ATE323947T1 - Röntgenanode - Google Patents

Röntgenanode

Info

Publication number
ATE323947T1
ATE323947T1 AT00958290T AT00958290T ATE323947T1 AT E323947 T1 ATE323947 T1 AT E323947T1 AT 00958290 T AT00958290 T AT 00958290T AT 00958290 T AT00958290 T AT 00958290T AT E323947 T1 ATE323947 T1 AT E323947T1
Authority
AT
Austria
Prior art keywords
ray
anode
ray anode
radiation intensity
radiation
Prior art date
Application number
AT00958290T
Other languages
English (en)
Inventor
Matthias Fryda
Lothar Schaefer
Thorsten Matthee
Original Assignee
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung filed Critical Fraunhofer Ges Forschung
Application granted granted Critical
Publication of ATE323947T1 publication Critical patent/ATE323947T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/16Vessels; Containers; Shields associated therewith
    • H01J35/18Windows
    • H01J35/186Windows used as targets or X-ray converters
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/10Rotary anodes; Arrangements for rotating anodes; Cooling rotary anodes

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT00958290T 1999-07-26 2000-07-24 Röntgenanode ATE323947T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19934987A DE19934987B4 (de) 1999-07-26 1999-07-26 Röntgenanode und ihre Verwendung

Publications (1)

Publication Number Publication Date
ATE323947T1 true ATE323947T1 (de) 2006-05-15

Family

ID=7916063

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00958290T ATE323947T1 (de) 1999-07-26 2000-07-24 Röntgenanode

Country Status (7)

Country Link
US (1) US6850598B1 (de)
EP (1) EP1198820B1 (de)
JP (1) JP2003505845A (de)
KR (1) KR100740266B1 (de)
AT (1) ATE323947T1 (de)
DE (2) DE19934987B4 (de)
WO (1) WO2001008195A1 (de)

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DE112005000798T5 (de) * 2004-04-08 2007-04-05 Japan Science And Technology Agency, Kawaguchi Röntgenstrahlen-Target und Vorrichtungen, die es verwenden
DE202005017496U1 (de) * 2005-11-07 2007-03-15 Comet Gmbh Target für eine Mikrofocus- oder Nanofocus-Röntgenröhre
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JP2012256443A (ja) 2011-06-07 2012-12-27 Canon Inc X線放出ターゲットおよびx線放出装置
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DE102012011309B4 (de) * 2011-10-28 2022-08-25 Gamc Biotech Development Co., Ltd. Röntgenstrahlröhre vom Transmissionstyp und Röntgenstrahlröhre vom Reflektionstyp
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
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JP5911323B2 (ja) 2012-02-06 2016-04-27 キヤノン株式会社 ターゲット構造体及びそれを備える放射線発生装置並びに放射線撮影システム
WO2014054497A1 (ja) * 2012-10-04 2014-04-10 東京エレクトロン株式会社 X線発生用ターゲットの製造方法及びx線発生用ターゲット
JP6140983B2 (ja) 2012-11-15 2017-06-07 キヤノン株式会社 透過型ターゲット、x線発生ターゲット、x線発生管、x線x線発生装置、並びに、x線x線撮影装置
JP6253233B2 (ja) 2013-01-18 2017-12-27 キヤノン株式会社 透過型x線ターゲットおよび、該透過型x線ターゲットを備えた放射線発生管、並びに、該放射線発生管を備えた放射線発生装置、並びに、該放射線発生装置を備えた放射線撮影装置
JP6116274B2 (ja) 2013-02-13 2017-04-19 キヤノン株式会社 放射線発生装置および該放射線発生装置を備える放射線撮影装置
JP6100036B2 (ja) 2013-03-12 2017-03-22 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備える放射線発生管、放射線発生装置、及び、放射線撮影装置
WO2015084466A2 (en) 2013-09-19 2015-06-11 Sigray, Inc. X-ray sources using linear accumulation
JP6338341B2 (ja) 2013-09-19 2018-06-06 キヤノン株式会社 透過型放射線管、放射線発生装置及び放射線撮影システム
US9390881B2 (en) 2013-09-19 2016-07-12 Sigray, Inc. X-ray sources using linear accumulation
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US9449781B2 (en) 2013-12-05 2016-09-20 Sigray, Inc. X-ray illuminators with high flux and high flux density
US9570265B1 (en) 2013-12-05 2017-02-14 Sigray, Inc. X-ray fluorescence system with high flux and high flux density
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US9448190B2 (en) 2014-06-06 2016-09-20 Sigray, Inc. High brightness X-ray absorption spectroscopy system
FR3012663B1 (fr) * 2013-10-25 2015-12-04 Thales Sa Generateur de rayons x a capteur de flux integre
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
JP6594479B2 (ja) * 2013-12-06 2019-10-23 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるx線発生管
JP6335729B2 (ja) 2013-12-06 2018-05-30 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットを備えるx線発生管
US9594036B2 (en) 2014-02-28 2017-03-14 Sigray, Inc. X-ray surface analysis and measurement apparatus
US9823203B2 (en) 2014-02-28 2017-11-21 Sigray, Inc. X-ray surface analysis and measurement apparatus
JP6381269B2 (ja) * 2014-04-21 2018-08-29 キヤノン株式会社 ターゲットおよび前記ターゲットを備えるx線発生管、x線発生装置、x線撮影システム
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
JP6452334B2 (ja) 2014-07-16 2019-01-16 キヤノン株式会社 ターゲット、該ターゲットを備えたx線発生管、x線発生装置、x線撮影システム
JP6700745B2 (ja) 2014-11-28 2020-05-27 キヤノン株式会社 粉末、熱可塑性組成物、および立体物の製造方法
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
WO2018175570A1 (en) 2017-03-22 2018-09-27 Sigray, Inc. Method of performing x-ray spectroscopy and x-ray absorption spectrometer system
JP2017139238A (ja) * 2017-05-02 2017-08-10 キヤノン株式会社 透過型ターゲットおよび該透過型ターゲットの製造方法、ならびに、放射線発生管、並びに、該放射線発生管を備えた放射線発生装置、並びに、該放射線発生装置を備えた放射線撮影装置
US10847336B2 (en) 2017-08-17 2020-11-24 Bruker AXS, GmbH Analytical X-ray tube with high thermal performance
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
CN112424591B (zh) 2018-06-04 2024-05-24 斯格瑞公司 波长色散x射线光谱仪
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
CN118541772A (zh) 2022-01-13 2024-08-23 斯格瑞公司 用于生成高通量低能量x射线的微焦x射线源
WO2023145101A1 (ja) 2022-01-31 2023-08-03 キヤノンアネルバ株式会社 検査装置および検査方法
WO2023168204A1 (en) 2022-03-02 2023-09-07 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

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Also Published As

Publication number Publication date
KR100740266B1 (ko) 2007-07-18
EP1198820A1 (de) 2002-04-24
DE19934987B4 (de) 2004-11-11
US6850598B1 (en) 2005-02-01
KR20020035111A (ko) 2002-05-09
DE19934987A1 (de) 2001-05-03
DE50012611D1 (de) 2006-05-24
JP2003505845A (ja) 2003-02-12
WO2001008195A1 (de) 2001-02-01
EP1198820B1 (de) 2006-04-19

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Legal Events

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REN Ceased due to non-payment of the annual fee