ATE310776T1 - Verfahren zur herstellung polymerer azofarbstoffe - Google Patents
Verfahren zur herstellung polymerer azofarbstoffeInfo
- Publication number
- ATE310776T1 ATE310776T1 AT00969286T AT00969286T ATE310776T1 AT E310776 T1 ATE310776 T1 AT E310776T1 AT 00969286 T AT00969286 T AT 00969286T AT 00969286 T AT00969286 T AT 00969286T AT E310776 T1 ATE310776 T1 AT E310776T1
- Authority
- AT
- Austria
- Prior art keywords
- azo dyes
- producing polymeric
- polymeric azo
- diazonium salt
- polymer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000012954 diazonium Substances 0.000 abstract 3
- 150000001989 diazonium salts Chemical class 0.000 abstract 3
- 239000007791 liquid phase Substances 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 abstract 2
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229920000620 organic polymer Polymers 0.000 abstract 1
- 239000012071 phase Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/106—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing an azo dye
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Chemical & Material Sciences (AREA)
- Structural Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Artificial Filaments (AREA)
- Polymerization Catalysts (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/413,181 US6346361B1 (en) | 1999-10-06 | 1999-10-06 | Method for synthesizing polymeric AZO dyes |
| PCT/EP2000/009294 WO2001025341A1 (en) | 1999-10-06 | 2000-09-22 | A method for synthesizing polymeric azo dyes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE310776T1 true ATE310776T1 (de) | 2005-12-15 |
Family
ID=23636201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT00969286T ATE310776T1 (de) | 1999-10-06 | 2000-09-22 | Verfahren zur herstellung polymerer azofarbstoffe |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US6346361B1 (de) |
| EP (1) | EP1222233B1 (de) |
| JP (1) | JP4629940B2 (de) |
| KR (1) | KR100585978B1 (de) |
| CN (1) | CN100383195C (de) |
| AT (1) | ATE310776T1 (de) |
| DE (1) | DE60024298T2 (de) |
| MY (1) | MY118581A (de) |
| TW (1) | TW538101B (de) |
| WO (1) | WO2001025341A1 (de) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001040865A1 (en) * | 1999-11-30 | 2001-06-07 | Brewer Science, Inc. | Non-aromatic chromophores for use in polymer anti-reflective coatings |
| US6852473B2 (en) * | 2000-01-12 | 2005-02-08 | Infineon Technologies Richmond, Lp | Anti-reflective coating conformality control |
| DE10249747A1 (de) * | 2002-10-25 | 2004-05-06 | Clariant Gmbh | Verfahren und Vorrichtung zur Durchführung chemischer und physikalischer Prozesse |
| US20060177772A1 (en) * | 2005-02-10 | 2006-08-10 | Abdallah David J | Process of imaging a photoresist with multiple antireflective coatings |
| US7816071B2 (en) * | 2005-02-10 | 2010-10-19 | Az Electronic Materials Usa Corp. | Process of imaging a photoresist with multiple antireflective coatings |
| JP5034513B2 (ja) * | 2007-01-23 | 2012-09-26 | コニカミノルタビジネステクノロジーズ株式会社 | 発色性ポリマー粒子 |
| WO2010148624A1 (en) | 2009-06-26 | 2010-12-29 | Unilever Plc | Dye polymers |
| CN101768373A (zh) * | 2010-01-08 | 2010-07-07 | 武汉科技学院 | 一种重氮偶合法制备水溶性乙烯砜型聚氨酯类高分子活性染料的方法 |
| CN104136468A (zh) | 2012-02-29 | 2014-11-05 | 佳能株式会社 | 具有偶氮骨架的新型化合物和包含该化合物的颜料分散剂、颜料组合物、颜料分散体和调色剂 |
| CN102618063B (zh) * | 2012-03-09 | 2013-11-20 | 大连理工大学 | 水溶性偶氮染料的螺旋管混沌混合的连续化制备方法 |
| CN103788706B (zh) * | 2013-03-12 | 2015-08-12 | 浙江迪邦化工有限公司 | 染料自动控制连续生产方法及装置 |
| CN104212201B (zh) * | 2014-08-06 | 2017-04-05 | 京东方科技集团股份有限公司 | 聚合物染料及其制备方法、光阻组合物和显示装置 |
| US9102886B1 (en) * | 2015-03-26 | 2015-08-11 | Tex-OK-Kan Oilfield Services, LLC | Mixer for removing impurities from gases and liquids |
| CN105885467B (zh) * | 2016-04-28 | 2017-10-03 | 武汉远大弘元股份有限公司 | 一种以乙酰酪氨酸为偶合组分的环保型染料及其制备方法 |
| JP7371334B2 (ja) * | 2018-05-11 | 2023-10-31 | 東ソー株式会社 | 重合性化合物、光架橋性重合体、絶縁膜、及び有機トランジスタデバイス |
| JP7283035B2 (ja) * | 2018-07-05 | 2023-05-30 | 東ソー株式会社 | 重合体、絶縁膜、撥液膜、及び電子デバイス |
| JP7363060B2 (ja) * | 2018-03-23 | 2023-10-18 | 東ソー株式会社 | 重合性化合物、光硬化型重合体、絶縁膜、保護膜、及び有機トランジスタデバイス |
| CN110590976B (zh) * | 2019-09-19 | 2020-12-25 | 北京师范大学 | 一种含偶氮基团的聚对-羟基苯乙烯衍生物、其制备方法及其在抗反射涂层中的应用 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5016364B1 (de) * | 1970-11-25 | 1975-06-12 | ||
| DE2903717A1 (de) * | 1978-02-14 | 1979-08-16 | Ici Ltd | Verfahren zur herstellung einer waessrigen aufschlaemmung einer wasserunloeslichen azoverbindung |
| US4533446A (en) * | 1983-07-20 | 1985-08-06 | Loctite (Ireland) Ltd. | Radiation-activatable anaerobic adhesive composition |
| GB8401166D0 (en) * | 1984-01-17 | 1984-02-22 | Bevaloid Ltd | Labelled polymer compositions |
| IN172052B (de) * | 1987-12-01 | 1993-03-27 | Hoechst Ag | |
| US5886102A (en) * | 1996-06-11 | 1999-03-23 | Shipley Company, L.L.C. | Antireflective coating compositions |
| US5994430A (en) * | 1997-04-30 | 1999-11-30 | Clariant Finance Bvi) Limited | Antireflective coating compositions for photoresist compositions and use thereof |
| US5981145A (en) | 1997-04-30 | 1999-11-09 | Clariant Finance (Bvi) Limited | Light absorbing polymers |
-
1999
- 1999-10-06 US US09/413,181 patent/US6346361B1/en not_active Expired - Lifetime
-
2000
- 2000-09-15 TW TW089118959A patent/TW538101B/zh not_active IP Right Cessation
- 2000-09-22 KR KR1020027004338A patent/KR100585978B1/ko not_active Expired - Lifetime
- 2000-09-22 AT AT00969286T patent/ATE310776T1/de not_active IP Right Cessation
- 2000-09-22 DE DE60024298T patent/DE60024298T2/de not_active Expired - Lifetime
- 2000-09-22 EP EP00969286A patent/EP1222233B1/de not_active Expired - Lifetime
- 2000-09-22 WO PCT/EP2000/009294 patent/WO2001025341A1/en not_active Ceased
- 2000-09-22 CN CNB008138621A patent/CN100383195C/zh not_active Expired - Lifetime
- 2000-09-22 JP JP2001528500A patent/JP4629940B2/ja not_active Expired - Lifetime
- 2000-10-04 MY MYPI20004627A patent/MY118581A/en unknown
-
2001
- 2001-11-09 US US10/008,656 patent/US20020061473A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| DE60024298D1 (de) | 2005-12-29 |
| JP4629940B2 (ja) | 2011-02-09 |
| TW538101B (en) | 2003-06-21 |
| US6346361B1 (en) | 2002-02-12 |
| US20020061473A1 (en) | 2002-05-23 |
| EP1222233B1 (de) | 2005-11-23 |
| DE60024298T2 (de) | 2006-08-17 |
| KR20020033839A (ko) | 2002-05-07 |
| MY118581A (en) | 2004-12-31 |
| CN1377389A (zh) | 2002-10-30 |
| KR100585978B1 (ko) | 2006-06-07 |
| CN100383195C (zh) | 2008-04-23 |
| WO2001025341A1 (en) | 2001-04-12 |
| EP1222233A1 (de) | 2002-07-17 |
| JP2003511514A (ja) | 2003-03-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |