ATE35697T1 - Verfahren zum ueberziehen von optischen substraten mit reflexvermindernden schichten, die geaetzt werden koennen. - Google Patents

Verfahren zum ueberziehen von optischen substraten mit reflexvermindernden schichten, die geaetzt werden koennen.

Info

Publication number
ATE35697T1
ATE35697T1 AT85401784T AT85401784T ATE35697T1 AT E35697 T1 ATE35697 T1 AT E35697T1 AT 85401784 T AT85401784 T AT 85401784T AT 85401784 T AT85401784 T AT 85401784T AT E35697 T1 ATE35697 T1 AT E35697T1
Authority
AT
Austria
Prior art keywords
enclosure
chromium
coating
chromium oxide
extinction
Prior art date
Application number
AT85401784T
Other languages
English (en)
Inventor
Michel Letellier
Original Assignee
D M E
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by D M E filed Critical D M E
Application granted granted Critical
Publication of ATE35697T1 publication Critical patent/ATE35697T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
AT85401784T 1984-09-19 1985-09-16 Verfahren zum ueberziehen von optischen substraten mit reflexvermindernden schichten, die geaetzt werden koennen. ATE35697T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8414369A FR2570392B1 (fr) 1984-09-19 1984-09-19 Procede de depot sur substrats optiques de couches antireflechissantes susceptibles d'etre gravees
EP85401784A EP0178969B1 (de) 1984-09-19 1985-09-16 Verfahren zum Überziehen von optischen Substraten mit reflexvermindernden Schichten, die geätzt werden können

Publications (1)

Publication Number Publication Date
ATE35697T1 true ATE35697T1 (de) 1988-07-15

Family

ID=9307861

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85401784T ATE35697T1 (de) 1984-09-19 1985-09-16 Verfahren zum ueberziehen von optischen substraten mit reflexvermindernden schichten, die geaetzt werden koennen.

Country Status (5)

Country Link
US (1) US4676992A (de)
EP (1) EP0178969B1 (de)
AT (1) ATE35697T1 (de)
DE (1) DE3563754D1 (de)
FR (1) FR2570392B1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1037702C (zh) * 1993-04-16 1998-03-11 利比-欧文斯-福特公司 涂敷－玻璃基片的方法和设备
US6231992B1 (en) 1998-09-04 2001-05-15 Yazaki Corporation Partial reflector
JP4447755B2 (ja) * 2000-08-28 2010-04-07 独立行政法人産業技術総合研究所 ＺｎＯ系酸化物半導体層の成長方法およびそれを用いた半導体発光素子の製法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE835203C (de) * 1948-10-02 1952-03-27 Physikalisches Untersuchungsla Verfahren zur genauen Bemessung der Schichtdicken beim Aufbringen reflexvermindernder Schichten auf optische Elemente durch Vakuumverdampfung oder Kathodenzerstaeubung
US2904452A (en) * 1956-04-16 1959-09-15 Heraeus Gmbh W C Oxide coating
US3208873A (en) * 1962-01-05 1965-09-28 Ibm Method and apparatus for depositing films of refractory metal oxides and refractory metals
FR1449361A (fr) * 1964-08-28 1966-08-12 Balzers Patent Beteilig Ag Procédé pour accroître la robustesse de la liaison entre des couches minces de matière
US3698928A (en) * 1967-11-14 1972-10-17 Fairchild Camera Instr Co Multilayer antireflective absorption film
US3808035A (en) * 1970-12-09 1974-04-30 M Stelter Deposition of single or multiple layers on substrates from dilute gas sweep to produce optical components, electro-optical components, and the like
JPS539060B1 (de) * 1971-05-24 1978-04-03
CH625054A5 (de) * 1976-12-27 1981-08-31 Balzers Hochvakuum
US4107349A (en) * 1977-08-12 1978-08-15 The United States Of America As Represented By The Secretary Of The Army Method of adjusting the frequency of piezoelectric resonators
US4172356A (en) * 1977-10-27 1979-10-30 Westland Industries, Inc. Yard rake
JPS57104141A (en) * 1980-12-22 1982-06-29 Dainippon Printing Co Ltd Photomask and photomask substrate
US4430366A (en) * 1981-02-04 1984-02-07 Minnesota Mining And Manufacturing Company Metal/metal oxide coating
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法

Also Published As

Publication number Publication date
FR2570392A1 (fr) 1986-03-21
EP0178969B1 (de) 1988-07-13
US4676992A (en) 1987-06-30
EP0178969A1 (de) 1986-04-23
FR2570392B1 (fr) 1987-01-02
DE3563754D1 (en) 1988-08-18

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