ATE338340T1 - Feldemissionsvorrichtung mit kohlenstoffhaltigen spitzen - Google Patents
Feldemissionsvorrichtung mit kohlenstoffhaltigen spitzenInfo
- Publication number
- ATE338340T1 ATE338340T1 AT01962116T AT01962116T ATE338340T1 AT E338340 T1 ATE338340 T1 AT E338340T1 AT 01962116 T AT01962116 T AT 01962116T AT 01962116 T AT01962116 T AT 01962116T AT E338340 T1 ATE338340 T1 AT E338340T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- dielectric
- dielectric layer
- coupled
- extractor
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
- H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/021—Electron guns using a field emission, photo emission, or secondary emission electron source
- H01J3/022—Electron guns using a field emission, photo emission, or secondary emission electron source with microengineered cathode, e.g. Spindt-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2201/00—Electrodes common to discharge tubes
- H01J2201/30—Cold cathodes
- H01J2201/304—Field emission cathodes
- H01J2201/30446—Field emission cathodes characterised by the emitter material
- H01J2201/30453—Carbon types
- H01J2201/30469—Carbon nanotubes (CNTs)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
- Y10S977/843—Gas phase catalytic growth, i.e. chemical vapor deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/842—Manufacture, treatment, or detection of nanostructure for carbon nanotubes or fullerenes
- Y10S977/847—Surface modifications, e.g. functionalization, coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
- Y10S977/891—Vapor phase deposition
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Cold Cathode And The Manufacture (AREA)
- Carbon And Carbon Compounds (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22871300P | 2000-08-29 | 2000-08-29 | |
| US09/810,531 US6692324B2 (en) | 2000-08-29 | 2001-03-15 | Single self-aligned carbon containing tips |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE338340T1 true ATE338340T1 (de) | 2006-09-15 |
Family
ID=26922595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01962116T ATE338340T1 (de) | 2000-08-29 | 2001-08-09 | Feldemissionsvorrichtung mit kohlenstoffhaltigen spitzen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6692324B2 (de) |
| EP (1) | EP1314176B1 (de) |
| AT (1) | ATE338340T1 (de) |
| AU (1) | AU2001283323A1 (de) |
| DE (1) | DE60122747T2 (de) |
| WO (1) | WO2002019372A2 (de) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6858455B2 (en) * | 2001-05-25 | 2005-02-22 | Ut-Battelle, Llc | Gated fabrication of nanostructure field emission cathode material within a device |
| US6982519B2 (en) * | 2001-09-18 | 2006-01-03 | Ut-Battelle Llc | Individually electrically addressable vertically aligned carbon nanofibers on insulating substrates |
| US6984579B2 (en) * | 2003-02-27 | 2006-01-10 | Applied Materials, Inc. | Ultra low k plasma CVD nanotube/spin-on dielectrics with improved properties for advanced nanoelectronic device fabrication |
| FR2851737B1 (fr) * | 2003-02-28 | 2006-05-26 | Commissariat Energie Atomique | Catalyseur structure notamment pour la realisation d'ecrans plats a emission de champ |
| US7521851B2 (en) * | 2003-03-24 | 2009-04-21 | Zhidan L Tolt | Electron emitting composite based on regulated nano-structures and a cold electron source using the composite |
| US7390535B2 (en) * | 2003-07-03 | 2008-06-24 | Aeromet Technologies, Inc. | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
| US7279686B2 (en) * | 2003-07-08 | 2007-10-09 | Biomed Solutions, Llc | Integrated sub-nanometer-scale electron beam systems |
| JP2007504086A (ja) * | 2003-09-03 | 2007-03-01 | 本田技研工業株式会社 | 一次元炭素ナノ構造体の製造方法 |
| US8541054B2 (en) * | 2003-09-08 | 2013-09-24 | Honda Motor Co., Ltd | Methods for preparation of one-dimensional carbon nanostructures |
| WO2005038468A1 (en) * | 2003-09-22 | 2005-04-28 | Brother International Corporation | A method and apparatus for sensing applied forces |
| US7459839B2 (en) * | 2003-12-05 | 2008-12-02 | Zhidan Li Tolt | Low voltage electron source with self aligned gate apertures, and luminous display using the electron source |
| US8102108B2 (en) * | 2003-12-05 | 2012-01-24 | Zhidan Li Tolt | Low voltage electron source with self aligned gate apertures, fabrication method thereof, and devices using the electron source |
| FR2865946B1 (fr) * | 2004-02-09 | 2007-12-21 | Commissariat Energie Atomique | Procede de realisation d'une couche de materiau sur un support |
| JP4558735B2 (ja) * | 2004-07-27 | 2010-10-06 | 大日本スクリーン製造株式会社 | カーボンナノチューブデバイス、ならびに、その製造方法 |
| US20060275537A1 (en) * | 2005-06-02 | 2006-12-07 | The Regents Of The University Of California | Method and apparatus for field-emission high-pressure-discharge laser chemical vapor deposition of free-standing structures |
| US7763353B2 (en) * | 2005-06-10 | 2010-07-27 | Ut-Battelle, Llc | Fabrication of high thermal conductivity arrays of carbon nanotubes and their composites |
| KR100634547B1 (ko) * | 2005-07-09 | 2006-10-13 | 삼성에스디아이 주식회사 | 링 타입 에미터를 갖는 전계방출소자 및 그 제조 방법 |
| CN100436311C (zh) * | 2005-07-22 | 2008-11-26 | 清华大学 | 碳纳米管阵列制作方法 |
| CN100462300C (zh) * | 2005-07-29 | 2009-02-18 | 鸿富锦精密工业(深圳)有限公司 | 碳纳米管生长装置 |
| CN100418876C (zh) * | 2005-08-19 | 2008-09-17 | 清华大学 | 碳纳米管阵列制备装置及方法 |
| US7544523B2 (en) * | 2005-12-23 | 2009-06-09 | Fei Company | Method of fabricating nanodevices |
| US7927666B2 (en) * | 2006-06-30 | 2011-04-19 | The University Of Akron | Aligned carbon nanotube-polymer materials, systems and methods |
| US8535791B2 (en) | 2006-06-30 | 2013-09-17 | The University Of Akron | Aligned carbon nanotube-polymer materials, systems and methods |
| TWI340985B (en) * | 2007-07-06 | 2011-04-21 | Chunghwa Picture Tubes Ltd | Field emission device array substrate and fabricating method thereof |
| WO2010109454A1 (en) * | 2009-03-23 | 2010-09-30 | El-Mul Technologies, Ltd. | Nanotube-based electron emission device and method for fabrication thereof |
| KR101864219B1 (ko) * | 2011-05-31 | 2018-06-05 | 한국전자통신연구원 | 전계 방출 장치 |
| US9306167B2 (en) * | 2012-01-19 | 2016-04-05 | Technion Research & Development Foundation Limited | Field emission device and method of fabricating the same |
| US8815780B2 (en) | 2012-02-09 | 2014-08-26 | Ut-Battelle, Llc | Platform for immobilization and observation of subcellular processes |
| US9053890B2 (en) | 2013-08-02 | 2015-06-09 | University Health Network | Nanostructure field emission cathode structure and method for making |
| JP6448594B2 (ja) * | 2016-09-13 | 2019-01-09 | 株式会社東芝 | 導電性プローブ、電気特性評価システム、走査型プローブ顕微鏡、導電性プローブ製造方法、及び、電気特性測定方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4405768A1 (de) * | 1994-02-23 | 1995-08-24 | Till Keesmann | Feldemissionskathodeneinrichtung und Verfahren zu ihrer Herstellung |
| US5872422A (en) * | 1995-12-20 | 1999-02-16 | Advanced Technology Materials, Inc. | Carbon fiber-based field emission devices |
| US5892231A (en) * | 1997-02-05 | 1999-04-06 | Lockheed Martin Energy Research Corporation | Virtual mask digital electron beam lithography |
| US5855675A (en) * | 1997-03-03 | 1999-01-05 | Genus, Inc. | Multipurpose processing chamber for chemical vapor deposition processes |
| US6062931A (en) * | 1999-09-01 | 2000-05-16 | Industrial Technology Research Institute | Carbon nanotube emitter with triode structure |
| US6512235B1 (en) * | 2000-05-01 | 2003-01-28 | El-Mul Technologies Ltd. | Nanotube-based electron emission device and systems using the same |
-
2001
- 2001-03-15 US US09/810,531 patent/US6692324B2/en not_active Expired - Fee Related
- 2001-08-09 AT AT01962116T patent/ATE338340T1/de not_active IP Right Cessation
- 2001-08-09 WO PCT/US2001/025270 patent/WO2002019372A2/en not_active Ceased
- 2001-08-09 EP EP01962116A patent/EP1314176B1/de not_active Expired - Lifetime
- 2001-08-09 DE DE60122747T patent/DE60122747T2/de not_active Expired - Fee Related
- 2001-08-09 AU AU2001283323A patent/AU2001283323A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002019372A2 (en) | 2002-03-07 |
| EP1314176B1 (de) | 2006-08-30 |
| DE60122747T2 (de) | 2007-09-06 |
| DE60122747D1 (de) | 2006-10-12 |
| AU2001283323A1 (en) | 2002-03-13 |
| EP1314176A2 (de) | 2003-05-28 |
| WO2002019372A3 (en) | 2002-06-06 |
| US6692324B2 (en) | 2004-02-17 |
| US20020024279A1 (en) | 2002-02-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE338340T1 (de) | Feldemissionsvorrichtung mit kohlenstoffhaltigen spitzen | |
| US5290610A (en) | Forming a diamond material layer on an electron emitter using hydrocarbon reactant gases ionized by emitted electrons | |
| FR2815954B1 (fr) | Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus | |
| TW469534B (en) | Plasma processing method and apparatus | |
| WO2005021430A1 (ja) | カーボンナノウォールの製造方法、カーボンナノウォールおよび製造装置 | |
| JP2006507211A5 (de) | ||
| US5058527A (en) | Thin film forming apparatus | |
| JP4963539B2 (ja) | カーボンナノチューブの作製方法及びその方法を実施するプラズマcvd装置 | |
| EP0878823A3 (de) | Vorrichtung und Verfahren zur plasmachemischen Abscheidung | |
| US6670629B1 (en) | Insulated gate field emitter array | |
| JP3792977B2 (ja) | 電子放出膜及び電界放出型冷陰極デバイス | |
| US5145712A (en) | Chemical deposition of diamond | |
| JPH0541705B2 (de) | ||
| KR100362899B1 (ko) | 탄소 나노튜브를 이용한 전계방출 표시소자의 제조 방법 | |
| EP1737012A3 (de) | Feldemissionsvorrichtung mit Kohlenstoffhaltigen spitzen | |
| JP4881504B2 (ja) | 熱cvd法によるグラファイトナノファイバー薄膜の選択形成方法 | |
| KR20080114316A (ko) | 박막 증착 장치 | |
| JP2003137521A (ja) | 成膜方法 | |
| JP4644346B2 (ja) | 熱cvd法によるグラファイトナノファイバー薄膜形成方法 | |
| JPS61238981A (ja) | 高周波エツチングの均一化方法 | |
| JP4284438B2 (ja) | 成膜方法 | |
| RU2161837C2 (ru) | Способ осаждения вещества на поверхность подложки | |
| US7691441B2 (en) | Method of forming carbon fibers using metal-organic chemical vapor deposition | |
| JP2001192830A (ja) | 大口径カーボンナノチューブ薄膜形成プラズマcvd装置及び該薄膜の形成方法 | |
| RU97116747A (ru) | Способ получения легированных алмазоподобных покрытий |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |