO2001052004A1 (en) | 2000-01-11 | 2001-01-05 | Abbe error correction system and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE308071T1 true ATE308071T1 (de) | 2005-11-15 |
Family
ID=22642517
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01901835T ATE308071T1 (de) | 2000-01-11 | 2001-01-05 | Verfahren und vorrichtung zur korrektur von abbe fehlern |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6430465B2 (de) |
| EP (1) | EP1275036B1 (de) |
| JP (1) | JP4860870B2 (de) |
| KR (1) | KR100755335B1 (de) |
| CN (1) | CN100437407C (de) |
| AT (1) | ATE308071T1 (de) |
| AU (1) | AU2001227690A1 (de) |
| CA (1) | CA2396259A1 (de) |
| DE (1) | DE60114397T2 (de) |
| TW (1) | TW472177B (de) |
| WO (1) | WO2001052004A1 (de) |
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-
2001
- 2001-01-05 EP EP01901835A patent/EP1275036B1/de not_active Expired - Lifetime
- 2001-01-05 AU AU2001227690A patent/AU2001227690A1/en not_active Abandoned
- 2001-01-05 AT AT01901835T patent/ATE308071T1/de not_active IP Right Cessation
- 2001-01-05 DE DE60114397T patent/DE60114397T2/de not_active Expired - Lifetime
- 2001-01-05 US US09/755,950 patent/US6430465B2/en not_active Expired - Lifetime
- 2001-01-05 CA CA002396259A patent/CA2396259A1/en not_active Abandoned
- 2001-01-05 KR KR1020027008743A patent/KR100755335B1/ko not_active Expired - Fee Related
- 2001-01-05 JP JP2001552159A patent/JP4860870B2/ja not_active Expired - Fee Related
- 2001-01-05 CN CNB018036155A patent/CN100437407C/zh not_active Expired - Fee Related
- 2001-01-05 WO PCT/US2001/000484 patent/WO2001052004A1/en not_active Ceased
- 2001-01-08 TW TW090100352A patent/TW472177B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA2396259A1 (en) | 2001-07-19 |
| WO2001052004A1 (en) | 2001-07-19 |
| JP4860870B2 (ja) | 2012-01-25 |
| CN100437407C (zh) | 2008-11-26 |
| JP2003523567A (ja) | 2003-08-05 |
| DE60114397D1 (de) | 2005-12-01 |
| TW472177B (en) | 2002-01-11 |
| US6430465B2 (en) | 2002-08-06 |
| EP1275036A1 (de) | 2003-01-15 |
| KR100755335B1 (ko) | 2007-09-05 |
| KR20020067600A (ko) | 2002-08-22 |
| DE60114397T2 (de) | 2006-08-03 |
| US20010029674A1 (en) | 2001-10-18 |
| CN1419663A (zh) | 2003-05-21 |
| AU2001227690A1 (en) | 2001-07-24 |
| EP1275036B1 (de) | 2005-10-26 |
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| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |