ATE313367T1 - Kühlmittel-entgasungsmethode für eine esfr-kammer - Google Patents

Kühlmittel-entgasungsmethode für eine esfr-kammer

Info

Publication number
ATE313367T1
ATE313367T1 AT99938950T AT99938950T ATE313367T1 AT E313367 T1 ATE313367 T1 AT E313367T1 AT 99938950 T AT99938950 T AT 99938950T AT 99938950 T AT99938950 T AT 99938950T AT E313367 T1 ATE313367 T1 AT E313367T1
Authority
AT
Austria
Prior art keywords
chamber
esfr
degassing method
coolants
rapid
Prior art date
Application number
AT99938950T
Other languages
English (en)
Inventor
Wayne L Johnson
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of ATE313367T1 publication Critical patent/ATE313367T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0063—Regulation, control including valves and floats
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Ceramic Products (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Continuous Casting (AREA)
  • Turbine Rotor Nozzle Sealing (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Water Treatments (AREA)
AT99938950T 1998-08-03 1999-08-03 Kühlmittel-entgasungsmethode für eine esfr-kammer ATE313367T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9503598P 1998-08-03 1998-08-03
PCT/US1999/017520 WO2000007688A1 (en) 1998-08-03 1999-08-03 Esrf coolant degassing process

Publications (1)

Publication Number Publication Date
ATE313367T1 true ATE313367T1 (de) 2006-01-15

Family

ID=22248852

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99938950T ATE313367T1 (de) 1998-08-03 1999-08-03 Kühlmittel-entgasungsmethode für eine esfr-kammer

Country Status (9)

Country Link
US (1) US6491742B1 (de)
EP (1) EP1102616B1 (de)
JP (1) JP4216476B2 (de)
KR (1) KR100626988B1 (de)
CN (1) CN1185037C (de)
AT (1) ATE313367T1 (de)
DE (1) DE69929056D1 (de)
HK (1) HK1040373B (de)
WO (1) WO2000007688A1 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001241947A1 (en) * 2000-03-02 2001-09-12 Tokyo Electron Limited Esrf source for ion plating epitaxial deposition
US7048910B2 (en) 2000-09-07 2006-05-23 Merck Patent Gmbh Use of ectoine or ectoine derivatives for oral care
JP3890229B2 (ja) * 2001-12-27 2007-03-07 株式会社コガネイ 薬液供給装置および薬液供給装置の脱気方法
KR20040001428A (ko) * 2002-06-28 2004-01-07 주식회사 다산 씨.앤드.아이 히트 챔버 냉각장치
CA2559171A1 (en) * 2004-03-12 2005-09-29 Biotrove, Inc. Nanoliter array loading
CN100428977C (zh) * 2004-04-08 2008-10-29 中国科学院工程热物理研究所 一种静电荷控制强化的活性炭纤维吸附床
US20090108969A1 (en) * 2007-10-31 2009-04-30 Los Alamos National Security Apparatus and method for transcranial and nerve magnetic stimulation
US8642974B2 (en) 2009-12-30 2014-02-04 Fei Company Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation
EP2341525B1 (de) 2009-12-30 2013-10-23 FEI Company Plasmaquelle für ein Teilchenstrahlsystem
US8987678B2 (en) 2009-12-30 2015-03-24 Fei Company Encapsulation of electrodes in solid media
US20130098871A1 (en) 2011-10-19 2013-04-25 Fei Company Internal Split Faraday Shield for an Inductively Coupled Plasma Source
CN104103485B (zh) * 2013-04-15 2016-09-07 中微半导体设备(上海)有限公司 电感耦合等离子体装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3591946A (en) 1968-11-26 1971-07-13 Loe Ind Fluid-degassing system
GB1440190A (en) 1972-11-23 1976-06-23 Boc International Ltd Electrical transformers
DE2810583A1 (de) * 1978-03-11 1979-09-20 Spiro Research Bv Verfahren und vorrichtung zum entgasen von umlaufsystemen fuer fluessigkeiten
DE3422788A1 (de) * 1984-06-20 1986-01-02 Spiro Research B.V., Helmond Verfahren und vorrichtung zum entlueften von geschlossenen fluessigkeits-umlaufsystemen
US5165237A (en) * 1991-03-08 1992-11-24 Graham Corporation Method and apparatus for maintaining a required temperature differential in vacuum deaerators
US5234529A (en) 1991-10-10 1993-08-10 Johnson Wayne L Plasma generating apparatus employing capacitive shielding and process for using such apparatus
US5269832A (en) * 1992-06-03 1993-12-14 Winfield Industries Method and apparatus for continuously measuring the concentration of chemicals in solutions

Also Published As

Publication number Publication date
EP1102616A4 (de) 2002-07-31
DE69929056D1 (de) 2006-01-26
WO2000007688A1 (en) 2000-02-17
HK1040373A1 (en) 2002-06-07
CN1185037C (zh) 2005-01-19
US6491742B1 (en) 2002-12-10
JP4216476B2 (ja) 2009-01-28
EP1102616A1 (de) 2001-05-30
KR20010072200A (ko) 2001-07-31
KR100626988B1 (ko) 2006-09-22
CN1311707A (zh) 2001-09-05
JP2002527217A (ja) 2002-08-27
HK1040373B (zh) 2005-05-06
EP1102616B1 (de) 2005-12-21

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties