ATE321992T1 - Gleichzeitige und sich selbst kalibrierende anpassung von subaperturen zur messung von oberflächenformen ( interferometer ) - Google Patents

Gleichzeitige und sich selbst kalibrierende anpassung von subaperturen zur messung von oberflächenformen ( interferometer )

Info

Publication number
ATE321992T1
ATE321992T1 AT02027674T AT02027674T ATE321992T1 AT E321992 T1 ATE321992 T1 AT E321992T1 AT 02027674 T AT02027674 T AT 02027674T AT 02027674 T AT02027674 T AT 02027674T AT E321992 T1 ATE321992 T1 AT E321992T1
Authority
AT
Austria
Prior art keywords
aperture
sub
uncertainties
full
compensators
Prior art date
Application number
AT02027674T
Other languages
English (en)
Inventor
Donald Golini
Gregory Forbes
Paul E Murphy
Original Assignee
Qed Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qed Technologies Inc filed Critical Qed Technologies Inc
Application granted granted Critical
Publication of ATE321992T1 publication Critical patent/ATE321992T1/de

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/255—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures for measuring radius of curvature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G01B9/02074—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer of the detector
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02083—Interferometers characterised by particular signal processing and presentation
    • G01B9/02085—Combining two or more images of different regions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2210/00—Aspects not specifically covered by any group under G01B, e.g. of wheel alignment, caliper-like sensors
    • G01B2210/52—Combining or merging partially overlapping images to an overall image
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/65—Spatial scanning object beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Signal Processing (AREA)
  • Engineering & Computer Science (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
AT02027674T 2001-12-18 2002-12-12 Gleichzeitige und sich selbst kalibrierende anpassung von subaperturen zur messung von oberflächenformen ( interferometer ) ATE321992T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US34154901P 2001-12-18 2001-12-18
US10/303,236 US6956657B2 (en) 2001-12-18 2002-11-25 Method for self-calibrated sub-aperture stitching for surface figure measurement

Publications (1)

Publication Number Publication Date
ATE321992T1 true ATE321992T1 (de) 2006-04-15

Family

ID=26973342

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02027674T ATE321992T1 (de) 2001-12-18 2002-12-12 Gleichzeitige und sich selbst kalibrierende anpassung von subaperturen zur messung von oberflächenformen ( interferometer )

Country Status (5)

Country Link
US (1) US6956657B2 (de)
EP (1) EP1324006B1 (de)
JP (1) JP4498672B2 (de)
AT (1) ATE321992T1 (de)
DE (1) DE60210195T2 (de)

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US5987189A (en) * 1996-12-20 1999-11-16 Wyko Corporation Method of combining multiple sets of overlapping surface-profile interferometric data to produce a continuous composite map
JPH10281737A (ja) * 1997-04-04 1998-10-23 Nikon Corp 波面合成法
JPH10332350A (ja) * 1997-05-30 1998-12-18 Nikon Corp 干渉計を用いた形状測定方法
US5986668A (en) * 1997-08-01 1999-11-16 Microsoft Corporation Deghosting method and apparatus for construction of image mosaics
US6097854A (en) * 1997-08-01 2000-08-01 Microsoft Corporation Image mosaic construction system and apparatus with patch-based alignment, global block adjustment and pair-wise motion-based local warping
JP3562338B2 (ja) * 1998-09-10 2004-09-08 富士ゼロックス株式会社 面形状測定方法及び装置
JP3403668B2 (ja) * 1999-05-27 2003-05-06 理化学研究所 部分測定データの合成方法

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US20030117632A1 (en) 2003-06-26
EP1324006A1 (de) 2003-07-02
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