ATE321999T1 - Abstimmung eines substrattemperaturmesssystems - Google Patents

Abstimmung eines substrattemperaturmesssystems

Info

Publication number
ATE321999T1
ATE321999T1 AT99942198T AT99942198T ATE321999T1 AT E321999 T1 ATE321999 T1 AT E321999T1 AT 99942198 T AT99942198 T AT 99942198T AT 99942198 T AT99942198 T AT 99942198T AT E321999 T1 ATE321999 T1 AT E321999T1
Authority
AT
Austria
Prior art keywords
temperature
temperature profile
substrate
correction value
tuning
Prior art date
Application number
AT99942198T
Other languages
English (en)
Inventor
Wolfgang Aderhold
Abhilash J Mayur
Peter A Knoot
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of ATE321999T1 publication Critical patent/ATE321999T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/28—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using photoemissive or photovoltaic cells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0806—Focusing or collimating elements, e.g. lenses or concave mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0875—Windows; Arrangements for fastening thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/80—Calibration
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/28—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using photoemissive or photovoltaic cells
    • G01J2005/283—Array

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Physical Vapour Deposition (AREA)
  • Control Of Temperature (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)
AT99942198T 1998-08-14 1999-08-13 Abstimmung eines substrattemperaturmesssystems ATE321999T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/133,993 US6164816A (en) 1998-08-14 1998-08-14 Tuning a substrate temperature measurement system

Publications (1)

Publication Number Publication Date
ATE321999T1 true ATE321999T1 (de) 2006-04-15

Family

ID=22461270

Family Applications (1)

Application Number Title Priority Date Filing Date
AT99942198T ATE321999T1 (de) 1998-08-14 1999-08-13 Abstimmung eines substrattemperaturmesssystems

Country Status (8)

Country Link
US (1) US6164816A (de)
EP (1) EP1116011B1 (de)
JP (1) JP2002522912A (de)
KR (1) KR100564788B1 (de)
AT (1) ATE321999T1 (de)
DE (1) DE69930649T2 (de)
TW (1) TW440685B (de)
WO (1) WO2000009976A1 (de)

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US8109669B2 (en) * 2008-11-19 2012-02-07 Applied Materials, Inc. Temperature uniformity measurement during thermal processing
TWI394941B (zh) * 2009-04-03 2013-05-01 China Steel Corp Method of processing temperature measurement data
KR101031226B1 (ko) * 2009-08-21 2011-04-29 에이피시스템 주식회사 급속열처리 장치의 히터블록
JP5640894B2 (ja) * 2011-05-26 2014-12-17 東京エレクトロン株式会社 温度測定装置、温度測定方法、記憶媒体及び熱処理装置
US9245768B2 (en) * 2013-12-17 2016-01-26 Applied Materials, Inc. Method of improving substrate uniformity during rapid thermal processing
DE102013114412A1 (de) * 2013-12-18 2015-06-18 Aixtron Se Vorrichtung und Verfahren zur Regelung der Temperatur in einer Prozesskammer eines CVD-Reaktors unter Verwendung zweier Temperatursensoreinrichtungen
US9435692B2 (en) * 2014-02-05 2016-09-06 Lam Research Corporation Calculating power input to an array of thermal control elements to achieve a two-dimensional temperature output
JP6479525B2 (ja) * 2015-03-27 2019-03-06 株式会社ニューフレアテクノロジー 成膜装置及び温度測定方法
CN106556462B (zh) * 2016-12-06 2018-06-12 清华大学 一种基于多光谱测量的亚像元温度分布测量装置及方法
US20180217005A1 (en) * 2017-02-02 2018-08-02 Pervacio Inc Device and components overheating evaluation
WO2019147405A1 (en) 2018-01-23 2019-08-01 Applied Materials, Inc. Methods and apparatus for wafer temperature measurement
US10760976B2 (en) * 2018-04-12 2020-09-01 Mattson Technology, Inc. Thermal imaging of heat sources in thermal processing systems
KR102841602B1 (ko) * 2019-02-04 2025-08-01 어플라이드 머티어리얼스, 인코포레이티드 온도 오프셋 및 구역 제어 튜닝
CN110220602B (zh) * 2019-06-24 2020-08-25 广西电网有限责任公司电力科学研究院 一种开关柜过热故障识别方法
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CN113432737A (zh) * 2020-03-19 2021-09-24 长鑫存储技术有限公司 晶圆卡盘温度量测及温度校准的方法和温度量测系统
CN113494968B (zh) * 2020-03-19 2022-11-25 长鑫存储技术有限公司 温度量测及温度校准的方法和温度量测系统
CN113496911A (zh) 2020-03-19 2021-10-12 长鑫存储技术有限公司 用于半导体机台的校温方法
KR102657953B1 (ko) * 2020-12-08 2024-04-18 (주)유우일렉트로닉스 셔터를 이용한 대상체의 온도 보정 장치, 방법 및 컴퓨터로 독출 가능한 기록 매체
JP7670439B2 (ja) * 2021-06-17 2025-04-30 東京エレクトロン株式会社 温度補正情報算出装置、半導体製造装置、プログラム、温度補正情報算出方法
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Also Published As

Publication number Publication date
EP1116011A1 (de) 2001-07-18
DE69930649D1 (de) 2006-05-18
WO2000009976A9 (en) 2005-07-07
TW440685B (en) 2001-06-16
DE69930649T2 (de) 2006-12-28
JP2002522912A (ja) 2002-07-23
EP1116011B1 (de) 2006-03-29
KR20010090716A (ko) 2001-10-19
KR100564788B1 (ko) 2006-03-28
WO2000009976A1 (en) 2000-02-24
US6164816A (en) 2000-12-26

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Legal Events

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