ATE354866T1 - Elektrische vorrichtung mit phasenwechselmaterial und parallelheizung - Google Patents

Elektrische vorrichtung mit phasenwechselmaterial und parallelheizung

Info

Publication number
ATE354866T1
ATE354866T1 AT03813663T AT03813663T ATE354866T1 AT E354866 T1 ATE354866 T1 AT E354866T1 AT 03813663 T AT03813663 T AT 03813663T AT 03813663 T AT03813663 T AT 03813663T AT E354866 T1 ATE354866 T1 AT E354866T1
Authority
AT
Austria
Prior art keywords
change material
phase
phase change
electrical device
parallel heating
Prior art date
Application number
AT03813663T
Other languages
English (en)
Inventor
Martijn H R Lankhorst
Erwin R Meinders
Robertus A M Wolters
Franciscus P Widdershoven
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE354866T1 publication Critical patent/ATE354866T1/de

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/30—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80—Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/061—Shaping switching materials
    • H10N70/068—Shaping switching materials by processes specially adapted for achieving sub-lithographic dimensions, e.g. using spacers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/821—Device geometry
    • H10N70/823—Device geometry adapted for essentially horizontal current flow, e.g. bridge type devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/821—Device geometry
    • H10N70/826—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H10N70/8265—Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices on sidewalls of dielectric structures, e.g. mesa-shaped or cup-shaped devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/861—Thermal details
    • H10N70/8613—Heating or cooling means other than resistive heating electrodes, e.g. heater in parallel
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828—Tellurides, e.g. GeSbTe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/884—Switching materials based on at least one element of group IIIA, IVA or VA, e.g. elemental or compound semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/90—Bulk effect device making

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Control Of Resistance Heating (AREA)
  • Resistance Heating (AREA)
  • Constitution Of High-Frequency Heating (AREA)
  • General Induction Heating (AREA)
AT03813663T 2002-12-19 2003-12-05 Elektrische vorrichtung mit phasenwechselmaterial und parallelheizung ATE354866T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP02080430 2002-12-19
EP03100583 2003-03-07
EP03103340 2003-09-10

Publications (1)

Publication Number Publication Date
ATE354866T1 true ATE354866T1 (de) 2007-03-15

Family

ID=32685712

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03813663T ATE354866T1 (de) 2002-12-19 2003-12-05 Elektrische vorrichtung mit phasenwechselmaterial und parallelheizung

Country Status (9)

Country Link
US (1) US7307267B2 (de)
EP (1) EP1576670B1 (de)
JP (1) JP2006511973A (de)
KR (1) KR20050084319A (de)
AT (1) ATE354866T1 (de)
AU (1) AU2003303171A1 (de)
DE (1) DE60312040T2 (de)
TW (1) TW200503113A (de)
WO (1) WO2004057676A2 (de)

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DE102004041894B3 (de) 2004-08-30 2006-03-09 Infineon Technologies Ag Speicherbauelement (CBRAM) mit Speicherzellen auf der Basis eines in seinem Widerstandswert änderbaren aktiven Festkörper-Elektrolytmaterials und Herstellungsverfahren dafür
KR100568543B1 (ko) * 2004-08-31 2006-04-07 삼성전자주식회사 작은 접점을 갖는 상변화 기억 소자의 제조방법
US7023008B1 (en) * 2004-09-30 2006-04-04 Infineon Technologies Ag Resistive memory element
KR100842903B1 (ko) * 2005-06-10 2008-07-02 주식회사 하이닉스반도체 상변환 기억 소자 및 그의 제조방법
JP4560818B2 (ja) * 2005-07-22 2010-10-13 エルピーダメモリ株式会社 半導体装置及びその製造方法
JP2007080311A (ja) * 2005-09-12 2007-03-29 Sony Corp 記憶装置及び半導体装置
DE602005011972D1 (de) 2005-09-14 2009-02-05 St Microelectronics Srl Ringförmiger Heizer für eine Phasenübergangsspeichervorrichtung
US7671356B2 (en) * 2005-11-03 2010-03-02 Elpida Memory, Inc. Electrically rewritable non-volatile memory element and method of manufacturing the same
JP4950490B2 (ja) * 2005-12-28 2012-06-13 株式会社東芝 不揮発性スイッチング素子およびその製造方法ならびに不揮発性スイッチング素子を有する集積回路
KR100660287B1 (ko) * 2005-12-29 2006-12-20 동부일렉트로닉스 주식회사 상변화 메모리 및 그 제조 방법
US7723712B2 (en) * 2006-03-17 2010-05-25 Micron Technology, Inc. Reduced power consumption phase change memory and methods for forming the same
US7884346B2 (en) 2006-03-30 2011-02-08 Panasonic Corporation Nonvolatile memory element and manufacturing method thereof
US7812334B2 (en) * 2006-04-04 2010-10-12 Micron Technology, Inc. Phase change memory elements using self-aligned phase change material layers and methods of making and using same
US9178141B2 (en) 2006-04-04 2015-11-03 Micron Technology, Inc. Memory elements using self-aligned phase change material layers and methods of manufacturing same
JP4437479B2 (ja) 2006-08-02 2010-03-24 株式会社半導体理工学研究センター 相変化メモリ素子
US7800092B2 (en) 2006-08-15 2010-09-21 Micron Technology, Inc. Phase change memory elements using energy conversion layers, memory arrays and systems including same, and methods of making and using
JP4267013B2 (ja) 2006-09-12 2009-05-27 エルピーダメモリ株式会社 半導体装置の製造方法
JP4257354B2 (ja) 2006-09-20 2009-04-22 エルピーダメモリ株式会社 相変化メモリ
KR100764343B1 (ko) * 2006-09-22 2007-10-08 주식회사 하이닉스반도체 비휘발성 메모리 소자 및 그 제조방법
KR100855855B1 (ko) 2006-10-04 2008-09-01 주식회사 하이닉스반도체 비휘발성 메모리 소자 및 그 제조방법
US20080160256A1 (en) * 2006-12-30 2008-07-03 Bristol Robert L Reduction of line edge roughness by chemical mechanical polishing
US8379438B2 (en) 2007-03-30 2013-02-19 Nxp B.V. Electronic device, and method of operating an electronic device
CN101663771A (zh) 2007-04-20 2010-03-03 Nxp股份有限公司 电子器件和制造电子器件的方法
US7719886B2 (en) * 2007-05-03 2010-05-18 Qimonda North America Corp. Multi-level resistive memory cell using different crystallization speeds
KR100888617B1 (ko) * 2007-06-15 2009-03-17 삼성전자주식회사 상변화 메모리 장치 및 그 형성 방법
US7811851B2 (en) * 2007-09-28 2010-10-12 Freescale Semiconductor, Inc. Phase change memory structures
US7888155B2 (en) * 2009-03-16 2011-02-15 Industrial Technology Research Institute Phase-change memory element and method for fabricating the same
US8077504B2 (en) * 2009-04-09 2011-12-13 Qualcomm Incorporated Shallow trench type quadri-cell of phase-change random access memory (PRAM)
US20110108792A1 (en) * 2009-11-11 2011-05-12 International Business Machines Corporation Single Crystal Phase Change Material
US8233317B2 (en) 2009-11-16 2012-07-31 International Business Machines Corporation Phase change memory device suitable for high temperature operation
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Also Published As

Publication number Publication date
EP1576670A2 (de) 2005-09-21
US7307267B2 (en) 2007-12-11
WO2004057676A2 (en) 2004-07-08
DE60312040D1 (de) 2007-04-05
US20060208847A1 (en) 2006-09-21
DE60312040T2 (de) 2007-12-13
EP1576670B1 (de) 2007-02-21
WO2004057676A3 (en) 2004-09-02
TW200503113A (en) 2005-01-16
KR20050084319A (ko) 2005-08-26
JP2006511973A (ja) 2006-04-06
AU2003303171A1 (en) 2004-07-14

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