ATE331737T1 - Polymerisation mit gepulstem elektronenstrahl - Google Patents

Polymerisation mit gepulstem elektronenstrahl

Info

Publication number
ATE331737T1
ATE331737T1 AT02769643T AT02769643T ATE331737T1 AT E331737 T1 ATE331737 T1 AT E331737T1 AT 02769643 T AT02769643 T AT 02769643T AT 02769643 T AT02769643 T AT 02769643T AT E331737 T1 ATE331737 T1 AT E331737T1
Authority
AT
Austria
Prior art keywords
polymerization
electron beam
polymerizable composition
pulsed electron
substrate
Prior art date
Application number
AT02769643T
Other languages
English (en)
Inventor
Douglas E Weiss
Douglas S Dunn
Roy G Schlemmer
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of ATE331737T1 publication Critical patent/ATE331737T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/54—Polymerisation initiated by wave energy or particle radiation by X-rays or electrons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10—Esters
    • C08F22/1006—Esters of polyhydric alcohols or polyhydric phenols, e.g. ethylene glycol dimethacrylate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Polymerisation Methods In General (AREA)
  • Paper (AREA)
AT02769643T 2001-05-11 2002-02-22 Polymerisation mit gepulstem elektronenstrahl ATE331737T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/853,217 US20030031802A1 (en) 2001-05-11 2001-05-11 Pulsed electron beam polymerization

Publications (1)

Publication Number Publication Date
ATE331737T1 true ATE331737T1 (de) 2006-07-15

Family

ID=25315401

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02769643T ATE331737T1 (de) 2001-05-11 2002-02-22 Polymerisation mit gepulstem elektronenstrahl

Country Status (8)

Country Link
US (1) US20030031802A1 (de)
EP (1) EP1385889B1 (de)
JP (1) JP4139691B2 (de)
KR (1) KR100901545B1 (de)
CN (1) CN1319997C (de)
AT (1) ATE331737T1 (de)
DE (1) DE60212829T2 (de)
WO (1) WO2002092639A1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4410055B2 (ja) * 2004-08-02 2010-02-03 日東電工株式会社 位相差粘着剤層、その製造方法、粘着型光学フィルム、その製造方法および画像表示装置
AU2005308920B2 (en) * 2004-11-29 2010-04-15 Dsm Ip Assets B.V. Method for reducing the amount of migrateables of polymer coatings
DE102007022726A1 (de) 2007-05-11 2008-11-13 Tesa Ag Verfahren und Vorrichtung zur lösungsmittelfreien Herstellung von Acrylathaftklebemassen
CN101998982A (zh) * 2008-04-11 2011-03-30 3M创新有限公司 透明粘合剂片材及包括所述透明粘合剂片材的图像显示装置
US8361633B2 (en) 2008-10-03 2013-01-29 3M Innovative Properties Company Cloud point-resistant adhesives and laminates
US8361632B2 (en) * 2008-10-03 2013-01-29 3M Innovative Properties Company Cloud point-resistant adhesives and laminates
US8765217B2 (en) * 2008-11-04 2014-07-01 Entrotech, Inc. Method for continuous production of (meth)acrylate syrup and adhesives therefrom
SG195117A1 (en) * 2011-05-27 2013-12-30 3M Innovative Properties Co Scanned, pulsed electron-beam polymerization
CN102807641B (zh) * 2012-08-29 2014-07-23 西华大学 甲基丙烯酸甲酯的本体聚合方法
JP6273108B2 (ja) * 2013-08-27 2018-01-31 地方独立行政法人大阪産業技術研究所 有機無機ハイブリッド薄膜の製造方法
KR101584183B1 (ko) 2014-12-31 2016-01-15 울산과학기술원 산학협력단 펄스 빔 처리를 이용한 특수강의 부식 억제 및 표면 경화방법
JP6335948B2 (ja) 2016-02-12 2018-05-30 キヤノン株式会社 インプリント装置および物品製造方法
CN109265604A (zh) * 2018-09-25 2019-01-25 中广核达胜加速器技术有限公司 一种高分子量阳离子聚丙烯酰胺的制备方法
CN114570608B (zh) * 2021-03-23 2023-12-26 河北益碧固化科技有限公司 一种电子加速器辐射固化型丙烯酸酯压敏胶黏剂涂布机

Family Cites Families (23)

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US2956904A (en) * 1954-11-04 1960-10-18 Minnesota Mining & Mfg Pressure-sensitive adhesive tapes
US3265604A (en) * 1960-06-02 1966-08-09 Shell Oil Co Process for polymerizing unsaturated monomers using high energy ionizing radiation
US3424638A (en) * 1964-11-02 1969-01-28 Grace W R & Co Chemical process
US3535148A (en) * 1968-08-07 1970-10-20 Continental Can Co Process for preparing polymerized aminoplast surface coatings using ionizing radiation
US3897295A (en) * 1969-01-16 1975-07-29 Ppg Industries Inc Ionizing radiation method for forming acrylic pressure sensitive adhesives and coated substrates
US3661618A (en) * 1969-06-30 1972-05-09 Firestone Fire And Rubber Co T Process for the preparation of pressure sensitive adhesives
JPS5214249B1 (de) * 1970-07-09 1977-04-20
US4181752A (en) * 1974-09-03 1980-01-01 Minnesota Mining And Manufacturing Company Acrylic-type pressure sensitive adhesives by means of ultraviolet radiation curing
US4163172A (en) * 1977-07-08 1979-07-31 Systems, Science And Software Sliding spark source cold cathode electron gun and method
GB2102011B (en) * 1981-06-17 1984-12-19 Smith & Nephew Ass Electron beam cured acrylic adhesive layer
US4490409A (en) * 1982-09-07 1984-12-25 Energy Sciences, Inc. Process and apparatus for decorating the surfaces of electron irradiation cured coatings on radiation-sensitive substrates
JPS59151100A (ja) * 1983-02-18 1984-08-29 ウシオ電機株式会社 電子線照射方法およびその装置
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US4810523A (en) * 1985-05-06 1989-03-07 Neutron Products, Inc. Pressure-sensitive adhesives
JPS62199608A (ja) * 1986-02-27 1987-09-03 Kohjin Co Ltd 紫外線硬化樹脂及び電子線硬化樹脂用希釈剤
US5166226A (en) * 1986-08-12 1992-11-24 Avery Dennison Corporation Radiation-cured rubber-based pressure-sensitive adhesive
US5028484A (en) * 1987-08-14 1991-07-02 Minnesota Mining And Manufacturing Company Pressure-sensitive adhesive
US5440446A (en) * 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
FR2751974B1 (fr) * 1996-07-31 1998-09-18 Atochem Elf Sa Polymeres adhesifs sensibles a la pression
DE19816246C1 (de) * 1998-04-11 1999-12-30 Fraunhofer Ges Forschung Verfahren zur Elektronenbestrahlung von Schichten auf Oberflächen von Objekten sowie Einrichtung zur Durchführung des Verfahrens
US6232365B1 (en) * 1998-07-17 2001-05-15 3M Innovative Properties Company Low temperature electron beam polymerization
WO2000009572A1 (fr) * 1998-08-11 2000-02-24 Rhodia Chimie Procede de polymerisation et/ou de reticulation sous faisceau d'electrons et/ou rayons gamma

Also Published As

Publication number Publication date
DE60212829D1 (de) 2006-08-10
CN1633449A (zh) 2005-06-29
EP1385889B1 (de) 2006-06-28
EP1385889A1 (de) 2004-02-04
KR20030096372A (ko) 2003-12-24
WO2002092639A1 (en) 2002-11-21
JP2004532323A (ja) 2004-10-21
KR100901545B1 (ko) 2009-06-08
DE60212829T2 (de) 2007-02-08
CN1319997C (zh) 2007-06-06
JP4139691B2 (ja) 2008-08-27
US20030031802A1 (en) 2003-02-13

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